| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/27/2003 | US20030039923 Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask |
| 02/27/2003 | US20030039922 Method of making an integrated circuit using a reflective mask |
| 02/27/2003 | US20030039900 Method for fabricating a mask configuration |
| 02/27/2003 | US20030039899 Mask for fabricating semiconductor components |
| 02/27/2003 | US20030039898 For integrated circuits; fitting segments, calibration |
| 02/27/2003 | US20030039897 Semiconductor device manufacturing mask substrate and semiconductor device manufacturing method |
| 02/27/2003 | US20030039895 Photomask, method for manufacturing the same and method for detecting/repairing defects in photomask |
| 02/27/2003 | US20030039894 Multilayer stacks; alternating phase shifting |
| 02/27/2003 | US20030039893 Phase shifting masking |
| 02/27/2003 | US20030039892 Radiation transparent plate; overcoating with opacity film; forming pattern |
| 02/27/2003 | US20030038330 Semiconductor Device |
| 02/27/2003 | US20030038250 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 02/26/2003 | EP1286381A2 Means for monitoring process conditions change in electron beam systems and related monitoring methods |
| 02/26/2003 | EP1286220A2 Exposure apparatus and exposing method |
| 02/26/2003 | EP1286219A2 Method of recording identifier and set of photomasks |
| 02/26/2003 | EP1286218A2 Lithographic patterning using a high transmission attenuated phase-shift mask and multiple exposures of optimised coherence |
| 02/26/2003 | EP1286217A2 Phase shift mask blanks, their manufacture and use |
| 02/26/2003 | EP0993490B1 Method for producing fine pigment dispersions |
| 02/26/2003 | CN1399796A Method and apparatus for personalization of semiconductor |
| 02/25/2003 | US6524870 Method and apparatus for improving resolution of objects in a semiconductor wafer |
| 02/25/2003 | US6524756 Gray scale all-glass photomasks |
| 02/25/2003 | US6524755 Lithography |
| 02/25/2003 | US6524754 Semiconductor photomask having increased durability, improved transmission uniformity, and birefringence properties |
| 02/25/2003 | US6524753 Method for manufacturing phase shift mask |
| 02/25/2003 | US6524752 Integrated circuits, photolithography |
| 02/25/2003 | US6524751 Design for ensuring that both the 0 degree light and the 180 degree light passing through mask are of approximately equal amplitude; semiconductors |
| 02/25/2003 | US6523471 Chemical imaging of a lithographic printing plate |
| 02/20/2003 | WO2003015135A2 Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same |
| 02/20/2003 | WO2003014831A2 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 02/20/2003 | WO2003014829A1 Mask and method for producing a mask |
| 02/20/2003 | WO2003014828A1 Resolution enhancement for alternating phase shift masks |
| 02/20/2003 | WO2003013993A1 Reticle protection and transport |
| 02/20/2003 | WO2002101419A3 Optical element with full complex modulation |
| 02/20/2003 | WO2002071154A3 Method of uniformly coating a substrate |
| 02/20/2003 | US20030037308 Layout verification method, program thereof, and layout verification apparatus |
| 02/20/2003 | US20030036293 Method for manufacturing a semiconductor device |
| 02/20/2003 | US20030036288 Method for forming a metal pattern on a dielectric substrate |
| 02/20/2003 | US20030036025 Method of recording identifier and set of photomasks |
| 02/20/2003 | US20030036022 Method for producing a self-supporting electron-optical transparent structure, and structure produced in accordance with the method |
| 02/20/2003 | US20030036007 Field correction of overlay error |
| 02/20/2003 | US20030036005 Method for producing a photomask and corresponding photomask |
| 02/20/2003 | US20030036004 The photographic emulsion surface protective layer in an uncured state comprises an ionized radiation-curable resin composition containing a hydrophilic group-containing monofunctional and a polyfunctional (meth)acrylate |
| 02/20/2003 | US20030035575 Method of defect inspection of graytone mask and apparatus doing the same |
| 02/20/2003 | US20030035508 Exposure apparatus and exposing method |
| 02/20/2003 | US20030035222 Pellicle |
| 02/20/2003 | US20030034570 Field correction of overlay error |
| 02/20/2003 | DE10124124C1 Lithography masking device has thermal expansion coefficient of pellicle frame material matched to that of mask material |
| 02/18/2003 | USRE37996 Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor |
| 02/18/2003 | US6523165 Alternating phase shift mask design conflict resolution |
| 02/18/2003 | US6523164 Classification and processing of data by computer; automatic modification; semiconductors, integrated circuits |
| 02/18/2003 | US6523163 Method for forming pattern data and method for writing a photomask with additional patterns |
| 02/18/2003 | US6523162 General purpose shape-based layout processing scheme for IC layout modifications |
| 02/18/2003 | US6522389 Scanning exposure photo-mask and method of scanning exposure and scanning exposure system |
| 02/18/2003 | US6521901 System to reduce heat-induced distortion of photomasks during lithography |
| 02/18/2003 | US6521900 Alignment marks for charged-particle-beam microlithography, and alignment methods using same |
| 02/18/2003 | US6521543 Multiple exposure method |
| 02/18/2003 | US6521390 Heat-combustible polymeric binder, at least one IR- absorbing material and at least one aliphatic diester; computer-to-plate- technology |
| 02/18/2003 | US6521383 X-rays absorber as etching barrier |
| 02/18/2003 | US6520083 Apparatus for producing printing plates having movable journal for axial removal of plate |
| 02/13/2003 | WO2003012551A1 Electron beam processing |
| 02/13/2003 | WO2003012546A2 Damascene extreme ultraviolet lithography (euvl) photomask and method of making |
| 02/13/2003 | US20030033581 Method of layout compaction |
| 02/13/2003 | US20030031961 Dual-focused ion beams for semiconductor image scanning and mask repair |
| 02/13/2003 | US20030031943 Focus monitoring method, focus monitoring system, and device fabricating method |
| 02/13/2003 | US20030031941 Multiple pass write method and reticle |
| 02/13/2003 | US20030031939 Large-area membrane mask and method for fabricating the mask |
| 02/13/2003 | US20030031938 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask |
| 02/13/2003 | US20030031937 Absorberless phase-shifting mask for EUV |
| 02/13/2003 | US20030031936 Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same |
| 02/13/2003 | US20030031935 The line width of non-exposure region can be freely controlled by the line width control region and not restricted to the wavelength of the incident radiation. |
| 02/13/2003 | US20030031934 Various portions of the pattern are all maintained at the same electrical potential thereby preventing damage due to an electrostatic discharge. |
| 02/13/2003 | US20030031890 Angular substrates |
| 02/13/2003 | US20030031545 System and method for reticle protection and transport |
| 02/13/2003 | US20030030796 Method of defect inspection of graytone mask and apparatus doing the same |
| 02/13/2003 | US20030030016 Reticles and rapid reticle-evaluation methods for use in charged-particle-beam microlithography |
| 02/13/2003 | US20030029378 Apparatus for coating on printing clinders |
| 02/12/2003 | EP1283551A2 Angular substrates |
| 02/12/2003 | CN1397090A Wet-etching agent composition |
| 02/12/2003 | CN1396628A Method for making compound semiconductor device |
| 02/12/2003 | CN1396494A Measuring method and correction method for illumination irregularity of exposure device |
| 02/11/2003 | US6519761 Photomask designing method, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element |
| 02/11/2003 | US6519760 Method and apparatus for minimizing optical proximity effects |
| 02/11/2003 | US6519759 Photomask pattern shape correction method and corrected photomask |
| 02/11/2003 | US6519758 Method of checking exposure patterns formed over photo-mask |
| 02/11/2003 | US6518180 Method for fabricating semiconductor device and method for forming mask suitable therefor |
| 02/11/2003 | US6517983 Aberration estimating mask pattern |
| 02/11/2003 | US6517982 Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same |
| 02/11/2003 | US6517978 Method to produce equal sized features in microlithography |
| 02/06/2003 | WO2003010692A1 Reduced disk access for complex mask generation |
| 02/06/2003 | WO2003010606A1 Fluoropolymer-coated photomasks for photolithography |
| 02/06/2003 | WO2003010605A2 Pattern generation method and apparatus using cached cells of hierarchical data |
| 02/06/2003 | WO2003010601A1 Method of preparing optically imaged high performance photomasks |
| 02/06/2003 | WO2003010598A1 Removable optical pellicle |
| 02/06/2003 | WO2002003139A9 Phase-shift lithography mapping method and apparatus |
| 02/06/2003 | US20030027425 Patterned product and its manufacturing method |
| 02/06/2003 | US20030027366 Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns |
| 02/06/2003 | US20030027083 Method of preparing optically imaged high performance photomasks |
| 02/06/2003 | US20030027082 Maintaining surface to be etched below freezing temperature of phase-change masking material; ejecting in liquid form droplets of phase change masking material in a predetermined pattern; etching surface to remove material; removing mask |
| 02/06/2003 | US20030027065 Mask for measuring optical aberration and method of measuring optical aberration |
| 02/06/2003 | US20030027064 Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same |