Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
03/2003
03/20/2003US20030054263 Multilayer; first mask having separation patterns; second mask is high density, overlapping patterns; transferring exposure
03/20/2003US20030054262 In-situ balancing for phase-shifting mask
03/20/2003US20030054260 In-situ balancing for phase-shifting mask
03/20/2003US20030052342 Method for forming a pattern and a semiconductor device
03/20/2003US20030052084 In-situ or ex-situ profile monitoring of phase openings on alternating phase shifting masks by scatterometry
03/20/2003US20030051740 Forming chrome photomasks and phase-shift masks without producing chrome opaque defects.
03/20/2003DE10127547C1 Verfahren zur Durchführung einer regelbasierten OPC bei gleichzeitigem Einsatz von Scatterbars A method for performing a rule-based OPC while running Scatterbars
03/19/2003EP1293833A1 High resolution printing technique by using a mask pattern adapted to the technique
03/19/2003EP1240556A4 Photolithography method, photolithography mask blanks, and method of making
03/19/2003CN1403873A Optical proximity effect correcting method
03/18/2003US6536032 Method of processing exposure mask-pattern data, simulation using this method, and recording medium
03/18/2003US6536015 Apparatus and method of correcting layout pattern data, method of manufacturing semiconductor devices and recording medium
03/18/2003US6534425 Mask design and method for controlled profile fabrication
03/18/2003US6534417 Method and apparatus for etching photomasks
03/18/2003US6534244 Phase-shifting masks used for forming features on a semiconductor substrate
03/18/2003US6534225 Removed by employing methods which provide a gradual sloped region in the transparent or semi-transparent substrate which is formed in an area of the substrate opposite to that of the opaque image which is formed thereon.
03/18/2003US6534224 Phase shift mask and system and method for making the same
03/18/2003US6534223 Ion implanting a species into the light transmissive substrate through openings; increasing a wet etch rate of the light transmissive substrate in a wet etch chemistry
03/18/2003US6534222 Reticles including support frame for charged-particle-beam microlithography, and methods for making same
03/18/2003US6534221 Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
03/18/2003US6533952 Mitigation of radiation induced surface contamination
03/13/2003WO2003021659A1 Methods and apparatus for etching metal layers on substrates
03/13/2003WO2003021654A2 System and method for identifying dummy features on a mask layer
03/13/2003WO2003021353A1 Photolithographic mask
03/13/2003WO2003021352A1 Reticle and optical characteristic measuring method
03/13/2003WO2003021351A2 Phase-shift mask
03/13/2003WO2002071105A3 Method of fabricating reflection-mode euv diffraction elements
03/13/2003WO2002050614A3 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
03/13/2003WO2002037537A3 Phase transition design to maintain constant line length through focus
03/13/2003US20030051225 Method for generating mask data, masks, recording media, and method for manufacturing semiconductor devices
03/13/2003US20030051224 Aggressive optical proximity correction method
03/13/2003US20030049946 Woven faced or warp knitted fabric composed of meta-aramid and/or polyamideimide fibers, including woven mesh back of low thermal shrinkage fibers which form interwoven backing scrim on face fabric, having specified ratio of face to back yarns
03/13/2003US20030049934 Methods and apparatus for etching metal layers on substrates
03/13/2003US20030049571 Exposing a substrate with the patterned photoresist to a vapor which penetrates the surface and heating for a time to cause the photoresist to flow
03/13/2003US20030049569 1-10 micrometer thick crystaline membrane surrounded by a frame of a bulk type crystalline material
03/13/2003US20030049565 Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio
03/13/2003US20030049546 Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfields
03/13/2003US20030049545 Reduced distortion; microelectronics, semiconductors, integrated circuits
03/13/2003US20030049544 Which can correct the spherical aberration caused by semi-dense lines (of opaque chromium coating) and increase the process window; for use in double exposure lithography; integrated circuits
03/13/2003US20030048988 Method for fabricating chirped fiber bragg gratings
03/13/2003US20030048939 Method of and apparatus for inspection of articles by comparison with a master
03/13/2003US20030047691 Directing electron beam activated etchant gas toward excess material defect on photolithography mask; directing electron beam toward defect to activate electron beam activated etchant gas near impact point of beam to remove defect
03/13/2003US20030047682 Detecting apparatus and device manufacturing method
03/13/2003US20030046821 Reticle, and pattern positional accuracy measurement device and method
03/12/2003EP1291900A2 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device
03/12/2003EP1291722A2 Method of recording identifier and set of photomasks
03/12/2003EP1290500A1 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor
03/12/2003EP1290496A2 Modification of mask layout data to improve mask fidelity
03/12/2003EP1290495A2 A method and apparatus for etching metal layers on substrates
03/12/2003EP1290430A1 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
03/12/2003EP1071981B1 Method for producing large-surface membrane masks
03/12/2003CN1402322A Monitoring system and method for monitoring process condition change by electron beam
03/12/2003CN1401994A Gray tone mask defect detecting method and defect detecting device
03/12/2003CN1401993A Gray tone mask defect detecting method and device, and optical mask defect detecting method and device
03/11/2003US6532585 Method and apparatus for application of proximity correction with relative segmentation
03/11/2003US6531403 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device
03/11/2003US6531251 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics
03/11/2003US6531250 Half-tone phase shift mask having a stepped aperture
03/11/2003US6531249 Reticle blanks for charged-particle-beam microlithography and methods for making same
03/11/2003US6531184 Multilayer of liquids; flexography printing sleeves; infrared radiation sensitivity
03/06/2003WO2003019626A2 Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
03/06/2003WO2003019291A2 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making
03/06/2003WO2003019290A2 Patterning an integrated circuit using a reflective mask
03/06/2003WO2003019272A2 Exposure mask
03/06/2003WO2002054151A3 A method for fabricating reticles
03/06/2003US20030046655 Data processing method and apparatus, reticle mask,exposing method and apparatus, and recording medium
03/06/2003US20030046654 Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor
03/06/2003US20030046653 Microloading effect correction
03/06/2003US20030044730 Substrate having character/symbol section and processing method of character/symbol section
03/06/2003US20030044721 Fabrication method of semiconductor integrated circuit device
03/06/2003US20030044698 Method for adjusting a multilevel phase-shifting mask or reticle
03/06/2003US20030044697 Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the same
03/06/2003US20030044696 Verification photomask
03/06/2003US20030044695 Bilayer mask with a native oxide-free, elemental metal, first layer to attenuate the light; and a second layer to impart a phase delay on the light
03/06/2003US20030044694 Improved the accuracy of critical dimensions of the mask pattern.
03/06/2003US20030044692 Optical proximity correction verification mask
03/06/2003US20030044059 System and method for indentifying dummy features on a mask layer
03/06/2003US20030044058 Reticle inspection apparatus
03/06/2003US20030043455 Collector for an illumination system with a wavelength of less than or equal to 193 nm
03/06/2003US20030043370 Method and apparatus for inspecting an EUV mask blank
03/06/2003US20030043356 Projection exposure apparatus and method
03/06/2003US20030043321 Slant reflector with bump structure and fabricating method thereof
03/06/2003US20030042433 Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate
03/05/2003EP1288718A2 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with bragg grating, and dispersion compensation device using the optical fiber
03/05/2003EP1288717A2 Phase shift mask blank, phase shift mask, and method of manufacture
03/05/2003EP1288716A1 Phase-shift mask
03/05/2003EP1287332A2 Straight line defect detection
03/05/2003CN1400630A Chromium-free phase-shift mask and equipment using said mask
03/05/2003CN1400627A 薄膜 Film
03/05/2003CN1400506A Exposure process
03/04/2003US6529621 Mechanisms for making and inspecting reticles
03/04/2003US6529463 Very-high-density memory device utilizing a scintillating data-storage medium
03/04/2003US6529266 Device and method for flat holding of a substrate in microlithography
03/04/2003US6528836 Photomask ESD protection and an anti-ESD pod with such protection
03/04/2003US6528806 Charged-particle-beam microlithography apparatus, reticles, and methods for reducing proximity effects, and device-manufacturing methods comprising same
03/04/2003US6528217 Electrically programmable photolithography mask
03/04/2003US6528216 Phase shift mask and fabrication method thereof
03/04/2003US6528215 Forming buried oxide layer on front side of silicon substrate, forming thin nucleation layer that nucleates diamond growth on buried oxide layer, growing on surface of nucleation layer thin diamond film, thus forming substrate for stencil mask
02/2003
02/27/2003US20030039928 Forming semiconductor wafer; lithography
02/27/2003US20030039925 Methods for forming a photosensitive insulating film pattern and reflection electrode each having an irregular upper surface and method for manufacturing a LCD having reflection electrode using the same
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