Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
04/2003
04/09/2003EP1300857A2 Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems
04/09/2003EP1300676A1 Method and apparatus for inspecting multilayer masks for defects
04/09/2003EP1299824A1 Convergence technique for model-based optical and proximity correction
04/09/2003EP1299771A1 Phase shift masking for complex patterns
04/09/2003EP1095346A4 Two-dimensional to three-dimensional vlsi design
04/09/2003CN1409171A Photoetching programming system and its use
04/08/2003US6546544 Method of producing mask data for partial one-shot transfer exposure and exposure method
04/08/2003US6546543 Method of displaying, inspecting and modifying pattern for exposure
04/08/2003US6546540 Method of automatic layout design for LSI, mask set and semiconductor integrated circuit manufactured by automatic layout design method, and recording medium storing automatic layout design program
04/08/2003US6545808 Phase mask with spatially variable diffraction efficiency
04/08/2003US6544897 Method for forming a vertical edge submicron through-hole and a thin film sample with this kind of through-hole
04/08/2003US6544699 Method to improve accuracy of model-based optical proximity correction
04/08/2003US6544696 Etch stop layer is selectivly plasma etched to the quartz substrate, maintians a 180 degree phase shift
04/08/2003US6544695 Patterning on a photoresist layer; increased pitch-to-size ration
04/08/2003US6544694 Projecting radiation; configurating substrate
04/08/2003US6544693 Pellicle for use in small wavelength lithography and a method for making such a pellicle
04/08/2003US6544692 Black defect correction method and black defect correction device for photomask
04/08/2003CA2311586C Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same
04/03/2003WO2003027769A2 Method for producing a two-dimensional photomask
04/03/2003WO2003027768A2 Providing an image on an organic product
04/03/2003WO2003001869A3 Method and apparatus for use of plasmon printing in near-field lithography
04/03/2003WO2002091026A3 Efficient phase defect detection system and method
04/03/2003WO2002014846A9 Multiple beam inspection apparatus and method
04/03/2003US20030066038 Alleviating line end shortening by extending phase shifters
04/03/2003US20030066035 Photomask visual inspection system
04/03/2003US20030065475 Method for estimating repair accuracy of a mask shop
04/03/2003US20030064300 Pattern transfer method using a mask and half tone mask
04/03/2003US20030064299 Method for adjusting and exposing the second level of a phase-shift mask
04/03/2003US20030064298 Optical proximity correction method utilizing phase-edges as sub-resolution assist features
04/03/2003US20030064297 Halftone phase-shift mask blank and halftone phase-shift mask
04/03/2003US20030064296 For imaging/patterning a semiconductor wafer, formed via selective etching; photoresists; offset printing
04/03/2003US20030062550 Semiconductor device and method for patterning
04/03/2003CA2461513A1 Providing an image on an organic product
04/02/2003EP1298489A2 An optical proximity correction method utilizing phase-edges as sub-resolution assist features
04/02/2003EP1297455A2 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
04/02/2003EP1297384A1 Device and method for cleaning articles used in the production of semiconductor components
04/02/2003CN1407374A Manufacture for photosensitive insulating film pattern and reflection electrode and its liquid crystal display device
04/02/2003CN1407334A Manufacture for test apparatus and parts
04/01/2003US6543045 Method for detecting and automatically eliminating phase conflicts on alternating phase masks
04/01/2003US6542218 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures
04/01/2003US6541783 Reticle having an apertured weakly scattering membrane with selective strongly scattering regions between the apertures; provides independent exposure dosage levels that can be mixed to provide a wide range of exposure levels with high contrast
04/01/2003US6541405 Reducing in radiation transmission variations; optics, lenses; oxidation decomposition of organosilicon compound
04/01/2003US6541168 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
04/01/2003US6541167 Optical proximity correction
04/01/2003US6541166 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
04/01/2003US6541165 Automatic mapping the phase shifting regions for implementation of such features, resolving phase conflicts, applying subresolution; miniaturization; high-density integrated circuits; opaque and complementary binary phases
03/2003
03/27/2003WO2003026000A1 In-situ or ex-situ profile monitoring of phase openings on alternating phase shifting masks by scatterometry
03/27/2003WO2003025979A2 Method for automatic optical measurement of an opc structure
03/27/2003WO2003025678A2 Method and device for control of the data flow on application of reticles in a semiconductor component production
03/27/2003WO2003025673A2 Method for the production of an euv reflection mask
03/27/2003WO2003025672A2 In-situ balancing for phase-shifting mask
03/27/2003WO2002093200A3 Advanced phase shift inspection method
03/27/2003US20030061595 Exposure method for correcting line width variation in a photomask
03/27/2003US20030061594 Pattern inspection apparatus
03/27/2003US20030061592 General purpose shape-based layout processing scheme for IC layout modifications
03/27/2003US20030061587 Method and apparatus for visualizing optical proximity correction process information and output
03/27/2003US20030059726 Method of recording identifier and set of photomasks
03/27/2003US20030059725 Overcoating an image detector with photoresist; exposure; masking; patterning; development
03/27/2003US20030059719 Post exposure modification of critical dimensions in mask fabrication
03/27/2003US20030059689 Method of producing a perforated mask for particle radiation
03/27/2003US20030059688 Post exposure modification of critical dimensions in mask fabrication
03/27/2003US20030059687 Anti-resonance mask for off-axis photolithography
03/27/2003US20030059685 Mask for multiple exposure
03/27/2003US20030059559 Providing an image on an organic product
03/27/2003US20030058986 Apparatus and methods for surficial milling of selected regions on surfaces multilayer-film reflective mirrors as used in X-ray optical systems
03/27/2003US20030058444 Inspection method, apparatus and system for circuit pattern
03/26/2003EP1295178A2 Imageable element and waterless printing plate
03/26/2003EP1295176A2 Transmission and phase balance for phase-shifting mask
03/26/2003CN1406392A Exposure mask, method for manufacturing the mask, and exposure method
03/26/2003CN1406347A Method of evaluation of reticle image using aerial image simulator
03/26/2003CN1405858A Method for generating mask data, mask and recording medium and method for manufacturing semiconductor device
03/26/2003CN1405634A Mask-pattern correction method
03/26/2003CN1405627A Alternating phase displacement light-cover
03/26/2003CN1405626A Active optical close correction method
03/25/2003US6539521 Dissection of corners in a fabrication layout for correcting proximity effects
03/25/2003US6539331 Microscopic feature dimension measurement system
03/25/2003US6538795 Optical reticle substrate inspection apparatus and beam scanning method of the same
03/25/2003US6538731 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
03/25/2003US6537844 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
03/25/2003US6537837 Pattern formation method using two alternating phase shift masks
03/25/2003US6537728 Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters
03/25/2003US6537710 Processor controls a display of an image on the electronically programmed mask, wherein the display replicates conventional type masks; optical contrast; characteristics easily changed or reprogrammed by the processor.
03/25/2003US6537709 Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor device
03/25/2003US6537708 Electrical critical dimension measurements on photomasks
03/25/2003US6537707 Fabricating laser ablation masks and more particularly to approaches to evacuating a vacuum chamber and depositing layers during the fabrication of such masks
03/25/2003US6537706 Method for making a photolithographic mask
03/20/2003WO2003023522A1 Attenuating phase shift mask for photolithography
03/20/2003WO2003023488A1 Graphics engine for high precision lithography
03/20/2003WO2003023462A1 Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other
03/20/2003WO2003022506A1 Ultrashort pulse laser ablation appartus and method using it to form reticles
03/20/2003WO2002097485A3 Method for controlled modification of the reflective qualities of a multi-layer
03/20/2003WO2002093639A3 Arrangement and method for detecting defects on a substrate in a processing tool
03/20/2003WO2002016306A3 Degradable, amorphous, fluoroacrylate polymers
03/20/2003US20030056190 Alternating phase shift mask design conflict resolution
03/20/2003US20030056189 Fabrication methods of semiconductor integrated circuit device and photomask
03/20/2003US20030056184 System for and method of evaluating mask patterns
03/20/2003US20030054732 Stacks; simplifying machining
03/20/2003US20030054646 Using hydrofluoric acid and sulfuric acid; leaving polycry-stalline silicon, silicon nitride and/or aluminum containing layers intact
03/20/2003US20030054604 Method and apparatus for improving resolution of objects in a semiconductor wafer
03/20/2003US20030054268 Semiconductor lithography structures; forming latent images; applying photoresist to semiconductor; calibration
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