| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/02/2003 | EP0744044B1 Masks for lithographic patterning using off-axis illumination |
| 05/01/2003 | WO2003036704A1 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 05/01/2003 | WO2003036387A2 Method of forming a pattern of sub-micron broad features |
| 05/01/2003 | WO2003036386A2 Method for forming elliptical and rounded mask features using beam shaping |
| 05/01/2003 | WO2003036385A2 Method for transmission increase at a position on a photo mask repaired with ionic radiation by means of thermal desorption |
| 05/01/2003 | WO2002075793A3 System and method of providing mask defect printability analysis |
| 05/01/2003 | WO2002042846A3 Fabrication of integrated circuit |
| 05/01/2003 | US20030084419 Row-based placement scoring and legalization measure for books with phase shift mask dependencies |
| 05/01/2003 | US20030082482 Photosensitive resin laminate |
| 05/01/2003 | US20030082463 Generating photolithography masks; calibration patterns |
| 05/01/2003 | US20030082462 Forming halftone; overcoating quartz substrate; phase shifting; inserting impurities |
| 05/01/2003 | US20030082461 Forming semiconductors; photoresist patterns; smooth edges |
| 05/01/2003 | US20030082460 Detection defects; calibrating absorber pattern; semiconductor |
| 05/01/2003 | US20030082030 System and method for reticle protection and transport |
| 05/01/2003 | US20030081213 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 04/30/2003 | CN1415082A Laser imaged printing plates comprising multi-layer slip film |
| 04/30/2003 | CN1414429A Photoresist sandwich body |
| 04/30/2003 | CN1414428A Identification method of new edition optical cover |
| 04/29/2003 | US6557162 Method for high yield reticle formation |
| 04/29/2003 | US6556294 Method of and apparatus for article inspection including speckle reduction |
| 04/29/2003 | US6555833 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 04/29/2003 | US6555828 Method and apparatus for inspecting reflection masks for defects |
| 04/29/2003 | US6555781 Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation |
| 04/29/2003 | US6555297 Etch stop barrier for stencil mask fabrication |
| 04/29/2003 | US6555286 Positive type actinic-ray-curable dry film and pattern-forming method by use of the same |
| 04/29/2003 | US6555283 Comprising a photosensitive composition which became insoluble upon absorption of actinic radiation, a cyanine dye inhibitor activated by heat or radiation to retard the insolubility of the photosensitive composition |
| 04/29/2003 | US6555277 Repairing photolithographic exposure masks by etching, extending over a length and a width equal of line pattern; repair accuracy |
| 04/29/2003 | US6555275 Using two stage exposure; resolution |
| 04/29/2003 | US6555274 Integrated circuit for and a method of correcting pupil errors |
| 04/29/2003 | US6555273 Glass substrate for an electron device, photomask blank and photomask using the same |
| 04/24/2003 | WO2003034476A1 Pattern drawing method, mask, and mask manufacturing method |
| 04/24/2003 | WO2003034475A1 Method and device for gas displacement, mask protective device, mask, and method and device for exposure |
| 04/24/2003 | WO2003015135A3 Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same |
| 04/24/2003 | WO2002025373A3 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 04/24/2003 | US20030079194 Method of automatic layout design for LSI, mask set and semiconductor integrated circuit manufactured by automatic layout design method, and recording medium storing automatic layout design program |
| 04/24/2003 | US20030078799 Mask trading system and method |
| 04/24/2003 | US20030077911 Rom code mask with assistant features |
| 04/24/2003 | US20030077908 Method of fabricating a microstructure and photolithography trimming mask |
| 04/24/2003 | US20030077526 Miniaturization; photolithography patterns; phase shifting; applying photosensitive material to semiconductor; exposure to electromagnetic waves |
| 04/24/2003 | US20030077525 Generatingn opening; applying calibrating structure |
| 04/24/2003 | US20030077524 Photolithography; etching controlling depth; forming recesses |
| 04/24/2003 | US20030077523 Lithography; spreading using centrifugal force; removal photoresists from edges; forming semiconductors |
| 04/24/2003 | US20030077522 Dimensional accuracy; applying photoresist; light transmission and opacity zones |
| 04/24/2003 | US20030077521 Method for producing scatter lines in mask structures for fabricating integrated electrical circuits |
| 04/24/2003 | US20030077520 Attenuation phase shifting; silicon oxide, silicon nitride |
| 04/24/2003 | US20030077519 Alternative pms with new phase conflict canceling method |
| 04/24/2003 | US20030077039 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a bragg grating, and dispersion compensating device using the optical fiber |
| 04/24/2003 | US20030076583 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 04/24/2003 | US20030076404 Optical recorder and method thereof |
| 04/24/2003 | US20030075690 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 04/24/2003 | CA2409725A1 Photosensitive resin laminate |
| 04/23/2003 | EP1304717A1 Sheet beam test apparatus |
| 04/23/2003 | EP1303790A2 Method for determining the ability to project images of integrated semiconductor switching circuits onto alternating phase masks |
| 04/23/2003 | CN1413356A Semiconductor integrated circuit device, and method for producing the same, and method of producing masks |
| 04/23/2003 | CN1412819A Application of metal cover in IC preparation process |
| 04/23/2003 | CN1412818A Application of ceramic cover in IC preparation process |
| 04/23/2003 | CN1412621A Optical recorder and recording method thereof |
| 04/23/2003 | CN1412620A Optical mask for focus monitor, monitoring method and device, and its manufacturing method |
| 04/22/2003 | US6553562 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques |
| 04/22/2003 | US6553560 Alleviating line end shortening in transistor endcaps by extending phase shifters |
| 04/22/2003 | US6553558 Integrated circuit layout and verification method |
| 04/22/2003 | US6553274 Simultaneously patterning interconnection and dummy layers; uniform thickness and flatting insulating film |
| 04/22/2003 | US6552331 Device and method for combining scanning and imaging methods in checking photomasks |
| 04/22/2003 | US6551759 Multilayer; flexible support, photopolymerizable layer, image recording layer and covering |
| 04/22/2003 | US6551750 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 04/17/2003 | WO2003032329A1 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 04/17/2003 | WO2002047172A9 A high frequency interconnect system using micromachined plugs and sockets |
| 04/17/2003 | US20030074646 Mask pattern generating method and manufacturing method of semiconductor apparatus |
| 04/17/2003 | US20030073795 Transparent to ultraviolet radiation; pattern clarity |
| 04/17/2003 | US20030073045 Exposure apparatus and method |
| 04/17/2003 | US20030073038 Fabrication method of semiconductor integrated circuit device and mask |
| 04/17/2003 | US20030073035 Forming substrate blanket resist layer on substrate; exposing, while employing a charged particle beam method susceptible to a proximity effect, the blanket resist layer to form a charged particle beam exposed blanket resist layers |
| 04/17/2003 | US20030073013 Generating diffraction pattern corresponding to lithographic pattern; determining which of spatial frequency components need to be captured by lens; illuminating high transmission attenuated phase-shift mask |
| 04/17/2003 | US20030073010 Photomask inspecting method |
| 04/17/2003 | US20030073009 Photomask for focus monitoring, method of focus monitoring, unit for focus monitoring and manufacturing method for a unit |
| 04/17/2003 | US20030073008 Method for certifying a newly-made photomask |
| 04/17/2003 | US20030071236 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 04/17/2003 | US20030071018 Method for correcting characteristics of attenuated phase-shift mask |
| 04/16/2003 | EP1301830A2 Method for characterizing optical systems using holographic reticles |
| 04/16/2003 | CN1411034A Mask pattern making method and semiconductor device making method |
| 04/16/2003 | CN1410926A Mask business system and method |
| 04/16/2003 | CN1410831A Method for making grey mask, grey mask and pattern transfer method |
| 04/16/2003 | CN1106029C Process of exactly patterning layer to target configuration by using photo-resist mask formed with dummy pattern |
| 04/16/2003 | CN1105943C 相移掩模 Phase shift mask |
| 04/15/2003 | US6550051 Lithographic data verification method and photo mask manufacturing method |
| 04/15/2003 | US6548417 In-situ balancing for phase-shifting mask |
| 04/15/2003 | US6548312 Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods |
| 04/15/2003 | US6548226 Narrow width pattern; variations in light intensity |
| 04/15/2003 | US6548224 Wiring substrate features having controlled sidewall profiles |
| 04/15/2003 | US6548213 Controlling transmission light |
| 04/15/2003 | US6548129 Fluoropolymer for photolithography patterning |
| 04/10/2003 | WO2003029897A2 Photolithographic mask fabrication |
| 04/10/2003 | WO2003028940A1 Utrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation |
| 04/10/2003 | WO2003019291A3 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making |
| 04/10/2003 | US20030070155 Method and apparatus for resolving coloring conflicts between phase shifters |
| 04/10/2003 | US20030068566 Full phase shifting mask in damascene process |
| 04/10/2003 | US20030068565 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 04/10/2003 | US20030068564 System and method for correcting 3D effects in an alternating phase-shifting mask |
| 04/10/2003 | US20030068563 Portions of light blocking layers are selectively removed to modify the transmittance of various regions of the mask and suppress undesired patterns, such as ghost images and side lobe effects; increased integration levels |
| 04/10/2003 | US20030067598 Method and apparatus for inspecting multilayer masks for defects |