| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/27/2003 | US6569581 Alternating phase shifting masks |
| 05/27/2003 | US6569580 Binary and phase-shift photomasks |
| 05/27/2003 | US6569578 Method for forming photo-mask |
| 05/27/2003 | US6569577 Phase-shift photo mask blank comprising half-tone phase-shift film, having specified phase difference and transmittance at specified wavelengths and consisting of two layers in which refractive index of upper layer is smaller than that of lower |
| 05/27/2003 | US6569576 Reticle cover for preventing ESD damage |
| 05/27/2003 | US6569575 Light coupling structure used as mask for exposure of resist, comprising protrusions guiding light towards end having lateral shape of structures to be exposed, where it is coupled directly into resist, and connections which block light |
| 05/27/2003 | US6569574 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools |
| 05/22/2003 | WO2003043065A1 Mask and its manufacturing method, and method for manufacturing semiconductor device |
| 05/22/2003 | WO2003043063A1 Complementary mask, fabrication method thereof, exposure method, semiconductor device, and fabrication method thereof |
| 05/22/2003 | WO2003042629A1 Focus masking structures, focus patterns and measurements thereof |
| 05/22/2003 | WO2003021654A3 System and method for identifying dummy features on a mask layer |
| 05/22/2003 | US20030097647 Method and apparatus for mixed-mode optical proximity correction |
| 05/22/2003 | US20030096200 A patterning mask is shifted a predetermined distance in a horizontal direction, to define second line patterns that overlap the first line patterns |
| 05/22/2003 | US20030096178 Photoresists; photolithography |
| 05/22/2003 | US20030096177 Capable of minimizing the effect of optical proximity; photoresists; for production of semiconductors |
| 05/22/2003 | US20030096176 Photomask, microstructure, manufacturing method of photomask, and aligner |
| 05/22/2003 | US20030096175 Manufacturing method for photomask |
| 05/22/2003 | US20030096174 Mask and method of manufacturing the same |
| 05/22/2003 | US20030096173 Comprises palladium aluminum oxide thin film; for patterning radiation transparent electroconductive substrate (quartz); semiconductors |
| 05/22/2003 | US20030095699 Method for applying a defect finder mark to a backend photomask making process |
| 05/22/2003 | US20030095267 Focus masking structures, focus patterns and measurements thereof |
| 05/22/2003 | US20030095247 provided with a substrate, a plurality of measurement patterns, a light blocking film and a plurality of reference patterns |
| 05/22/2003 | US20030095245 Structure for attaching a pellicle to a photo-mask |
| 05/21/2003 | EP1312981A2 Transparent substrate having character/symbol section and processing method of character/symbol section |
| 05/21/2003 | EP1311637A2 Fluoroalkyl (meth)acrylate copolymer coating compositions |
| 05/20/2003 | US6567972 Method and apparatus for correcting mask pattern, mask having corrected mask pattern, and storage medium storing program for executing the method for correcting mask pattern |
| 05/20/2003 | US6567719 Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations |
| 05/20/2003 | US6567588 Method for fabricating chirped fiber bragg gratings |
| 05/20/2003 | US6567168 Inspection method, apparatus and system for circuit pattern |
| 05/20/2003 | US6566662 Charged beam exposure system |
| 05/20/2003 | US6566275 Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the same |
| 05/20/2003 | US6566169 Method and apparatus for local vectorial particle cleaning |
| 05/20/2003 | US6566041 Forming plurality of exposure openings; overcoating with photoresist; patterning |
| 05/20/2003 | US6566023 Phase shifting circuit manufacture method and apparatus |
| 05/20/2003 | US6566021 Applying the amorophous solution of fluoropolymer prepared in a suitable solvent, to the surface of the photomask (containing a transpernt substrate defining transmitting and nontransmitting segments), curing the coating |
| 05/20/2003 | US6566020 Dark field trench in an alternating phase shift mask to avoid phase conflict |
| 05/20/2003 | US6566019 Semiconductors; process control of masks |
| 05/20/2003 | US6566018 Protective coatings during photomasking |
| 05/20/2003 | US6566017 Semiconductor wafer imaging mask having uniform pattern features and method of making same |
| 05/20/2003 | US6566016 Apparatus and method for compensating critical dimension deviations across photomask |
| 05/15/2003 | WO2003040828A2 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 05/15/2003 | US20030093767 Method for fabrication of patterns and semiconductor devices |
| 05/15/2003 | US20030093766 Alternating phase shift mask design with optimized phase shapes |
| 05/15/2003 | US20030093251 Simulation using design geometry information |
| 05/15/2003 | US20030091940 Transferring a bright line pattern to a photosensitive material through a photomask |
| 05/15/2003 | US20030091911 Radiation phase shifting partially transparent layer; producing semiconductors |
| 05/15/2003 | US20030091910 Two multilayer layers cover the substrate, one is construction layer, the other is destructive layer, because the interaction of the two multilayer layers, yields the desired local absorption of the radiation on mask; photolithography |
| 05/15/2003 | US20030091909 Phase shift mask and fabrication method therefor |
| 05/15/2003 | US20030091908 A photosensitive binder comprising one alkali-soluble resin and a monomer both having polymerizable unsaturated bonds and colors; sensitive to light of a wavelength longer than 405 nm; photolithography; flat panel displays, semiconductors |
| 05/15/2003 | US20030091907 Reverse tone process for masks |
| 05/15/2003 | US20030091224 Apparatus and methods for collecting global data during a reticle inspection |
| 05/15/2003 | US20030090644 Mask and exposure apparatus |
| 05/15/2003 | US20030090636 Reducing multiple reflections of the illuminating ultraviolet light, improving image quality; photolithographic process for producing semiconductor wafers |
| 05/15/2003 | US20030090193 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 05/15/2003 | US20030089680 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 05/14/2003 | EP1310987A1 Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 05/14/2003 | EP1310827A2 Photomask with dust-proofing device and exposure method using the same |
| 05/14/2003 | EP1309896A2 Shadow mask and method for producing a shadow mask |
| 05/14/2003 | CN1417646A Method of checking exposure device, correcting focus position and manfacturing semiconductor device |
| 05/13/2003 | US6563568 Multiple image reticle for forming layers |
| 05/13/2003 | US6563566 System and method for printing semiconductor patterns using an optimized illumination and reticle |
| 05/13/2003 | US6562553 Lithographic printing method using a low surface energy layer |
| 05/13/2003 | US6562549 Method of manufacturing photomasks by plasma etching with resist stripped |
| 05/13/2003 | US6562525 Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask |
| 05/13/2003 | US6562524 Photomask and method of fabricating the same |
| 05/13/2003 | US6562523 Direct write all-glass photomask blanks |
| 05/13/2003 | US6562522 Photomasking |
| 05/13/2003 | US6562521 Semiconductor feature having support islands |
| 05/13/2003 | US6562248 Active control of phase shift mask etching process |
| 05/08/2003 | WO2003038522A1 Anti-reflective coating on a photomask |
| 05/08/2003 | US20030088849 Semiconductor integrated circuit device and method for designing the same |
| 05/08/2003 | US20030087205 Overcoating silicon substrate with dielectrics; masking; etching |
| 05/08/2003 | US20030087197 Biocompatibility protective coating; dielectrics; prevent current leakage |
| 05/08/2003 | US20030087193 Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography |
| 05/08/2003 | US20030087168 Reticle cleaning without damaging pellicle |
| 05/08/2003 | US20030087167 Method for fabricating a mask for semiconductor structures |
| 05/08/2003 | US20030087166 Reticle and a method for manufacturing a semiconductor device using the same |
| 05/08/2003 | US20030087165 Exhaustion, removal of air from photomask and substrate |
| 05/08/2003 | US20030087164 Novel reticle design for alternating phase shift mask |
| 05/08/2003 | US20030086081 Reticle design inspection system |
| 05/08/2003 | US20030085197 Etching method and apparatus |
| 05/07/2003 | EP1308789A2 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 05/07/2003 | EP1308784A2 System and method for forming features on a semiconductor substrate |
| 05/07/2003 | EP1308780A2 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques |
| 05/07/2003 | CN1416167A Method for designing and allocating masks in procedure of making integrated circuit |
| 05/07/2003 | CN1416018A Mfg. method of light shade for protecting film and auxilary protective film |
| 05/07/2003 | CN1416015A Method for preparing alternation type phase shift optical mask and relieving mask as well as contact hole |
| 05/06/2003 | US6560767 Process for making photomask pattern data and photomask |
| 05/06/2003 | US6560011 High NA system for multiple mode imaging |
| 05/06/2003 | US6559953 Point diffraction interferometric mask inspection tool and method |
| 05/06/2003 | US6558876 Flexographic element having an infrared radiation ablatable layer capable of being selectively removed by a laser beam |
| 05/06/2003 | US6558859 Method of checking pattern measurement and image recognition assisting pattern |
| 05/06/2003 | US6558856 Subresolution grating for attenuated phase shifting mask fabrication |
| 05/06/2003 | US6558855 For semiconductor device, integrated circuit device, a superconductor device, micromachine, and electronic devices, in particular suitable for forming very fine patterns |
| 05/06/2003 | US6558854 Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light |
| 05/06/2003 | US6558853 Method for manufacturing exposure mask, exposure apparatus and semiconductor device |
| 05/02/2003 | EP1306725A1 Photosensitive resin laminate |
| 05/02/2003 | EP1305817A1 Methods to predict and correct resist heating during lithography |
| 05/02/2003 | EP1305673A1 Prioritizing the application of resolution enhancement techniques |
| 05/02/2003 | EP0910816B1 Composite relief image printing plates and methods for preparing same |