| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/26/2003 | US20030117627 Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device |
| 06/26/2003 | US20030117609 Device manufacturing-related apparatus, gas purge method, and device manufacturing method |
| 06/26/2003 | US20030115733 Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask |
| 06/25/2003 | EP1321820A1 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 06/25/2003 | EP1321440A2 Glass ceramic product and process of its manufacture |
| 06/25/2003 | EP1320784A1 Method for high yield reticle formation |
| 06/25/2003 | EP1075642B1 Position coordinate measuring device for measuring structures on a transparent substrate |
| 06/25/2003 | CN1112601C Technique for making X-ray mask |
| 06/24/2003 | US6584610 Incrementally resolved phase-shift conflicts in layouts for phase-shifted features |
| 06/24/2003 | US6584609 Method and apparatus for mixed-mode optical proximity correction |
| 06/24/2003 | US6584218 Automated photomask inspection apparatus |
| 06/24/2003 | US6583431 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 06/24/2003 | US6583068 Enhanced inspection of extreme ultraviolet mask |
| 06/24/2003 | US6582891 Process for reducing edge roughness in patterned photoresist |
| 06/24/2003 | US6582860 Transferring the images of openings onto photoresists |
| 06/24/2003 | US6582859 Fluoropolymer substrate with inorganic anti-reflective coating |
| 06/24/2003 | US6582858 Mask which can correct spherical aberration caused by semi-dense lines and can increase size of process window, which is employed in double exposure lithographic process with light source of 248 nanometers |
| 06/24/2003 | US6582857 Repair of masks to promote adhesion of patches |
| 06/24/2003 | US6582856 Etching opaque layer and transparent substrate to pattern layer and form notches in transparent substrate only at edges of layer, causing phase shift in incident light relative to light passing through adjacent regions in substrate |
| 06/19/2003 | WO2003050622A1 Multi-tone photomask and method for manufacturing the same |
| 06/19/2003 | WO2003050619A2 A method for producing a mask for high resolution lithography, a mask obtained thereby and a multi-layer element for high resolution lithography |
| 06/19/2003 | WO2003050618A1 Method for manufacturing wiring board |
| 06/19/2003 | WO2003050617A2 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 06/19/2003 | WO2003050616A1 Method of enhancing phase shift masks |
| 06/19/2003 | WO2003050615A2 Photomask and method for qualifying the same with a prototype specification |
| 06/19/2003 | US20030115569 Method and system for optical proximity correction |
| 06/19/2003 | US20030113674 At least one exposure is conducted through a regular mask, and at least one exposure through modified mask with a clear region overlapping the position of a non-clear region of the first mask |
| 06/19/2003 | US20030112312 Non-permanent inkjetted flexographic mask |
| 06/19/2003 | US20030111447 Method and apparatus for repair of defects in materials with short laser pulses |
| 06/18/2003 | EP1319985A2 Reticle |
| 06/18/2003 | EP1319982A1 Lithographic apparatus , device manufacturing method, and computer program |
| 06/18/2003 | CN1424743A Mask pattern forming method, computer programme product and optical mask production |
| 06/17/2003 | US6581193 Apparatus and methods for modeling process effects and imaging effects in scanning electron microscopy |
| 06/17/2003 | US6580492 Reticle system for measurement of effective coherence factors |
| 06/17/2003 | US6579666 Methodology to introduce metal and via openings |
| 06/17/2003 | US6579660 Process for direct digital printing of circuit boards |
| 06/17/2003 | US6579651 Modification of mask layout data to improve mask fidelity |
| 06/12/2003 | US20030110465 Method and apparatus for controlling rippling during optical proximity correction |
| 06/12/2003 | US20030110460 Dissection of printed edges from a fabrication layout for correcting proximity effects |
| 06/12/2003 | US20030109126 Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 06/12/2003 | US20030108816 Positive type actinic ray-curable dry film and pattern-forming method by use of the same |
| 06/12/2003 | US20030108803 Method of manufacturing phase shift mask, phase shift mask and apparatus |
| 06/12/2003 | US20030108299 Adjustment slits; photolithography |
| 06/12/2003 | US20030106999 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 06/11/2003 | CN1423168A Light mask and making method thereof |
| 06/10/2003 | US6578188 Method and apparatus for a network-based mask defect printability analysis system |
| 06/10/2003 | US6577994 Design rule generation system and recording medium recording program thereof |
| 06/10/2003 | US6577991 Recordable method of processing figure |
| 06/10/2003 | US6576572 Method of heating a substrate using a variable surface hot plate for improved bake uniformity |
| 06/10/2003 | US6576486 Unlanded process in semiconductor manufacture |
| 06/10/2003 | US6576406 Resist material on filamentary substrate includes a hollow, energy transparent tube |
| 06/10/2003 | US6576380 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 06/10/2003 | US6576379 Phaseshift mask and manufacturing the same |
| 06/10/2003 | US6576377 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method |
| 06/10/2003 | US6576376 Tri-tone mask process for dense and isolated patterns |
| 06/10/2003 | US6576375 Chromium and chromium oxide laminate, antireflective film |
| 06/10/2003 | US6576374 Mask blank and method of fabricating phase shift mask from the same |
| 06/10/2003 | US6576147 Method of layout compaction |
| 06/10/2003 | US6575035 Apparatus and method for measuring internal stress of reticle membrane |
| 06/05/2003 | WO2003046660A1 Method for dynamic relief forming in functional layer |
| 06/05/2003 | WO2003046659A1 Halftone phase shift mask blank, halftone phase shift mask, and manufacturing method thereof |
| 06/05/2003 | WO2003046658A1 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 06/05/2003 | WO2003046628A1 Method for fabricating chirped fiber bragg gratings |
| 06/05/2003 | WO2002049841A3 Method for producing models for printing blocks and for producing said printing blocks |
| 06/05/2003 | US20030106037 Method for fabricating a semiconductor device |
| 06/05/2003 | US20030104319 Of sub-micron dimensions; ratio of hole-diameter to hole-distance is narrowed to an optimum range of off axis illumination. |
| 06/05/2003 | US20030104290 Resist openings are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation. |
| 06/05/2003 | US20030104289 Resist openings are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation. |
| 06/05/2003 | US20030104288 Identifying a defect or contaminant of the mask in the subject image and modifying the image to remove the defect or contaminant from the mask to generate the reference image. |
| 06/05/2003 | US20030104287 Method of manufacturing mask for electron beam lithography and mask blank for electron beam lithography |
| 06/05/2003 | US20030104286 Hole printing by packing and unpacking using alternating phase-shifting masks |
| 06/05/2003 | US20030103196 Exposure method and exposure apparatus |
| 06/05/2003 | US20030103195 Mask for proximity field optical exposure, exposure apparatus and method therefor |
| 06/05/2003 | US20030102576 Alignment pattern and method of forming the same |
| 06/04/2003 | EP1316851A2 Multiple exposure method with reduction of printed assist features |
| 06/04/2003 | CN1422395A Self-compensating mark arrangement for stepper alignment |
| 06/04/2003 | CN1421741A Method for producing photomask |
| 06/04/2003 | CN1110840C Photomask and its exposure method |
| 06/03/2003 | US6574789 Exposing method and apparatus for semiconductor integrated circuits |
| 06/03/2003 | US6573980 Removable optical pellicle |
| 06/03/2003 | US6573959 Optical element, a method of making a display device and a display device comprising an optical element |
| 06/03/2003 | US6573519 Electron beam exposure apparatus, adjusting method, and block mask for adjustment |
| 06/03/2003 | US6573029 Patterning capacitors of dynamic random access memories with increaced capacity and reduced area without deformation |
| 06/03/2003 | US6573027 Forming pattern having narrow spacings with no thinning |
| 06/03/2003 | US6573023 Masking, screen printing; for field emission display in electronics/semiconductors |
| 06/03/2003 | US6573015 Automatic realization of best focus position quickly and accurately |
| 06/03/2003 | US6573010 Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator |
| 05/29/2003 | US20030101430 Priority coloring for vlsi designs |
| 05/29/2003 | US20030101421 Photomask designing mehod, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element. |
| 05/29/2003 | US20030098970 Method and apparatus for detecting aberrations in a projection lens utilized for projection optics |
| 05/29/2003 | US20030098424 System to reduce heat-induced distortion of photomasks during lithography |
| 05/28/2003 | CN1109924C Photomask and method for producing same |
| 05/27/2003 | USRE38126 Improved reticle and method of using it to expose layers of wafers for large integrated circuits |
| 05/27/2003 | US6571383 Semiconductor device fabrication using a photomask designed using modeling and empirical testing |
| 05/27/2003 | US6570174 Connecting zones; calibration |
| 05/27/2003 | US6569772 Method for producing an alternating phase mask |
| 05/27/2003 | US6569605 Exposing photoresist films to light, then etching barrier layers and baking to form electrical ane electronic apparatus such as random acess memory computers |
| 05/27/2003 | US6569584 Methods and structures for protecting reticles from electrostatic damage |
| 05/27/2003 | US6569583 Using a computer program; for an optical lithography process for manufacturing an integrated circuit |
| 05/27/2003 | US6569582 Hinged pellicles and methods of use |