| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 07/22/2003 | US6596448 Alternating phase shift pattern on the peripheries of an alternating phase shift mask and a modification pattern on the peripheries of a modification pattern. |
| 07/22/2003 | US6596444 Photomask and method for correcting feature size errors on the same |
| 07/22/2003 | US6596442 Asymmetric halftone biasing for sub-grid pattern adjustment |
| 07/22/2003 | US6596186 Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the mask |
| 07/17/2003 | WO2003058681A2 Differential detector coupled with defocus for improved phase defect sensitivity |
| 07/17/2003 | WO2003058344A2 System and method for aerial image sensing |
| 07/17/2003 | WO2002044812A3 Embedded attenuated phase shift mask and method of making embedded attenuated phase shift mask |
| 07/17/2003 | US20030135839 Incrementally resolved phase-shift conflicts in layouts for phase-shifted features |
| 07/17/2003 | US20030134516 Inexpensive fabrication of large-area pixel arrays for displays and sensors |
| 07/17/2003 | US20030134208 Method for producing a semiconductor device |
| 07/17/2003 | US20030134207 Alternating phase shift mask |
| 07/17/2003 | US20030134206 Mask with programmed defects and method for the fabrication thereof |
| 07/17/2003 | US20030134205 Producing a photomask for semiconductor photolithography processing |
| 07/17/2003 | US20030134057 Wherein membrane/adhesive comprises ethylene-tetrafluoroethylene copolymer having high durability and light transmission, for photolithographic patterning; excimer lasers; semiconductors |
| 07/17/2003 | US20030133104 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes |
| 07/17/2003 | US20030133099 Reticle and optical characteristic measuring method |
| 07/17/2003 | US20030132382 System and method for inspecting a mask |
| 07/16/2003 | EP1327705A1 Method for producing metal mask and metal mask |
| 07/16/2003 | EP1326902A2 Degradable, amorphous, fluoroacrylate polymers |
| 07/15/2003 | US6594073 Antistatic optical pellicle |
| 07/15/2003 | US6593249 Method for forming a metal pattern on a dielectric substrate |
| 07/15/2003 | US6593226 Method for adding features to a design layout and process for designing a mask |
| 07/15/2003 | US6593214 Method of manufacturing semiconductor device |
| 07/15/2003 | US6593041 Damascene extreme ultraviolet lithography (EUVL) photomask and method of making |
| 07/15/2003 | US6593040 Analyzing defect; supplying, controlling actinic radiation |
| 07/15/2003 | US6593039 Photoresist mask that combines attenuated and alternating phase shifting masks |
| 07/15/2003 | US6593038 Method and apparatus for reducing color conflicts during trim generation for phase shifters |
| 07/15/2003 | US6593037 Antirefelctive layer is configured to reduce a reflection of a lithographic radiation having a wavelength shorter than in a deep ultraviolet range from the absorptive layer by destructive interference |
| 07/15/2003 | US6593036 Structure for a reflection lithography mask and method for making same |
| 07/15/2003 | US6593035 Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films |
| 07/15/2003 | US6593034 Framed pellicle for protection of photolithographic photomask |
| 07/15/2003 | US6593033 Attenuated rim phase shift mask |
| 07/10/2003 | WO2002088843A3 Exposure method and apparatus |
| 07/10/2003 | US20030129788 Compound semiconductor device |
| 07/10/2003 | US20030129545 Method and apparatus for use of plasmon printing in near-field lithography |
| 07/10/2003 | US20030129533 Photosensitive flexographic device with associated addressable mask |
| 07/10/2003 | US20030129509 Forming photoresist on semiconductor; exposure, development pattern |
| 07/10/2003 | US20030129505 Photo mask |
| 07/10/2003 | US20030129504 Photosensitive resin compositon, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof |
| 07/10/2003 | US20030129503 Mask shaping using temporal and spatial coherence in ultra high resolution lithography |
| 07/10/2003 | US20030129502 Masking to reduce pattern deformation; semiconductors |
| 07/10/2003 | US20030128929 Method for fabricating chirped fiber Bragg gratings |
| 07/10/2003 | US20030128870 System and method for aerial image sensing |
| 07/10/2003 | US20030127607 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 07/10/2003 | US20030127441 Debris minimization and improved spatial resolution in pulsed laser ablation of materials |
| 07/10/2003 | DE19758634C2 X=ray lithography mask useful in semiconductor industry |
| 07/10/2003 | DE10142592C2 Verfahren zur Justierung und Belichtung der zweiten Ebene einer Phasenschiebemaske Procedures for calibration and exposure of the second level of a phase shift mask |
| 07/09/2003 | CN1429353A Exposure controlling photomask and production method therefor |
| 07/09/2003 | CN1428819A Method for detecting corrected accuracy of oplical cover machine table |
| 07/09/2003 | CN1428655A Exposure method for making full image optical cover |
| 07/09/2003 | CN1428652A Optical mask structure and its manufacture method |
| 07/09/2003 | CN1428358A Method for mfg. water alkaline-soluble resin, photosensitive resin composition, optical mask and electronic device |
| 07/09/2003 | CN1114129C Phase shift mask and method for fabricating the same |
| 07/08/2003 | US6591412 Methods for dividing a pattern in a segmented reticle for charged-particle-beam microlithography |
| 07/08/2003 | US6589718 Forming a resist layer on a target layer and patterning the resist layer to form original openings and a slit in the resist layer, reflowing resist layer patterned under heat to cause deformation of original openings and the slit |
| 07/08/2003 | US6589717 Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks |
| 07/08/2003 | US6589699 Transparent substrate with a light-shielding film and an antireflective film, both films made of a chromiun oxycarbide, a chromium oxycarbonitride or a combination |
| 07/08/2003 | US6589354 Method and apparatus for in-situ lithography mask cleaning |
| 07/08/2003 | CA2307363C Enhanced optical transmission apparatus with improved inter-surface coupling |
| 07/03/2003 | WO2003054632A1 Method and apparatus for image formation |
| 07/03/2003 | WO2003054627A2 Phase shifting mask |
| 07/03/2003 | WO2003054626A1 Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 07/03/2003 | US20030126582 Pattern correction method and manufacturing method of semiconductor device |
| 07/03/2003 | US20030126581 User interface for a network-based mask defect printability analysis system |
| 07/03/2003 | US20030125184 Glass ceramic product with variably adjustable zero crossing of the CTE-T curve |
| 07/03/2003 | US20030124868 Pattern forming method |
| 07/03/2003 | US20030124759 Photo mask and semiconductor device manufacturing method |
| 07/03/2003 | US20030124441 Correcting the polygon feature pattern with an optical proximity correction method |
| 07/03/2003 | US20030124440 Use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using static |
| 07/03/2003 | US20030124439 Exposure positioning in photolithography |
| 07/03/2003 | US20030124437 Exposure method and apparatus for producing a hologram mask and recording method using the hologram mask |
| 07/03/2003 | US20030123605 Reflection mask and method for fabricating the reflection mask |
| 07/03/2003 | US20030123042 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 07/03/2003 | US20030123038 Projection aligner, aberration estimating mask pattern,aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 07/03/2003 | US20030123014 Exposure mask for liquid crystal display device and exposure method thereof |
| 07/02/2003 | EP1228402A4 Composite relief image printing elements |
| 07/02/2003 | CN1428003A Variable surface hot plate for improved bake uniformity of substrates |
| 07/02/2003 | CN1113253C Amplitude mask, and apparatus and method for mfg. long period grating filter using same |
| 07/02/2003 | CN1112997C Platemaking film, platemaking ink and platemaking method and system using the film |
| 07/01/2003 | US6588005 Method of manufacturing semiconductor integrated circuit device |
| 07/01/2003 | US6587194 Method of and apparatus for article inspection including speckle reduction |
| 07/01/2003 | US6587193 Inspection systems performing two-dimensional imaging with line light spot |
| 07/01/2003 | US6586341 Method of manufacturing semiconductor device |
| 07/01/2003 | US6586281 Variable rotational assignment of interconnect levels in integrated circuit fabrication |
| 07/01/2003 | US6586168 Exposure method based on multiple exposure process |
| 07/01/2003 | US6586159 Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication |
| 07/01/2003 | US6586144 Lithography; screen printing, curing |
| 07/01/2003 | US6586142 Correct distortions due to optical proximity effects is described. A two reticle per pattern approach is used. The first, or primary, reticle contains the image that is to be transferred to the photoresist. The two overlap all line ends |
| 06/26/2003 | WO2003052803A1 Mask and method for making the same, and method for making semiconductor device |
| 06/26/2003 | WO2003052516A1 Method and apparatus for patterning a workpiece |
| 06/26/2003 | WO2003052512A1 Mask pattern correction apparatus, mask pattern correction method, mask manufacturing method, and semiconductor device manufacturing method |
| 06/26/2003 | WO2002050614B1 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/26/2003 | US20030121021 System and method for determining manufacturing error enhancement factor |
| 06/26/2003 | US20030120432 Method, system and computer software for online ordering of custom probe arrays |
| 06/26/2003 | US20030119285 Method of manufacturing semiconductor device |
| 06/26/2003 | US20030118920 Multi-tone photomask and method for manufacturing the same |
| 06/26/2003 | US20030118919 Mask set for use in phase shift photolithography technique which is suitable to form random patterns |
| 06/26/2003 | US20030118918 Photomask, production method of semiconductor laser element, and semiconductor laser element |
| 06/26/2003 | US20030118917 Controlling width, spacing using computer; masking, detection; forming integrated circuits |
| 06/26/2003 | US20030117683 Optical reticle substrate inspection apparatus and beam scanning method of the same |