| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/17/2014 | US8753791 Laser-markable compositions |
| 06/17/2014 | US8753788 Apparatus of repairing a mask and a method for the same |
| 06/17/2014 | US8753787 Light pattern exposure method, photomask, and photomask blank |
| 06/17/2014 | US8753786 Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank |
| 06/12/2014 | WO2014087905A1 Pellicle frame and process for manufacturing same |
| 06/12/2014 | WO2014086905A1 Reflective optical element for euv lithography and method of manufacturing a reflective optical element |
| 06/12/2014 | US20140162192 Photopolymer Imaging from Solvent Ink Film Images |
| 06/12/2014 | US20140162177 Optical mask for forming pattern |
| 06/12/2014 | US20140162176 Semiconductor device resolution enhancement by etching multiple sides of a mask |
| 06/12/2014 | US20140160455 Pellicle for reticle and multilayer mirror |
| 06/12/2014 | US20140160454 Mask plate, exposure system and exposing method |
| 06/12/2014 | US20140158157 Mask cleaner and cleaning method |
| 06/11/2014 | CN103858210A Reflective mask blank, reflective mask, and methods for manufacturing reflective mask blank and reflective mask |
| 06/11/2014 | CN103858209A Mask blank for reflection-type exposure, and mask for reflection-type exposure |
| 06/11/2014 | CN103858055A Reflective optical element for the EUV wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens |
| 06/11/2014 | CN103852970A Double patterning technology |
| 06/11/2014 | CN103852969A Mask, method for manufacturing light filter and liquid crystal display device |
| 06/11/2014 | CN103852968A Mask strips and method for manufacturing organic light emitting diode display using same |
| 06/11/2014 | CN102495524B Photomask, conducting wire manufacturing method of flat display panel and conducting wire structure of flat display panel |
| 06/11/2014 | CN102414278B Mold release composition and surface protective film |
| 06/10/2014 | US8748326 Device and method for forming low-temperature polysilicon film |
| 06/10/2014 | US8748313 Electroforming technique for mask formation |
| 06/10/2014 | US8748065 Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same |
| 06/10/2014 | US8748064 Charged particle beam drawing method and charged particle beam drawing apparatus |
| 06/10/2014 | US8748063 Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks |
| 06/10/2014 | US8748061 Method of fabricating wave-shaped mask for photolithography and exposure method of fabricating nano-scaled structure using the wave-shaped mask |
| 06/10/2014 | US8748060 Fluorinated coating and phototools made therewith |
| 06/05/2014 | US20140155246 Very low cte slope doped silica-titania glass |
| 06/05/2014 | US20140154615 Method for etching euv material layers utilized to form a photomask |
| 06/04/2014 | EP2738791A2 Method for correcting a photomask |
| 06/04/2014 | EP2738603A1 Pellicle for lithography, photomask fitted with pellicle and exposure method |
| 06/04/2014 | CN103838089A Method of determining mask pattern and exposure condition and computer |
| 06/04/2014 | CN103838077A Defect treating method of phase shifting mask |
| 06/04/2014 | CN103838076A Method for reducing haze defect of mask plate |
| 06/04/2014 | CN103837938A Fiber alignment device and manufacturing method thereof |
| 06/04/2014 | CN103105727B Forming method of photomask and photomask |
| 06/04/2014 | CN102809894B Method for computing diffraction of masks of contact holes of multiple absorbing layers |
| 06/04/2014 | CN102540773B Novel method for inspecting photolithographic process by utilizing optical proximity correction (OPC) models of post exposure bake |
| 06/04/2014 | CN102486604B Phase shift mask, manufacturing method thereof and haze defect detection method thereof |
| 06/04/2014 | CN102135724B Mask for semiconductor process |
| 06/03/2014 | US8745556 Layout method and system for multi-patterning integrated circuits |
| 06/03/2014 | US8743490 Color filter substrate and method of manufacturing the same |
| 06/03/2014 | US8742376 Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask |
| 06/03/2014 | US8741535 Laser irradiation device and method of fabricating organic light emitting display device using the same |
| 06/03/2014 | US8741507 Method for separating photomask pattern |
| 06/03/2014 | US8741506 Mask and repairing method therefor |
| 05/30/2014 | WO2014080840A1 Mask blank, transfer mask, method for producing mask blank, method for producing transfer mask, and method for manufacturing semiconductor device |
| 05/29/2014 | US20140147976 Exposure mask and method of manufacturing a substrate using the exposure mask |
| 05/29/2014 | US20140147774 Photomask and thin-film transistor fabricated using the photomask |
| 05/29/2014 | US20140147773 Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method |
| 05/28/2014 | EP2735906A2 Mask, and optical filter manufacturing apparatus comprising same |
| 05/28/2014 | CN203616577U 一种火山型掩膜版及其图形化衬底 One kind of volcano-type mask and patterned substrates |
| 05/28/2014 | CN103828022A 模具坯、母模具、复制模具和模具坯的制造方法 Die blanks, the mother dies, molds and manufacturing methods to copy billet mold |
| 05/28/2014 | CN103823330A 匀胶版制造工艺 Uniform offset the manufacturing process |
| 05/28/2014 | CN103823329A 掩膜版及对其进行缺陷检测的方法 Mask and method for detecting flaws in its |
| 05/28/2014 | CN102591138B 应用于硅穿孔晶圆级封装中的双光阻墙及其制备方法 Double photoresist is applied to the silicon wall perforation wafer level packaging in its preparation method |
| 05/27/2014 | US8739078 Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications |
| 05/27/2014 | US8739075 Method of making pattern data, and medium for storing the program for making the pattern data |
| 05/27/2014 | US8737676 Defect estimation device and method and inspection system and method |
| 05/27/2014 | US8736849 Method and apparatus for measuring structures on photolithography masks |
| 05/27/2014 | US8736810 EUV reticle substrates with high thermal conductivity |
| 05/27/2014 | US8735050 Integrated circuits and methods for fabricating integrated circuits using double patterning processes |
| 05/27/2014 | US8735030 Method and apparatus for modifying a substrate surface of a photolithographic mask |
| 05/27/2014 | US8735025 Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition |
| 05/27/2014 | US8735024 Non-planar lithography mask and system and methods |
| 05/27/2014 | US8734702 Original and article manufacturing method using same |
| 05/22/2014 | WO2014076291A1 Semiconductor treating device and method |
| 05/22/2014 | US20140141536 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change |
| 05/21/2014 | CN103814429A 具有正交底层虚拟填充的叠盖目标 The underlying virtual filled with orthogonal overlapping goals |
| 05/21/2014 | CN103809385A 曝光机光罩结构的水平角度调整机构及方法 Exposure mask structure horizontal angle adjustment mechanism and method |
| 05/21/2014 | CN103809371A 矩形形成模具用基板 Rectangular substrate to form a mold |
| 05/21/2014 | CN103809370A 使用定向自组装的光刻工艺 Using a photolithography process directed self-assembly |
| 05/21/2014 | CN103809369A 光掩模坯、光掩模及其制作方法 Photomask blanks, photomask and its production method |
| 05/21/2014 | CN102692815B 光掩模及其制造方法 The method of manufacturing a photomask and |
| 05/21/2014 | CN102456540B 应用于外延工艺中的光刻套刻标记的制备方法 Applied to the preparation of the epitaxial process lithography overlay mark |
| 05/21/2014 | CN102414787B 激光反射掩模以及其制造方法 Laser reflection mask and a manufacturing method thereof |
| 05/21/2014 | CN102385649B 检测光学微影光罩的方法及系统与装置 Detecting optical lithography mask method and system and apparatus |
| 05/21/2014 | CN102236250B 防尘薄膜组件 Pellicle |
| 05/21/2014 | CN101796522B 用于预测侧面位置信息的方法和系统 Method and system for the side surface position information prediction |
| 05/20/2014 | US8731273 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section |
| 05/20/2014 | US8730474 Method and apparatus for measuring of masks for the photo-lithography |
| 05/20/2014 | US8730452 Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders |
| 05/20/2014 | US8728686 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors |
| 05/15/2014 | WO2014073389A1 Process for producing mask blank and process for producing transfer mask |
| 05/15/2014 | WO2013189724A3 Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method |
| 05/15/2014 | US20140134523 Method for Forming Circular Patterns on a Surface |
| 05/15/2014 | US20140134522 Method for forming quarter-pitch patterns |
| 05/14/2014 | EP2729427A1 Method of manufacture and apparatus therefor |
| 05/14/2014 | CN103797329A 用于监测光刻图案形成装置的设备 Monitoring apparatus for a lithographic patterning device |
| 05/14/2014 | CN103794551A 采用电子束工艺定义连接孔的方法 Define a connection using the process of electron beam apertures |
| 05/14/2014 | CN103792786A 母版检测清洁装置 Master cleaning device detection |
| 05/14/2014 | CN103792785A 一种对具有低图像对比度的图形进行光学邻近修正的方法 Kind of pattern having a low image contrast of the optical proximity correction method |
| 05/14/2014 | CN103792784A 图形化衬底用掩膜版、图形化衬底及其制造方法 Patterning the substrate with a mask, patterning a substrate and its manufacturing method |
| 05/14/2014 | CN102998895B 光学邻近修正掩膜 Optical proximity correction mask |
| 05/14/2014 | CN102270651B 装置和图像传感器 And an image sensor means |
| 05/14/2014 | CN101727516B 基于对聚焦敏感的成本协方差场的辅助特征布置 Based on the cost of a focus sensitive assist features disposed covariance Field |
| 05/13/2014 | US8724078 Device and method for drying a photomask |
| 05/13/2014 | US8722322 Photonic heating of silver grids |
| 05/13/2014 | US8722287 Phase shift focus monitor reticle, manufacturing method thereof and method for monitoring focus difference |
| 05/13/2014 | US8722286 Devices and methods for improved reflective electron beam lithography |