Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
09/2003
09/10/2003EP1343050A2 Device and system for improving phase shift mask imaging performance and associated methods
09/10/2003CN1441461A Mask base board and its producing method
09/10/2003CN1441460A Laser device, laser radiation method and semiconductor device and its producing method
09/10/2003CN1441316A Method for producing photo mask and method for producing semiconductor device using said photomask
09/09/2003US6617265 Photomask and method for manufacturing the same
09/09/2003US6617087 Use of scatterometry to measure pattern accuracy
09/09/2003US6617084 Efficiency
09/09/2003US6617083 Method of correcting mask patterns
09/09/2003US6617082 Microelectromechanical system mask
09/09/2003US6617081 Forming phase shifter in-between adjacent opaque regions such as chromium on a transparent substrate such as quartz
09/09/2003US6617080 Photomask, semiconductor device, and method for exposing through photomask
09/09/2003US6615477 Method and apparatus for processing workpiece by using X-Y stage capable of improving position accuracy
09/04/2003WO2003073166A1 Critical dimension control using full phase and trim masks
09/04/2003WO2002084400A3 Preparation of photomasks
09/04/2003US20030165754 First mask is an opaque- field phase shift mask and the second mask is a single phase structure mask; optical lithography patterning
09/04/2003US20030165752 A film-forming polymer obtained by copolymerization of a comonomer mixture, including at least one first comonomer having polymerizable carbon-carbon double bond and an anchor group
09/04/2003US20030165751 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer
09/04/2003US20030165750 Method of manufacturing electronic device
09/04/2003US20030165749 Exposing the substrate using a mask containing gray-tone features
09/04/2003US20030165748 Pattern mask with features to minimize the effect of aberrations
09/04/2003US20030165747 Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks
09/04/2003US20030165654 Assist feature for random, isolated, semi-dense, and other non-dense contacts
09/04/2003US20030165641 Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device
09/04/2003US20030164998 Planarizing with an ion beam at least one layer of amorphous material
09/04/2003US20030164949 Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers
09/03/2003EP1341042A2 System and method for using a two part cover for protecting a reticle
09/03/2003CN1440517A Method of manufacturing integrated circuit
09/02/2003US6615399 Semiconductor device having dummy pattern
09/02/2003US6614504 Used in manufacturing electronic devices such as semiconductor devices and liquid crystal displays by using photolithography
09/02/2003US6613498 Exposure of photoresistive material by transmitting radiation through layer of absorber; development
09/02/2003US6613485 Dividing the pattern into sub-patterns; and rectifying an area of at least one of sub-patterns to have the sub-patterns to havesub-patterns being spaced apart for modifying a light intensity distribution with respect to the pattern
09/02/2003US6613483 Calibration pattern
09/02/2003US6613482 Oxidation resistant covering
08/2003
08/28/2003WO2003071590A1 Production method for exposure mask, exposure mask, and production method of semiconductor device
08/28/2003WO2003071358A1 Method and system for repairing defected photomasks
08/28/2003WO2003058681A3 Differential detector coupled with defocus for improved phase defect sensitivity
08/28/2003US20030163794 Method and apparatus for prepareing patterns used for manufacture of semiconductor device
08/28/2003US20030163791 Shape-based geometry engine to perform smoothing and other layout beautification operations
08/28/2003US20030162329 Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer and structure thereof
08/28/2003US20030162132 Method of producing pattern-formed structure and photomask used in the same
08/28/2003US20030162107 Image forming method
08/28/2003US20030162105 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask
08/28/2003US20030162104 Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure
08/28/2003US20030162103 The serifs or pattern combine to produce an optical proximity correction that reduces corner rounding and increases edge straightness in the resist pattern
08/28/2003US20030162102 Critical dimension control using full phase and trim masks
08/28/2003US20030162005 Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure
08/28/2003US20030161525 Mask defect analysis system
08/28/2003US20030160980 Graphics engine for high precision lithography
08/28/2003US20030160244 Thin-film semiconductor device, electro-optical device, methods for manufacturing the same, and reticle
08/28/2003US20030159712 Supplying fluid flow; then gas flow; ionization; extraction
08/27/2003EP1337838A2 Method and device for determining the properties of an integrated circuit
08/27/2003EP1163552B1 Method of forming a masking pattern on a surface
08/27/2003CN1438679A Method for making semiconductor integrated circuit device
08/27/2003CN1438542A Method for making anti-electrostatic light cover
08/27/2003CN1438520A Film semiconductor device and photoelectric device, making method thereof and intermediate mask
08/26/2003US6611953 Mask correction optimization
08/26/2003US6611317 Synthetic quartz glass optical member highly transparent in ultraviolet range and having a 3640 cm-1 SIOH stretching vibration absorption peak; fluorine laser fine patterning
08/26/2003US6610980 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
08/26/2003US6610464 Uniform thickness; amplificated photoresist; lithography pattern; inversion spinning
08/26/2003US6610463 Method of manufacturing structure having pores
08/26/2003US6610461 Reticle having accessory pattern divided into sub-patterns
08/26/2003US6610460 Exposure method
08/26/2003US6610449 Mapping the phase shifting regions for implementation of such features, resolving phase conflicts and applying sub-resolution assist features within phase shift regions and optical proximity correction features to phase shift regions
08/26/2003US6610447 Lithography; for semiconductors, integrated circuits
08/26/2003US6610446 Information storage on masks for microlithographic tools
08/26/2003US6609459 Gravure short run printing plate
08/21/2003WO2003069014A1 Aperture masks for circuit fabrication
08/21/2003WO2003027768A3 Providing an image on an organic product
08/21/2003US20030159126 Phase-shift lithography mapping method and apparatus
08/21/2003US20030157808 Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts
08/21/2003US20030157436 Method for forming a hard mask in a layer on a planar device
08/21/2003US20030157415 Apparatus and method for compensating critical dimension deviations across photomask
08/20/2003EP1336130A2 Mitigation of multilayer defects on a reticle
08/20/2003EP1044077B1 Apparatus for cleaning surfaces with a cleaning roller assembly
08/20/2003CN1437072A Method for raising processing range with eliminating auxiliary characteristic
08/20/2003CN1437069A Photomask for off-axis illumination and its producing method
08/20/2003CN1437045A Large size substrate and its producing method
08/20/2003CN1118827C Bit line pattern in DRAM for reducing optical close range effect
08/19/2003US6609245 Priority coloring for VLSI designs
08/19/2003US6608691 Generation of exposure data having hierarchical structure
08/19/2003US6607863 Exposure method of production of density filter
08/19/2003US6607862 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making
08/19/2003US6607674 Forming sequentially phase shifter layer and opaque shield layer, defining phase shifter layer and opaque shield layer, etching, etching substrate and exposing a portion of the substrate, etching
08/19/2003US6607634 Reticle adapter for a reactive ion etch system
08/14/2003WO2003067651A1 Test wafer and method for investigating elecrostatic discharge induced wafer defects
08/14/2003WO2003067520A1 Method and system for detecting defects
08/14/2003WO2003067331A1 Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method
08/14/2003WO2003067330A2 Radiation patterning tools, and methods of forming radiation patterning tools
08/14/2003US20030154461 High yield reticle with proximity effect
08/14/2003US20030154460 Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor device
08/14/2003US20030153126 Mask and method for patterning a semiconductor wafer
08/14/2003US20030153114 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
08/14/2003US20030152873 Fabrication method of semiconductor integrated circuit device
08/14/2003US20030152850 Optics; microlithography; configuration, transferring pattern from optics to substrate using charged particles beams
08/14/2003US20030152846 Photolithographic mask
08/14/2003US20030152845 Mask blank, protective film therefor and method of patterning mask blank
08/14/2003US20030152844 Contact layouts; phase shifting; rotation; photolithography; integrated circuits
08/14/2003US20030152843 Resolution enhancing technology using phase assignment bridges
08/14/2003US20030151731 Pellicle distortion reduction
08/14/2003US20030151118 Aperture masks for circuit fabrication
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