| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/14/2003 | US20030151002 Apparatus for inspecting mask |
| 08/14/2003 | US20030150737 Illuminating an inorganic negative tone resist layer on an electroplating base layer by a beam (EB), which is able to cure the resist to a pattern; removing non-illuminated portions and electroplating between cured layers |
| 08/14/2003 | US20030150329 Inert gas purge method and apparatus, exposure apparatus, recticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method |
| 08/13/2003 | EP1335245A2 Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask |
| 08/13/2003 | EP1334406A2 Photolithographic mask |
| 08/13/2003 | EP1021747B1 Optical lithography beyond conventional resolution limits |
| 08/12/2003 | US6606168 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same |
| 08/12/2003 | US6606145 Exposure apparatus, microdevice, photomask, and exposure method |
| 08/12/2003 | US6605816 Reticle and direct lithography writing strategy |
| 08/12/2003 | US6605481 Facilitating an adjustable level of phase shifting during an optical lithography process for manufacturing an integrated circuit |
| 08/12/2003 | US6605411 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask |
| 08/12/2003 | US6605410 Wherein thin polymeric film (polyurethane) doped with ultraviolet radiation absorber is laminated (ablated via laser) to photopolymer (isoprene-styrene) layer, creating in situ negative; flexography; offset printing; photolithography |
| 08/12/2003 | US6605397 Method of preparing pattern data to be used for different exposure methods |
| 08/12/2003 | US6605396 Resolution enhancement for alternating phase shift masks |
| 08/12/2003 | US6605395 Two areas phase shifted relative to the other two areas to create unexposed areas that are have polarizations orthogonal to each other, are frequency shifted relative to the two other areas, or are exposed at a different time |
| 08/12/2003 | US6605394 Exposing a surface of said DUV photoresist to radiation from said direct write continuous wave laser. |
| 08/12/2003 | US6605393 Alternative PSM with new phase conflict canceling method |
| 08/12/2003 | US6605392 X-ray mask structure, and X-ray exposure method and apparatus using the same |
| 08/07/2003 | WO2003065434A1 Method of treating surface, semiconductor device, process for producing semiconductor device, and apparatus for treatment |
| 08/07/2003 | WO2002027404A8 Mitigation of multilayer defects on a reticle |
| 08/07/2003 | US20030149956 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 08/07/2003 | US20030149955 Rule-based opc evaluating method and simulation base opc model evaluating method |
| 08/07/2003 | US20030149947 Method and system for detecting defects |
| 08/07/2003 | US20030148635 Method of manufacturing integrated circuit |
| 08/07/2003 | US20030148608 Method of manufacturing integrated circuit |
| 08/07/2003 | US20030148549 Method of manufacturing integrated circuit |
| 08/07/2003 | US20030148221 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 08/07/2003 | US20030148220 Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique |
| 08/07/2003 | US20030148217 Ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink |
| 08/07/2003 | US20030148195 Forming a device pattern of a semiconductor device. The method includes the steps of carrying out an over-exposure to a resist film using a mask which has transmission regions which are positioned about a circumference of each of intended |
| 08/07/2003 | US20030148194 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 08/07/2003 | US20030148193 Capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent |
| 08/07/2003 | US20030147139 Multi-layered film reflector manufacturing method |
| 08/07/2003 | US20030147128 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 08/07/2003 | US20030147058 Self-cleaning reflective optical elements for use in X-ray optical systems, and optical systems and microlithography systems comprising same |
| 08/07/2003 | US20030146485 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device |
| 08/07/2003 | DE19946991C1 Verfahren zur Erzeugung von Phasenmasken beim automatisierten Entwurf von integrierten Schaltkreisen A method for generating phase masks for automated design of integrated circuits |
| 08/06/2003 | EP1333323A2 Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same |
| 08/06/2003 | EP1333313A1 Large-sized substrate and method of producing the same |
| 08/06/2003 | CN1434769A Chemical imaging of a lithographic printing plate |
| 08/06/2003 | CN1434349A Photo-mechanical characteristic making containing micrometer and submicrometer characteristic for semiconductor device |
| 08/05/2003 | US6604234 Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device |
| 08/05/2003 | US6604011 Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same |
| 08/05/2003 | US6603875 Pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. |
| 08/05/2003 | US6603873 Defect detection using gray level signatures |
| 08/05/2003 | US6603120 Test method of mask for electron-beam exposure and method of electron-beam exposure |
| 08/05/2003 | US6602728 Method for generating a proximity model based on proximity rules |
| 08/05/2003 | US6602642 Optical proximity correction verification mask |
| 07/31/2003 | WO2003062923A1 Photomask, method of producing it and pattern froming method using the photomask |
| 07/31/2003 | WO2003062922A2 Photomask and method for manufacturing the same |
| 07/31/2003 | WO2003062919A1 Lacquer layer deposition |
| 07/31/2003 | US20030144760 Personalized hardware |
| 07/31/2003 | US20030143858 Process for the plasma etching of materials not containing silicon |
| 07/31/2003 | US20030143472 Manufacturing method of photomask |
| 07/31/2003 | US20030143471 For use in flexographic printing plate, does not require treatments with chemicals, resolution by etching with laser beam |
| 07/31/2003 | US20030143470 Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools |
| 07/31/2003 | US20030143468 Multiple photolithographic exposures with different non-clear patterns |
| 07/31/2003 | US20030143403 Large-sized substrate and method of producing the same |
| 07/31/2003 | US20030142860 Mechanisms for making and inspecting reticles |
| 07/31/2003 | US20030141584 Variable rotational assignment of interconnect levels in integrated circuit fabrication |
| 07/30/2003 | EP1331516A2 Method and mask for fabricating features in a polymer layer |
| 07/30/2003 | EP1330742A1 Integrated verification and manufacturability tool |
| 07/30/2003 | EP1330680A1 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 07/30/2003 | EP0980407B1 Hot melt ink |
| 07/30/2003 | EP0900410B1 Attenuating embedded phase shift photomask blanks |
| 07/30/2003 | CN1433531A Lithography device which uses source of radiation in the extreme ultraviolet range and multi-layered mirrors with broad spectral band in this range |
| 07/29/2003 | US6601231 Space classification for resolution enhancement techniques |
| 07/29/2003 | US6600551 Programmable photolithographic mask system and method |
| 07/29/2003 | US6599679 Photosensitive flexographic printing element having an IR-ablative layer comprising polyether-polyurethanes |
| 07/29/2003 | US6599667 Light shielding film is a single layered or multiple layered film which has a layer of tantalum. |
| 07/29/2003 | US6599666 Multi-layer, attenuated phase-shifting mask |
| 07/29/2003 | US6599665 Empolying differing radiation dosages to expose photoresist; using dummy features to eliminate loading effect of etch rate at marginal areas |
| 07/29/2003 | US6598789 Substrate managing system and substrate storing system |
| 07/24/2003 | US20030140331 Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks |
| 07/24/2003 | US20030140330 Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device |
| 07/24/2003 | US20030140329 Method for forming exposure pattern and exposure pattern |
| 07/24/2003 | US20030140328 Selective promotion for resolution enhancement techniques |
| 07/24/2003 | US20030139055 Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device |
| 07/24/2003 | US20030139054 Pattern formation method |
| 07/24/2003 | US20030138741 A patterned, multi-transmissive mask is used during patterning of resists to control exposure at areas of the resist at which features having different detail are desired |
| 07/24/2003 | US20030138707 Depositing a first material on a substrate and applying a thermal treatment to the substrate at >300 degrees Celsius before completing the deposition of the first material; stress relieving; dimensional stability; flatness; semiconductors |
| 07/24/2003 | US20030138706 Designing a layout by dividing each of the pixels into sub-pixels having a variable length in a first axis and fixed length in a second axis, to form a continuous tone, aerial light image; smoother/more linear profile for three-dimension |
| 07/24/2003 | US20030138705 Simultaneously generating small- and large-scale circuit structures of a parallel processing system for a reticle; controlling the connectivity between a circuit trace of adjacent reticle images by varying the degree of overlap |
| 07/24/2003 | US20030138704 Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features |
| 07/24/2003 | US20030137665 Pattern test device |
| 07/24/2003 | US20030137024 Mask and production method therefor and production method for semiconductor device |
| 07/24/2003 | US20030136772 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment |
| 07/24/2003 | US20030136512 Device manufacturing-related apparatus, reticle, and device manufacturing method |
| 07/24/2003 | US20030135979 Three-dimensional structure; process control |
| 07/23/2003 | EP1329771A2 Method of two dimensional feature model calibration and optimization |
| 07/23/2003 | EP1329710A2 Pattern test device |
| 07/23/2003 | CN1431851A Mask and its mfg. method, electroluminance device and its mfg. method and electronic machine |
| 07/23/2003 | CN1431558A Method for modifying charactristie pattern of regular polygon mask by use optical proximity effect |
| 07/22/2003 | US6598218 Optical proximity correction method |
| 07/22/2003 | US6598185 Pattern data inspection method and storage medium |
| 07/22/2003 | US6596656 Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM |
| 07/22/2003 | US6596603 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 07/22/2003 | US6596552 Test photomask and method for investigating ESD-induced reticle defects |
| 07/22/2003 | US6596466 For integrated circuit structure that includes a contact hole formed adjacent to an intermediate "cactus-shaped" structure |
| 07/22/2003 | US6596465 Manufacturing a semiconductor component having submicron features |