| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/07/2003 | US6630273 Etching silicon layer; forming silicide |
| 10/02/2003 | WO2003081649A1 Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure method |
| 10/02/2003 | WO2003081339A2 Patterning semiconductor layers using phase shifting and assist features |
| 10/02/2003 | US20030188289 LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program |
| 10/02/2003 | US20030188288 Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatus |
| 10/02/2003 | US20030188283 Method and apparatus for identifying an identical cell in an IC layout with an existing solution |
| 10/02/2003 | US20030187750 Photomask supply system with photomask production period shortened |
| 10/02/2003 | US20030186624 Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| 10/02/2003 | US20030186557 Fabrication method for lines of semiconductor device |
| 10/02/2003 | US20030186473 Electrical print resolution test die |
| 10/02/2003 | US20030186142 Directing optical radiation on the optical medium; propagating a test beam; capturing and measuring a defined characteristic associated with initial grating; comparing; performing grating correction |
| 10/02/2003 | US20030186138 Resolution of a stepper |
| 10/02/2003 | US20030186137 Disposable hard mask for phase shift photomask plasma etching |
| 10/02/2003 | US20030186135 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 10/02/2003 | US20030186132 Optical alignment test structure patterns on photomasks used to determine field-to-field alignment of a stepper in lithography |
| 10/02/2003 | US20030186131 For keeping contaminants away from a vicinity of a mask during exposure |
| 10/02/2003 | US20030186130 Forming repairing pattern as to make obtainable a graytone effect equal to the graytone effect of a regular pattern without restoring the same form as that of the regular pattern in the defective portion |
| 10/02/2003 | US20030184722 Laser repair system and glass mask used for the same |
| 10/02/2003 | US20030184721 Mask substrate and its manufacturing method |
| 10/01/2003 | EP1349091A2 LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program |
| 10/01/2003 | EP1349004A1 Preparation of a flexographic printing plate |
| 10/01/2003 | EP1349003A2 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
| 10/01/2003 | EP1349002A2 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 10/01/2003 | CN1445848A Semiconductor device and its manufacturing method and phase-shift mask |
| 10/01/2003 | CN1445604A Low cost photo etching technique |
| 10/01/2003 | CN1122876C Photomask blanks |
| 09/30/2003 | US6628456 Ultraviolet and vacuum ultraviolet antireflection substrate |
| 09/30/2003 | US6628409 Method for determining the distance between periodic structures on an integrated circuit or a photomask |
| 09/30/2003 | US6627885 Method of focused ion beam pattern transfer using a smart dynamic template |
| 09/30/2003 | US6627392 Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns |
| 09/30/2003 | US6627365 Photomask and projection exposure apparatus |
| 09/30/2003 | US6627363 Utilizing vacuum ultraviolet (VUV) exposure to remove halos of carbon deposition in clear reticle repair |
| 09/30/2003 | US6627362 Correction reduces effects of the mask blank defect on the operation of the mask |
| 09/30/2003 | US6627361 An illuminated annulus including an inner edge for producing intermediate level of illumination in a pattern area, an outer edge for producing intermediate level of illumination to generate assist feature separated from pattern area |
| 09/30/2003 | US6627359 Phase-shift photomask manufacturing method and phase-shift photomask |
| 09/30/2003 | US6627358 Mask repair in resist image |
| 09/30/2003 | US6627357 Reticle |
| 09/30/2003 | US6627356 Radiation transparent substrate; forming pattern |
| 09/30/2003 | US6627355 Providing photomask substrate; applying an opaque material to photomask substrate, wherein a reflection of light at an interface between substrate and opaque material is at least 45 percent and absorption by opaque material is reduced |
| 09/25/2003 | WO2003079419A1 Mask storage device, exposure device, and device manufacturing method |
| 09/25/2003 | WO2003079117A1 Full phase shifting mask in damascene process |
| 09/25/2003 | WO2003079112A1 Method of producing an etch-resistant polymer structure using electron beam lithography |
| 09/25/2003 | WO2003079111A1 A method and system of lithography using masks having gray-tone features |
| 09/25/2003 | WO2002054115A3 A self-cleaning optic for extreme ultraviolet lithography |
| 09/25/2003 | US20030181033 Masks and method for contact hole exposure |
| 09/25/2003 | US20030180670 Surface treatment of a semiconductor wafer by photomasking, using a metal shields; materials handling |
| 09/25/2003 | US20030180668 Forming reduced size openings, by flowing the photoresist layer to reduce the size of the opening images; materials handling |
| 09/25/2003 | US20030180655 Process for making a flexographic printing plate and a photosensitive element for use in the process |
| 09/25/2003 | US20030180632 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method |
| 09/25/2003 | US20030180631 For use in short-wavelength exposure light source/excimer laser |
| 09/25/2003 | US20030180630 Halftone type phase shift mask blank and phase shift mask thereof |
| 09/25/2003 | US20030180629 Comprises phase shift layer of molybdenum silicide oxynitride; semiconductors; photolithography |
| 09/25/2003 | US20030180628 Comprises controllable transmittance photomask vertically divided into regions having both transparent and dark blocks |
| 09/25/2003 | US20030180627 Method of producing an etch-resistant polymer structure using electron beam lithography |
| 09/25/2003 | US20030179251 Preparation of a flexographic printing plate |
| 09/25/2003 | US20030178703 Patterning semiconductor layers using phase shifting and assist features |
| 09/25/2003 | DE29924532U1 Photographic illumination apparatus for biological matter has a perforated mask between the light source and the DNA chip with micro shutters operated by electronic control |
| 09/24/2003 | EP1346262A1 Self-compensating mark arangement for stepper alignment |
| 09/24/2003 | CN1444097A Mask element, method for preparing mask by using said element and method for preparing photosensitive resin printing plate by sing said mask |
| 09/23/2003 | US6625802 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 09/23/2003 | US6625801 Dissection of printed edges from a fabrication layout for correcting proximity effects |
| 09/23/2003 | US6625800 Machine readable medium having stored instructions for simulating inspection of mask patterned according to patterns in design file through mask inspection tool optical channel, and simulating passing of region of light through mask |
| 09/23/2003 | US6623895 Optically transferring lithography patterns |
| 09/23/2003 | US6623893 Pellicle for use in EUV lithography and a method of making such a pellicle |
| 09/23/2003 | US6622547 System and method for facilitating selection of optimized optical proximity correction |
| 09/18/2003 | WO2003077292A1 Mask, semiconductor device manufacturing method, and semiconductor device |
| 09/18/2003 | WO2003077038A2 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae |
| 09/18/2003 | WO2002075454A3 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 09/18/2003 | US20030177467 Opc mask manufacturing method, opc mask, and chip |
| 09/18/2003 | US20030175623 Method for forming resist pattern |
| 09/18/2003 | US20030175600 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 09/18/2003 | US20030174876 Local bias map using line width measurements |
| 09/18/2003 | US20030174805 X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist material |
| 09/18/2003 | US20030173675 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 09/18/2003 | US20030173529 Mask pattern inspection system and mask pattern-inspecting method |
| 09/17/2003 | EP1344110A1 Mitigation of radiation induced surface contamination |
| 09/17/2003 | EP1344107A2 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 09/17/2003 | CN1442884A Manufacturing method of electron device |
| 09/17/2003 | CN1442756A Inert gas displacement method and device, exposure device and graticule sheet device |
| 09/16/2003 | US6622297 Pattern correcting method and pattern verifying method |
| 09/16/2003 | US6622296 Exposure mask pattern correction method, pattern formation method, and a program product for operating a computer |
| 09/16/2003 | US6622295 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 09/16/2003 | US6622288 Conflict sensitive compaction for resolving phase-shift conflicts in layouts for phase-shifted features |
| 09/16/2003 | US6620561 Method for designing photolithographic reticle layout, reticle, and photolithographic process |
| 09/16/2003 | US6620559 Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements |
| 09/16/2003 | US6620558 Strength, rigidity |
| 09/16/2003 | US6620557 A main object of the present invention is to provide a photo-mask improved to ensure dimension with high accuracy. An actual pattern is provided on a substrate. A monitor mark for ensuring dimension of the actual pattern is also provided on |
| 09/16/2003 | US6620556 Cyclic pattern, exposure, devlopment |
| 09/16/2003 | US6620555 Transmits ultraviolet rays and, particularly, vacuum ultraviolet rays, does not lose the film thickness thereof that stems from the photolysis and, hence, exhibits excellent light resistance. The pellicle is obtained by using, as a |
| 09/16/2003 | US6619903 System and method for reticle protection and transport |
| 09/16/2003 | US6619359 Pellicle mounting apparatus |
| 09/15/2003 | CA2377081A1 Method of producing an etch-resistant polymer structure using electron beam lithography |
| 09/12/2003 | WO2002088844A3 Alternating phase shift mask |
| 09/12/2003 | WO2002086622A3 Ion-beam deposition process for manufacturing binary photomask blanks |
| 09/12/2003 | WO2002086621A3 Ion-beam deposition process for manufacturing multilayered attenuated phase shift photomask blanks |
| 09/12/2003 | WO2002086620A3 Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks |
| 09/12/2003 | WO2002054150A3 Optical assist feature for two-mask exposure lithography |
| 09/11/2003 | US20030170572 Photomasking |
| 09/11/2003 | US20030170565 Method of removing assist features utilized to improve process latitude |
| 09/11/2003 | US20030170551 Proximity effect correction apparatus, proximity effect correction method, storage medium , and computer program product |