Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2003
10/28/2003US6639232 Pattern writing method employing electron beam writing device of variable-shaped vector scan system
10/28/2003US6638667 Generating gray scale pattern on mask to form true gray scale mask by creating a layer having transmission varying acrossmask; positioning true gray scale mask between light source and a photoresist layer; exposing; transferring pattern
10/28/2003US6638666 Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask
10/28/2003US6638665 Method and apparatus for designing EB mask
10/28/2003US6638664 Optical mask correction method
10/28/2003US6638663 Glass, quartz, silicon oxyfluoride or metal fluorides having patterns comprising radiation transparent and transluscence regions used for photolithography
10/28/2003US6637273 Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks
10/23/2003WO2003088329A1 Reticle and optical characteristic measuring method
10/23/2003WO2003087948A1 Attenuated embedded phase shift photomask blanks
10/23/2003WO2003087945A2 Interferometric measuring device and projection illumination installation comprising one such measuring device
10/23/2003WO2003021351A3 Phase-shift mask
10/23/2003WO2002072353A3 Photosensitive flexographic device with associated thermally addressable mask
10/23/2003US20030200524 Priority coloring for VLSI designs
10/23/2003US20030200523 Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices
10/23/2003US20030199124 Photomask and pattern forming method
10/23/2003US20030198876 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools
10/23/2003US20030198875 Wave guided alternating phase shift mask and fabrication method thereof
10/23/2003US20030198874 Reflection photomasks with a capping layer and methods for manufacturing the same
10/23/2003US20030198873 Photomask and method for qualifying the same with a prototype specification
10/23/2003US20030198872 Method for setting mask pattern and illumination condition
10/23/2003US20030197923 High NA system for multiple mode imaging
10/23/2003US20030197865 Reticle and optical characteristic measuring method
10/23/2003US20030197858 Method and apparatus for article inspection including speckle reduction
10/23/2003US20030197857 Defect inspection apparatus
10/23/2003US20030197851 Patterned substrate; stretched optical film; confining frame; sealing
10/23/2003US20030197838 Ilumination optical system and method, and exposure apparatus
10/23/2003US20030197182 Thin film transistor array substrate, manufacturing method thereof, and mask
10/22/2003EP1354325A2 Collector with an unused area for lighting systems having a wavelength inferior or equal of 193 nm
10/22/2003CN1450411A Method and apparatus for porforming rule-based gate shrink utilizing dipole illumination
10/22/2003CN1450407A Method for correcting mask distribution pattern
10/22/2003CN1450406A Method and apparatus for definiting mask pattern by doubling space frequency technology
10/22/2003CN1450403A Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
10/22/2003CN1450393A Mask, substrate with light reflection film, method for making light-reflection film, display device and electric appliance
10/22/2003CN1450392A Mask, substrate with light reflection film, method for making light reflection film
10/22/2003CN1450391A Mask, substrate with light reflection film, light reflection film forming method
10/21/2003US6637010 Method and program for processing design pattern of semiconductor integrated circuit
10/21/2003US6636294 Microdevice and structural components of the same
10/21/2003US6635884 Method for directing an electron beam onto a target position on a substrate surface
10/21/2003US6635549 Method of producing exposure mask
10/21/2003US6635394 Three dimensional mask
10/21/2003US6635393 Blank for alternating PSM photomask with charge dissipation layer
10/21/2003US6635392 Computer corrected pattern
10/21/2003US6635391 Method for fabricating reticles for EUV lithography without the use of a patterned absorber
10/21/2003US6635390 Photomask used in lithographic printing; dislodge the particulate matter on the photomask surface and cause it to be directed toward the adhesive surface of the interior wall and adhere thereto; semiconductor wafer
10/21/2003US6635389 Through machining or mold forming; high resolution lithography
10/21/2003US6635388 Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask
10/16/2003WO2003085709A1 Reflection type mask blank and reflection type mask and production methods for them
10/16/2003WO2003085362A1 A mask blank and a method for producing the same
10/16/2003WO2002095498A3 Lithographic method of manufacturing a device
10/16/2003US20030196178 Trough adjusted optical proximity correction for vias
10/16/2003US20030194620 Mask blank and method of fabricating phase shift mask from the same
10/16/2003US20030194618 Method of inspecting photo-mask
10/16/2003US20030194617 Method of producing pattern-formed structure and photomask used in the same
10/16/2003US20030194616 Ion-beam deposition process for manufacture of binary photomask blanks
10/16/2003US20030194615 Use of a planarizing layer to improve multilayer performance in extreme ultra-violet masks
10/16/2003US20030194614 Lower fabrication cost and enhanced fabrication throughput
10/16/2003US20030194613 Projecting a laser beam through a mask having a slit pattern comprising a corner region with edges, and a blocking feature with the corner region to reduce energy spikes projected on a substrate.
10/16/2003US20030194569 Phase shifting layer on etch stop layer and capable of producing a photomask with 180 degrees phase shift and an optical transmission of at least 0.001% at a selected wavelength of less-than 500 nm.
10/16/2003US20030194568 Attenuated embedded phase shift photomask blanks
10/16/2003US20030193656 Photomask for measuring lens aberration, method of manufacturing the same, and method of measuring lens aberration
10/16/2003US20030192567 Method of making foreign matter harmless
10/15/2003EP1353224A1 Cleaning of a pellicle-mask assembly
10/15/2003EP1353165A2 Automated photomask inspection apparatus and method
10/15/2003CN1448989A Photomask supply system capable of shortening photomask manufacturing cycle
10/15/2003CN1448800A Multiply light shield putting flatwise device and method for improving superimposed micro-image
10/15/2003CN1448794A Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
10/15/2003CN1448786A A few light shield installable light shield support and micro-image exposure system
10/15/2003CN1448785A Large-area light shield and exposure system with the same large-area light shield
10/15/2003CN1448784A Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
10/15/2003CN1448783A Method for correcting defect of grey part in grey mask
10/15/2003CN1124519C Photomask blanks
10/14/2003US6634018 Optical proximity correction
10/14/2003US6632744 Manufacturing method of semiconductor integrated circuit device
10/14/2003US6632593 Pattern-forming method using photomask, and pattern-forming apparatus
10/14/2003US6632592 Resist pattern forming method
10/14/2003US6632590 Enhance the process window of memory cell line/space dense pattern in sub-wavelength process
10/14/2003US6632576 For use in semiconductor integrated circuit (IC) manufacturing
10/14/2003US6632574 Mask having pattern areas whose transmission factors are different from each other
10/14/2003US6632125 Method of manufacturing aluminum frames for photomask protective films
10/09/2003WO2003083913A1 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method, and mask
10/09/2003WO2003050619A3 A method for producing a mask for high resolution lithography, a mask obtained thereby and a multi-layer element for high resolution lithography
10/09/2003WO2003025678A3 Method and device for control of the data flow on application of reticles in a semiconductor component production
10/09/2003WO2003003118A3 Mask repair with electron beam-induced chemical etching
10/09/2003WO2002101466A3 Exposure control for phase shifting photolithographic masks
10/09/2003US20030192015 Method and apparatus to facilitate test pattern design for model calibration and proximity correction
10/09/2003US20030192013 Method and apparatus for facilitating process-compliant layout optimization
10/09/2003US20030190556 Method of manufacturing TFT array
10/09/2003US20030190534 Method and apparatus for producing a photomask blank, and apparatus for removing an unnecessary portion of a film
10/09/2003US20030190532 Photolithographic mask fabrication
10/09/2003US20030189703 Image pickup apparatus and defect inspection apparatus for photomask
10/08/2003EP1351297A2 Semiconductor device, method of manufacturing the same, and phase shift mask
10/08/2003EP1351095A2 Reticles for MEMS and IC processes
10/08/2003EP1350264A1 Method for forming a pattern and a semiconductor device
10/08/2003EP0900411B1 Attenuating embedded phase shift photomask blanks
10/08/2003CN1447384A LSI mark mfg. system, LSI mark mfg. method and LSI mark mfg. program
10/08/2003CN1447189A Light mark, focusing monitoring method, light exposure monitoring method, and mfg. method of semiconductor device
10/07/2003US6631511 Generating mask layout data for simulation of lithographic processes
10/07/2003US6631307 Compensation for distortion of photoresist image; modifying data file whereby is added at each primary vertex location; high speed correction; computer programs
10/07/2003US6630987 Rotational mask scanning exposure method and apparatus
10/07/2003US6630408 Self alignment process to fabricate attenuated shifting mask with chrome border
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