Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2003
11/20/2003US20030214642 Method for detecting flare noise of semiconductor device
11/20/2003US20030213613 Lithography correction method and device
11/20/2003US20030213612 For electrostatic discharge protection; comprising first ring on substrate having plurality of electrically connected lightening bars and second ring concentric to first and having lightening bars electrically isolated from one another
11/19/2003EP1363164A1 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
11/19/2003CN1456938A System and method for protecting templates by two-piece cover
11/18/2003US6649932 Electrical print resolution test die
11/18/2003US6649719 Degradable, amorphous, fluorochemical acrylate polymers
11/18/2003US6649452 Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer
11/18/2003US6649328 Coating a photoresist on the Fresnel lens surfaces and rise surfaces, and forming a layer of a light-diffusing material or a light-absorbing material on the rise surfaces by exposing the photoresist at different light exposure doses
11/18/2003US6649310 Calibration pattern
11/18/2003US6649309 Computer simulation program
11/13/2003WO2002101468A3 Design and layout of phase shifting photolithographic masks
11/13/2003WO2002101465A3 Phase conflict resolution for photolithographic masks
11/13/2003WO2002092670A3 Fluoropolymer compositions comprising a fluor-containing liquid
11/13/2003WO2002069390A3 Grating test patterns and methods for overlay metrology
11/13/2003US20030212981 Method utilizing dummy patterns to fabricate active region for stabilizing lithographic process
11/13/2003US20030211419 Process for making a flexographic printing plate
11/13/2003US20030211403 Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask
11/13/2003US20030211401 Photolithography masking; integrated circuits
11/13/2003US20030211400 Method of improving photomask geometry
11/13/2003US20030211399 Photomask with illumination control over patterns having varying structural densities
11/13/2003US20030211398 Method of correcting a mask layout
11/13/2003US20030210484 Mask, substrate with light reflecting film, method for manufacturing light reflecting film, optical display device, and electronic apparatus
11/13/2003US20030210431 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same
11/13/2003US20030210058 Electrical print resolution test die
11/12/2003EP1361478A1 Method of manufacturing phase shift mask and phase shift mask
11/12/2003EP1360555A1 Fused silica pellicle
11/12/2003EP1360553A2 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation
11/12/2003EP1360552A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography
11/12/2003CN1455439A Mask making method and method for making semiconductor integrated circuit device
11/12/2003CN1455300A Light shade, its making method and pattern formation method using said light shade
11/12/2003CN1455299A Light shade, its making method and pattern formation method using said light shade
11/12/2003CN1455298A Phase-shift mask manufacturing method
11/11/2003US6647543 For use in an electron projection lithographic (EPL) technique
11/11/2003US6647087 Exposure method
11/11/2003US6646722 Improvement in dimensions of circuitry and other structures formed on the semiconductor wafer; optical lithographic techniques used in the formation of integrated circuits
11/11/2003US6646281 Differential detector coupled with defocus for improved phase defect sensitivity
11/11/2003US6646260 Measurement technique for determining the width of a structure on a mask
11/11/2003US6645856 Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate
11/11/2003US6645823 Reticle and method of fabricating semiconductor device
11/11/2003US6645679 Heat treatment or e-beam treatment can locally modify the multilayer to provide different reflective characteristics. The attenuated phase shift mask can be utilized in EUV applications
11/11/2003US6645678 Semiconductor wafer undergoes two exposures using different masks
11/11/2003US6645677 Preparation of patterned reticles to be used as masks in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a masking layer on a reticle. The methods and devices
11/11/2003US6645676 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
11/07/2003CA2428288A1 Method for manufacturing complex grating masks having phase shifted regions and a holographic set-up for making the same
11/06/2003WO2003091949A2 Switched fabric based inspection system
11/06/2003WO2003010605A3 Pattern generation method and apparatus using cached cells of hierarchical data
11/06/2003WO2002003141A8 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
11/06/2003US20030208742 Space classification for resolution enhancement techniques
11/06/2003US20030208741 Apparatus for correcting data of layout pattern
11/06/2003US20030208728 Method and system for simulating resist and etch edges
11/06/2003US20030207747 Direct write all-glass photomask blanks
11/06/2003US20030207521 Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 nm
11/06/2003US20030207184 Method and apparatus for repairing an alternating phase shift mask
11/06/2003US20030207183 Manufacturing method of a phase-shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device
11/06/2003US20030207182 Photolithographic patterning of a photoresist layer by pattern-wise exposure to short- wavelength ultraviolet light through a pattern-bearing photomask which is dustproof protected by mounting a framed pellicle thereon. With an
11/06/2003US20030207181 Mask includes a mask substrate and mask patterns arranged on the mask substrate such that a critical dimension (CD), represented by the width of each of the mask patterns, and a phase of the mask patterns have a size proportional to a SINC
11/06/2003US20030207180 Dual damascene process using a single photo mask
11/06/2003US20030205658 Use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
11/06/2003US20030205657 Use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
11/05/2003EP1359467A2 Arrangement and method for transferring a pattern from a mask to a wafer
11/05/2003EP1359464A2 A method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
11/05/2003EP1358623A2 Method and apparatus for inspecting a substrate
11/05/2003CN1454332A Phase shift masking for complex patterns
11/05/2003CN1453635A Apparatus and system for improving phase-shift mask image performance and its method
11/04/2003US6643616 Integrated device structure prediction based on model curvature
11/04/2003US6642532 Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery
11/04/2003US6642531 Contamination control on lithography components
11/04/2003US6642530 Multiple pass write method and reticle
11/04/2003US6642529 Methods for the automated testing of reticle feature geometries
11/04/2003US6641982 Methodology to introduce metal and via openings
11/04/2003US6641979 Technique of exposing a resist using electron beams having different accelerating voltages
11/04/2003US6641978 Coating substrates with thin films consisting of metals such as bismuth and/or indium, then alloying, etching and stripping to form patterns, used for masking integrated circuits
11/04/2003US6641959 Lower multilayer mirror having a first region and a second region; a buffer layer disposed over the second region of the lower multilayer mirror; and an upper multilayer mirror disposed over the buffer layer.
11/04/2003US6641958 Radiation transparent substrate overcoated with silicides
11/04/2003US6641705 Apparatus and method for reducing differential sputter rates
10/2003
10/30/2003WO2003089990A2 Process for etching photomasks
10/30/2003WO2003089964A1 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device
10/30/2003US20030203318 Exposure method based on multiple exposure process
10/30/2003US20030203292 Quartz damage repair method for high-end mask
10/30/2003US20030203291 Photomask, method for producing the same, and method for forming pattern using the photomask
10/30/2003US20030203290 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film
10/30/2003US20030203289 Increasing contrast of extreme ultraviolet light mask at inspection by forming multilayer mirror over substrate, forming absorber layer over mirror, top layer over absorber layer, patterning mask, removing top and absorber layers
10/30/2003US20030203288 Method and apparatus capable of accurately measuring overlay shift between overlay measuring pattern used for transfer to lower target transfer film and overlay measuring pattern used for transfer to upper target transfer film
10/30/2003US20030203287 Such as a photo mask and a reticle, and particularly to a method of forming a required pattern on the original plate by means of an electron beam exposure
10/30/2003US20030203286 Relates to structure of a high-transmittance halftone phase shift mask used to form a small pattern in a process of manufacturing semiconductor devices; capable of transferring desired pattern to photosensitive resin clearly and precisely
10/30/2003US20030203285 Method of fabricating phase shift mask
10/30/2003US20030203284 Using holographic technique; particularly relates to method of forming micropores by off-axis exposure process by which a pattern having high resolution can be formed using diagonally applied light
10/30/2003US20030202244 Self-aligned aperture masks having high definition apertures
10/30/2003US20030202233 Pattern generator mirror configurations
10/30/2003US20030202181 Arrangement and method for transferring a pattern from a mask to a wafer
10/30/2003US20030201410 Sensitivity adjusting method for pattern inspection apparatus
10/29/2003EP1357427A2 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
10/29/2003EP1357426A2 Method for setting mask pattern and its illumination condition
10/29/2003CN1452749A Network-based photomask data entry interface and instruction generator for mfg. photomasks
10/29/2003CN1452215A Pattern forming method
10/29/2003CN1452009A Method for forming phase deviation optical mask of microimage mfg. process
10/29/2003CN1451996A Thin film transistor array substrate, mfg. method thereof and mask therefor
10/28/2003US6639676 Method for determining rotational error portion of total misalignment error in a stepper
10/28/2003US6639650 Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
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