Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2003
12/11/2003US20030228541 Controlling light source; lauout of liquid crystals; masking structure for photolithography
12/11/2003US20030228530 Extreme ultraviolet mask with improved absorber
12/11/2003US20030228529 Lithography; substrate overcoated with buffer; prevent electrostatics discharging
12/11/2003US20030228528 Photomask blank manufacturing method
12/11/2003US20030228527 Method for compensating for scatter/reflection effects in particle beam lithography
12/11/2003US20030228526 Self-aligned alternating phase shift mask patterning process
12/11/2003US20030228048 Pattern image comparison method, pattern image comparison device, and program
12/11/2003US20030228047 Photomask transparent substrate protection during removal of opaque photomask defects
12/11/2003US20030227605 System and method for using a two part cover for protecting a reticle
12/11/2003US20030226980 Exposure method
12/11/2003US20030226951 System and method for lithography process monitoring and control
12/11/2003US20030226819 Single trench alternating phase shift mask fabrication
12/10/2003EP1369743A2 Characterisation of lithography apparatus
12/10/2003EP1368711A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
12/10/2003EP1368708A2 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks
12/10/2003EP1290496B1 Modification of mask layout data to improve mask fidelity
12/10/2003CN1460896A Energy beam exposure method and device
12/10/2003CN1460892A Laser processing method and equipment
12/10/2003CN1130755C Method for correcting photo-adjacency effect in course of production of semiconductor device
12/09/2003US6661105 Alignment mark structure
12/09/2003US6660653 Dual trench alternating phase shift mask fabrication
12/09/2003US6660649 In-situ balancing for phase-shifting mask
12/09/2003US6660546 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device
12/09/2003US6660540 Test wafer and method for investigating electrostatic discharge induced wafer defects
12/09/2003US6660462 Suppressing variation in gate length caused by proximity effect
12/09/2003US6660455 Pattern formation material, pattern formation method, and exposure mask fabrication method
12/09/2003US6660439 Without using complex software or large corrected pattern files
12/09/2003US6660438 A halftone phase-shift pattern on an optically transmissive plate and a resist film outside the pattern formation area, is illuminated, transferring the pattern to a photosensitive film
12/09/2003US6660437 The phase mask contains a T-patterned structure composed of transparent surface segments with mutually displaced phases and surface boundary segment whose phase is situated between the phases of the adjacent surface segments
12/09/2003US6660436 OPC-like repair method for attenuated phase shift masks
12/09/2003US6660346 Pellicle
12/04/2003WO2003100816A2 Energetic neutral particle lithographic apparatus and process
12/04/2003WO2003050617A3 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region
12/04/2003WO2002041077A3 Attenuating extreme ultraviolet (euv) phase-shifting mask fabrication method
12/04/2003US20030226130 Method for making an OPC mask and an OPC mask manufactured using the same
12/04/2003US20030224560 Method for manufacturing an electronic device
12/04/2003US20030224295 Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method
12/04/2003US20030224252 In the manufacture of integrated circuit devices lithography is controlled so that the best focus for imaging is constantly maintained.
12/04/2003US20030224251 Method for photo-imageable lacquer deposition for a display device
12/04/2003US20030224148 Photomask with dies relating to different functionalities
12/04/2003US20030223121 Mask, substrate with light reflecting film, method for forming light reflecting film, method for manufacturing electro-optical device, electro-optical device, and electronic apparatus
12/04/2003US20030222225 High reflectivity to incident X-radiation independently of the angle of incidence and without significantly compromising optical performance. Also disclosed are X-ray optical systems and microlithography apparatus comprising such mirrors.
12/03/2003EP1367605A1 Multilayer-film reflective mirrors and optical systems comprising same
12/03/2003EP1366511A1 Metal pattern formation
12/03/2003CN1459667A Light cage for preventing electrostatic break down
12/02/2003US6658641 Analyzing and evaluating masking pattern instruction accuracy used to form semiconductors
12/02/2003US6657736 Method and system for measuring patterned structures
12/02/2003US6657208 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method
12/02/2003US6656795 Method of manufacturing semiconductor memory element
12/02/2003US6656664 Method of forming minute focusing lens
12/02/2003US6656648 Pattern inspection apparatus, pattern inspection method and mask manufacturing method
12/02/2003US6656646 Fabrication method of semiconductor integrated circuit device
12/02/2003US6656645 Shade pattern; photolithography
12/02/2003US6656644 Resist film patterns are partly formed over substrate in addition to metal patterns to shorten time required to change or correct mask pattern
12/02/2003US6656643 Method of extreme ultraviolet mask engineering
12/02/2003US6655024 Method of manufacturing a circuit board
11/2003
11/27/2003WO2003027769A3 Method for producing a two-dimensional photomask
11/27/2003US20030220997 Switched fabric based inspection system
11/27/2003US20030219990 Dual trench alternating phase shift mask fabrication
11/27/2003US20030219675 For manufacturing reticles and microelectromechanical systems (MEMS) processing
11/27/2003US20030219660 Pattern forming method
11/27/2003US20030219655 Photomask having a focus monitor pattern
11/27/2003US20030219654 Radiation transparent substrates having translucent and shielding film patterns which can be analyzed with high accuracy; reflection
11/27/2003US20030219154 Quality measurement of an aerial image
11/27/2003US20030219096 Apparatus and system for improving phase shift mask imaging performance and associated methods
11/27/2003US20030219095 X-ray mask and semiconductor device manufatured through x-ray exposure method
11/27/2003US20030218728 System and method for using a two part cover for protecting a reticle
11/27/2003US20030218698 Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus
11/27/2003US20030217809 Laser machining method and apparatus
11/26/2003EP1365288A1 Photo mask, production method of the same, pattern forming method using the photo mask
11/26/2003EP1364256A2 Method of uniformly coating a substrate
11/26/2003EP1364255A2 Method for uniformly coating a substrate
11/26/2003EP1364231A2 A self-cleaning optic for extreme ultraviolet lithography
11/26/2003CN1459048A Dual layer reticle bland and manufacturing process
11/26/2003CN1458553A Optical mask with illuminance polarization control
11/26/2003CN1129172C Aperture apparatus used for photo litho-graphy and munafacturing method thereof
11/25/2003US6654703 Method for estimating repair accuracy of a mask shop
11/25/2003US6654489 Apparatus and methods for collecting global data during a reticle inspection
11/25/2003US6654110 Image pickup apparatus and defect inspection apparatus for photomask
11/25/2003US6653695 Semiconductor device with an improved gate electrode pattern
11/25/2003US6653644 Pattern exposure method and apparatus
11/25/2003US6653177 Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask
11/25/2003US6653053 Overcoating semiconductor wafer; repairable; miniaturization resolution; photoresist pattern transfer
11/25/2003US6653052 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods
11/25/2003US6653046 Infrared sensitive coating liquid
11/25/2003US6653043 Active particle, photosensitive resin composition, and process for forming pattern
11/25/2003US6653030 Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features
11/25/2003US6653029 Dual-focused ion beams for semiconductor image scanning and mask repair
11/25/2003US6653028 Radiation transparent substrate; sheild pattern
11/25/2003US6653027 Attenuated embedded phase shift photomask blanks
11/25/2003US6653026 Photolithography; integrated circuits; semiconductors
11/25/2003US6653024 Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice
11/20/2003WO2003096356A2 Reflective x-ray microscope and inspection system for examining objects with wavelengths of≤ 100nm
11/20/2003WO2003096121A2 Photolithography mask comprising absorber/phase-shifter elements
11/20/2003WO2003025672A3 In-situ balancing for phase-shifting mask
11/20/2003WO2003019290A3 Patterning an integrated circuit using a reflective mask
11/20/2003US20030215722 Photomask repair method and apparatus
11/20/2003US20030215721 Method for quartz bump defect repair with less substrate damage
11/20/2003US20030215664 Method for providing an arbitrary three-dimensional microstructure in silicon using an anisotropic deep etch
11/20/2003US20030214704 Ultraviolet and vacuum ultraviolet antireflection substrate
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