| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/08/2004 | US20040006758 Corrected mask pattern verification apparatus and corrected mask pattern verification |
| 01/08/2004 | US20040006757 Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique |
| 01/08/2004 | US20040006756 Method and apparatus for reducing optical proximity correction output file size |
| 01/08/2004 | US20040006485 Manufacturing integrated circuits |
| 01/08/2004 | US20040005505 A phase shifting mask is disclosed in this present invention. The above-mentioned phase shifting mask comprises a quartz layer and a plurality of transmission adjustor layer onto the quartz layer. By employing the above-mentioned phase shifting |
| 01/08/2004 | US20040005266 Optical member, process for producing the same, and projection aligner |
| 01/08/2004 | US20040005117 Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask |
| 01/08/2004 | US20040005089 Contrast based resolution enhancing technology |
| 01/08/2004 | US20040004297 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 01/08/2004 | US20040004195 Mask inspecting apparatus |
| 01/08/2004 | DE10227189A1 Verfahren zur Herstellung von Flexdruckformen mittels Laser-Direktgravur A process for the production of printing forms Flex means of direct laser engraving |
| 01/08/2004 | DE10224953A1 Verfahren zur Beseitigung von Phasenkonfliktzentren bei alternierenden Phasenmasken sowie Verfahren zur Herstellung von alternierenden Phasenmasken A method for removing phase conflict centers on alternating phase masks and process for producing alternating phase masks |
| 01/07/2004 | EP1378918A1 Multi-layered film reflector manufacturing method |
| 01/07/2004 | EP1378788A2 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 01/07/2004 | EP1377878A2 Preparation of photomasks |
| 01/06/2004 | US6675369 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 01/06/2004 | US6675368 Apparatus for and method of preparing pattern data of electronic part |
| 01/06/2004 | US6674889 Pattern inspection method and pattern inspection apparatus |
| 01/06/2004 | US6674522 Efficient phase defect detection system and method |
| 01/06/2004 | US6674511 Evaluation mask, focus measuring method and aberration measuring method |
| 01/06/2004 | US6673526 Illumination from light sources to phase shifting masks through lenses and optical filters onto substrates; photolithography |
| 01/06/2004 | US6673524 Providing multilayer mirror over integrated circuit substrate or mask blank and buffer layer and dual element material; selectively growing features on integrated circuit substrate or mask blank using photon assisted chemical vapor deposition |
| 01/06/2004 | US6673520 Method of making an integrated circuit using a reflective mask |
| 01/06/2004 | US6673509 Photopolymerizable recording element and process for preparing flexographic printing forms |
| 01/06/2004 | US6673498 Method for reticle formation utilizing metal vaporization |
| 01/02/2004 | EP1373978A2 Extreme ultraviolet mask with improved absorber |
| 01/02/2004 | EP1373151A1 Oxygen doping of silicon oxyfluoride glass |
| 01/01/2004 | US20040003368 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
| 01/01/2004 | US20040002010 Variation in light intensity; high density images; photolithography |
| 01/01/2004 | US20040002009 Re-usable extreme ultraviolet lithography multilayer mask blank |
| 01/01/2004 | US20040001964 Method of manufacturing a structure having pores |
| 01/01/2004 | US20040001191 Scanning exposure apparatus and method |
| 01/01/2004 | US20040000535 Process for etching photomasks |
| 12/31/2003 | WO2004001797A2 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 12/31/2003 | WO2004000571A1 Photosensitive resin composition for original printing plate capable of being carved by laser |
| 12/31/2003 | WO2003014831A3 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 12/31/2003 | CN1464338A Grey mask and method for making same |
| 12/31/2003 | CN1464337A Grey mask and method for making same |
| 12/31/2003 | CN1133201C Method of manufacturing EB mask for electron beam image drawing and device for manufacturing EB mask |
| 12/30/2003 | US6671396 Method to monitor stepper lens quality in color filter process |
| 12/30/2003 | US6671034 Optical device; evanescent(proximity)-field-assisted two dimensional micropatterning |
| 12/30/2003 | US6670646 Mask and method for patterning a semiconductor wafer |
| 12/30/2003 | US6670632 Reticle and method of fabricating semiconductor device |
| 12/30/2003 | US6670082 Building a library used for creating the alternating PSM |
| 12/30/2003 | US6670081 Forming making; transferring lithography pattern; adjustment vertical, horizontal spacings |
| 12/30/2003 | US6670080 Mask pattern creating method and mask pattern creating apparatus |
| 12/25/2003 | US20030235767 Phase shift mask blank, phase shift mask, and method of manufacture |
| 12/25/2003 | US20030235766 Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern |
| 12/25/2003 | US20030235765 Uniformity |
| 12/25/2003 | US20030235764 Planar reticle design/fabrication method for rapid inspection and cleaning |
| 12/24/2003 | WO2003107398A2 Techniques to characterize iso-dense effects for microdevice manufacture |
| 12/24/2003 | WO2003107092A1 Method for producing flexo printing forms by means of laser direct engraving |
| 12/24/2003 | WO2003036386A3 Method for forming elliptical and rounded mask features using beam shaping |
| 12/24/2003 | CN1462908A Optical mask without chromium film phase transition by using auxiliary graphics of chromium film |
| 12/24/2003 | CN1132224C Optical mask and method of preparing electronic element |
| 12/23/2003 | US6668367 Selective promotion for resolution enhancement techniques |
| 12/23/2003 | US6667142 Recording material having a pigment-coloured radiation-sensitive layer |
| 12/23/2003 | US6667139 Setting the exposure amount and the focus value in forming a pattern by transferring a circuit pattern on a mask onto a resist film. |
| 12/23/2003 | US6667136 A substrate having a first transmittance, a first pattern to be transferred to a photosensitive layer(first pattern having a second transmittance lower than first) and a second transmittance having third > than second, lower than first |
| 12/23/2003 | US6667135 Method of manufacturing a photomask |
| 12/23/2003 | US6666957 Magnetron sputtering system and photomask blank production method based on the same |
| 12/18/2003 | WO2003104896A2 Photomask and method for repairing defects |
| 12/18/2003 | WO2003025979A3 Method for automatic optical measurement of an opc structure |
| 12/18/2003 | WO2003012546A3 Damascene extreme ultraviolet lithography (euvl) photomask and method of making |
| 12/18/2003 | WO2002097486A3 Hybrid optical component for x ray applications and method associated therewith |
| 12/18/2003 | WO2002061504A3 Phase shift mask and system and method for making the same |
| 12/18/2003 | WO2002052344A3 Manufacturing integrated circuits using phase-shifting masks |
| 12/18/2003 | US20030233630 To correct for optical proximity and other effects in generating patterns on workpieces; workpieces include lithographic masks and integrated circuits produced by direct writing |
| 12/18/2003 | US20030233629 Mask manufacturing method |
| 12/18/2003 | US20030232258 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 12/18/2003 | US20030232257 Apertures connecting to each other, exposing at a predetermined distance; exposing a single crystal semiconductor wafer, a glass substrate for a liquid crystal display |
| 12/18/2003 | US20030232256 Photolithographic mask and methods for the fabrication of the mask |
| 12/18/2003 | US20030232255 Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane |
| 12/18/2003 | US20030232254 Photolithography process for making semiconductor devices, etching to form a deep trench in the substrate |
| 12/18/2003 | US20030232253 Techniques to characterize iso-dense effects for microdevice manufacture |
| 12/18/2003 | US20030232251 An adjacent opaque part area with a transmission part area, by reducing the amount of exposing radiation transmitted through the area, improve the geometrical shape and dimensional accuracy of a photoresist pattern |
| 12/17/2003 | EP1372032A1 Mask manufacturing method |
| 12/17/2003 | EP1370911A1 Enchanced bright peak clear phase shifting mask and method of use |
| 12/17/2003 | EP1370909A1 Alternating phase shift masking for multiple levels of masking resolution |
| 12/16/2003 | US6665858 Manufacturing method of semiconductor device |
| 12/16/2003 | US6665857 System and method of generating integrated circuit mask data |
| 12/16/2003 | US6665856 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 12/16/2003 | US6665112 Optical reticle substrate inspection apparatus and beam scanning method of the same |
| 12/16/2003 | US6665050 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis |
| 12/16/2003 | US6665049 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 12/16/2003 | US6664554 Self-cleaning optic for extreme ultraviolet lithography |
| 12/16/2003 | US6664524 Focusing method |
| 12/16/2003 | US6664032 Using two masks; stripe shapes |
| 12/16/2003 | US6664030 System for and method of constructing an alternating phase-shifting mask |
| 12/16/2003 | US6664011 Improving DOF and MEF performance for creation of holes by adding extra holes to a given pattern, thus densifying the pattern of holes on the first mask and reducing the range of the hole-diameter to hole separation ratio. |
| 12/16/2003 | US6664010 Optimal proximity correction (OPC); pattern for a phase shifting mask is corrected in a first step, and the pattern for the trimming mask is corrected using the corrected pattern for the phase-shifting mask in a second correction step |
| 12/16/2003 | US6664009 Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges |
| 12/16/2003 | US6662661 Method of measuring oscillatory semiconductor membranes and shielding for external excitations in the measurement |
| 12/16/2003 | US6662395 Apparatus for cleaning surfaces with a cleaning roller assembly |
| 12/11/2003 | WO2003102690A2 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography |
| 12/11/2003 | WO2002101464A3 Optical proximity correction for phase shifting photolithographic masks |
| 12/11/2003 | US20030229882 Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masks |
| 12/11/2003 | US20030229879 Model-based data conversion |
| 12/11/2003 | US20030229856 Text grid creation tools |
| 12/11/2003 | US20030228758 Semiconductor device and manufacturing method thereof |