| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/03/2004 | US6687895 Method and apparatus for reducing optical proximity correction output file size |
| 02/03/2004 | US6687885 Correction of layout pattern data during semiconductor patterning process |
| 02/03/2004 | US6687041 Pattern generator using EUV |
| 02/03/2004 | US6686591 Apparatus for inspecting mask |
| 02/03/2004 | US6686300 Sub-critical-dimension integrated circuit features |
| 02/03/2004 | US6686108 Improve resolution of patterns; reduce size difference of patterns in the coarse region and fine region; improve size accuracy of patterns existing at the boundary of the coarse region and fine region. |
| 02/03/2004 | US6686107 Method for producing a semiconductor device |
| 02/03/2004 | US6686103 Fused silica pellicle |
| 02/03/2004 | US6686102 Miniaturization; photolithography patterns; phase shifting; applying photosensitive material to semiconductor; exposure to electromagnetic waves |
| 02/03/2004 | US6686101 For use in projecting a circuit pattern on a photosensitive resist covered wafer having a transparent substrate with a reflective or dielectric layer thereon. |
| 02/03/2004 | US6686100 Optical proximity correction method |
| 02/03/2004 | US6686099 Shade patterns |
| 02/03/2004 | US6686098 Lithography method and lithography mask |
| 02/03/2004 | US6685848 Method and apparatus for dry-etching half-tone phase-shift films half-tone phase-shift photomasks and method for the preparation thereof and semiconductor circuits and method for the fabrication thereof |
| 01/29/2004 | WO2004010229A1 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension |
| 01/29/2004 | US20040019872 Caching of lithography and etch simulation results |
| 01/29/2004 | US20040019870 Method for creating mask pattern for circuit fabrication and method for verifying mask pattern for circuit fabrication |
| 01/29/2004 | US20040019869 Repetition recognition using segments |
| 01/29/2004 | US20040018437 Prevention damage; isolation patterns of light blocking and light transmission zones; photolithography |
| 01/29/2004 | US20040018436 Detecting pattern defects; transferring pattern; lithography |
| 01/29/2004 | US20040018435 Photomask for forming small contact hole array and methods of fabricating and using the same |
| 01/29/2004 | US20040018434 Transferring image to photosensitive film; semiconductor for photolithography |
| 01/29/2004 | US20040018433 Process for fabricating a mask |
| 01/29/2004 | US20040016897 Method and system for detecting phase defects in lithographic masks and semiconductor wafers |
| 01/29/2004 | DE10230675A1 Verfahren und Vorrichtung zur Herstellung von Phasenschiebermasken Method and apparatus for production of phase-shift mask |
| 01/29/2004 | DE10230532A1 Verfahren zum Bestimmen des Aufbaus einer Maske zum Mikrostrukturieren von Halbleitersubstraten mittels Fotolithographie A method for determining the structure of a mask for micro-patterning of semiconductor substrates by means of photolithography, |
| 01/28/2004 | EP1385053A2 Automatical optical proximity correction (OPC) rule generation |
| 01/28/2004 | EP1385052A2 Orientation dependent shielding for use with dipole illumination techniques |
| 01/28/2004 | EP1385051A1 EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer and device manufacturing method |
| 01/28/2004 | EP1384234A1 Euvl multilayer structures |
| 01/28/2004 | EP1384117A2 Exposure method and apparatus |
| 01/28/2004 | EP1384115A2 Attenuating extreme ultraviolet (euv) phase-shifting mask fabrication method |
| 01/28/2004 | CN1471133A Photomask pattern layout method for pattern transfer and photomask thereof |
| 01/28/2004 | CN1470943A Light cover combination and exposure method for forming threadlet pattern therewith |
| 01/28/2004 | CN1470942A Vortex phase-shift mask in photoetching technique |
| 01/28/2004 | CN1470927A Transverse electric-field type liquid crystal display device, its making method and scanning exposure device |
| 01/27/2004 | US6684382 Microloading effect correction |
| 01/27/2004 | US6682873 Forming a masking layer over a surface of a substrate; screen printing plural masking particles over masking layer, removing a portion of masking layr using masking particle as a mask |
| 01/27/2004 | US6682861 Forming patterns or images on semiconductor wafers using masks comprising substrates having photoresists, etch selective and antireflective multilayers; photolithography |
| 01/27/2004 | US6682860 Quartz substrates having translucent thin films comprising silicon oxynitrides and transition metal mixtures having improved etch selectivity for use in lithography |
| 01/27/2004 | US6682859 Monolithic glass; exposure to radiation; patterning |
| 01/27/2004 | US6682858 Patterning layer of negative photoresist; miniaturization |
| 01/22/2004 | WO2004008508A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 01/22/2004 | WO2004008247A1 Glass substrate for mask blank and method of producing the same |
| 01/22/2004 | WO2004008246A2 Method and system for context-specific mask writing |
| 01/22/2004 | WO2004008245A2 Method and system for context-specific mask inspection |
| 01/22/2004 | WO2004008244A2 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 01/22/2004 | US20040013952 Method for structuring a lithography mask |
| 01/22/2004 | US20040013950 Photolithographic process used in semiconductor manufacturing |
| 01/22/2004 | US20040013949 Electron beam exposure-use mask and electron beam exposure method |
| 01/22/2004 | US20040013948 Chromeless PSM with chrome assistant feature |
| 01/22/2004 | US20040013947 Increased-contrast film for high-transmittance attenuated phase-shaft masks |
| 01/22/2004 | US20040011966 Energy beam exposure method and exposure apparatus |
| 01/22/2004 | DE10325308A1 Abbildungsverfahren Imaging methods |
| 01/22/2004 | DE10230755A1 Anordnung zur Herstellung von Photomasken Arrangement for the production of photomasks |
| 01/21/2004 | EP1382446A1 Laminate for IR ablation |
| 01/21/2004 | EP1381918A2 Ion-beam deposition process for manufacturing multilayered attenuated phase shift photomask blanks |
| 01/21/2004 | CN1469431A Method for producing alternating phase-shift mask |
| 01/21/2004 | CN1469427A Method for selecting mask manufacturer for producing optical mask |
| 01/21/2004 | CN1135602C Method for producing mask |
| 01/20/2004 | US6681379 Phase shifting design and layout for static random access memory |
| 01/20/2004 | US6680162 VLSI-based system for durable high-density information storage |
| 01/20/2004 | US6680151 Alternating phase mask |
| 01/20/2004 | US6680150 Forming sub-wavelength size contact openings using attenuated phase-shift photomasks |
| 01/16/2004 | CA2435162A1 Laminate for ir ablation |
| 01/15/2004 | WO2004006310A1 Exposure system |
| 01/15/2004 | WO2004006018A1 Reflective maskblanks |
| 01/15/2004 | WO2004006017A1 Phase shift mask and production method therefor and production method for semiconductor device |
| 01/15/2004 | WO2004006016A2 Mask and manufacturing method using mask |
| 01/15/2004 | WO2004006015A2 Method for determining the structure of a mask for microstructuring semiconductor substrates by means of photolithography |
| 01/15/2004 | WO2004006014A2 Method of using an amorphous carbon layer for improved reticle fabrication |
| 01/15/2004 | WO2004006013A1 Arrangement for the production of photomasks |
| 01/15/2004 | WO2003029897A3 Photolithographic mask fabrication |
| 01/15/2004 | US20040010770 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 01/15/2004 | US20040010768 Performance of integrated circuit components via a multiple exposure technique |
| 01/15/2004 | US20040010385 Inspection method and a photomask |
| 01/15/2004 | US20040009431 Method of exposing semiconductor device |
| 01/15/2004 | US20040009413 Substrate and masking multilayers having apertures for transmission of radiation to form patterns, and for generation of optics by printing onto photoresist layers and transferring the prints to radiation transparent layers |
| 01/15/2004 | US20040009412 Method of manufacturing chromeless phase shift mask |
| 01/15/2004 | US20040009411 In-situ pellicle monitor |
| 01/15/2004 | US20040009410 Integrated cooling substrate for extreme ultraviolet reticle |
| 01/15/2004 | US20040009409 Forming masking patterns comprising integrated circuit layouts, then transferring to photoressits layers and semiconductor wafers; photolithography |
| 01/15/2004 | US20040009408 EUVL mask structure and method of formation |
| 01/15/2004 | US20040009407 Generating phase shifting patterns on silicon wafers, then forming segments having edges, for balancing light; quality; integrated circuits |
| 01/15/2004 | US20040009295 Spin-coating method, determination method for spin-coating condition and mask blank |
| 01/15/2004 | US20040008880 Device and method for inspecting photomasks and products fabricated using the same |
| 01/15/2004 | DE10329384A1 Phasenverschiebungsmaske für optische Lithographie Phase shift mask for optical lithography |
| 01/14/2004 | EP1379922A2 Grating test patterns and methods for overlay metrology |
| 01/14/2004 | CN1467565A Structure of phase shifting mask |
| 01/14/2004 | CN1134705C Smart photolithography |
| 01/13/2004 | US6678304 Laser correction method and apparatus |
| 01/13/2004 | US6677107 Resist film is made to function as a light screening film, wherein the information detecting ability of the photo mask can be enhanced |
| 01/13/2004 | US6677088 Photomask producing method and apparatus and device manufacturing method |
| 01/13/2004 | US6677087 Suitable for a krf excimer laser and especially an arf excimer laser and an f2 excimer |
| 01/13/2004 | US6676800 Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation |
| 01/08/2004 | WO2004003985A1 Mask and production method therefor and production method for semiconductor device |
| 01/08/2004 | WO2004003814A2 Method and system for electronic order entry and automatic processing of photomask orders |
| 01/08/2004 | WO2004003664A1 Mask and inspection method therefor and production method for semiconductor device |
| 01/08/2004 | WO2003036385A3 Method for transmission increase at a position on a photo mask repaired with ionic radiation by means of thermal desorption |
| 01/08/2004 | WO2002054455A3 Variable surface hot plate for improved bake uniformity of substrates |