| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/25/2004 | EP1391783A2 Method and apparatus for making a shadow mask array |
| 02/25/2004 | EP1390974A2 Arrangement and method for detecting defects on a substrate in a processing tool |
| 02/25/2004 | EP1390812A1 Organic bottom antireflective coating for high performance mask making optical imaging |
| 02/25/2004 | EP1390309A1 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass |
| 02/25/2004 | EP0851294B1 Mask protecting device |
| 02/25/2004 | CN1477677A Crystallizer, crystalline method, film transitior and display device |
| 02/24/2004 | US6698008 Row-based placement scoring and legalization measure for books with phase shift mask dependencies |
| 02/24/2004 | US6698007 Method and apparatus for resolving coloring conflicts between phase shifters |
| 02/24/2004 | US6697194 Antireflection coating for ultraviolet light at large angles of incidence |
| 02/24/2004 | US6696371 Method for fabricating positionally exact surface-wide membrane masks |
| 02/24/2004 | US6696208 Semiconductor lithography structures; forming latent images; applying photoresist to semiconductor; calibration |
| 02/24/2004 | US6696206 Lithography mask configuration |
| 02/24/2004 | US6696205 Thin tantalum silicon composite film formation and annealing for use as electron projection scatterer |
| 02/19/2004 | WO2004015496A2 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams |
| 02/19/2004 | WO2002082182A3 Alleviating line end shortening in transistor endcaps by extending phase shifters |
| 02/19/2004 | US20040034517 Device modeling for proximity effects |
| 02/19/2004 | US20040033699 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition |
| 02/19/2004 | US20040033425 Irradiating with at least one beam of molecules, at least one beam of photons and at least one beam of electrons |
| 02/19/2004 | US20040032931 X-ray alignment system for fabricaing electronic chips |
| 02/19/2004 | US20040031936 Fine stencil structure correction device |
| 02/19/2004 | US20040031410 Providing customized text and imagery on organic products |
| 02/19/2004 | DE19903200B4 Verfahren zum Korrigieren des Maskenlayouts bei der Herstellung von Strukturen auf der Oberfläche eines Halbleiterwafers A method of correcting the mask layout in the manufacture of structures on the surface of a semiconductor wafer |
| 02/19/2004 | DE10235255A1 Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren Reflective mirror for lithographic exposure and production methods |
| 02/18/2004 | EP0788435B1 Digital laser imagable lithographic printing plates |
| 02/18/2004 | CN2603952Y Ferric oxide photo-etching mask printing plate |
| 02/17/2004 | US6692900 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools |
| 02/17/2004 | US6692878 Photomask frame modification to eliminate process induced critical dimension control variation |
| 02/17/2004 | US6692877 Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 02/17/2004 | US6692876 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools |
| 02/17/2004 | US6692875 Semi-transparent dummy structure increases depth of focus |
| 02/17/2004 | US6691618 Chemical imaging of a lithographic printing plate |
| 02/12/2004 | WO2004013904A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 02/12/2004 | WO2004013696A1 Pattern size correcting device and pattern size correcting method |
| 02/12/2004 | WO2004013695A1 Photomask |
| 02/12/2004 | WO2004013694A1 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 02/12/2004 | WO2004013693A2 Scatterometry alignment for imprint lithography |
| 02/12/2004 | WO2004001797A9 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 02/12/2004 | WO2003050615A3 Photomask and method for qualifying the same with a prototype specification |
| 02/12/2004 | WO2002099533A3 Alternating phase-shift mask inspection method and apparatus |
| 02/12/2004 | US20040031013 Methods of forming patterned reticles |
| 02/12/2004 | US20040031005 Electronic cad system and layout data producing method therefor |
| 02/12/2004 | US20040030814 Reflective mirror for lithographic exposure and production method |
| 02/12/2004 | US20040029327 Semiconductor device with an improved gate electrode pattern and a method of manufacturing the same |
| 02/12/2004 | US20040029024 Reflective masking; dividing pattern forming using light wavelength; photolithography; miniatruizing circuit |
| 02/12/2004 | US20040029023 Photomask, productyion method of the same, pattern forming method using the photomask |
| 02/12/2004 | US20040029022 Compact design; rotating adjustment of optics; forming image; calibration |
| 02/12/2004 | US20040029021 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 02/12/2004 | US20040028269 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device |
| 02/12/2004 | US20040027555 Reduced striae extreme ultraviolet elements |
| 02/12/2004 | US20040027553 Method for the characterization of an illumination source in an exposure apparatus |
| 02/12/2004 | US20040025733 EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer, device manufacturing method and device manufactured thereby |
| 02/11/2004 | EP1388026A1 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 02/11/2004 | CN1474960A Lithographic method of manufacturing device |
| 02/11/2004 | CN1474236A Cross mark keeping method, cross mark keeping device and exposure device |
| 02/11/2004 | CN1474233A Method for transfering mask or chip in storage box and used device and its producing method |
| 02/10/2004 | US6691052 Apparatus and methods for generating an inspection reference pattern |
| 02/10/2004 | US6689625 Method for correcting a design data of a layout pattern of a photomask, photomask manufactured by said method, and semiconductor device method using said photomask |
| 02/10/2004 | US6689520 Exposure method for correcting dimension variation in electron beam lithography |
| 02/10/2004 | US6689516 Cutting, flattening silicon oxyfluoride glass tube |
| 02/10/2004 | US6689515 Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank |
| 02/05/2004 | WO2004011258A2 Method of forming and repairing a lithographic template having a gap defect |
| 02/05/2004 | WO2004011161A2 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 02/05/2004 | WO2003054627A3 Phase shifting mask |
| 02/05/2004 | US20040025140 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 02/05/2004 | US20040025139 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 02/05/2004 | US20040025138 Light intensity simulation method, program product, and designing method of photomask |
| 02/05/2004 | US20040023509 Electron beam mask substrate, electron beam mask blank, electron beam mask, and fabrication method thereof |
| 02/05/2004 | US20040023161 Using a photomask having both a minute aperture where the main component of a transmitted light is an evanescent light and an aperture where the main component is a propagating light; controlling distance between substrate and photomask |
| 02/05/2004 | US20040023134 Reduces problems associated with side lobe printing in areas including closely-spaced or nested features, while maximizing resolution and depth-of-focus performance for isolated features of a semiconductor device. |
| 02/05/2004 | US20040023133 Photoresist pattern and forming method thereof |
| 02/05/2004 | US20040023132 Requires correction of line degeneration during exposure of a miniaturized integrated circuit pattern. |
| 02/05/2004 | US20040023131 Reticles in MEMS and IC processes |
| 02/05/2004 | US20040023130 Test photomask, flare evaluation method, and flare compensation method |
| 02/05/2004 | US20040023129 Method of manufacturing phase shift mask and phase shift mask |
| 02/05/2004 | US20040023128 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same |
| 02/05/2004 | US20040023127 Correcting a mask pattern using multiple correction grids |
| 02/05/2004 | US20040023126 Lithographic template having a repaired gap defect method of repair and use |
| 02/05/2004 | US20040023125 Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask |
| 02/05/2004 | US20040023124 Photolithography process with hybrid chromeless phase shift mask |
| 02/05/2004 | US20040023123 Improve mask generation by allowing the chrome on the mask to fully define the quartz etch. |
| 02/05/2004 | US20040022006 Method and layout for MOS capacitors with phase shifted layers |
| 02/05/2004 | US20040021845 Illumination optical system, exposure method and apparatus using the same |
| 02/05/2004 | US20040021801 Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/05/2004 | US20040021410 Method and apparatus for making a shadow mask array |
| 02/05/2004 | US20040021221 Method of forming a pattern of a semiconductor device and photomask therefor |
| 02/05/2004 | DE4438616B4 Halbton-Phasenverschiebermaske Halftone Phasenverschiebermaske |
| 02/05/2004 | DE10310073A1 Process for selecting a mask producer for a photomask for semiconductor wafer processing compares at least two masks |
| 02/05/2004 | DE10228546A1 Verfahren zur Strukturierung einer Lithographiemaske Method for structuring a lithography mask |
| 02/04/2004 | EP1387384A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 02/04/2004 | EP1387289A1 Method for automatically determining an imposition plan |
| 02/04/2004 | EP1387219A2 Test photomask, flare evaluation method, and flare compensation method |
| 02/04/2004 | EP1387217A2 Lithography exposure apparatus having an evacuable reticle library coupled to a vacuum chamber |
| 02/04/2004 | EP1387189A2 Substrate with at least two layers for microlithographic applications |
| 02/04/2004 | EP1386198A2 Ion-beam deposition process for manufacturing binary photomask blanks |
| 02/04/2004 | CN1473129A Reticle protection and transport |
| 02/04/2004 | CN1472789A Optical mask testing, optical spot evaluating method and optical spot compensation |
| 02/04/2004 | CN1472776A Optical masks, manufacture thereof and manufacture of electronic elements |
| 02/04/2004 | CN1472604A Optical approaching correcting method |
| 02/04/2004 | CN1472603A Scanning exposuring device and method, manufacture of scanning exposuring device |
| 02/04/2004 | CN1472597A Laminating body for IR burning |