| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/18/2004 | US20040053026 Attenuated embedded phase shift photomask blanks |
| 03/18/2004 | US20040051855 Programmable photolithographic mask system and method |
| 03/18/2004 | US20040050491 Substrate processing apparatus |
| 03/18/2004 | US20040050098 Method and feedstock for making photomask material |
| 03/18/2004 | DE10337509A1 Semiconductor manufacturing apparatus using network, provides communication between storage device and drawing unit storing drawing information, using storage area network |
| 03/17/2004 | EP1398666A2 Method of achieving CD linearity control for full chip chromeless phase lithography manufacturing |
| 03/17/2004 | EP1398656A1 Surface-plasmon-generated light source and its use |
| 03/17/2004 | EP1397813A2 Hybrid optical component for x ray applications and method associated therewith |
| 03/17/2004 | CN1483157A Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method |
| 03/17/2004 | CN1142579C 电子束曝光方法 Electron beam exposure method |
| 03/16/2004 | US6708323 Method and apparatus for verifying mask pattern data according to given rules |
| 03/16/2004 | US6707123 EUV reflection mask |
| 03/16/2004 | US6707107 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 03/16/2004 | US6706453 Photolithographic formation of microscopic patterns in semiconductor; integrated circuits; resolution |
| 03/16/2004 | US6706452 Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device |
| 03/11/2004 | WO2004021082A2 Improved photomask having an intermediate inspection film layer |
| 03/11/2004 | WO2004021081A2 Method for the production of a phase mask |
| 03/11/2004 | WO2004021078A2 Vent for an optical pellicle system |
| 03/11/2004 | WO2004021049A2 Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles |
| 03/11/2004 | WO2003062922A3 Photomask and method for manufacturing the same |
| 03/11/2004 | US20040049761 Hybrid optical proximity correction for alternating aperture phase shifting designs |
| 03/11/2004 | US20040049760 Wafer process critical dimension, alignment, and registration analysis simulation tool |
| 03/11/2004 | US20040048469 Hole forming by cross-shape image exposure |
| 03/11/2004 | US20040048405 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 03/11/2004 | US20040048398 Mask repair with electron beam-induced chemical etching |
| 03/11/2004 | US20040048170 Computer software for simulation |
| 03/11/2004 | US20040048169 For use in irradiating a wafer with an electron beam for cell projection |
| 03/11/2004 | US20040048168 Chromeless photomask, method of manufacturing the same, and exposure apparatus comprising the chromeless photomask |
| 03/11/2004 | US20040048166 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/11/2004 | US20040048005 Pellicle |
| 03/11/2004 | US20040047109 Method for forming a photoresist pattern, method for forming a capacitor using the same and capacitor |
| 03/11/2004 | US20040045929 Mask and its manufacturing method, and method for manufacturing semiconductor device |
| 03/11/2004 | DE10240403A1 Mask for projecting a structural pattern onto a semiconductor substrate in an exposure device comprises a substrate, a first structural element on the substrate, and an arrangement of second structural elements |
| 03/11/2004 | DE10239858A1 Verfahren und Anordnung zur Kompensation von Unebenheiten in der Oberfläche eines Substrates Method and apparatus for compensating for irregularities in the surface of a substrate |
| 03/10/2004 | EP1396011A2 Variable surface hot plate for improved bake uniformity of substrates |
| 03/10/2004 | EP1395877A2 Lithographic method of manufacturing a device |
| 03/10/2004 | EP1395876A2 Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks |
| 03/10/2004 | EP1395857A2 Method for controlled modification of the reflective qualities of a multi-layer |
| 03/10/2004 | EP1395428A1 Chemical imaging of a lithographic printing plate |
| 03/09/2004 | US6704922 Correcting method of mask and mask manufactured by said method |
| 03/09/2004 | US6704695 Interactive optical proximity correction design method |
| 03/09/2004 | US6704092 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane |
| 03/09/2004 | US6703629 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 03/09/2004 | US6703626 Defect observed with the atomic force microscope (afm) and a pattern putting together the shape and position of the defect is extracted from and afm image. the extracted pattern is then converted to a shape format for a for an ion beam defect |
| 03/09/2004 | US6703328 Semiconductor device manufacturing method |
| 03/09/2004 | US6703172 Pellicle and producing method of mask with pellicle |
| 03/09/2004 | US6703171 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method |
| 03/09/2004 | US6703170 Method and apparatus for reducing loading effects on a semiconductor manufacturing component during an etch process |
| 03/09/2004 | US6703169 Applying an organic antireflection coating over a metal-containing layer; applying a chemically-amplified positive tone or negative tone deep ultraviolet photoresist; baking; exposure to radiation; baking |
| 03/09/2004 | US6703168 Light-shielding pattern is formed from the light-shielding film region, and the phase shift region having a phase difference with respect to the light-transmitting region |
| 03/09/2004 | US6703167 Calibration using scattering bars; lithography tools |
| 03/04/2004 | WO2004019129A1 Flexographic element having an integral thermally bleachable mask layer |
| 03/04/2004 | WO2004018443A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 03/04/2004 | US20040044984 Considering mask writer properties during the optical proximity correction process |
| 03/04/2004 | US20040044981 Reticle fabrication method |
| 03/04/2004 | US20040044978 Pattern generation on a semiconductor surface |
| 03/04/2004 | US20040043309 Apparatus and method for mounting a hard pellicle |
| 03/04/2004 | US20040043307 Miniaturization integrated circuits, semiconductors; phase shifting masking |
| 03/04/2004 | US20040043306 Light shield on transparent substrate; variation in light transmission between edges and interiors of pattern; reducing transfer error; phase shifting |
| 03/04/2004 | US20040043305 Alternating phase shifting masking; generating destructive interference |
| 03/04/2004 | US20040043304 Optics, transmission pattern; etching edges; radiation transparent substrate |
| 03/04/2004 | US20040043303 Photomask having an intermediate inspection film layer |
| 03/04/2004 | US20040043302 Vent for an optical pellicle system |
| 03/04/2004 | US20040042002 Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles |
| 03/04/2004 | US20040041993 Mask having pattern areas whose transmission factors are different from each other |
| 03/04/2004 | US20040041102 Method and configuration for compensating for unevenness in the surface of a substrate |
| 03/04/2004 | DE10237344A1 Verfahren zur Herstellung einer Phasenmaske A method of manufacturing a phase mask |
| 03/04/2004 | DE10056541B4 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions |
| 03/03/2004 | EP1394610A2 Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes |
| 03/03/2004 | EP1393132A2 Exposure control for phase shifting photolithographic masks |
| 03/03/2004 | EP1393130A2 Design and layout of phase shifting photolithographic masks |
| 03/03/2004 | EP1393129A2 Phase conflict resolution for photolithographic masks |
| 03/03/2004 | EP1169850B1 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same |
| 03/03/2004 | CN1479175A Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 03/03/2004 | CN1479171A Oxidative carbonyl iron photoetching masking film plate |
| 03/02/2004 | US6701511 Optical and etch proximity correction |
| 03/02/2004 | US6701004 Detecting defects on photomasks |
| 03/02/2004 | US6700096 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment |
| 03/02/2004 | US6699800 Pattern design method for lithography C/H process |
| 03/02/2004 | US6699626 Mask set for use in phase shift photolithography technique which is suitable to form random patterns |
| 03/02/2004 | US6699625 Absorber pattern that is configured to absorb extreme ultraviolet rays |
| 03/02/2004 | US6699624 Precision optical measurement of the two process layers on a semiconductor wafer, set of diffraction grating test patterns that are used in combination with rigorous diffraction grating analysis |
| 02/26/2004 | WO2004017140A1 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank |
| 02/26/2004 | WO2003040828A3 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 02/26/2004 | WO2002037182A3 Method and apparatus for creating photolithographic masks |
| 02/26/2004 | US20040040002 Automatic recognition of an optically periodic structure in an integrated circuit design |
| 02/26/2004 | US20040039584 Method of selecting mask manufacturer of photomask |
| 02/26/2004 | US20040038152 Wet offset lithographic printing, a negative-working lithographic master, photolithography |
| 02/26/2004 | US20040038147 Flexographic element having an integral thermally bleachable mask layer |
| 02/26/2004 | US20040038136 Method of making a photomask |
| 02/26/2004 | US20040038135 Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus |
| 02/26/2004 | US20040038134 Radiation-patterning tools, and methods of printing structures |
| 02/26/2004 | US20040036860 Method and apparatus for defect inspection of phase shifting masks |
| 02/26/2004 | US20040036040 Writing methodology to reduce write time, and system for performing same |
| 02/26/2004 | DE10305824A1 Musterlayoutverfahren einer Photomaske für den Mustertransfer und Photomaske für den Mustertransfer Pattern layout method of a photomask for pattern transfer and photomask for pattern transfer |
| 02/26/2004 | DE10236422A1 Verfahren zur Charakterisierung einer Beleuchtungsquelle in einem Belichtungsgerät A method of characterizing an illumination source in an exposure apparatus |
| 02/26/2004 | DE10236027B3 Checking method for lithography mask used for IC manufacture using comparison of checked mask structure with reference structure after transfer of both structures to a semiconductor material |
| 02/26/2004 | DE10114861B4 Verfahren und Vorrichtung zum Entlacken eines Bereiches auf einem Maskensubstrat Method and apparatus for stripping paint an area on a mask substrate |
| 02/25/2004 | EP1391920A2 Method of fabricating an active matrix, optoelectronic visualisation devices and mask for such devices |
| 02/25/2004 | EP1391844A2 Automatic recognition of an optically periodic structure in an integrated circuit design |