| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/29/2004 | US20040081896 Mask repair using multiple exposures |
| 04/29/2004 | US20040080733 Projection exposure method with luminous flux distribution |
| 04/29/2004 | US20040080732 Near-field photomask, near-field exposure apparatus using the photomask, dot pattern forming method using the exposure apparatus, and device manufactured using the method |
| 04/29/2004 | US20040079726 Method of using an amorphous carbon layer for improved reticle fabrication |
| 04/29/2004 | US20040079722 Method for controlling CD during an etch process |
| 04/29/2004 | US20040079386 Removal surface impurities from surface of mask using aqueous solution |
| 04/29/2004 | DE10295952T5 Maske, Verfahren zum Herstellen derselben sowie Verfahren zum Herstellen eines Halbleiterbauteils Mask, method for producing the same as well as method of manufacturing a semiconductor device |
| 04/29/2004 | DE10195745T5 Eine neue chromfreie Wechselmaske zur Produktion von Halbleiter-Bauelement Features A new chrome-free exchange mask for production of semiconductor device features |
| 04/28/2004 | EP1412962A2 Pattern generation method and apparatus using cached cells of hierarchical data |
| 04/28/2004 | EP1412817A2 Damascene extreme ultraviolet lithography (euvl) photomask and method of making |
| 04/28/2004 | EP1412816A2 Alternating phase-shift mask inspection method and apparatus |
| 04/28/2004 | CN2613792Y Mask plate design and mfg structure |
| 04/28/2004 | CN1492477A Crystallizing device, crystallizing method and phase exchanging mechanism |
| 04/28/2004 | CN1492284A Method for producing photoetching projector and device with optical element and its device |
| 04/28/2004 | CN1492241A Reflector for exposure device, reflective mask for exposure device, exposure device and pattern forming method |
| 04/27/2004 | US6728946 Method and apparatus for creating photolithographic masks |
| 04/27/2004 | US6728332 X-ray mask, and exposure method and apparatus using the same |
| 04/27/2004 | US6727987 Image pickup apparatus and defect inspection system for photomask |
| 04/27/2004 | US6727978 Projection exposure apparatus and projection exposure method |
| 04/27/2004 | US6727976 Adjusting projection optical system according to detection of interference fringe |
| 04/27/2004 | US6727565 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 04/27/2004 | US6727512 Method and system for detecting phase defects in lithographic masks and semiconductor wafers |
| 04/27/2004 | US6727048 Selectively removing a lacquer layer so that so that the remaining lacquer is disposed in the sub-pixel areas of a display device, resulting in a smooth, highly reflective aluminum layer that is electrically and mechanically robust |
| 04/27/2004 | US6727047 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 04/27/2004 | US6727029 Method for making reticles with reduced particle contamination and reticles formed |
| 04/27/2004 | US6727028 Separating masking pattern into zones; overcoating semiconductor wafer |
| 04/27/2004 | US6727027 Seed layer is formed of a chromium material containing atleast one of oxygen, nitrogen and carbon, disposed between the transparent substrate and the light-shielding film or the antireflective film |
| 04/27/2004 | US6727026 Semiconductor integrated circuit patterns |
| 04/27/2004 | US6727025 Photomask and exposure method |
| 04/22/2004 | WO2004034448A1 Exposure device, exposure system, recipe generation system, and device manufacturing method |
| 04/22/2004 | WO2004034424A2 A method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability |
| 04/22/2004 | US20040078763 Short edge smoothing for enhanced scatter bar placement |
| 04/22/2004 | US20040076895 0 degree phase-shifting regions; and corresponding 180 degree phase-shifting regions, wherein a first set of the 180 degree phase-shifting regions includes a first bias and a second set includes a second bias. |
| 04/22/2004 | US20040076894 Exposing the silicon layer to a laser beam through a mask having a phase shift layer; stripes having a first width separated by slits, and an overlapping blocking layer having stripes having a narrower width and parallel to the first |
| 04/22/2004 | US20040076893 Mask comprising: a transparent substrate; and a light shielding layer having at least two rectangular opening patterns arranged with a predetermined interval to define a single trench. |
| 04/22/2004 | US20040076892 Having some of the cuts on the complementary mask 180-degrees out of phase with one another helps cuts that are close to one another to print better and prevents undesirable deterioration of the features printed using the phase mask |
| 04/22/2004 | US20040076891 Identifying selected segments that do not abut any feature to be printed; first OPC on selected segments; second OPC to correct segments that do abut features; third OPC on an associated phase shifting mask |
| 04/22/2004 | US20040076890 Ion-implanted layer. |
| 04/22/2004 | US20040076889 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 04/22/2004 | US20040076834 Reticle with antistatic coating |
| 04/22/2004 | US20040074868 Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process |
| 04/22/2004 | DE19508746B4 Belichtungsmaske Exposure mask |
| 04/22/2004 | DE10346561A1 Manufacturing photomask for photolithography involves selecting transparency-adjusting pattern features during exposure process, and ascertaining densities of pattern features |
| 04/22/2004 | DE10245621A1 Method for transferring measurement position of structure element to be formed on mask used in photolithographic structuring of semiconductor wafers employs measurement reference positions provided by end customer |
| 04/22/2004 | DE10233205A1 Method for correction of local loading effects when etching photo masks for manufacturing integrated circuits based on knowledge from position dependent structural densities |
| 04/22/2004 | DE10151406B4 Photomaske und Verfahren zu dessen Hertellung Photo mask and method of Hertel Lung |
| 04/21/2004 | EP1411388A1 A method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 04/21/2004 | EP1410106A1 Method of preparing optically imaged high performance photomasks |
| 04/21/2004 | EP1410105A2 Alleviating line end shortening in transistor endcaps by extending phase shifters |
| 04/21/2004 | EP1410095A2 Optical element with full complex modulation |
| 04/21/2004 | EP1023638B1 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit |
| 04/21/2004 | EP0993627B1 Device for transferring structures |
| 04/21/2004 | CN1490671A Method for designing mask and manufacturing face plate |
| 04/21/2004 | CN1490670A Phase-shift mask |
| 04/20/2004 | US6725122 Device and method of selecting photomask manufacturer based on received data |
| 04/20/2004 | US6724712 Nanometer scale data storage device and associated positioning system |
| 04/20/2004 | US6724465 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range |
| 04/20/2004 | US6724092 Semiconductor device having a wiring pattern and method for manufacturing the same |
| 04/20/2004 | US6723477 Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask |
| 04/20/2004 | US6723476 Depositing a material in a pattern over the opaque material; and etching the mass while using the deposited material as an etch mask |
| 04/20/2004 | US6723475 Multilayer |
| 04/15/2004 | WO2004032204A2 Method of making an integrated circuit using a photomask having a dual antireflective coating |
| 04/15/2004 | WO2004032000A1 Methods and systems for process control of corner feature embellishment |
| 04/15/2004 | WO2004031867A2 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2004031861A2 Method for fabrication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2004031857A1 Method for correcting mask pattern |
| 04/15/2004 | WO2004031856A2 Photomask assembly incorporating a porous frame and method for making it |
| 04/15/2004 | WO2004031855A2 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 04/15/2004 | WO2003014831A8 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 04/15/2004 | US20040073885 Mask pattern correction apparatus, mask pattern correction method, mask manufacturing method, and semiconductor device manufacturing method |
| 04/15/2004 | US20040073884 Phase shifting mask topography effect correction based on near-field image properties |
| 04/15/2004 | US20040072083 For use in photolithography |
| 04/15/2004 | US20040072082 Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product |
| 04/15/2004 | US20040072081 Methods for etching photolithographic reticles |
| 04/15/2004 | US20040072016 Halftone phase shift mask blank, and method of manufacture |
| 04/15/2004 | US20040071899 For photolithographic patterning |
| 04/15/2004 | US20040070753 Pattern inspection apparatus |
| 04/15/2004 | US20040070740 Exposure method and exposure apparatus |
| 04/15/2004 | US20040069757 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 04/15/2004 | US20040069636 Metal pattern formation |
| 04/15/2004 | DE10328386A1 Maskendatenprozessor Mask data processor |
| 04/15/2004 | DE10245159A1 Photo mask especially alternating phase mask and production process for semiconductor devices has product field region electrically connected to a surrounding compensation structure |
| 04/15/2004 | DE10244399A1 Repairing quartz defects, especially quartz bumps, on alternating phase masks, employs both mechanical- and etching stages |
| 04/15/2004 | DE10240085A1 Process for structuring a masking layer for semiconductor production uses ideal and correcting mask patterns to allow for lateral distortion |
| 04/14/2004 | EP1408373A1 Photomask, method of producing it and pattern froming method using the photomask |
| 04/14/2004 | CN1489195A Mask defect inspection method and use thereof |
| 04/14/2004 | CN1488995A Method for making microelectronic structure using mixed layers of forming water soluble resin and anti-corrosion agent |
| 04/14/2004 | CN1488994A Substrate for special micro-optical-etching |
| 04/14/2004 | CN1146022C Electron-beam cell projection aperture formation method |
| 04/14/2004 | CN1146019C Phase-shift mask and manufacture thereof |
| 04/13/2004 | US6721938 Optical proximity correction for phase shifting photolithographic masks |
| 04/13/2004 | US6721695 Method and apparatus for evaluating the runability of a photomask inspection tool |
| 04/13/2004 | US6721390 Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method |
| 04/13/2004 | US6721035 Lithographic projection apparatus |
| 04/13/2004 | US6720565 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 04/13/2004 | US6720130 Two polymeric layers on a support, first layer is olophilic polymer and a photothermal converter which converts radiation to heat. the second polymeric layer (top) is composed of crosslinked hydrophilic polymers which absorb aqueous |
| 04/13/2004 | US6720118 Mask comprising substrate, multilayer mirror over substrate having first and second regions, absorber layer over second region absorbent at first wavelength, top layer over absorber layer absorbent at second wavelength |
| 04/13/2004 | US6720117 Exposure mask with appended mask error data |
| 04/13/2004 | US6720116 Process flow and pellicle type for 157 nm mask making |
| 04/13/2004 | US6720115 Exposure method and exposure apparatus using near-field light and exposure mask |