Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
07/2014
07/15/2014US8778569 Pellicle and a method for making the same
07/15/2014US8778235 Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter
07/10/2014US20140192335 Euv exposure apparatus, euv mask, and method of measuring distortion
07/09/2014CN203705817U 光罩盒结构 Reticle box structure
07/09/2014CN103913957A 掩膜版、掩膜图案生成控制系统及方法、掩膜系统 Mask, the mask pattern generation control system and method, the mask system
07/09/2014CN103913945A 光刻掩模修复工艺 Photolithographic mask repair technology
07/09/2014CN103913944A 半色调掩膜版、阵列基板及其制作方法、显示装置 Halftone mask, array substrate and method of manufacturing the display device
07/09/2014CN103913943A 光罩检测方法 Mask detection method
07/09/2014CN102621803B 一种尖劈型超透镜的制备方法 One kind of wedge-type preparation superlens
07/09/2014CN101587293B 用于降低金属栓塞碟化的光罩、孔布局及方法 Embolism dish of mask used to reduce metal hole layout and method
07/08/2014US8774493 Apparatus for forming image for pattern matching
07/08/2014US8773597 Pixel-to-barrier-uneveness-controllable ink
07/08/2014US8772740 UV curing creating flattop and roundtop structures on a single printing plate
07/08/2014US8772737 Conductive element for electrically coupling an EUVL mask to a supporting chuck
07/08/2014US8771906 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
07/08/2014US8771905 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
07/08/2014US8771527 Method of manufacturing an extreme ultraviolet mask
07/03/2014WO2014104544A1 Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
07/03/2014WO2014104276A1 Substrate for mask blank, substrate with multilayer reflective film, reflective type mask blank, reflective type mask, manufacturing method of substrate for mask blank and manufacturing method of substrate with multilayer reflective film as well as manufacturing method of semiconductor device
07/03/2014WO2014104009A1 Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method
07/03/2014WO2014103875A1 Phase shift mask and method for producing same
07/03/2014WO2014103867A1 Phase shift mask and method for producing same
07/03/2014US20140186777 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
07/03/2014US20140186754 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask
07/03/2014US20140186753 Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank
07/03/2014US20140186752 Reflective mask blank for euv lithography, and process for its production
07/03/2014US20140186751 Apparatus Of Repairing A Mask And A Method For The Same
07/03/2014US20140186750 Lithography Mask Repairing Process
07/03/2014US20140186591 Solder Mask Shape for BOT Laminate Packages
07/03/2014DE102012025294A1 Verfahren zum Erzeugen von Strukturen auf einer Oberfläche eines Werkstücks A method for generating patterns on a surface of a workpiece
07/02/2014EP2750164A1 Reflective mask and method for manufacturing same
07/02/2014EP2749945A2 A pellicle for lithography
07/02/2014CN103904060A Tft lcd阵列对位标记设计及制造方法 Tft lcd array alignment mark design and method of manufacture
07/02/2014CN103903964A 一种用氟基气体钝化刻蚀胶掩蔽的薄膜的方法 One kind of a fluorine-based gas etching adhesive masking film passivation method
07/02/2014CN103901737A 用于euv掩模版的表膜和多层反射镜 Tables for euv reticle and multilayer mirror film
07/02/2014CN103901716A 光刻技术用防尘薄膜组件 Pellicle for lithography technique
07/02/2014CN103901715A 一种掩膜板及其制造方法 One kind of mask and its manufacturing method
07/02/2014CN103901714A 提高光刻工艺窗口的光学临近修正处理方法 Improving lithographic process window of the optical proximity correction processing method
07/02/2014CN103901713A 一种采用核回归技术的自适应光学邻近效应校正方法 One kind of kernel regression techniques using adaptive optical proximity effect correction method
07/02/2014CN103034046B 掩模板、曝光系统和曝光方法 Mask, exposure system and exposure method
07/02/2014CN102944970B 基板掩膜对位方法 Substrate mask alignment method
07/02/2014CN102655175B Tft、阵列基板及显示装置、制备该tft的掩模板 Tft, the array substrate and a display device, the mask preparation of the tft
07/02/2014CN102650819B 掩模板和掩膜板的定位方法 Mask positioning method and the mask plate
07/02/2014CN101856805B 用于生产大尺寸合成石英玻璃基板的方法 Production of large-size synthetic quartz glass substrate is a method for
07/01/2014US8766158 Production method of microlens
07/01/2014US8765361 Reticle and manufacturing method of solid-state image sensor
07/01/2014US8765331 Reducing edge die reflectivity in extreme ultraviolet lithography
07/01/2014US8765330 Phase shift mask for extreme ultraviolet lithography and method of fabricating same
07/01/2014US8765329 Sub-resolution rod in the transition region
07/01/2014US8765328 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
07/01/2014US8764995 Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
06/2014
06/26/2014US20140178805 Pellicle for lithogrpahy
06/26/2014US20140178804 Stacked Mask
06/26/2014US20140178597 Method for producing pattern phase difference film
06/26/2014US20140176932 Reticle, exposure apparatus including the same, and exposure method
06/25/2014EP2746852A2 Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
06/25/2014CN103890657A 大型相移掩模及大型相移掩模的制造方法 The method of manufacturing a large phase shift mask and a large phase shift mask
06/25/2014CN103885285A 一种针对光刻版图接触孔热点的检查方法 One for lithography hotspot map to check a contact hole
06/25/2014CN103885284A 堆叠掩模 Stacking mask
06/25/2014CN103885283A 一种掩模对准信号的归一化方法 One kind of mask alignment signal normalization method
06/25/2014CN103885282A 一种减少opc修正后验证误报错的方法 Mistakenly given way to verify a reduction in the revised opc
06/25/2014CN103885281A 一种光屏障基板的制备方法 A light barrier method for preparing a substrate
06/25/2014CN102998896B 一种基于基本模块的掩模主体图形优化方法 An optimization method based on the basic module of the mask body graphics
06/25/2014CN102998893B 使用反射式掩膜版的曝光装置及曝光方法 Use reflective mask exposure apparatus and exposure method
06/25/2014CN102654729B 带辅助线条的双层衰减相移接触孔掩模衍射场的计算方法 Calculation contact hole mask diffraction field double decay phase shift with auxiliary lines
06/25/2014CN102640021B Euv光刻用光学构件及带反射层的euv光刻用衬底的制造方法 Euv lithography method for producing an optical member and euv lithography with a reflective layer of the substrate
06/25/2014CN102472960B 防护膜框架以及包括该防护膜框架的防护膜组件 Pellicle frame and includes a protective membrane of the pellicle frame
06/24/2014US8762897 Semiconductor device design system and method of using the same
06/24/2014US8759984 Semiconductor memory device
06/24/2014US8758964 LCD panel photolithography process and mask
06/24/2014US8758963 Holographic reticle and patterning method
06/24/2014US8758962 Method and apparatus for sub-pellicle defect reduction on photomasks
06/24/2014US8758864 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
06/19/2014WO2014033532A3 Centimeter-scale high resolution metrology of entire cvd grown graphene sheets
06/19/2014US20140173534 Resolution enhancing technology using phase assignment bridges
06/19/2014US20140170539 Determination of lithography tool process condition
06/19/2014US20140170537 Method of defining an intensity selective exposure photomask
06/19/2014US20140170536 Reflective mask and method for manufacturing same
06/19/2014US20140170535 Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
06/19/2014US20140170534 Phase shift masks and methods of forming phase shift masks
06/19/2014US20140170533 Extreme ultraviolet lithography (euvl) alternating phase shift mask
06/18/2014CN203658726U 一种菲林存放装置 One kind of film storage unit
06/18/2014CN203658725U 一种掩膜板 One kind of mask
06/18/2014CN103869607A Method for removing chromium metal film from binary mask
06/18/2014CN103869606A Exposure photomask and method for manufacturing color filter
06/18/2014CN103869605A Mask plate for manufacturing light filter plate, light filter plate forming method, and display apparatus
06/18/2014CN103869604A Light shield and its designing method
06/18/2014CN103869603A Photolithographic plate assembly and photolithographic alignment accuracy detection method
06/18/2014CN103869602A Mask plate, and method of mask plate used for realizing exposure joint
06/18/2014CN103869601A Mask plate with fixed auxiliary edge and manufacture method
06/18/2014CN103869600A Optical proximity correction method
06/18/2014CN103869599A Optical proximity correction method for through hole
06/18/2014CN103869598A Optical proximity effect correction method for ion injection layer
06/18/2014CN103869597A Semiconductor device resolution enhancement by etching multiple sides of a mask
06/18/2014CN103869596A Method for determining safe range of lateral erosion width of phase shift mask layer in double exposure
06/18/2014CN102749802B Mask for black matrix
06/18/2014CN102468182B Method and device for increasing fin device density for unaligned fins
06/18/2014CN102378939B Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate
06/17/2014US8756536 Generation method, storage medium, and information processing apparatus
06/17/2014US8755599 Review apparatus and inspection system
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