| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/20/2004 | US20040096755 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/20/2004 | US20040096754 Mask for laser irradiation and apparatus for laser crystallization using the same |
| 05/20/2004 | US20040096753 Mask for laser irradiation, method of manufacturing the same, and apparatus for laser crystallization using the same |
| 05/20/2004 | US20040096752 Phase-width balanced alternating phase shift mask design |
| 05/20/2004 | US20040094504 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 05/19/2004 | EP1420294A2 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 05/19/2004 | EP1419418A1 Electron beam processing |
| 05/19/2004 | EP1419417A2 Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same |
| 05/19/2004 | CN1498418A System and method of providing mask defect printablity analysis |
| 05/19/2004 | CN1498359A Mask pattern correction device and mask pattern correction method, mask manufacturing method and semiconductor device manufacturing method |
| 05/19/2004 | CN1497699A Pattern copy mask, manufacturing method of semiconductor device and program for making mask pattern |
| 05/18/2004 | US6738859 Method and apparatus for fast aerial image simulation |
| 05/18/2004 | US6737224 Method of preparing thin supported films by vacuum deposition |
| 05/18/2004 | US6737205 Arrangement and method for transferring a pattern from a mask to a wafer |
| 05/18/2004 | US6737201 Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device |
| 05/18/2004 | US6737200 Method for aligning a contact or a line to adjacent phase-shifter on a mask |
| 05/18/2004 | US6737199 Avoids the formation of resist residue. |
| 05/18/2004 | US6737198 Transparent substrate; shield pattern |
| 05/18/2004 | US6736386 Covered photomask holder and method of using the same |
| 05/13/2004 | WO2004040626A1 Mask, mask producing method and exposure method |
| 05/13/2004 | WO2004040374A2 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 05/13/2004 | WO2004040373A1 Multi-image reticles |
| 05/13/2004 | WO2004040372A1 Multi-image reticles |
| 05/13/2004 | WO2004039601A1 Thermal generation of a mask for flexography |
| 05/13/2004 | WO2003100816A3 Energetic neutral particle lithographic apparatus and process |
| 05/13/2004 | US20040092081 Method of manufacturing alignment mark and aligning method using the same |
| 05/13/2004 | US20040091822 Accurately patterning features above and below baseline in single step |
| 05/13/2004 | US20040091798 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 05/13/2004 | US20040091797 Correcting design data of layout pattern; calculating area ratio and density; positional accuracy |
| 05/13/2004 | US20040091796 Pellicle for lithography, and a method for producing it |
| 05/13/2004 | US20040091795 Rapid, error free semiconductor batch production |
| 05/13/2004 | US20040091794 Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof |
| 05/13/2004 | US20040091793 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 05/13/2004 | US20040091792 Photoresist patterning variety of sizes and pitches; simple, easy fabrication |
| 05/13/2004 | US20040091791 Scatter dots |
| 05/13/2004 | US20040091790 Reducing corner rounding and image shortening |
| 05/13/2004 | US20040091789 Subtractive attenuation and phase shifting; accurate opening depth; simplified manufacturing |
| 05/13/2004 | US20040091788 Reduced darkening upon repeated exposures |
| 05/13/2004 | US20040091142 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 05/13/2004 | US20040090610 Microfabrication of pattern imprinting |
| 05/13/2004 | US20040090605 Advanced mask cleaning and handling |
| 05/13/2004 | DE10330599A1 Verfahren zur Herstellung von Mikroelektronik-Strukturelementen durch Ausbilden von Durchmischungsschichten aus wasserlöslichen Harzen und Resistmaterialien A process for the production of microelectronic structure elements by forming mixing layers of water-soluble resins and resist materials |
| 05/12/2004 | EP1418466A2 Halftone phase shift mask blank, and method of manufacture |
| 05/12/2004 | EP1417538A2 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 05/12/2004 | CN1496495A Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 05/12/2004 | CN1495856A Orientation dependent on screen by adopting dipole illumination technigue |
| 05/12/2004 | CN1495539A Production of automatic optical approximate correcting regulation |
| 05/12/2004 | CN1495521A Method for implementing key size linear control in whole-chip chrome-less photoetching technique production |
| 05/12/2004 | CN1495444A Method for designing phase raster graphics and method for making photomask system containing it |
| 05/12/2004 | CN1495443A Reflector utilizing microimage to make exposure and its production method |
| 05/12/2004 | CN1494956A Cleaning method for removing particles from surface, cleaning equipment and photo-engraving projection equipment |
| 05/12/2004 | CN1149643C Pattern drawing method using charged particle beams and apparatus therefor |
| 05/11/2004 | US6735745 Method and system for detecting defects |
| 05/11/2004 | US6734445 Mechanized retractable pellicles and methods of use |
| 05/11/2004 | US6734442 Mapping method for a microscope slide |
| 05/11/2004 | US6733953 Semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. |
| 05/11/2004 | US6733933 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 05/11/2004 | US6733932 Mask lithography data generation method |
| 05/11/2004 | US6733930 Photomask blank, photomask and method of manufacture |
| 05/11/2004 | US6733929 Phase shift masking for complex patterns with proximity adjustments |
| 05/11/2004 | US6733686 Method and device for removing an unnecessary film |
| 05/06/2004 | WO2004038507A1 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith |
| 05/06/2004 | WO2004038504A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication |
| 05/06/2004 | WO2004027830A3 Method and system detecting phase defects in phptomasks and wafers |
| 05/06/2004 | WO2004021078A3 Vent for an optical pellicle system |
| 05/06/2004 | US20040088675 Method of and computer program product for designing patterns, and method of manufacturing semiconductor device |
| 05/06/2004 | US20040088149 Method and apparatus for performing OPC using model curvature |
| 05/06/2004 | US20040087181 Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof |
| 05/06/2004 | US20040086804 Forming a resist pattern on a microelectronic substrate; forming a coating layer comprising a water-soluble resin on resist pattern, hardening intermixed layer; and removing the non-intermixed coating layer from hardened intermixed layer |
| 05/06/2004 | US20040086792 Lithographic mask for semiconductor devices with a polygonal-section etch window, in particular having a section of at least six sides |
| 05/06/2004 | US20040086791 Reference data is created from corrected photomask design data that is corrected on the basis of an exposure transfer pattern, and sensor data is created by measuring shape of the photomask based on the corrected photomask design data |
| 05/06/2004 | US20040086790 Mask, method of producing mask, and method of producing semiconductor device |
| 05/06/2004 | US20040086789 Manufacturing method of photomask and photomask |
| 05/06/2004 | US20040086788 Enables accurate critical-dimension control |
| 05/06/2004 | US20040086787 Alternating aperture phase shift photomask having plasma etched isotropic quartz features |
| 05/06/2004 | US20040086785 AISixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography |
| 05/06/2004 | EP1415197A2 Optical proximity correction for phase shifting photolithographic masks |
| 05/06/2004 | EP1415196A1 Resolution enhancement for edge phase shift masks |
| 05/06/2004 | EP1414722A1 Reticle protection and transport |
| 05/06/2004 | EP0877292B1 Pellicle |
| 05/06/2004 | DE10246788A1 Schutzvorrichtung für lithographische Masken und Verfahren zu ihrer Verwendung Protection device for lithographic masks and methods for their use |
| 05/05/2004 | CN1493923A Inspecting method and photomask |
| 05/05/2004 | CN1493921A Photoetching equipment having vacuum mask plate store connected with vacuum chamber |
| 05/04/2004 | US6732351 Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure |
| 05/04/2004 | US6731378 Pellicle distortion reduction |
| 05/04/2004 | US6730463 Exposure of photoresist segemnts to radiation; phase shifting |
| 05/04/2004 | US6730445 Attenuated embedded phase shift photomask blanks |
| 05/04/2004 | US6730444 Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same |
| 05/04/2004 | US6729927 Method and apparatus for making a shadow mask array |
| 04/29/2004 | WO2004021082A3 Improved photomask having an intermediate inspection film layer |
| 04/29/2004 | WO2003067330B1 Radiation patterning tools, and methods of forming radiation patterning tools |
| 04/29/2004 | WO2003046628A8 Method for fabricating chirped fiber bragg gratings |
| 04/29/2004 | US20040083444 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 04/29/2004 | US20040083439 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 04/29/2004 | US20040081917 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 04/29/2004 | US20040081916 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/29/2004 | US20040081908 Thermal generation of a mask for flexography |
| 04/29/2004 | US20040081899 Able to form any pattern feature with any dimension including a dimension equal to or smaller than the resolution to be formed by exposure using a single mask implementing a phase shift effect. |
| 04/29/2004 | US20040081898 Mask can be used independently of its height tolerances and of the membrane holder to be mounted thereon for a distortion-free lithographic imaging |
| 04/29/2004 | US20040081897 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |