| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/10/2004 | US20040110095 Depositing a positive type photoresist film over a semiconductor substrate;exposing a first mask pattern;exposing a second mask pattern; performing development treatment; etching |
| 06/10/2004 | US20040110073 Methods of manufacturing photomask blank and photomask |
| 06/10/2004 | US20040110072 Process for manufacturing half-tone phase shifting mask blanks |
| 06/10/2004 | US20040110071 For high image contrast and improved resolution |
| 06/10/2004 | US20040110070 For forming patterns on a semiconductor substrate |
| 06/10/2004 | US20040110069 Pattern compensation techniques for charged particle lithographic masks |
| 06/10/2004 | US20040109601 Method for facilitating automatic analysis of defect printability |
| 06/10/2004 | US20040109201 Image arrangement method, image arrangement device, and image arrangement program storage medium |
| 06/10/2004 | US20040109173 Method and system for measuring patterned structures |
| 06/10/2004 | US20040109153 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 06/10/2004 | US20040108049 Method for laminating a pre-press proof |
| 06/09/2004 | EP1427014A2 Integrated circuit identification |
| 06/09/2004 | EP1426821A1 Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 06/09/2004 | EP1426820A2 Methods of manufacturing photomask blank and photomask |
| 06/09/2004 | EP1425787A2 System and method for identfying dummy features on a mask layer |
| 06/09/2004 | EP1425623A1 Graphics engine for high precision lithography |
| 06/09/2004 | CN1503929A Method of uniformly coating substrate |
| 06/09/2004 | CN1503928A Method for uniformly coating substrate |
| 06/09/2004 | CN1503926A Ion-beam deposition process for manufacturing multilayered attenuated phase shift photomask blanks |
| 06/09/2004 | CN1503342A Method and device for checking mask pattern |
| 06/09/2004 | CN1503062A Method for making lithographic apparatus and device |
| 06/09/2004 | CN1503060A Method foe making optical elements, lithographic device and apparatus making method |
| 06/09/2004 | CN1503056A Phase-width balanced alternating phase shift mask design |
| 06/09/2004 | CN1503055A Master mask, exposure monitor method, exposure method and semiconductordevice mfg method |
| 06/09/2004 | CN1502555A Method for forming pattern film of surface modified carbon nano tube |
| 06/08/2004 | US6748578 Streamlined IC mask layout optical and process correction through correction reuse |
| 06/08/2004 | US6748103 Mechanisms for making and inspecting reticles |
| 06/08/2004 | US6747783 Pattern generator |
| 06/08/2004 | US6746824 Lithography; forming semiconductors using patterned photoresist |
| 06/08/2004 | US6746806 Lithography mask blank and method of manufacturing the same |
| 06/08/2004 | US6746805 Forming support structure including substrate with plurality of windows, filling windows with temporary fill material, forming additional windows in unfilled portions of substrate, filling windows, forming mask over substrate, removing fill |
| 06/08/2004 | US6745484 Reticle, and pattern positional accuracy measurement device and method |
| 06/03/2004 | WO2004046827A1 Pellicle with small gas production amount |
| 06/03/2004 | WO2004031855A3 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 06/03/2004 | WO2004029716A3 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer |
| 06/03/2004 | US20040107412 Method and system for context-specific mask writing |
| 06/03/2004 | US20040106051 Projectors comprising quartz substrates having light diversion and absorption stacks, and electroconductive layers, that can be chucked to substrate holders to which an electrostatic potential is applied |
| 06/03/2004 | US20040106050 coating radiation transparent substrates with photoresists, then scanning with lasers light in controlled patterns, development and etching to form optical fibers; communication |
| 06/03/2004 | US20040106049 coating substrates with chromium, molybdenum, tungsten, or tantalum oxynitrtides, oxycarbides, nitrides, carbides or oxides, by bombarding with plasma gases; lithography; miniaturization; integrated circuits |
| 06/03/2004 | US20040105578 Pattern inspection apparatus |
| 06/03/2004 | US20040105577 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 06/03/2004 | US20040103983 Method of laminating a pre-press proof |
| 06/03/2004 | US20040103917 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 06/03/2004 | DE10352740A1 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Grösse Auxiliary structural features with a sub-resolution size |
| 06/03/2004 | DE10253679A1 Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system |
| 06/02/2004 | EP1424596A2 First approximation for OPC significant speed-up |
| 06/02/2004 | EP1424595A2 Automatic calibration of a masking process simulator |
| 06/02/2004 | EP1423759A2 Method and device for control of the data flow on application of reticles in a semiconductor component production |
| 06/02/2004 | EP1131665B1 Microscope, especially microscope used for inspection in semiconductor manufacture |
| 06/02/2004 | CN1501174A Method, inspection system, computer program and reference substrate for detecting mask defects |
| 06/02/2004 | CN1501164A Staggered phase displacement mask |
| 06/02/2004 | CN1500715A Lamination and picture composition method utilizing chemical self-assembly process |
| 06/01/2004 | US6745380 Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor |
| 06/01/2004 | US6745372 Method and apparatus for facilitating process-compliant layout optimization |
| 06/01/2004 | US6744562 Pellicle |
| 06/01/2004 | US6744489 Semiconductor exposure apparatus and method of driving the same |
| 06/01/2004 | US6744054 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/01/2004 | US6743555 Top and central exposure |
| 06/01/2004 | US6743554 Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device |
| 06/01/2004 | US6743553 Which can enhance a resolution of a transfer pattern by utilizing an interference action caused to occur among light waves in a phase shifter |
| 05/27/2004 | WO2004044967A1 Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask |
| 05/27/2004 | WO2004044964A1 Advanced mask cleaning and handling |
| 05/27/2004 | WO2004006015A3 Method for determining the structure of a mask for microstructuring semiconductor substrates by means of photolithography |
| 05/27/2004 | WO2003036387A3 Method of forming a pattern of sub-micron broad features |
| 05/27/2004 | WO2000066969A3 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 05/27/2004 | US20040103388 First approximation for OPC significant speed-up |
| 05/27/2004 | US20040102945 Simulation-based selection of evaluation points for model-based optical proximity correction |
| 05/27/2004 | US20040102912 Automatic calibration of a masking process simulator |
| 05/27/2004 | US20040101767 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 05/27/2004 | US20040101766 Substrates having radiation transparent and opalescence layers, aperture patterns and grooves, formed by exposing, undercutting, bias adjustment and analyzing; tools for miniaturization of semiconductors; efficiency |
| 05/27/2004 | US20040101765 Use of chromeless phase shift features to pattern large area line/space geometries |
| 05/27/2004 | US20040101764 Use of chromeless phase shift masks to pattern contacts |
| 05/27/2004 | US20040101634 Method of forming a patterned film of surface-modified carbon nanotubes |
| 05/27/2004 | US20040100671 Hologram element |
| 05/27/2004 | US20040100593 Method for designing mask and fabricating panel |
| 05/27/2004 | DE10351027A1 Crystallizing device used in the production of thin film transistors comprises an illuminating system and a mask consisting of a light absorption layer |
| 05/27/2004 | DE10349087A1 Half-tone-type phase shift mask blank manufacturing method involves sputtering reactive gas onto substrate, to form half-tone film with desired optical characteristic, irrespective of change of gas flow amount |
| 05/27/2004 | DE10253073A1 Process for repairing a defect of a light-influencing structure on a photolithographic mask in semiconductor component production comprises irradiating gallium ions in the region of a defect for implantation into the mask substrate |
| 05/26/2004 | EP1422563A1 Method of forming a patterned film of surface-modified carbon nanotubes |
| 05/26/2004 | EP1422562A1 Reticle and optical characteristic measuring method |
| 05/26/2004 | EP1421445A1 Photolithographic mask |
| 05/26/2004 | EP1421444A2 Patterning an integrated circuit using a reflective mask |
| 05/26/2004 | EP1421443A2 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making |
| 05/26/2004 | CN1500230A Extreme ultraviolet mask with improved absorber |
| 05/26/2004 | CN1499571A Fig. design method of integrated circuit, exposure mask mfg. method and application |
| 05/26/2004 | CN1499293A Checking method and element mfg. method |
| 05/26/2004 | CN1499288A Mask protective layer for photoetching and its mfg. method |
| 05/26/2004 | CN1498989A 结晶装置和结晶方法 Crystallization apparatus and the crystallization method |
| 05/26/2004 | CN1151408C Method for fabricating light exposure mask |
| 05/25/2004 | US6741733 Drawing pattern verifying method |
| 05/25/2004 | US6741327 Eliminating residual pattern aberration |
| 05/25/2004 | US6740896 Sensitivity adjusting method for pattern inspection apparatus |
| 05/25/2004 | US6740856 Preformed heating element and method of making |
| 05/25/2004 | US6740596 Manufacturing method of active matrix substrate |
| 05/25/2004 | US6740456 Method of correcting a photomask and method of manufacturing a semiconductor device |
| 05/25/2004 | US6740455 Simplification of lithography |
| 05/25/2004 | US6740368 Beam shaped film pattern formation method |
| 05/25/2004 | US6740208 Photo mask blank and method of manufacturing the same |
| 05/21/2004 | WO2003096356A3 Reflective x-ray microscope and inspection system for examining objects with wavelengths of≤ 100nm |
| 05/21/2004 | WO2002075793B1 System and method of providing mask defect printability analysis |