| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/01/2004 | US20040126670 High performance EUV mask |
| 07/01/2004 | US20040125911 Reflection type mask |
| 07/01/2004 | US20040125355 Semiconductor manufacturing apparatus |
| 07/01/2004 | US20040125354 Pellicle distortion reduction |
| 07/01/2004 | US20040125118 Method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 07/01/2004 | US20040124175 Defect repair method, in particular for repairing quartz defects on alternating phase shift masks |
| 07/01/2004 | US20040123950 Venting of pellicle cavity for a mask |
| 07/01/2004 | DE19611726B4 Blindstruktur zur Außeraxial-Belichtung Blind structure for off-axis illumination |
| 07/01/2004 | DE10134462B4 Verfahren zur Planarisierung der Oberfläche eines Halbleiterwafers und Vorrichtung zur Durchführung dieses Verfahrens A process for planarization of the surface of a semiconductor wafer and device for carrying out this method |
| 06/30/2004 | EP1434099A1 Device manufacturing method |
| 06/30/2004 | EP1433026A2 Photolithographic mask fabrication |
| 06/30/2004 | CN1509233A Chemical imaging of lithographic printing plate |
| 06/30/2004 | CN1508623A Method for making sub-wavelength structure |
| 06/29/2004 | US6757886 Alternating phase shift mask design with optimized phase shapes |
| 06/29/2004 | US6757645 Visual inspection and verification system |
| 06/29/2004 | US6757629 Calibration plate having accurately defined calibration pattern |
| 06/29/2004 | US6756182 Charged-particle-beam microlithography methods exhibiting reduced coulomb effects |
| 06/29/2004 | US6756181 Made without using a negative, useful for flexographic printing; laser creates scanned negative image on modified slip film, which is then exposed and developed |
| 06/29/2004 | US6756164 Exposure mask with repaired dummy structure and method of repairing an exposure mask |
| 06/29/2004 | US6756163 Re-usable extreme ultraviolet lithography multilayer mask blank |
| 06/29/2004 | US6756161 Film essentially of a moxcynz compound where m is chromium, molybdenum, tungsten, and/or tantalum |
| 06/29/2004 | US6756160 Tunable optics transmission; lithography wavelengths; attenuation phase shifting |
| 06/29/2004 | US6756158 Thermal generation of mask pattern |
| 06/24/2004 | WO2004053592A1 Reticle manipulations |
| 06/24/2004 | US20040123266 Method and system for constructing a hierarchy-driven chip covering for optical proximity correction |
| 06/24/2004 | US20040123265 Method and system for classifying an integrated circut for optical proximity correction |
| 06/24/2004 | US20040123264 Incremental lithography mask layout design and verification |
| 06/24/2004 | US20040122636 Rapid scattering simulation of objects in imaging using edge domain decomposition |
| 06/24/2004 | US20040121248 improvement over prior art pellicle membranes which are susceptible to being scratched and torn, and where any damage to the thin pellicle membrane requires that the entire pellicle be removed and replaced |
| 06/24/2004 | US20040121247 Projection lithography photomasks and method of making |
| 06/24/2004 | US20040121245 Exposure method, exposure mask, and exposure apparatus |
| 06/24/2004 | US20040121244 Photomask, method of producing it and pattern forming method using the photomask |
| 06/24/2004 | US20040121243 Damage-resistant coatings for EUV lithography components |
| 06/24/2004 | US20040121242 Sidelobe correction for attenuated phase shift masks |
| 06/24/2004 | US20040121069 lithography; accurately matching up the defect location; focused ion beam systems |
| 06/24/2004 | US20040120458 Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 06/24/2004 | US20040119970 Test pattern, inspection method, and device manufacturing method |
| 06/24/2004 | US20040119965 Positioning films to allow purge gases to repair damage caused by exposure to radiation, and allow radiation to reach semiconductor wafer for photolithography; separators |
| 06/24/2004 | US20040119724 Digital prepress masking tools |
| 06/24/2004 | US20040119036 System and method for lithography process monitoring and control |
| 06/24/2004 | DE10255653A1 Reducing illumination device imaging errors involves determining auxiliary structures acting on working structure diffraction spectrum with dimensions less than optical resolution limit by simulation |
| 06/24/2004 | DE10255605A1 Reflektionsmaske zur Projektion einer Struktur auf einen Halbleiterwafer sowie Verfahren zu deren Herstellung Reflection mask for projecting a pattern on a semiconductor wafer, as well as processes for their preparation |
| 06/23/2004 | EP1431820A2 Method and system for classifying an integrated circuit for optical proximity correction |
| 06/23/2004 | EP1430343A1 Method for fabricating chirped fiber bragg gratings |
| 06/23/2004 | CN1506767A Method for detemining photoetching projection parameter, device producing method and device |
| 06/23/2004 | CN1506764A Method and equipment for heightening adhesive surface of film frame with porous filtering inset |
| 06/23/2004 | CN1506760A Method for producing micro structure |
| 06/23/2004 | CN1506759A Photoresist mask and its making process |
| 06/23/2004 | CN1154879C Phase shift mask and method for fabricating same |
| 06/22/2004 | US6754303 Exposure apparatus and exposing method |
| 06/22/2004 | US6753954 Method and apparatus for detecting aberrations in a projection lens utilized for projection optics |
| 06/22/2004 | US6753945 Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method |
| 06/22/2004 | US6753611 Semiconductor device, designing method thereof, and recording medium storing semiconductor designing program |
| 06/22/2004 | US6753538 Electron beam processing |
| 06/22/2004 | US6753131 Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element |
| 06/22/2004 | US6753118 Optical grating fabrication process |
| 06/22/2004 | US6753116 Multiple photolithographic exposures with different non-clear patterns |
| 06/22/2004 | US6753115 Controlling width, spacing using computer; masking, detection; forming integrated circuits |
| 06/17/2004 | WO2004051370A1 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 06/17/2004 | WO2004051369A1 Photomask blank, and photomask |
| 06/17/2004 | US20040117757 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 06/17/2004 | US20040117055 Configuration and method for detecting defects on a substrate in a processing tool |
| 06/17/2004 | US20040115960 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 06/17/2004 | US20040115654 Preparing nucleotide sequence array platforms; genomics; genotyping |
| 06/17/2004 | US20040115568 Fabrication of sub-wavelength structures |
| 06/17/2004 | US20040115541 Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, defect influence map generating method, and computer program product |
| 06/17/2004 | US20040115539 Masking; printing a pattern using; determination, calibration, adjustment |
| 06/17/2004 | US20040115538 X-rays; exposure a self-supporting film of radiation sensitivity material to electrons beams scanning pattern ; generating film with reduced metal concentration |
| 06/17/2004 | US20040115537 Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks |
| 06/17/2004 | US20040115442 Photomask, in particular alternating phase shift mask, with compensation structure |
| 06/17/2004 | US20040115343 Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks |
| 06/17/2004 | US20040114824 Method of adjusting the level of a specimen surface |
| 06/17/2004 | US20040113098 Structured organic materials and devices using low-energy particle beams |
| 06/17/2004 | US20040111823 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 06/16/2004 | EP1429186A2 Pellicle frame with porous inserts or heightened bonding surfaces |
| 06/16/2004 | EP1429159A1 Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other |
| 06/16/2004 | EP1428073A2 In-situ balancing for phase-shifting mask |
| 06/16/2004 | EP1428072A2 Method for automatic optical measurement of an opc structure |
| 06/16/2004 | CN1505127A Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 06/16/2004 | CN1505102A Manufacturing method of photo mask and semiconductor device |
| 06/16/2004 | CN1504842A 全息元件 Holographic elements |
| 06/15/2004 | US6750961 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes |
| 06/15/2004 | US6750496 Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device |
| 06/15/2004 | US6750464 Having pattern elements defined as apertures in stencil reticle, each element split into portions separated by girders formed from membrane of reticle and configured for transfer to substrate using single exposure shot of charged particle beam |
| 06/15/2004 | US6750000 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods |
| 06/15/2004 | US6749997 Lithographic mask capable of providing regions of graded exposure, such that when combined with anisotropic etching provides three dimensional microstructures of arbitrary size and shape |
| 06/15/2004 | US6749974 Disposable hard mask for photomask plasma etching |
| 06/15/2004 | US6749973 Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask |
| 06/15/2004 | US6749972 Producing a photomask for semiconductor photolithography processing |
| 06/15/2004 | US6749971 Chrome region on the phase mask can improve mask generation by allowing the chrome on the mask to fully define the quartz etch |
| 06/15/2004 | US6749970 Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 06/15/2004 | US6749969 Reverse tone process for masks |
| 06/15/2004 | US6749968 Making a stencil mask as can be used in conjunction with electron projection lithography, ion projection lithography, electron proximity lithography, and ion proximity lithography. |
| 06/10/2004 | WO2004049213A1 System and method for automatically transferring a defect image from an inspection system to a database |
| 06/10/2004 | WO2004049067A1 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 06/10/2004 | WO2004049063A2 Photomask and method for creating a protective layer on the same |
| 06/10/2004 | WO2004006014A3 Method of using an amorphous carbon layer for improved reticle fabrication |
| 06/10/2004 | WO2003089990A3 Process for etching photomasks |
| 06/10/2004 | US20040111693 Identifying phantom images generated by side-lobes |
| 06/10/2004 | US20040110313 Integrated circuit identification |