| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/22/2004 | DE10260755A1 Verfahren zur Bildung eines Strukturelementes auf einem Wafer mittels einer Maske und einer ihr zugeordneten Trim-Maske A method for forming a structural element on a wafer with a mask and a trim mask assigned |
| 07/21/2004 | EP1439690A2 Multi-bit output sampled threshold array halftoner |
| 07/21/2004 | EP1439425A1 Lithographic projection apparatus and device manufacturing method |
| 07/21/2004 | EP1439421A2 Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
| 07/21/2004 | EP1439420A1 Simulation based method of optical proximity correction design for contact hole mask |
| 07/21/2004 | EP1439419A2 Method and apparatus for providing optical proximity correction features to a reticle pattern for optical lithography |
| 07/21/2004 | EP1439418A2 Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects |
| 07/21/2004 | EP1438725A1 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 07/21/2004 | EP1438636A2 Real-time prediction of and correction of proyimity resist heating in raster scan particle beam lithography |
| 07/21/2004 | EP1438633A2 Method for forming elliptical and rounded mask features using beam shaping |
| 07/21/2004 | CN2627537Y Thin film semiconductor device, electrolight device and intermediate mask |
| 07/21/2004 | CN1514953A Exposure control for phase shifting photolithographic masks |
| 07/21/2004 | CN1158570C Phase shifting mask etching process of producing T-shaped grid through one photo-etching step |
| 07/20/2004 | US6765673 Pattern forming method and light exposure apparatus |
| 07/20/2004 | US6765645 De-pellicle tool |
| 07/20/2004 | US6764795 Method and system for mask pattern correction |
| 07/20/2004 | US6764794 Used for focus monitoring that measures the position of an exposed surface in an optical system in order to adjust focus of optical image on exposed surface |
| 07/20/2004 | US6764792 Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it |
| 07/15/2004 | WO2004059384A1 Lithography mask blank |
| 07/15/2004 | WO2004025369A3 Method for lithographically structuring a substrate, and lacquer system |
| 07/15/2004 | WO2004008246A3 Method and system for context-specific mask writing |
| 07/15/2004 | US20040139418 Automatic optical proximity correction (OPC) rule generation |
| 07/15/2004 | US20040139414 Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method |
| 07/15/2004 | US20040138860 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 07/15/2004 | US20040138842 Method for determining rotational error portion of total misalignment error in a stepper |
| 07/15/2004 | US20040137828 Glass substrate for a mask blank, method of producing a glass substrate for a mask blank, mask blank, method of producing the mask blank, transfer mask, and method of producing a transfer mask |
| 07/15/2004 | US20040137677 Device manufacturing method and computer program |
| 07/15/2004 | US20040137375 Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto |
| 07/15/2004 | US20040137371 Protective coating for optic surfaces; microlithography; patterning semiconductor wafer |
| 07/15/2004 | US20040137343 method involves selecting features of a pattern to be imaged, notionally dividing the source into a plurality of source elements, for each source element, calculating the process window for each selected feature |
| 07/15/2004 | US20040137342 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools |
| 07/15/2004 | US20040137341 Fast and flexible method and system for grating overlay patterns, semiconductors |
| 07/15/2004 | US20040137340 Method for evaluating photo mask and method for manufacturing semiconductor device |
| 07/15/2004 | US20040137339 includes a pellicle assembly with a pellicle frame and a pellicle film coupled to a surface of the pellicle frame; A molecular sieve prevents airborne molecular contaminants (AMCs) generated during lithography from contaminating the photomask |
| 07/15/2004 | US20040137338 includes closely contacting, to a workpiece, a mask having an opening formed with lengthwise directions extending in orthogonal directions, and projecting onto the mask, exposure light being polarized in another direction |
| 07/15/2004 | US20040137337 includes providing an attenuated phase shift mask comprising an etched opening extending through a thickness of a light blocking layer and an underlying light attenuating layer to reveal a quartz substrate the opening including an unetched portion |
| 07/15/2004 | US20040137336 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface |
| 07/15/2004 | US20040137335 alternating and attenuating phase shift masks that provide improved resolution of a photolithographic projection apparatus |
| 07/15/2004 | US20040136587 Method and device for determining the properties of an integrated circuit |
| 07/15/2004 | US20040136034 Multi-bit output sampled threshold array halftoner |
| 07/15/2004 | US20040135987 Removable reticle window and support frame using magnetic force |
| 07/15/2004 | US20040135986 De-pellicle tool |
| 07/15/2004 | US20040135100 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 07/15/2004 | US20040134597 Method of preparing plastic materials to allow lamination of a pre-press color proof |
| 07/15/2004 | DE10259331A1 Making photo-masks for integrated circuits, pre-structures multi-layer coating on substrate surface to form reflected regions outside trench and non-reflective regions inside it |
| 07/15/2004 | DE10259057A1 Photoresist composition for use in semiconductor lithography, contains a methacrylate copolymer with polycyclic siloxane groups in side chains as carrier polymer, plus photo-acid generator and solvent |
| 07/14/2004 | EP1437882A1 Method and apparatus for creating 3-D prints and a 3-D printing system |
| 07/14/2004 | CN1512545A Templet mask for charging-proof and its producing method |
| 07/14/2004 | CN1512543A Double layer coding light shade for rooting of mask implanting code ROM |
| 07/14/2004 | CN1512273A Mask box and method for transport light etched mask in box and scanning mask in box |
| 07/13/2004 | US6763514 Method and apparatus for controlling rippling during optical proximity correction |
| 07/13/2004 | US6762821 Gas purge method and exposure apparatus |
| 07/13/2004 | US6762434 Electrical print resolution test die |
| 07/13/2004 | US6762433 Semiconductor product wafer having vertically and horizontally arranged patterned areas including a limited number of test element group regions |
| 07/13/2004 | US6762001 Method of fabricating an exposure mask for semiconductor manufacture |
| 07/13/2004 | US6762000 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
| 07/08/2004 | US20040133872 Photomask designing method, pattern predicting method and computer program product |
| 07/08/2004 | US20040133369 Method and system for context-specific mask inspection |
| 07/08/2004 | US20040132266 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment |
| 07/08/2004 | US20040131978 Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography |
| 07/08/2004 | US20040131977 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/08/2004 | US20040131954 Non absorbing reticle and method of making same |
| 07/08/2004 | US20040131953 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 07/08/2004 | US20040131952 Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation |
| 07/08/2004 | US20040131951 Mask, manufacturing method for mask, and manufacturing method for semiconductor device |
| 07/08/2004 | US20040131950 Increased depth of field range; mapping operation dimensional accuracy in dense configurations and isolated elements |
| 07/08/2004 | US20040131949 Single ultraviolet radiation exposure |
| 07/08/2004 | US20040131948 Having antireflective coating on absorber layer |
| 07/08/2004 | US20040131947 Having film stack with deep trenches and specific sidewall shape; radiation absorption |
| 07/08/2004 | US20040131946 System and method for fabrication and replication of diffractive optical elements for maskless lithography |
| 07/08/2004 | US20040131352 Plate registering system and method of operation |
| 07/08/2004 | US20040130711 Method of detecting mask defects, a computer program and reference substrate |
| 07/08/2004 | DE10258371A1 Inspection method for the periodic grating structures on lithography masks used in semiconductor production, whereby the mask position is controlled using a computer and an initial calibration of each array structure is undertaken |
| 07/07/2004 | EP1435289A1 Plate registering system and method of operation |
| 07/07/2004 | EP1274581B1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 07/07/2004 | CN1511241A Antistatic optical pellicle |
| 07/07/2004 | CN1510719A Mask and producing method, producing method for semiconductor device with this mask |
| 07/07/2004 | CN1156892C Exposure mask, its manufacturing method and making method of semiconductor devices using same |
| 07/06/2004 | US6760901 Trough adjusted optical proximity correction for dual damascene vias which takes into account the topography on a wafer created by prior wafer processing operations |
| 07/06/2004 | US6760892 Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor device |
| 07/06/2004 | US6760473 Optical proximity correction serif measurement technique |
| 07/06/2004 | US6759655 Inspection method, apparatus and system for circuit pattern |
| 07/06/2004 | US6759328 Masks and method for contact hole exposure |
| 07/06/2004 | US6759175 Laminating multilayer of peelable support, image recording layer, adhesive and ultraviolet sensitive material; image-wise exposure ; flood exposure and development |
| 07/06/2004 | US6759171 Alternating aperture phase shifting photomask with improved intensity balancing |
| 07/06/2004 | US6758912 Method of inhibiting contaminants using dilute acid rinse |
| 07/06/2004 | US6758669 Variable surface hot plate for improved bake uniformity of substrates |
| 07/06/2004 | US6758063 Photolithography method, photolithography mask blanks, and method of making |
| 07/01/2004 | WO2004055917A2 Manufacture of thin film transistors |
| 07/01/2004 | WO2004055585A1 Liquid crystal displays with post spacers, and their manufacture |
| 07/01/2004 | WO2004001797A3 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 07/01/2004 | WO2003102690A3 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography |
| 07/01/2004 | US20040128643 Method for communicating a measuring position of a structural element that is to be formed on a mask |
| 07/01/2004 | US20040128642 Method and apparatus for creating a phase-shifting mask for a photolithographic process |
| 07/01/2004 | US20040128118 Process window compliant corrections of design layout |
| 07/01/2004 | US20040126919 Crystallization apparatus and crystallization method |
| 07/01/2004 | US20040126675 Thermal generation of mask pattern |
| 07/01/2004 | US20040126673 Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes |
| 07/01/2004 | US20040126672 Data processing to design, manufacture, and/or inspect a mask to help print target pattern more accurately; integrated circuits, computers |
| 07/01/2004 | US20040126671 Structure and process for a pellicle membrane for 157 nanometer lithography |