| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/12/2004 | WO2004032204A3 Method of making an integrated circuit using a photomask having a dual antireflective coating |
| 08/12/2004 | WO2003081339A3 Patterning semiconductor layers using phase shifting and assist features |
| 08/12/2004 | US20040158809 Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus |
| 08/12/2004 | US20040157164 Method of manufacturing semiconductor integrated circuit devices |
| 08/12/2004 | US20040157138 Manufacturing method and apparatus of phase shift mask blank |
| 08/12/2004 | US20040157135 For the proximity effects in the imaging of patterns in a photolithography |
| 08/12/2004 | US20040157134 Simulation based PSM clear defect repair method and system |
| 08/12/2004 | US20040155346 poor quality photo resist patterns are prevented because the focus area is confined to an exposure region |
| 08/12/2004 | US20040155204 Mask and method for producing thereof and a semiconductor device using the same |
| 08/12/2004 | US20040154489 Chemical imaging of a lithographic printing plate |
| 08/12/2004 | DE19648063B4 Verfahren zum Herstellen einer Mikrolinse eines Halbleiterbauteils A method of manufacturing a microlens of a semiconductor device |
| 08/12/2004 | DE10235255B4 Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren Reflective mirror for lithographic exposure and production methods |
| 08/11/2004 | EP1445652A2 Removable pellicle frame for photolithographic reticle using magnetic force |
| 08/11/2004 | EP1444726A1 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 08/11/2004 | CN1520533A Ion-beam deposition process for mfg. binary photomask blanks |
| 08/11/2004 | CN1519955A Thin film transistor array panel, its mfg. method and mask for such panel |
| 08/11/2004 | CN1519890A Photomask group of forming multilayer interlconnection line and semiconductor device made by such photomask |
| 08/11/2004 | CN1519653A Photoetching mask, its making method and making appts. |
| 08/11/2004 | CN1519652A Mask for projection exposure, projection exposure appts. and used method |
| 08/11/2004 | CN1519647A Light mask, mfg. method of electronic device and mfg. method of light mask |
| 08/11/2004 | CN1161656C Attenuating embedded phase shift photomask blanks |
| 08/11/2004 | CN1161655C Highly transparent, color-pigmented high molecular weight material |
| 08/10/2004 | US6775815 Exposure method for correcting line width variation in a photomask |
| 08/10/2004 | US6773870 Comprises controllable transmittance photomask vertically divided into regions having both transparent and dark blocks |
| 08/10/2004 | US6773859 Process for making a flexographic printing plate and a photosensitive element for use in the process |
| 08/10/2004 | US6773854 Calibrating elasticity; determination deformation force; cutting pattern |
| 08/10/2004 | US6773853 Exposing a partial area of a resist film formed on a surface of a substrate to light of different intensities; developing the resist film exposed |
| 08/10/2004 | US6773503 Method of heat-treating fluoride crystal, method of producing optical part, and optical apparatus |
| 08/10/2004 | CA2281787C Phase mask with spatially variable diffraction efficiency |
| 08/05/2004 | WO2004066370A1 Mask, method for manufacturing mask and method for manufacturing semiconductor device |
| 08/05/2004 | WO2004066358A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 08/05/2004 | WO2004066027A2 Electron beam processing for mask repair |
| 08/05/2004 | WO2004066026A2 Imageable elements and compositions for imaging by means of uv irradiation |
| 08/05/2004 | WO2004065635A2 Laser exposure of photosensitive masks for dna microarray fabrication |
| 08/05/2004 | WO2004065287A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 08/05/2004 | WO2004051370A8 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 08/05/2004 | US20040151993 Patterning light-shielding film; mounting pellicle on mask substrate; inspection; repairing defects |
| 08/05/2004 | US20040151992 Photomask, and method and apparatus for producing the same |
| 08/05/2004 | US20040151991 Photolithography mask repair |
| 08/05/2004 | US20040151990 Photomask assembly incorporating a porous frame and method for making it |
| 08/05/2004 | US20040151989 Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask |
| 08/05/2004 | US20040151988 EUV mask blank defect mitigation |
| 08/05/2004 | US20040150809 [mask for fabricating a contact and contact process thereof] |
| 08/05/2004 | US20040150804 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 08/05/2004 | US20040150684 Method for printing an image from a halftone binary bitmap using multiple exposures |
| 08/05/2004 | US20040149935 High throughput, low cost; exposing arbitrary pattern with constant and periodical arrangement of wirings and standard cells of semiconductor |
| 08/05/2004 | DE10302342A1 Production of substrate used in the production of mask or optical component comprises preparing a base layer, applying a first covering layer on the base layer, and post-treating the covering layer |
| 08/04/2004 | EP1443747A2 A method for printing an image from a halftone binary bitmap using multiple exposure values |
| 08/04/2004 | EP1443361A2 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 08/04/2004 | CN1517799A Perfluoropolyether liquid film and method for cleaning mask using perfluoropolyether liquid |
| 08/04/2004 | CN1517792A Device for removing protective film of optical mask |
| 08/04/2004 | CN1160762C Electronic beam exposure mask, exposure method and equipment and method for making semiconductor device |
| 08/03/2004 | US6771301 Image setting apparatus having drum simulating supports |
| 08/03/2004 | US6770425 Positive photoresists; exposure to actinic radiation; development; bright screens; controlled distribution of light |
| 08/03/2004 | US6770408 X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. |
| 08/03/2004 | US6770404 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 08/03/2004 | US6770403 Mask for a photolithography process and method of fabricating the same |
| 08/03/2004 | US6770402 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 07/29/2004 | WO2004064126A1 Charge particle exposure method, complementarily divided mask used for it, and semiconductor device produced by using the method |
| 07/29/2004 | WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/29/2004 | WO2004011258A3 Method of forming and repairing a lithographic template having a gap defect |
| 07/29/2004 | WO2004008244A3 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 07/29/2004 | US20040148584 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method |
| 07/29/2004 | US20040147125 Stencil mask and its manufacturing method |
| 07/29/2004 | US20040146808 an assembly of lithographic sub-masks together forming a fictitious design mask for configuring a device pattern in a layer of a substrate |
| 07/29/2004 | US20040146790 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate |
| 07/29/2004 | US20040146789 based on discovery that the flatness of the mask substrate was degraded after chucked depending on the surface shape of the mask substrate, and found that such degraded flatness was a major cause to lower the product yield |
| 07/29/2004 | US20040146788 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 07/29/2004 | US20040146787 even small defects in a light-influencing structure can be reliably repaired; Since no carbon film is applied to the defect, a defect repaired according to the invention is not impaired even during a cleaning of the mask |
| 07/29/2004 | US20040146139 X-ray mask and method for making |
| 07/29/2004 | US20040145716 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 07/29/2004 | US20040145712 Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby |
| 07/29/2004 | US20040144399 Processing of semiconductor components with dense processing fluids and ultrasonic energy |
| 07/29/2004 | DE4018135B4 Verfahren und Vorrichtung zur Reparatur von Fehlern in Emulsionsmasken Method and apparatus for repairing errors in emulsion masks |
| 07/29/2004 | DE19726835B4 Photomaske für einen Prozeßspielraumtest und ein Verfahren zum Durchführen eines Prozeßspielraumtests unter Verwendung dieser Maske Photomask for a process margin test and a method for performing a process margin test using this mask |
| 07/28/2004 | CN1516827A Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making |
| 07/28/2004 | CN1516826A Ion-beam deposition process for mfg. attenuated phase shift photomask blanks |
| 07/28/2004 | CN1516236A Semiconductor integrated circuit device and mfg. method of multichip module |
| 07/28/2004 | CN1515960A Photomask containing non-linear optical material layer |
| 07/27/2004 | US6768958 Automatic calibration of a masking process simulator |
| 07/27/2004 | US6767771 Formation process of quantum dots or wires |
| 07/27/2004 | US6767691 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 07/27/2004 | US6767682 Method for producing quadratic contact holes utilizing side lobe formation |
| 07/27/2004 | US6767679 Correcting the polygon feature pattern with an optical proximity correction method |
| 07/27/2004 | US6767675 Rendering, developing, and etching for superposition of masking patterns |
| 07/27/2004 | US6767674 Forming semiconductors; photoresist patterns; smooth edges |
| 07/27/2004 | US6767673 Creating a layer of protective semiconductor material over the surface of pattern of phase shifter material provided over surface of faulty element |
| 07/27/2004 | US6767672 Method for forming a phase-shifting mask for semiconductor device manufacture |
| 07/22/2004 | WO2004061766A2 Digital prepress masking tools |
| 07/22/2004 | WO2004060793A1 Multilayer structure and method for manufacturing same, functional structure and method for manufacturing same, and mask for electron beam exposure and method for manufacturing same |
| 07/22/2004 | US20040143805 Device for determining the mask version utilized for each metal layer of an integrated circuit |
| 07/22/2004 | US20040142286 Use of partially fluotinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 07/22/2004 | US20040142285 reacting substrate having exposed amino groups with linking agent having a carboxy group and protected amino groups, photolithography to expose amino groups, then reacting with carboxylated nanotubes using a coupler; high conductivity layer |
| 07/22/2004 | US20040142283 Fabrication method of semiconductor integrated circuit device |
| 07/22/2004 | US20040142281 layer of hydrogen silsesquioxane on top of carbon layer; electrons passing through the resist layer conducted away through the carbon layer to prevent buildup of electrons which repel electrons from the e-beam resulting in a less focused e-beam |
| 07/22/2004 | US20040142253 Mask set for compensating a misalignment between patterns and method of compensating a misalignment between patterns using the same |
| 07/22/2004 | US20040142251 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 07/22/2004 | US20040142250 EUV lithography reticles fabricated without the use of a patterned absorber |
| 07/22/2004 | US20040142249 making integrated circuits using absorbent transmission masks that can be repaired |
| 07/22/2004 | US20040140418 System and method for lithography process monitoring and control |