| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 09/02/2004 | US20040170921 Electron beam recording substrate |
| 09/02/2004 | US20040170907 produces a phase shift of the transmitted light formed with an optically translucent film made of metal, silicon, nitrogen and oxygen, and an etch stop layer is added to improve the etch selectivity of the phase shifting layer |
| 09/02/2004 | US20040170906 photoresists reduce subwavelength/proximity effect distortions; for production of semiconductors |
| 09/02/2004 | US20040170905 Binary OPC for assist feature layout optimization |
| 09/02/2004 | US20040169834 Optical device for use with a lithography method |
| 09/02/2004 | US20040169008 Forming a substrate with windows and filling the windows multiple times, forming a support membrane over the substrate, and a mask layer is then formed and patterned |
| 09/02/2004 | US20040168765 Transport apparatus |
| 09/02/2004 | DE10304674A1 Substrate illumination method with a structural pattern that compensates for the optical proximity effect, for use in semiconductor manufacture wherein serif lengths are reduced by a specified amount |
| 09/02/2004 | CA2515793A1 Optical lithography using both photomask surfaces |
| 09/01/2004 | EP1451641A1 Method and apparatus for image formation |
| 09/01/2004 | CN2638107Y 2.5 inchosX5 inches UT1 times photoetching printing plate |
| 09/01/2004 | CN1525245A Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 08/31/2004 | US6785879 Model-based data conversion |
| 08/31/2004 | US6785878 Correcting a mask pattern using multiple correction grids |
| 08/31/2004 | US6785874 Layout verification method, program thereof, and layout verification apparatus |
| 08/31/2004 | US6785871 Automatic recognition of an optically periodic structure in an integrated circuit design |
| 08/31/2004 | US6784005 Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts |
| 08/31/2004 | US6783904 Lithography correction method and device |
| 08/31/2004 | US6783898 Projection lithography photomask blanks, preforms and method of making |
| 08/31/2004 | US6783634 Manufacturing method and apparatus of phase shift mask blank |
| 08/31/2004 | US6782716 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 08/26/2004 | WO2004072735A1 Mask correcting method |
| 08/26/2004 | WO2004072734A2 Transmission mask with differential attenuation to improve iso-dense proximity |
| 08/26/2004 | US20040168147 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 08/26/2004 | US20040168146 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 08/26/2004 | US20040166422 Mask and its manufacturing method, exposure, and device fabrication method |
| 08/26/2004 | US20040166421 a membrane portion supported by a substrate and having on one side a shielding membrane that has a microaperture; relieves stress that is generated in the border between the membrane portion and the substrate when the membrane portion is sagged. |
| 08/26/2004 | US20040166420 Substrate for the micro-lithography and process of manufacturing thereof |
| 08/26/2004 | US20040166419 Resolution and process window improvement using lift-off |
| 08/26/2004 | US20040166418 Adjusting line width deviations |
| 08/26/2004 | US20040165763 Method for inspection of periodic grating structures on lithography masks |
| 08/26/2004 | US20040165762 System and method for detecting and reporting fabrication defects using a multi-variant image analysis |
| 08/26/2004 | US20040165194 Method and apparatus for characterization of optical systems |
| 08/26/2004 | US20040165170 Pattern generator |
| 08/26/2004 | US20040165165 Short wavelength metrology imaging system |
| 08/26/2004 | DE10337262A1 Fotomaske, Verfahren zum Herstellen einer elektronischen Vorrichtung, Verfahren zum Herstellen einer Fotomaske Photomask, method for manufacturing an electronic device, method of manufacturing a photomask |
| 08/25/2004 | EP1450206A2 Mask and its manufacturing method, exposure, and device fabrication method |
| 08/25/2004 | EP1450182A2 Substrate for UV-lithography and fabrication process therefor |
| 08/25/2004 | CN1524202A Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 08/25/2004 | CN1524199A Design and layout of phase shifting photolithographic masks |
| 08/25/2004 | CN1523659A Multilayer semiconductor integrated circuit, light shield used therefor and manufacturing method thereof |
| 08/25/2004 | CN1523639A Photomask, pattern formation method using photomask and mask data creation method |
| 08/25/2004 | CN1523446A Mask graphics producing method and mask graphics producing device |
| 08/25/2004 | CN1523445A Light shield for contacting window making process and making process thereof |
| 08/25/2004 | CN1523444A Buttgereit Ute |
| 08/25/2004 | CN1523443A K fraction fractal masking method for preparing material chips |
| 08/24/2004 | US6782526 Photomask designing method, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element |
| 08/24/2004 | US6782525 Wafer process critical dimension, alignment, and registration analysis simulation tool |
| 08/24/2004 | US6781673 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 08/24/2004 | US6780781 Method for manufacturing an electronic device |
| 08/24/2004 | US6780659 Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device |
| 08/24/2004 | US6780570 Method of fabricating a suspended micro-structure with a sloped support |
| 08/24/2004 | US6780568 Increasing resolution and depth of focus; chromeless |
| 08/24/2004 | US6780551 Charged particle processing for forming pattern boundaries at a uniform thickness |
| 08/24/2004 | US6780548 Decreased diffraction |
| 08/24/2004 | US6780547 Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask |
| 08/19/2004 | WO2004070809A1 Method for manufacturing display |
| 08/19/2004 | WO2004070799A1 Mask processing device, mask processing method, program, and mask |
| 08/19/2004 | WO2004070472A1 Photomask blank, photomask, and pattern transfer method using photomask |
| 08/19/2004 | US20040161864 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040161707 Photomask and pattern forming method employing the same |
| 08/19/2004 | US20040161679 Loading into layout processing software the GDS data for two layers that define a transistor; generating a phase mask; inputting gate block data that includes assigned phase areas and polygate areas; generating a trim mask; providing a modified GDS |
| 08/19/2004 | US20040161678 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 08/19/2004 | US20040161677 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 08/19/2004 | US20040161676 For lateral growth from a crystal nucleus and produce a crystallized semiconductor film with a large particle size |
| 08/19/2004 | US20040161675 Phase shifting lithographic process |
| 08/19/2004 | US20040161674 Graytone mask and method thereof |
| 08/19/2004 | US20040160628 Print inspection apparatus, printing system, method of inspecting print data and program |
| 08/19/2004 | US20040160609 Surface inspecting apparatus |
| 08/19/2004 | US20040159914 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159890 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159838 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 08/19/2004 | US20040159636 Data path for high performance pattern generator |
| 08/19/2004 | US20040159538 binary photo mask blank, a phase shifting photo mask blank or an extreme ultra violet photo mask blank having small structures; sputtering a target in a vacuum chamber by irradiating with a particle beam to deposit a first layer; high stability |
| 08/19/2004 | DE10302111A1 Bebilderbare Elemente und Zusammensetzungen für Bebilderung mittels UV-Bestrahlung Imageable elements and compositions for imaging by means of UV irradiation |
| 08/19/2004 | DE10292343T5 Maske, Verfahren zur Herstellung der Maske und Verfahren zur Herstellung eines Halbleiterbauelements Mask, method for producing the mask and method for manufacturing a semiconductor device |
| 08/19/2004 | DE10258423A1 Verfahren und Maske zur Charakterisierung eines Linsensystems Process and mask for the characterization of a lens system |
| 08/18/2004 | EP1447711A2 Photomask, pattern formation method using photomask and mask data creation method |
| 08/18/2004 | EP1446813A2 Reflective x-ray microscope and inspection system for examining objects with wavelengths of= 100nm |
| 08/18/2004 | EP1446283A2 Providing an image on an organic product |
| 08/18/2004 | EP0927381B1 Phase shifting circuit manufacturing method and device |
| 08/18/2004 | CN1521566A Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus |
| 08/18/2004 | CN1162899C Monocrystalline silicon wafer crystal orientation calibrating method |
| 08/18/2004 | CN1162754C Pattern forming material, pattern forming method, and manufacture method of mask for exposure |
| 08/17/2004 | US6779171 Field correction of overlay error |
| 08/17/2004 | US6779167 Automated wiring pattern layout method |
| 08/17/2004 | US6778733 Lithographic fabrication of phase mask for fiber Bragg gratings |
| 08/17/2004 | US6778695 Design-based reticle defect prioritization |
| 08/17/2004 | US6778285 Automatic in situ pellicle height measurement system |
| 08/17/2004 | US6777168 Multiple photolithographic exposures with different clear patterns |
| 08/17/2004 | US6777167 Comprises sterol layer deposited by evaporation, langmuir-blodgett deposition, spin coating and and/or dip coating |
| 08/17/2004 | US6777146 Adjusting line width deviations |
| 08/17/2004 | US6777145 In-line focus monitor structure and method using top-down SEM |
| 08/17/2004 | US6777141 Includes identifying a pattern, and automatically mapping the phase shifting regions for implementation of such features. |
| 08/17/2004 | US6777140 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask |
| 08/17/2004 | US6777138 Improved agreement between design layout and actual printed feature |
| 08/17/2004 | US6777137 Enabling mask defect repair without impairing effectiveness of extreme ultraviolet lithography (euvl) component |
| 08/12/2004 | WO2004068565A1 Mask for charged particle exposure |
| 08/12/2004 | WO2004068241A1 Exposing mask and production metod therefor and exposing method |
| 08/12/2004 | WO2004053592A8 Reticle manipulations |