| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 09/23/2004 | US20040185348 optical lithography; radiation transparent; semiconductors/integrated circuits |
| 09/23/2004 | DE102004004854A1 Fotomaske sowie Verfahren und Vorrichtung zu ihrer Herstellung Photomask and method and apparatus for the production thereof |
| 09/22/2004 | EP1460477A1 Digitally imageable, light-sensitive flexographic printing element and process for fabricating newspaper flexographic printing plates |
| 09/22/2004 | EP1459131A1 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 09/22/2004 | CN1531019A Producing method for X-ray mask and semiconductor device |
| 09/22/2004 | CN1530748A Embedded etching stopping layer for phase shift mask |
| 09/22/2004 | CN1530747A Device manufacturing method and computer programm |
| 09/22/2004 | CN1530746A Design change-over method and apparatus based on model by doublet illumination |
| 09/22/2004 | CN1530744A Method for preventing industrial photoresisting residual |
| 09/22/2004 | CN1530743A Light mask and diffuse-reflecting board |
| 09/21/2004 | US6795961 Priority coloring for VLSI designs |
| 09/21/2004 | US6795955 Method and apparatus for identifying an identical cell in an IC layout with an existing solution |
| 09/21/2004 | US6795614 Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber |
| 09/21/2004 | US6795170 Structure for attaching a pellicle to a photo-mask |
| 09/21/2004 | US6794207 Method of manufacturing integrated circuit |
| 09/21/2004 | US6794118 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
| 09/21/2004 | US6794107 Thermal generation of a mask for flexography |
| 09/21/2004 | US6794096 Phase shifting mask topography effect correction based on near-field image properties |
| 09/21/2004 | US6794095 Method of fabricating a microstructure and photolithography trimming mask |
| 09/16/2004 | WO2004079780A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 09/16/2004 | WO2004079779A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 09/16/2004 | WO2004079632A2 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 09/16/2004 | WO2003087945A3 Interferometric measuring device and projection illumination installation comprising one such measuring device |
| 09/16/2004 | US20040181770 Method and apparatus for controlling rippling during optical proximity correction |
| 09/16/2004 | US20040181767 By forming clip segments along the intersections and by generating longer segments from short clip segments, very small corrections that violate a minimum correction threshold may be avoided |
| 09/16/2004 | US20040181728 Methods and systems for estimating reticle bias states |
| 09/16/2004 | US20040180548 Dual trench alternating phase shift mask fabrication |
| 09/16/2004 | US20040180273 Methods of forming aligned structures with radiation-sensitive material |
| 09/16/2004 | US20040180272 Methods of printing structures |
| 09/16/2004 | US20040180271 Electrostatic pellicle system for a mask |
| 09/16/2004 | US20040180270 Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container |
| 09/16/2004 | US20040180268 Method of manufacturing photomask |
| 09/16/2004 | US20040180267 binary photomask may include glass and chrome features which form a pattern |
| 09/16/2004 | US20040179726 Process for detecting defects in photomasks |
| 09/16/2004 | US20040178170 Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure |
| 09/16/2004 | DE10310136A1 Set of masks for projection of structure patterns on each mask to photosensitive layer on semiconductor wafer as trim or correction mask in lithographic process in manufacture of integrated circuits |
| 09/16/2004 | DE10260645B3 Compensation frame for holding substrate for semiconducting manufacture has polygonal inner profile for holding substrate, area of upper main surface of frame with different widths at different points |
| 09/16/2004 | DE10143516B4 Verfahren zur Herstellung einer EUV-Reflexionsmaske A process for producing an EUV reflection mask |
| 09/15/2004 | EP1457979A2 Electron beam recording substrate |
| 09/15/2004 | EP1457818A2 Photosensitive resin laminate |
| 09/15/2004 | EP1240556B1 Photolithography method, photolithography mask blanks, and method of making |
| 09/15/2004 | CN1166984C Method and apparatus for production of structure by focused laser radiation on photosensitively coated substrate |
| 09/14/2004 | US6792593 Pattern correction method, apparatus, and program |
| 09/14/2004 | US6792592 Considering mask writer properties during the optical proximity correction process |
| 09/14/2004 | US6792591 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
| 09/14/2004 | US6792590 Eliminating unnecessary evaluation points |
| 09/14/2004 | US6792029 Method of suppressing energy spikes of a partially-coherent beam |
| 09/14/2004 | US6791667 Illumination device for projection system and method for fabricating |
| 09/14/2004 | US6791145 Semiconductor device formed by utilizing deformed pattern |
| 09/14/2004 | US6791096 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 09/14/2004 | US6791082 Process conditions change monitoring systems that use electron beams, and related monitoring methods |
| 09/14/2004 | US6790598 Methods of patterning resists and structures including the patterned resists |
| 09/14/2004 | US6790564 Photomask and manufacturing method of an electronic device therewith |
| 09/14/2004 | US6790292 Reticle cleaning without damaging pellicle |
| 09/10/2004 | WO2004077484A1 Plasma display panel producing method, and plasma display panel |
| 09/10/2004 | WO2004077163A2 Method for creating a pattern on a wafer using a single photomask |
| 09/10/2004 | WO2004077162A1 Multiple exposure method for circuit performance improvement |
| 09/10/2004 | WO2004077156A1 Photomask and its production method, and pattern forming method |
| 09/10/2004 | WO2004077155A1 Method for fabricating photomask and semiconductor device |
| 09/10/2004 | WO2004031856A3 Photomask assembly incorporating a porous frame and method for making it |
| 09/09/2004 | US20040175962 Fusion attachment of rigid pellicles and/or frames |
| 09/09/2004 | US20040175658 Embossing tool having an arbitrary three-dimensional microstructure |
| 09/09/2004 | US20040175635 Alternating phase shift mask design with optimized phase shapes |
| 09/09/2004 | US20040175634 Design and layout of phase shifting photolithographic masks |
| 09/09/2004 | US20040175633 Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect |
| 09/09/2004 | US20040175632 Fusion attachment of rigid pellicles and/or frames |
| 09/09/2004 | US20040175631 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
| 09/09/2004 | US20040175630 overlying an absorber stack that overlies a reflective substrate; the multilayer antireflective coating has layers of nitrogen, oxygen and nitrogen combined with the predetermined metal of the upper layer of the absorber stack; making semiconductors at lower wavelengths |
| 09/09/2004 | US20040175629 Stack overcoating semiconductor substrate; ruthenium or chromium layer; patterning using optical radiation |
| 09/09/2004 | US20040174624 Reflecting device for electromagnetic waves |
| 09/09/2004 | US20040174587 Antireflection coating for ultraviolet light at large angels of incidence |
| 09/09/2004 | US20040173871 Gray scale x-ray mask |
| 09/09/2004 | US20040173580 Apparatus for non-contact cleaning of a surface |
| 09/09/2004 | US20040173579 Apparatus and method for non-contact cleaning of a surface |
| 09/09/2004 | DE10305618A1 Method for exposing photosensitive lacquer on semiconductor wafer to form structure pattern in lacquer in manufacture of integrated circuits, forming layer on wafer |
| 09/08/2004 | EP1455365A2 Reflective X-ray microscope and inspection system for examining objects with wavelengths 100nm |
| 09/08/2004 | EP1455007A2 Method for depositing and patterning carbon nanotubes using chemical self-assembly process |
| 09/08/2004 | EP1454194A1 Method and apparatus for patterning a workpiece |
| 09/08/2004 | EP1454193A2 Phase shifting mask |
| 09/08/2004 | EP1454192A2 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 09/08/2004 | EP1454191A1 Method of enhancing phase shift masks |
| 09/08/2004 | EP1454190A1 Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 09/08/2004 | EP1454112A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/08/2004 | CN1527134A Manufacture of ture 3D microelectronic mechanical system based on composite imprinting photoetched material |
| 09/08/2004 | CN1165968C Method for mfg. semiconductor crystal plate by making several zone masks having various scatter abilites |
| 09/07/2004 | US6789250 Pattern data generation system, method and program for pattern data generation, reticle fabricating method, and semiconductor device manufacturing method using the pattern data |
| 09/07/2004 | US6788400 Method and apparatus for detecting aberrations in an optical system |
| 09/07/2004 | US6788388 Illumination device for projection system and method for fabricating |
| 09/07/2004 | US6787785 Able to prevent a drop in pattern alignment accuracy due to the internal stress of the membrane and able to align patterns including complementary patterns at a high accuracy |
| 09/07/2004 | US6787459 Method for fabricating a semiconductor device |
| 09/07/2004 | US6787274 Mask having dummy features formed at peripheries of isolated edges of features corresponding to each circuit element of an integrated circuit to correct the optical proximity effect (ope) |
| 09/07/2004 | US6787272 Assist feature for random, isolated, semi-dense, and other non-dense contacts |
| 09/07/2004 | US6787271 Design and layout of phase shifting photolithographic masks |
| 09/07/2004 | US6787270 Photo mask for patterning a lightning rod |
| 09/02/2004 | WO2004074765A1 Method of forming ultrasmall structures and apparatus therefor |
| 09/02/2004 | WO2004073379A2 Optical lithography using both photomask surfaces |
| 09/02/2004 | WO2004055917A3 Manufacture of thin film transistors |
| 09/02/2004 | WO2004040374A3 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 09/02/2004 | US20040172611 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 09/02/2004 | US20040172610 Pitch-based subresolution assist feature design |