| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 10/07/2004 | US20040199895 Method for automatic mask tool translation |
| 10/07/2004 | US20040199349 Automatic calibration of a masking process simulator |
| 10/07/2004 | US20040198047 Method for fabricating a photomask for an integrated circuit and corresponding photomask |
| 10/07/2004 | US20040197713 Radiation sensitivity; heat treatment ; adjustable spacer |
| 10/07/2004 | US20040197706 Photosensitive resin laminate |
| 10/07/2004 | US20040197680 an opaque-field phase shift mask and the second mask is a single phase structure mask, a phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field |
| 10/07/2004 | US20040197679 For use in the microfabrication of semiconductor integrated circuits |
| 10/07/2004 | US20040197677 Trimming or correction mask for lithography |
| 10/07/2004 | US20040197676 Method for forming an opening in a light-absorbing layer on a mask |
| 10/07/2004 | US20040197675 Stencil mask with charge-up prevention and method of manufacturing the same |
| 10/07/2004 | US20040197674 Chromeless phase shift mask |
| 10/07/2004 | US20040197673 Photo reticles using channel assist features |
| 10/07/2004 | US20040197671 A phase shift mask |
| 10/07/2004 | US20040196579 Method of producing a reflective mask and method of producing a semiconductor device |
| 10/07/2004 | US20040196447 Photomask, flare measuring mechanism, flare measuring method, and exposing method |
| 10/07/2004 | US20040196446 Exposure method and apparatus |
| 10/07/2004 | US20040194556 Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array |
| 10/07/2004 | DE10338048A1 Phasenverschiebungsmaske, Verfahren zumBilden eines Musters mit einer Phasenverschiebungsmaske, Verfahren zum Herstellen einer elektronischen Vorrichtung Phase shift mask method zumBilden a pattern having a phase shift mask method for manufacturing an electronic device |
| 10/07/2004 | DE10312628A1 Verfahren und Vorrichtung zum Benetzen eines Substrats mit einer Flüssigkeit Method and apparatus for wetting a substrate with a liquid |
| 10/07/2004 | DE10310137A1 Satz von wenigstens zwei Masken zur Projektion von jeweils auf den Masken gebildeten und aufeinander abgestimmten Strukturmustern und Verfahren zur Herstellung der Masken Set of at least two masks for the projection of the respectively formed on the masks and concerted structure patterns and methods for making the masks |
| 10/07/2004 | DE10261323B3 Vorrichtung und Verfahren zur Bestimmung struktureller und/oder geometrischer Eigenschaften eines Maskenblanks Apparatus and method for determining structural and / or geometric properties of a mask blanks |
| 10/06/2004 | EP1465017A2 Semiconductor wafer and exposure mask with alignment marks, mark detecting method and method of exposure |
| 10/06/2004 | EP1465016A2 Illumination source and photomask optimization |
| 10/06/2004 | EP1465009A2 Photo reticles using channel assist features |
| 10/06/2004 | EP1464993A1 Optical device with improved mechanical stability for the extreme ultraviolet and lithography mask incorporating the device |
| 10/06/2004 | CN1534730A Method of forming and testing phase shift mask |
| 10/06/2004 | CN1534383A Deposited mask of display device and its manufacturing method |
| 10/06/2004 | CN1534382A Dismountable stencil plate window and supporting frame using magnetic force |
| 10/06/2004 | CN1534380A Method and device of transferring optical enclosure picture and method of manufacturing optical enclosure |
| 10/06/2004 | CN1534366A Defect correcting method of gray mask |
| 10/06/2004 | CN1534365A Defect examining method of gray mask and mfg. method thereof |
| 10/05/2004 | US6801824 Substrate selector |
| 10/05/2004 | US6801823 Photomask supply system with photomask production period shortened |
| 10/05/2004 | US6801358 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 10/05/2004 | US6801357 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 10/05/2004 | US6801302 Plate registering system and method of operation |
| 10/05/2004 | US6801295 Heterogeneity radiant energy flux; adjustable plate with apertures; semiconductor masking |
| 10/05/2004 | US6800540 Method for crystallizing silicon |
| 10/05/2004 | US6800428 Generating enlargement pattern; conveying pattern edges; protective coatings; exposure, development |
| 10/05/2004 | US6800421 Pattern in chip areas of a photomask is transferred onto an internal area of a semiconductor wafer as ship areas including defects among the chip areas of the photomask are shielded with a light shielding body; shortens time |
| 10/05/2004 | US6800407 Lithographic structuring of semiconductors |
| 10/05/2004 | US6800406 Method of generating optical assist features for two-mask exposure lithography |
| 10/05/2004 | US6800405 Irradiating the substrate surface with a modifiable layer having a photocatalyst, with a gap of light shielding; color filters; high precise pattern, free of photocatalyst in pattern layer, nondeforming |
| 10/05/2004 | US6800404 Multi-layer strips and recesses located between the multi-layer strips. |
| 10/05/2004 | US6800403 Techniques to characterize iso-dense effects for microdevice manufacture |
| 10/05/2004 | US6800402 Phase-shifting mask and method of forming pattern using the same |
| 10/05/2004 | US6800401 Method for phase shift mask design, fabrication, and use |
| 10/05/2004 | US6800214 Computerized adjustment of the thickness of photoresists; semiconductors; integrated circuits |
| 09/30/2004 | WO2004083961A1 Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank |
| 09/30/2004 | WO2004083960A2 Alternating aperture phase shift photomask having light absorption layer |
| 09/30/2004 | WO2004083958A2 Photoactive component comprising organic layers |
| 09/30/2004 | WO2004082814A2 Method and device for wetting a substrate with a liquid |
| 09/30/2004 | US20040194050 Optical proximity correction method |
| 09/30/2004 | US20040194039 Apparatus and method for determining physical properties of a mask blank |
| 09/30/2004 | US20040192171 Method of producing a glass substrate for a mask blank and method of producing a mask blank |
| 09/30/2004 | US20040192063 Method of producing a glass substrate for a mask blank and method of producing a mask blank |
| 09/30/2004 | US20040191651 Sputtering; continuous forming thin films on transparent substrate; forming pattern by sputtering |
| 09/30/2004 | US20040191650 Phase shift masking for complex patterns with proximity adjustments |
| 09/30/2004 | US20040191648 Applying optical adjustment to first pattern; dividing into zones; sampling; determination edges; calibration |
| 09/30/2004 | US20040191646 Sputtering layers of phase shifting mask on substrates; concurrent discharging various targets; reducing defects |
| 09/30/2004 | US20040191644 Mask pattern generating method and mask pattern generating apparatus |
| 09/30/2004 | US20040191643 photoresists/photomasks; for producing a halftone gray level dosage distribution after illumination |
| 09/30/2004 | US20040191642 Multiple stepped aperture repair of transparent photomask substrates |
| 09/30/2004 | US20040191641 Forming image; applying paste to substrate; irradiation |
| 09/30/2004 | US20040191640 Forming pattern on substrate; heat sensitive elements; imaging, development ; adhesion to surfaces; masking; printing plates |
| 09/30/2004 | US20040191639 Surface of pattern having organosilicon release agents |
| 09/30/2004 | US20040191638 Phase shifting mask shapes; lithographic shortening; calibration; shape design ; integrated circuits |
| 09/30/2004 | US20040188384 Method for making a metal forming structure |
| 09/30/2004 | US20040188383 Non-resolving mask tiling method for flare reduction |
| 09/30/2004 | US20040188382 Process to form fine features using photolithography and plasma etching |
| 09/30/2004 | US20040188243 Apparatus for enhancing the lifetime of stencil masks |
| 09/30/2004 | US20040187719 Photosensitive, flexo printing element, and method for the production of newspaper flexo printing plates |
| 09/30/2004 | DE4042695B4 Emulsion mask defect repair |
| 09/30/2004 | DE102004014046A1 Photoaktives Bauelement mit organischen Schichten A photoactive device with organic layers |
| 09/29/2004 | EP1462872A2 Image setting apparatus having drum simulating supports |
| 09/29/2004 | CN1532891A Photomask, light spot detector and detecting method and exposur method |
| 09/29/2004 | CN1532631A Base board for optical mask, optical mask blank and optical mask |
| 09/29/2004 | CN1169204C Design method, masks integrated circuit and its producing method and storage medium |
| 09/28/2004 | US6799313 Space classification for resolution enhancement techniques |
| 09/28/2004 | US6798505 Method and apparatus for article inspection including speckle reduction |
| 09/28/2004 | US6797638 Plasma-etching process for molybdenum silicon nitride layers on half-tone phase masks based on gas mixtures containing monofluoromethane and oxygen |
| 09/28/2004 | US6797635 Fabrication method for lines of semiconductor device |
| 09/28/2004 | US6797527 Manufacturing method of a phase shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device |
| 09/28/2004 | US6797441 Assigning different phases to selected cuts on a complementary mask to clear phase conflicts generated by a phase shifting mask during an optical lithography process used in fabricating a semiconductor chip |
| 09/28/2004 | US6797440 First phase-shifting regions phase shift the light traveling through them 180 degrees relative to the light traveling through the rims, thereby increasing the contrast of the light traveling through the rim phase shifting mask |
| 09/28/2004 | US6797439 Anti-reflective coating, the substrate, the patterned anti-reflective layer, and the patterned absorber layer arranged in that order |
| 09/28/2004 | US6797438 Method and enhancing clear field phase shift masks with border around edges of phase regions |
| 09/28/2004 | US6797368 Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure |
| 09/28/2004 | US6796235 Applying imagewise an insolubilizing chemical to the coating for imaging a printing plate having a coating comprising diazo compounds |
| 09/23/2004 | WO2004081258A2 Apparatus and method for non-contact cleaning of a surface |
| 09/23/2004 | WO2004072734A3 Transmission mask with differential attenuation to improve iso-dense proximity |
| 09/23/2004 | WO2004063814A3 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 09/23/2004 | WO2004031867A3 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 09/23/2004 | WO2004027519A3 Dummy patterns for reducing proximity effects and method of using same |
| 09/23/2004 | US20040185682 Reticle tracking and cleaning |
| 09/23/2004 | US20040185644 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 09/23/2004 | US20040185381 exposure light flux is transmitted and inverted through the shifter edge region contacted with the border of the opening region; destructive interference between exposure light fluxes improves resolution; microminiaturization, increased integration; photolithography |
| 09/23/2004 | US20040185351 Design and layout of phase shifting photolithographic masks |
| 09/23/2004 | US20040185350 A thin layer material combined with a radiation-opaque layer material with different etch selectivity facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask; accuracy |
| 09/23/2004 | US20040185349 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |