| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/28/2004 | WO2004093171A1 Pattern forming apparatus and pattern forming method |
| 10/28/2004 | WO2004092836A1 Fabrication of nanostructures |
| 10/28/2004 | WO2004092829A2 Masking arrangement and method for producing integrated circuit arrangements |
| 10/28/2004 | US20040216065 Convergence technique for model-based optical and process correction |
| 10/28/2004 | US20040214096 Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns |
| 10/28/2004 | US20040214095 Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device |
| 10/28/2004 | US20040214094 Photomasks including shadowing elements therein and related methods and systems |
| 10/28/2004 | US20040212796 Method and mark for metrology of phase errors on phase shift masks |
| 10/28/2004 | US20040212793 Projection exposure apparatus with line width calculator controlled diaphragm unit |
| 10/28/2004 | DE10316713A1 Production of photomasks used in the production of electronic devices comprises structuring a chromium absorber layer applied on a quartz substrate by etching regions not covered by a photolacquer mask using plasma etching |
| 10/28/2004 | DE10313277A1 Photoresist outputting device for microlithography, has homogenizing device in photoresist flow between filter and outlet opening |
| 10/27/2004 | EP1471386A1 Lithographic processing method and device manufactured thereby |
| 10/27/2004 | EP1471385A1 Arrangement for inspecting objects, in particular for masks in microlithography |
| 10/27/2004 | CN1541409A Metal pattern formation |
| 10/27/2004 | CN1540737A Substrate retaining tool, mfg. method of electronic instrument, and mfg. method of light mask |
| 10/27/2004 | CN1540445A Lighographic processing method and device made therefrom |
| 10/27/2004 | CN1173234C Pattern generator with EUV |
| 10/27/2004 | CN1173230C Optical lithography beyond conventional resolution limits |
| 10/26/2004 | US6810104 X-ray mask and method for making |
| 10/26/2004 | US6808850 Integrated circuit |
| 10/21/2004 | WO2004090635A1 Method of producing photomask and photomask blank |
| 10/21/2004 | WO2004089836A1 Silica glass containing tio2 and process for its production |
| 10/21/2004 | WO2004079632A3 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 10/21/2004 | WO2004049063A3 Photomask and method for creating a protective layer on the same |
| 10/21/2004 | WO2004021081A3 Method for the production of a phase mask |
| 10/21/2004 | WO2003102690B1 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography |
| 10/21/2004 | US20040210862 Automated wiring pattern layout method |
| 10/21/2004 | US20040210423 Complementary division condition determining method and program and complementary division method |
| 10/21/2004 | US20040209477 Methods for substrate orientation |
| 10/21/2004 | US20040209415 Semiconductor device employing a method for forming a pattern using a crystal structure of a crystalline material |
| 10/21/2004 | US20040209193 better exposure profiles for the resulting ICs and improved chip yield and increased throughput by reducing the need to alter settings and/or switch reticles between exposures. |
| 10/21/2004 | US20040209176 Model-based data conversion |
| 10/21/2004 | US20040209175 Mask, method of producing mask, and method of producing semiconductor device |
| 10/21/2004 | US20040209174 Mask, method of producing mask, and method of producing semiconductor device |
| 10/21/2004 | US20040209173 For semiconductor production; improved uniformity of photoresists |
| 10/21/2004 | US20040209172 Defect correction method for a photomask |
| 10/21/2004 | US20040209171 inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 10/21/2004 | US20040209170 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography |
| 10/21/2004 | US20040209169 Defining a unique image property linked to the accurate placement of the assist features, and combines that with in-situ image simulation of the individual layout; individual device on the photomask layout are marked with error marker shapes to be subsequently corrected; computer readable media |
| 10/21/2004 | US20040207856 Design system of alignment marks for semiconductor manufacture |
| 10/21/2004 | US20040206912 Method of reducing heat-induced distortion of photomasks during lithography |
| 10/21/2004 | DE10316821A1 Process for the correction of image errors in an optical system for the manufacture of masks for semiconductors |
| 10/20/2004 | EP1469352A2 Illuminator controlled tone reversal printing |
| 10/20/2004 | EP1469345A2 Complementary division condition determining method and program and complementary division method |
| 10/20/2004 | EP1469015A1 Amorphous perfluorinated polymers |
| 10/20/2004 | CN1538239A Reticle transfering suport and reticle transfering method |
| 10/20/2004 | CN1538238A Mask for EUV photoetching and manufacturing method thereof |
| 10/19/2004 | US6807663 Accelerated layout processing using OPC pre-processing |
| 10/19/2004 | US6807662 Performance of integrated circuit components via a multiple exposure technique |
| 10/19/2004 | US6807661 By forming clip segments along the intersections and by generating longer segments from short clip segments, very small corrections that violate a minimum correction threshold may be avoided |
| 10/19/2004 | US6807654 Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product |
| 10/19/2004 | US6807519 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 10/19/2004 | US6806456 System and method for lithography process monitoring and control |
| 10/19/2004 | US6806007 EUV mask which facilitates electro-static chucking |
| 10/19/2004 | US6806006 Integrated cooling substrate for extreme ultraviolet reticle |
| 10/19/2004 | US6805751 Arranging energy transfer medium under and around particles adhered to surface, irradiating with laser, absorbing energy sufficient to dislodge particles, forming temperature gradient near surface by heating and/or cooling to prevent redeposition |
| 10/14/2004 | WO2004088735A1 Cleaning method, method for removing foreign particle, cleaning apparatus and cleaning liquid |
| 10/14/2004 | WO2004088426A1 Method for making a metal forming structure |
| 10/14/2004 | WO2004088425A2 Contact masks and lithographic patterning methods using said masks |
| 10/14/2004 | WO2004088422A1 Fluoro compound and fluoropolymer |
| 10/14/2004 | WO2004088421A1 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| 10/14/2004 | WO2004088420A1 Method for producing mask blank and method for producing transfer mask |
| 10/14/2004 | WO2004088419A1 Mask blanks production method and mask production method |
| 10/14/2004 | WO2004088418A1 Method of manufacturing mask blank |
| 10/14/2004 | WO2004088417A1 Photomask pattern inspecting method, photomask pattern inspecting device, and photomask pattern inspecting program |
| 10/14/2004 | WO2004088416A1 Method for measuring/inspecting pattern size of photomask |
| 10/14/2004 | WO2004023211A3 Exposure method, exposure mask, and exposure apparatus |
| 10/14/2004 | US20040205687 Method and apparatus for fracturing polygons on masks used in an optical lithography process |
| 10/14/2004 | US20040205686 Fracturing polygons used in a lithography process for fabricating an integrated circuit |
| 10/14/2004 | US20040202965 Phase conflict resolution for photolithographic masks |
| 10/14/2004 | US20040202944 Method for quartz bump defect repair with less substrate damage |
| 10/14/2004 | US20040202943 Set of at least two masks for the projection of structure patterns and method for producing the masks |
| 10/14/2004 | US20040202821 Deposition mask for display device and method for fabricating the same |
| 10/14/2004 | US20040202784 Evenly drying coating; producing uniform thickness without using rotary mechanism |
| 10/14/2004 | US20040201842 Method and apparatus for article inspection including speckle reduction |
| 10/14/2004 | US20040201097 Semiconductor device and method for manufacturing the same |
| 10/14/2004 | US20040200572 Assembling pellicle frames and photomasks |
| 10/14/2004 | US20040200369 Method and system for printing press image distortion compensation |
| 10/13/2004 | EP1467554A2 Method and system for printing press image distortion compensation. |
| 10/13/2004 | EP1467256A1 Device manufacturing method and mask set for use in the method |
| 10/13/2004 | EP1466212A1 Multi-image reticles |
| 10/13/2004 | CN1536440A Gray mask defect checking method |
| 10/13/2004 | CN1536439A Gray mask defect correction method |
| 10/13/2004 | CN1536438A Method for eliminating key size deviation of dense pattern and single pattern |
| 10/13/2004 | CN1536437A Corrosion-proof film forming method and photomask making method |
| 10/13/2004 | CN1171126C Optical proximity effect correcting method |
| 10/12/2004 | US6803996 Device manufacturing-related apparatus, gas purge method, and device manufacturing method |
| 10/12/2004 | US6803554 System and method for lithography process monitoring and control |
| 10/12/2004 | US6803178 Two mask photoresist exposure pattern for dense and isolated regions |
| 10/12/2004 | US6803175 Method of producing pattern-formed structure and photomask used in the same |
| 10/12/2004 | US6803174 Forming photosensitive dielectric film pattern; reflection electrode; liquid crystals display |
| 10/12/2004 | US6803161 Framed pellicle for protection of photolithographic photomask |
| 10/12/2004 | US6803160 Multi-tone photomask and method for manufacturing the same |
| 10/12/2004 | US6803159 For keeping contaminants away from a vicinity of a mask during exposure |
| 10/12/2004 | US6803158 Photomask and method for forming an opaque border on the same |
| 10/12/2004 | US6803157 Making added features of sub-resolution size that do not produce features on the exposed wafer |
| 10/12/2004 | US6803156 Electrostatic damage (ESD) protected photomask |
| 10/12/2004 | US6803155 Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns |
| 10/07/2004 | WO2004086143A2 Multi-step process for etching photomasks |
| 10/07/2004 | WO2004066026A3 Imageable elements and compositions for imaging by means of uv irradiation |