Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
08/2014
08/07/2014US20140220480 Mask Repair with Passivation
08/07/2014US20140218714 System, method and reticle for improved pattern quality in extreme ultraviolet (euv) lithography and method for forming the reticle
08/06/2014EP2763158A1 Reflective mask blank, reflective mask, and methods for manufacturing reflective mask blank and reflective mask
08/06/2014EP2763157A1 Mask blank for reflection-type exposure, and mask for reflection-type exposure
08/06/2014CN203759422U 一种掩模板 One kind of mask
08/06/2014CN103969967A 用于硅片对准级间串绕测试和拟合的信号处理方法 Wafer-level crosstalk between alignment and fit test method for signal processing
08/06/2014CN103969945A 刮伤掩模修补装置及方法 Scratch mask repair apparatus and method
08/06/2014CN103969944A 紫外掩膜及其制作方法 UV mask and manufacturing method thereof
08/06/2014CN103969943A 一种对基板进行标记的方法 One kind of labeled substrate method
08/06/2014CN103969942A 集成式光刻板制作方法及其制得led芯片晶粒的分选方法 Integrated optical and mechanical production methods to obtain sorting method led chip grains
08/06/2014CN103969941A 掩膜版及其制备方法和图形化方法 Mask preparation method and graphical method
08/06/2014CN103969940A 相移掩模板和源漏掩模板 Phase shift mask and source and drain mask
08/06/2014CN103969939A 一种掩膜板 One kind of mask
08/06/2014CN103969875A 显示基板及其制作方法、掩膜板、掩膜板组 Display substrate and its production method, mask, mask group
08/06/2014CN102866576B 一种掩膜板组及应用掩膜板组确定对位精度范围的方法 One kind of mask mask group and application group to determine the scope of the method for positioning accuracy
08/06/2014CN102246269B 反射型掩模用低膨胀玻璃基板及其加工方法 Reflective mask with a low expansion glass substrate and processing method
08/06/2014CN102246100B 凸起状图案形成方法、曝光装置和光掩模 Projection-like pattern forming method, the exposure apparatus and the photomask
08/06/2014CN101995762B 掩模版及其制备方法 Mask and its preparation method
08/05/2014US8799832 Optical proximity correction for topographically non-uniform substrates
08/05/2014US8799830 Integrated circuit layout design methodology with process variation bands
08/05/2014US8796645 Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display
08/05/2014US8796055 Method for manufacturing group III nitride semiconductor light-emitting element, group III nitride semiconductor light-emitting element, lamp, and reticle
08/05/2014US8796053 Photolithographic LED fabrication using phase-shift mask
08/05/2014US8795932 Method of fabricating a polarized color filter
08/05/2014US8795931 Reflection-type photomasks and methods of fabricating the same
08/05/2014US8795930 Self-polarized mask and self-polarized mask application
08/05/2014US8795929 Pellicle having buffer zone and photomask structure having pellicle
08/05/2014US8795928 Wave-shaped mask of fabricating nano-scaled structure
07/2014
07/31/2014US20140215417 Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications
07/31/2014US20140212795 Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask
07/31/2014US20140212794 Reflective mask blank for euv lithography and process for its production
07/31/2014US20140212793 Multiresolution Mask Writing
07/30/2014EP2758986A1 Method and system for optimization of an image on a substrate to be manufactured using optical lithography
07/30/2014CN103955113A 一种印刷制版设备及制版方法 A plate-making equipment and printing plate method
07/30/2014CN103955111A 光掩模用基板组和光掩模组及显示装置的制造方法 Group photomask substrate and photomask group and a display device manufacturing method
07/30/2014CN103955110A 掩膜板和光掩膜 Mask and photomasks
07/30/2014CN103955088A 一种高性能液晶光掩膜及其应用 A high-performance LCD photomask and its application
07/30/2014CN103955087A 一种液晶光掩膜、其应用及制版装置 A liquid crystal photomask, its application and plate-making device
07/30/2014CN103019027B 从曝光结果改进光学邻近模拟的方法 The method improved results from the exposure optical proximity simulation
07/30/2014CN102636951B 双吸收层交替相移接触孔掩模衍射场的计算方法 Double-absorbing layers are alternately calculated diffraction field contact hole phase shift mask
07/30/2014CN102612665B 玻璃掩模用热固化型保护液及玻璃掩模 Glass mask with a thermosetting liquid and glass protection mask
07/30/2014CN102540698B 双吸收层交替相移掩模衍射场的计算方法 Double-absorbing layer alternating phase-shift mask diffraction field calculation method
07/30/2014CN102466984B 源、掩模和投影光学装置的优化 Optimization of the source, a mask and a projection optical device
07/30/2014CN102365584B 用于在光聚合物表面上产生光掩模的工艺 For producing a photomask on the surface of the photopolymer process
07/30/2014CN101971336B 三维六边形矩阵存储器阵列和制造方法 A three-dimensional hexagonal matrix memory array and method of manufacturing
07/29/2014US8791432 Charged particle beam writing apparatus and charged particle beam writing method
07/29/2014US8790851 Mask and method for fabricating semiconductor device
07/24/2014WO2014113245A1 Lithographic error reduction by pattern matching
07/24/2014WO2014113070A1 Single reticle approach for multiple patterning technology
07/24/2014US20140205954 Method for forming patterns of semiconductor device by using mixed assist feature system
07/24/2014US20140205938 EUV Mask and Method for Forming the Same
07/24/2014US20140205937 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
07/24/2014US20140205936 Mask blank for reflection-type exposure, and mask for reflection-type exposure
07/24/2014US20140205935 Adjustable Photo-Mask
07/24/2014US20140205934 Single reticle approach for multiple patterning technology
07/23/2014EP2757078A1 Euv lithography member, making method, and titania-doped quartz glass
07/23/2014CN103943607A 划片槽条宽测试结构及方法 Scribe bar width test structures and methods
07/23/2014CN103943603A 金属互连线拼接版图结构 Metal interconnect structure mosaic map
07/23/2014CN103941541A 一种掩膜板污染区域的位置标识方法和装置 A method and apparatus for identifying the position of the mask contaminated area
07/23/2014CN103941540A 一种掩模板 One kind of mask
07/23/2014CN103941539A Euv光刻部件、制备方法和掺杂二氧化钛的石英玻璃 Euv lithography members, method of preparation of titania-doped quartz glass
07/23/2014CN103941538A 硬掩模表面处理 Hard mask surface treatment
07/23/2014CN103091971B 掩模板及其制造方法、以及监测掩模板雾状污染的方法 Mask and its manufacturing method, and a method of monitoring the mask mist contamination
07/23/2014CN102819182B 光掩模基板及制造方法、光掩模制造方法和图案转印方法 A photomask substrate and a manufacturing method and a manufacturing method of a photomask pattern transfer method
07/23/2014CN102736402B 光掩模用基板、光掩模、光掩模制造方法及图案转印方法 A photomask substrate, a photomask, the photomask manufacturing method, and a pattern transfer method
07/23/2014CN102455602B 确定曝光条件和掩模图案的方法 To determine the exposure conditions and the mask pattern methods
07/23/2014CN102439519B 具有多重半透过部分的半色调掩膜及其制造方法 Having a half-tone mask and a manufacturing method of multiple semi-transparent portion
07/23/2014CN101846877B 掩模板制造方法、掩模制造方法、掩模板透明基片制造方法 Mask manufacturing method, a method of manufacturing a mask, the transparent mask substrate manufacturing method
07/22/2014US8788982 Layout design defect repair using inverse lithography
07/22/2014US8788981 Method of OPC model building, information-processing apparatus, and method of determining process conditions of semiconductor device
07/22/2014US8788242 Pattern measurement apparatus
07/22/2014US8785112 Reticle defect correction by second exposure
07/22/2014US8785086 Reflective mask blank, method of manufacturing the same, and reflective mask
07/22/2014US8785085 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
07/22/2014US8785084 Method for mask fabrication and repair
07/22/2014US8785083 Systems and methods for lithography masks
07/22/2014US8785082 Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality
07/22/2014US8785081 Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same
07/22/2014US8784672 Photomasks and methods of manufacturing the same
07/17/2014US20140199615 Method to print contact holes at high resolution
07/17/2014DE102013212957A1 Verfahren zur Entladung von Photolithographiemasken und Vorrichtung hierfür Process for the discharge of photolithography masks and apparatus therefor
07/16/2014CN203720525U 一种可控的万能光罩 A controlled universal mask
07/16/2014CN103926808A 氧化铟锡图案曝光装置 Indium tin oxide patterned exposure apparatus
07/16/2014CN103926802A 光刻机光源与掩模的联合优化方法 Joint optimization methods lithography light source and mask
07/16/2014CN103926787A 颗粒清理装置 Particle cleaning device
07/16/2014CN103926786A 光罩静电除尘装置 Electrostatic dust mask device
07/16/2014CN102770806B 用于极紫外光刻的反射掩模及euv光刻设备 Reflection for EUVL mask and lithography equipment euv
07/16/2014CN102736405B 一种光罩及其修正方法 One kind of mask and Correction
07/16/2014CN102411260B 掩膜板缺陷检测方法 Mask defect detection method
07/16/2014CN102262354B 多色调光掩模的制造方法和图案转印方法 The method of manufacturing a multi-tone mask and a pattern transfer method
07/16/2014CN102132209B 具有高热传导率的euv掩模版基底 Euv reticle substrate having a high thermal conductivity
07/15/2014US8781212 Defect estimation device and method and inspection system and method
07/15/2014US8778605 Mask design and OPC for device manufacture
07/15/2014US8778593 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
07/15/2014US8778576 Exposure method and exposure device
07/15/2014US8778575 Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element
07/15/2014US8778574 Method for etching EUV material layers utilized to form a photomask
07/15/2014US8778572 Photomask and pattern forming method
07/15/2014US8778571 Method of manufacturing EUV mask
07/15/2014US8778570 Photomask and method for manufacturing the same
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