| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/29/2004 | CN1558823A Methods and systems for providing an image on an organic product |
| 12/29/2004 | CN1182568C Method of producing semiconductor integrated circuit device and multi-chip module |
| 12/28/2004 | US6836560 Advanced phase shift inspection method |
| 12/28/2004 | US6835991 Method and apparatus for improving resolution of objects in a semiconductor wafer |
| 12/28/2004 | US6835671 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition |
| 12/28/2004 | US6835666 Applying sacificial coating to semiconductor substrate; lithography; hard masking enclosing pattern; transferring to undercoating |
| 12/28/2004 | US6835511 Defining multiple position-measurement marks on the reticle; using a reticle-inspection device detecting respective positional coordinates of marks on the reticle; mounting reticle in the microlithography apparatus and detecting |
| 12/28/2004 | US6835510 Used for Forming a non-critical feature on the mask utilizing one of low transmission phase-shift mask and a non-phase shifting mask, and for forming a critical feature on the mask utilizing a high transmission phase shift mask |
| 12/28/2004 | US6835509 Mask for estimating aberration in projection lens system of exposure apparatus |
| 12/28/2004 | US6835508 Large-area membrane mask and method for fabricating the mask |
| 12/28/2004 | US6835507 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 12/28/2004 | US6835506 Method for producing a photomask and corresponding photomask |
| 12/28/2004 | US6835505 Attenuation phase shifting; silicon oxide, silicon nitride |
| 12/28/2004 | US6835504 Photomask with illumination control over patterns having varying structural densities |
| 12/28/2004 | US6835503 Planarizing layer comprises a material that has superior surface flatness properties and provides a flat surface upon which the reflective layer is deposited. |
| 12/28/2004 | US6835502 Masking having detectors for detection and measurement of variable film wear or thinning, induced by exposure to light sources during printing |
| 12/28/2004 | US6834549 Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array |
| 12/28/2004 | US6834548 Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
| 12/23/2004 | WO2004111728A1 Method for storing data and device for storing data |
| 12/23/2004 | WO2004031861A3 Method for fabrication of diffractive optical elements for maskless lithography |
| 12/23/2004 | WO2003013993A9 Reticle protection and transport |
| 12/23/2004 | US20040259367 Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias |
| 12/23/2004 | US20040259357 Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus |
| 12/23/2004 | US20040259296 Apparatus for performing anastomosis |
| 12/23/2004 | US20040259042 Method and system of lithography using masks having gray-tone features |
| 12/23/2004 | US20040259033 Process for making flexographic printing plate |
| 12/23/2004 | US20040259005 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 12/23/2004 | US20040257624 Image processing apparatus for prepress printing and prepress printing system |
| 12/23/2004 | US20040257568 Dimension measuring method, system and program |
| 12/23/2004 | US20040256356 Photolithographic mask |
| 12/23/2004 | US20040255676 Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
| 12/22/2004 | EP1489644A1 Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure method |
| 12/22/2004 | EP1488284A2 Photomask and method for photolithographic patterning of a substrate by use of phase shifted assist features |
| 12/22/2004 | CN1556442A Binary optica device grey scale changing mask method and device for making |
| 12/21/2004 | US6834262 Scheme for improving the simulation accuracy of integrated circuit patterns by simulation of the mask |
| 12/21/2004 | US6833903 Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method |
| 12/21/2004 | US6833301 Semiconductor device with an improved gate electrode pattern and a method of manufacturing the same |
| 12/21/2004 | US6833223 Multilayer-film reflective mirrors and optical systems comprising same |
| 12/21/2004 | US6833222 Method and apparatus for trimming a pellicle film using a laser |
| 12/16/2004 | WO2004109778A1 Mutilayer film reflector and x-ray exposure system |
| 12/16/2004 | US20040255305 Method of forming a pattern of sub-micron broad features |
| 12/16/2004 | US20040253546 Method for manufacturing a diffuser for a backlight module |
| 12/16/2004 | US20040253525 Photomask correcting method and manufacturing method of semiconductor device |
| 12/16/2004 | US20040253524 Substrate with light shielding film; measurement flatness of substrate; calibration; forming pattern ; optical images |
| 12/16/2004 | US20040253523 Embedded bi-layer structure for attenuated phase shifting mask |
| 12/16/2004 | US20040253522 Strip-like profile on surface of masking substrate with protective coatings |
| 12/16/2004 | US20040253426 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 12/16/2004 | US20040251229 Manufacturing method for membrane member |
| 12/16/2004 | DE10324202A1 Maskenhaltevorrichtung Mask holding device |
| 12/16/2004 | DE10321680A1 Photolithographic film quality control procedure images mask structures using higher order beams from diffraction grating creating intensity profile for comparison with reference |
| 12/16/2004 | DE10258371B4 Verfahren zur Inspektion von periodischen Gitterstrukturen auf Lithographiemasken A method for the inspection of periodic lattice structures on lithography masks |
| 12/16/2004 | DE10030143B4 Photomaske, Herstellungsverfahren davon und Halbleitereinrichtung Photomask manufacturing method thereof, and semiconductor device |
| 12/15/2004 | EP1487005A1 Stencil mask for ion implantation |
| 12/15/2004 | EP1485757A1 METHOD OF PRODUCING AN ETCH−RESISTANT POLYMER STRUCTURE USING ELECTRON BEAM LITHOGRAPHY |
| 12/15/2004 | EP1485756A2 Method of forming a pattern of sub-micron broad features |
| 12/15/2004 | CN1555082A Laser apparatus, laser irradiation method and semiconductor device and its producing method |
| 12/15/2004 | CN1180468C Non-grounding technology and optical approximation correcting method for generating optical mask pattern |
| 12/15/2004 | CN1180315C Method for reducing optical proximity effect |
| 12/15/2004 | CN1180313C Phase error detection pattenr and its use |
| 12/15/2004 | CN1180280C Self-aligning mask plate |
| 12/14/2004 | US6832364 Integrated lithographic layout optimization |
| 12/14/2004 | US6831997 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 12/14/2004 | US6830873 Includes depositing a thin conductive layer over a photoresist layer only on the alignment structures, and grounding; semiconductors |
| 12/14/2004 | US6830854 System and method for correcting 3D effects in an alternating phase-shifting mask |
| 12/14/2004 | US6830853 Providing critical dimension control; working relatively large areas of opaque material |
| 12/14/2004 | US6830852 Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles |
| 12/14/2004 | US6830851 Forming silicide overcoating substrates; controlling thickness |
| 12/14/2004 | US6830702 Single trench alternating phase shift mask fabrication |
| 12/09/2004 | WO2004107046A2 Mask, mask blank, photosensitive film therefor and fabrication thereof |
| 12/09/2004 | WO2004107044A2 Mask, mask blank, photosensitive material therefor and fabrication thereof |
| 12/09/2004 | WO2004106580A1 Mask retaining device |
| 12/09/2004 | US20040250233 A die with text deposited upon the die uses semiconductor processing techniques during fabrication, included in the die are a substrate, a first paragraph in contact with the substrate, a second paragraph in contact with the substrate and aligned with the first paragraph in a column |
| 12/09/2004 | US20040250232 Optical proximity correction method using weighted priorities |
| 12/09/2004 | US20040248045 for forming thin line portion having a line width thinner than a minimum line width which can be optically resolved by a projection exposure system by slimming a line width of a pattern transferred on a semiconductor substrate |
| 12/09/2004 | US20040248044 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/09/2004 | US20040248043 Exposure method, exposure apparatus and device manufacturing method |
| 12/09/2004 | US20040248020 Exposure mask and pattern exposure method |
| 12/09/2004 | US20040248018 to produce patterns of substantially the same size but having different pitches, including fine pitches; can be selectively isotropically etched to form an undercut under the portion of the opaque layer that extends between the second and third transparent regions |
| 12/09/2004 | US20040248017 Substrate for photomask, photomask blank and photomask |
| 12/09/2004 | US20040248016 Manually or automatically inserting into the layout file after locations of the attenuating feature are determined; forming resist features of uniform width |
| 12/09/2004 | US20040246574 Microscope, especially microscope used for inspection in semiconductor manufacture |
| 12/09/2004 | US20040245618 Integrated circuit and method for fabricating an integrated circuit |
| 12/09/2004 | US20040244912 Method and apparatus for photomask fabrication |
| 12/09/2004 | US20040244643 UV-absorbing ink composition for ink-jet printing |
| 12/09/2004 | DE19729600B4 Mustervergleichsüberprüfungssystem und -verfahren, die ein Grauwertpunktraster verwenden Pattern matching verification system and method using a grayscale bitmap |
| 12/09/2004 | DE10343313A1 Mask unit for optical system, especially for device for wave front measurement of microlithographic projection lens, comprises mask structure layer on support which is heat-conducting in region next to mask structure layer |
| 12/09/2004 | DE10323365A1 Vorrichtung zur Herstellung geprägter Substrate Device for producing embossed substrates |
| 12/08/2004 | EP1483628A1 Full phase shifting mask in damascene process |
| 12/08/2004 | EP1390309A4 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass |
| 12/08/2004 | CN1554029A Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other |
| 12/08/2004 | CN1553283A Metal mask plate |
| 12/08/2004 | CN1553282A Method for forming photoresist layer without side vanes |
| 12/08/2004 | CN1179398C Process for preparing low storage junctions of DRAM |
| 12/07/2004 | US6829084 Ultraviolet and vacuum ultraviolet antireflection substrate |
| 12/07/2004 | US6829035 Advanced mask cleaning and handling |
| 12/07/2004 | US6828542 System and method for lithography process monitoring and control |
| 12/07/2004 | US6828080 Pattern forming method and method of fabricating device |
| 12/07/2004 | US6828068 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 12/07/2004 | US6828067 Polymeric matrix having a carbon pigment to absorb relatively long wavelengths of light to cause ablation of the medium and an ultraviolet absorbing dye to give high optical density in ultraviolet portions of the spectrum. |
| 12/02/2004 | WO2004104705A1 Preparing imaging member with microgel protective layer |