| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/18/2005 | US6844117 Reactive ion etching using a mixed gas including an oxygen containing gas and a halogen containing gas, and a reducing gas for dry etching a metal film; high precision pattern-etched product; dry etching apparatus |
| 01/18/2005 | US6844116 Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer |
| 01/18/2005 | US6844023 Alumina insulation for coating implantable components and other microminiature devices |
| 01/13/2005 | WO2005004211A1 Focus test mask, focus measureing method, and exposure device |
| 01/13/2005 | WO2005003863A2 Device and method for processing a mask pattern used for the production of semiconductors |
| 01/13/2005 | WO2004077163A3 Method for creating a pattern on a wafer using a single photomask |
| 01/13/2005 | US20050010890 Design-based monitoring |
| 01/13/2005 | US20050009355 Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same |
| 01/13/2005 | US20050009344 Optical proximity correction method |
| 01/13/2005 | US20050009341 Method of reducing critical dimension bias of dense pattern and isolation pattern |
| 01/13/2005 | US20050008953 Design feature can be introduced into layout prior to correstion then removed prior to tapping of pattern onto reticle; printing design inot radiation sensitive material |
| 01/13/2005 | US20050008952 Methods of forming patterned reticles |
| 01/13/2005 | US20050008951 Methods of forming patterned reticles |
| 01/13/2005 | US20050008950 Methods of forming patterned reticles |
| 01/13/2005 | US20050008949 Methods of forming patterned reticles |
| 01/13/2005 | US20050008948 Suppression pattern deformation in longitudinal direction by wet washing |
| 01/13/2005 | US20050008947 Adjustment pattern; controlling exposure and focusing dosage; patterngenerated that reflects scattering |
| 01/13/2005 | US20050008946 Mask for charged particle beam exposure, and method of forming the same |
| 01/13/2005 | US20050008945 plasma/dry etching; photolithographic reticle; oxygen-free gas etches anti-reflective coating and patterned photoresistive material; integrated circuits |
| 01/13/2005 | US20050008944 Defect inspection of extreme ultraviolet lithography masks and the like |
| 01/13/2005 | US20050008943 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 01/13/2005 | US20050008942 [photomask with internal assistant pattern forenhancing resolution of multi-dimension pattern] |
| 01/13/2005 | US20050008864 Substrate covered with photoresist; projecting patterned beam |
| 01/13/2005 | US20050008314 Fabrication of integrated circuit |
| 01/13/2005 | DE10309266B3 Verfahren zum Bilden einer Öffnung einer Licht absorbierenden Schicht auf einer Maske A method of forming an opening of a light-absorbing layer on a mask |
| 01/12/2005 | EP1496394A2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 01/12/2005 | EP1496393A2 Complementary division mask, method of producing mask, and program |
| 01/12/2005 | EP1495369A2 Interferometric measuring device and projection illumination installation comprising one such measuring device |
| 01/12/2005 | EP1221073A4 A photolithography mask having a subresolution alignment mark window |
| 01/12/2005 | CN1565035A Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 01/12/2005 | CN1564084A Digital shape spliting mask prodn. method for microoptical element |
| 01/11/2005 | US6842889 Methods of forming patterned reticles |
| 01/11/2005 | US6842245 Pattern test device |
| 01/11/2005 | US6842228 Fusion attachment of rigid pellicles and/or frames |
| 01/11/2005 | US6842227 Fusion attachment of rigid pellicles and/or frames |
| 01/11/2005 | US6841889 Adjusting coordinates of a feature of mask in response to correction for zone in which feature is mapped; optical photolithography projection; integrated circuits |
| 01/11/2005 | US6841801 Mask for correcting optical proximity effect |
| 01/11/2005 | US6841786 Calculating radiation dose for light, ion or electron beam for counter stress; extreme ultraviolet radiation reflection masks; data processing |
| 01/11/2005 | US6841399 Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device |
| 01/11/2005 | US6841338 Exposing a microelectronic structure that has a photoresist layer of a (co)polymer of p-hydroxystyrene and p-oxystyrene with a remnant ratio of 40-85% to light and developing |
| 01/11/2005 | US6841318 Levenson phase shift mask and method for forming fine pattern by using the same |
| 01/11/2005 | US6841317 Frames with covering membrane pellicle; venting slit; photomasking; patterned circuit |
| 01/11/2005 | US6841316 Method for producing a phase shift mask |
| 01/11/2005 | US6841315 An adjacent opaque part area with a transmission part area, by reducing the amount of exposing radiation transmitted through the area, improve the geometrical shape and dimensional accuracy of a photoresist pattern |
| 01/11/2005 | US6841314 Forming halftone; overcoating quartz substrate; phase shifting; inserting impurities |
| 01/11/2005 | US6841313 Photomask with dies relating to different functionalities |
| 01/11/2005 | US6841312 Method and apparatus for coupling a pellicle assembly to a photomask |
| 01/11/2005 | US6841311 Cleaning the surface of halftone shift masks that use MoSiON as shifter material |
| 01/11/2005 | US6841310 Radiation patterning tools, and methods of forming radiation patterning tools |
| 01/11/2005 | US6841309 Damage resistant photomask construction |
| 01/11/2005 | US6841308 Phase shift lithography provides control of the phase of an exposure of light beam at a target |
| 01/11/2005 | US6841307 Photomask making method and alignment method |
| 01/06/2005 | WO2005001898A2 Method of designing a reticle and forming a semiconductor device therewith |
| 01/06/2005 | WO2005001573A2 Adhesion method using gray-scale photolithography |
| 01/06/2005 | WO2005001569A1 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 01/06/2005 | WO2004061766A3 Digital prepress masking tools |
| 01/06/2005 | WO2004027684B1 Photolithography mask repair |
| 01/06/2005 | US20050005256 Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout file |
| 01/06/2005 | US20050004774 Methods and systems for inspection of wafers and reticles using designer intent data |
| 01/06/2005 | US20050003617 Template padding method for padding edges of holes on semiconductor masks |
| 01/06/2005 | US20050003305 Photo mask, exposure method using the same, and method of generating data |
| 01/06/2005 | US20050003284 Exposure, development of testing photoresist using photomask; forming hole pattern; measurement; adjustment |
| 01/06/2005 | US20050003282 Pattern adjustment; high speed; stress adjustment; dispalcement; calibrating shape |
| 01/06/2005 | US20050003281 Pattern mask with features to minimize the effect of aberrations |
| 01/06/2005 | US20050003280 Exposure to adjustment design pattern; shaping inclined edge zones; measurement calibration; drawing pattern using electron beams |
| 01/06/2005 | US20050003279 Positioning mask on semiconductor wafer; exposure; fading zones |
| 01/06/2005 | US20050003278 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 01/06/2005 | US20050002020 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask |
| 01/06/2005 | US20050002003 Lithographic apparatus and device manufacturing method |
| 01/05/2005 | EP1494071A2 Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 01/05/2005 | EP1494070A2 A method, program product and apparatus for generating assist features utilizing an image field map |
| 01/04/2005 | US6839890 Mask manufacturing method |
| 01/04/2005 | US6838699 Electro-optical device with undercut-reducing thin film pattern and reticle |
| 01/04/2005 | US6838216 Semiconductors; improved aerial image contrast |
| 01/04/2005 | US6838215 Graytone mask producing method, graytone mask and pattern transfer method |
| 01/04/2005 | US6838214 Method of fabrication of rim-type phase shift mask |
| 01/04/2005 | US6838213 Overcoating substrate with membrane layer; etching windows; depositing scattering layer; transferring patterns; forming hybrid stencil |
| 01/04/2005 | US6838212 Controlling spacings; computer calibration |
| 12/30/2004 | US20040268291 Method and device for checking lithography data |
| 12/30/2004 | US20040268290 Removal of relatively unimportant shapes from a set of shapes |
| 12/30/2004 | US20040268289 Method for error reduction in lithography |
| 12/30/2004 | US20040268272 Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 12/30/2004 | US20040265744 Stencil mask having main and auxiliary strut and method of forming the same |
| 12/30/2004 | US20040265710 Lithographic processing method and device manufactured thereby |
| 12/30/2004 | US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device |
| 12/30/2004 | US20040265708 Photomask, pattern formation method using photomask and mask data creation method for photomask |
| 12/30/2004 | US20040265707 Source and mask optimization |
| 12/30/2004 | US20040265705 Masking; radiation patterning tool |
| 12/30/2004 | US20040265703 Method for dry etching photomask material |
| 12/30/2004 | US20040265460 Process for producing a fried foodstuff |
| 12/30/2004 | US20040263866 Apparatus for optical proximity correction, method for optical proximity correction, and computer program product for optical proximity correction |
| 12/30/2004 | US20040263829 Method and device for inspecting an object using a time delay integration sensor |
| 12/30/2004 | US20040263820 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask |
| 12/30/2004 | US20040263816 Lithographic apparatus and device manufacturing method |
| 12/30/2004 | US20040262264 Improved cd uniformity of chrome etch to photomask process |
| 12/30/2004 | DE10321278A1 Illuminating mask for structuring a photo lacquer on a substrate disc for integrated circuits has a lithographic structure of reticle and pellicle in a frame held by inorganic adhesive |
| 12/29/2004 | WO2004114024A2 Exposure method and exposure apparatus |
| 12/29/2004 | EP1491949A2 Photomask, pattern formation method using photomask and mask data creation method for photomask |
| 12/29/2004 | EP1491331A2 Process for making flexographic printing plate |
| 12/29/2004 | EP1490657A1 A mask blank and a method for producing the same |