| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/03/2005 | US20050026090 Method for high aspect ratio pattern transfer |
| 02/03/2005 | US20050026086 Photolithographic techniques for producing angled lines |
| 02/03/2005 | US20050026053 Photolithography; semiconductors, integrated circuits; detecting defects |
| 02/03/2005 | US20050026052 Contact layouts; phase shifting; rotation ; photolithography; integrated circuits |
| 02/03/2005 | US20050026050 Exposure mask and mask pattern production method |
| 02/03/2005 | US20050026049 Method for forming an opening on an alternating phase shift mask |
| 02/03/2005 | US20050026048 Proximity correcting lithography mask blanks |
| 02/03/2005 | US20050026047 comprises line-shaped features and ladder-shaped assists; improved image contrast, resolution, and uniformity |
| 02/03/2005 | US20050026046 Multilayer reflective extreme ultraviolet lithography mask blanks |
| 02/03/2005 | US20050026045 consists of a mask barrier and a set of contact barriers; mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle |
| 02/03/2005 | US20050025959 Hard pellicle and fabrication thereof |
| 02/03/2005 | US20050025351 Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask |
| 02/03/2005 | US20050025279 Non absorbing reticle and method of making same |
| 02/03/2005 | US20050024622 Exposure mask and method for divisional exposure |
| 02/03/2005 | DE10330907A1 Vorrichtung und Verfahren zum Bearbeiten einer Maskenvorlage für die Halbleiterherstellung Apparatus and method for processing a mask pattern for semiconductor manufacturing |
| 02/03/2005 | DE10330467A1 Verfahren zur Erstellung von alternierenden Phasenmasken Process for the preparation of alternating phase masks |
| 02/02/2005 | EP1503403A1 Reticle and optical characteristic measuring method |
| 02/02/2005 | EP1502153A2 Photolithography mask comprising absorber/phase-shifter elements |
| 02/02/2005 | EP1410095A4 Optical element with full complex modulation |
| 02/02/2005 | EP0941865B1 Process film, process ink, and platemaking method and system using the film |
| 02/02/2005 | CN1575437A Method for obtaining elliptical and rounded shapes using beam shaping |
| 02/02/2005 | CN1574364A Memory array with loop line pattern structure and fabricating method thereof |
| 02/02/2005 | CN1574223A Photomask, pattern formation method using photomask and mask data creation method for photomask |
| 02/02/2005 | CN1574217A Semiconductor design layout pattern formation method and graphic pattern formation unit |
| 02/02/2005 | CN1573561A Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 02/02/2005 | CN1573558A Light mask manufacturing method capable of avoiding electron beam offset due to charge effect |
| 02/02/2005 | CN1573557A Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 02/02/2005 | CN1573554A Method of optical proximity correction design for contact hole mask |
| 02/02/2005 | CN1573541A Method for coating a substrate for EUV lithography and substrate with photoresist layer |
| 02/02/2005 | CN1573540A Water soluble negative photoresist and method for forming photoresist pattern |
| 02/02/2005 | CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 02/02/2005 | CN1187655C Retaining device for photo blanks |
| 02/01/2005 | US6851103 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 02/01/2005 | US6850858 Method and apparatus for calibrating a metrology tool |
| 02/01/2005 | US6850676 Optical fiber block photo mask for loss reduction |
| 02/01/2005 | US6850321 Dual stage defect region identification and defect detection method and apparatus |
| 02/01/2005 | US6849937 Variable rotational assignment of interconnect levels in integrated circuit fabrication |
| 02/01/2005 | US6849540 Method of fabricating semiconductor integrated circuit device and method of producing a multi-chip module that includes patterning with a photomask that uses metal for blocking exposure light and a photomask that uses organic resin for blocking exposure light |
| 02/01/2005 | US6849393 Phase shifting lithographic process |
| 02/01/2005 | US6849391 Alkali-soluble novolak resin and a photosensitive compound having a naphthoquinone diazide group; absorption coefficient alpha of the photoresist for an exposure light falls in the range of 0.5<alpha</=7 |
| 02/01/2005 | US6849365 Two multilayer layers cover the substrate, one is construction layer, the other is destructive layer, because the interaction of the two multilayer layers, yields the desired local absorption of the radiation on mask; photolithography |
| 02/01/2005 | US6849364 Mask for fabricating semiconductor components |
| 02/01/2005 | US6849363 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 02/01/2005 | US6849308 Method of forming a masking pattern on a surface |
| 02/01/2005 | US6848277 Projection lithography photomasks and method of making |
| 01/27/2005 | WO2005008754A1 Flare measurement method, exposure method, and flare measurement mask |
| 01/27/2005 | WO2005008747A2 Methods and systems for inspection of wafers and reticles using designer intent data |
| 01/27/2005 | WO2005008548A1 Method of transmitting cad data to a wafer inspection system |
| 01/27/2005 | WO2005008335A2 Method for analysing objects in microlithography |
| 01/27/2005 | WO2004106580B1 Mask retaining device |
| 01/27/2005 | US20050022150 Optical proximity correction method |
| 01/27/2005 | US20050020083 Method of making photomask blank substrates |
| 01/27/2005 | US20050019708 Phase-shifting mask and method of forming pattern using the same |
| 01/27/2005 | US20050019703 Photocatalysts; color filters |
| 01/27/2005 | US20050019678 Method of selecting photomask blank substrates |
| 01/27/2005 | US20050019677 quadrangular, which has a pair of strip-like regions with a 2 mm edge portion excluded at each end; good surface flatness at the time of wafer exposure |
| 01/27/2005 | US20050019676 Method of selecting photomask blank substrates |
| 01/27/2005 | US20050019675 Lithographic apparatus, device manufacturing method, and mask |
| 01/27/2005 | US20050019674 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
| 01/27/2005 | US20050019673 Attenuated film with etched quartz phase shift mask |
| 01/27/2005 | US20050016468 Compensation frame for receiving a substrate |
| 01/27/2005 | US20050016445 Method for producing diamond film |
| 01/27/2005 | DE10332059A1 Analysis of microlithography objects, especially masks using aerial image measurement systems, whereby a detected image is corrected using a transfer function correction filter |
| 01/27/2005 | DE10327613A1 Formation of preferably square hole on an alternating phase mask useful in electronics for the lithographic structuring of contact planes in preparation of integrated circuits, and in semiconductor technology |
| 01/26/2005 | EP1500974A2 A method, program product and apparatus of simultaneous optimization for na-sigma exposure settings and scattering bars opc using a device layout |
| 01/26/2005 | EP1500718A1 Method for producing diamond film |
| 01/26/2005 | EP0898732B1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers |
| 01/26/2005 | CN1570760A Correction for optical proximity effect of contact hole, mask and semiconductor device manufacturing method |
| 01/25/2005 | US6848096 Apparatus for correcting data of layout pattern |
| 01/25/2005 | US6847434 Method and apparatus for a pellicle frame with porous filtering inserts |
| 01/25/2005 | US6846598 Overcoating with photoresist forming light shielding patterns; transferring pattern |
| 01/25/2005 | US6846597 Photomask inspecting method |
| 01/25/2005 | US6846596 Design of integrated circuits; photolithography; calibration |
| 01/25/2005 | US6846595 Method of improving photomask geometry |
| 01/20/2005 | WO2004065287A3 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 01/20/2005 | US20050015233 Method for computing partially coherent aerial imagery |
| 01/20/2005 | US20050015165 Semiconductor production system |
| 01/20/2005 | US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 01/20/2005 | US20050014075 Phase edge darkening binary masks |
| 01/20/2005 | US20050014074 Generating mask patterns for alternating phase-shift mask lithography |
| 01/20/2005 | US20050013972 Large-size substrate |
| 01/20/2005 | US20050013927 Manufacturing method for display device |
| 01/20/2005 | US20050011862 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 01/20/2005 | US20050011377 Methods and systems for providing an image on an organic product |
| 01/19/2005 | EP1498936A1 Reflection type mask blank and reflection type mask and production methods for them |
| 01/19/2005 | EP1498775A2 Large-size substrate for photolithographic applications |
| 01/19/2005 | EP1498750A1 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 01/19/2005 | EP1498262A1 Method and apparatus for producing a screen printing stencil and a screen with a stencil |
| 01/19/2005 | EP1497699A1 Attenuated embedded phase shift photomask blanks |
| 01/19/2005 | EP1194803B1 Broad band ultraviolet catadioptric imaging system |
| 01/19/2005 | CN1567088A X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
| 01/19/2005 | CN1185684C Method of preparing charged particle beam drawing data |
| 01/19/2005 | CN1185549C Optical nearby correcting method based on contact hole model |
| 01/19/2005 | CN1185512C Optical film |
| 01/18/2005 | US6845497 Method for fabrication of patterns and semiconductor devices |
| 01/18/2005 | US6844272 Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers |
| 01/18/2005 | US6844235 Reticle repeater monitor wafer and method for verifying reticles |
| 01/18/2005 | US6844123 System for production of large area display panels with improved precision |
| 01/18/2005 | US6844119 Alternately laminating, on a transparent substrate, thin layers made of tintanium nitride and thin layers made of silicon nitride to form multilayered semi-transmission film, heating the film at 300 degree C. or higher |
| 01/18/2005 | US6844118 Photolithography; forming semiconductors |