| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/24/2005 | US20050042523 Endpoint detection of plasma-assisted etch process |
| 02/24/2005 | US20050042153 Extreme ultraviolet pellicle using a thin film and supportive mesh |
| 02/24/2005 | US20050040545 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 02/24/2005 | US20050040345 Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby |
| 02/24/2005 | DE19837037B4 Retikel, Belichtungsverfahren, Belichtungsgerät und Halbleitervorrichtung Reticle, exposure methods, exposure apparatus and semiconductor device |
| 02/24/2005 | DE102004021151A1 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 02/23/2005 | EP1508070A2 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography |
| 02/23/2005 | CN1585908A Graphics engine for high precision lithography |
| 02/23/2005 | CN1585110A Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure |
| 02/23/2005 | CN1584738A Light cover for decreasing optical approaching effect |
| 02/23/2005 | CN1190708C Mask-pattern correction method |
| 02/22/2005 | US6859918 Alleviating line end shortening by extending phase shifters |
| 02/22/2005 | US6859264 Projection exposure apparatus having aberration measurement device |
| 02/22/2005 | US6858948 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 02/22/2005 | US6858377 Dual damascene process using a single photo mask |
| 02/22/2005 | US6858375 Method for forming resist pattern |
| 02/22/2005 | US6858357 Attenuated embedded phase shift photomask blanks |
| 02/22/2005 | US6858356 Method of generating large scale signal paths in a parallel processing system |
| 02/22/2005 | US6858355 A transparent quartz substrate; a light-shielding chromium layer having a rectangular ring composed of multiple of opening patterns to define the guard ring pattern, and a pair of assited line pattern of linear opening; photolithography |
| 02/22/2005 | US6858354 Method to prevent side lobe on seal ring |
| 02/22/2005 | US6858353 Increased-contrast film for high-transmittance attenuated phase-shaft masks |
| 02/22/2005 | US6858118 Apparatus for enhancing the lifetime of stencil masks |
| 02/17/2005 | WO2005015616A1 Electronic beam exposure device and exposure method |
| 02/17/2005 | WO2005015311A2 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 02/17/2005 | WO2005015308A2 Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal |
| 02/17/2005 | US20050037293 Imaging printing plate having a coating containinga diazo compound; exposure to infrared radiation; development |
| 02/17/2005 | US20050037267 Illumination multilayer, vertical pattern through mask |
| 02/17/2005 | US20050036783 Pattern production system, exposure system, and exposure method |
| 02/17/2005 | US20050036122 Evaluation mask, focus measuring method and aberration measuring method |
| 02/17/2005 | US20050035377 Solid-state camera device and method of manufacturing the same, and method of making mask for manufacturing the device |
| 02/17/2005 | US20050035306 Focused charged particle beam apparatus |
| 02/17/2005 | DE10392464T5 Maskenmuster-Korrekturverfahren, Herstellungsverfahren einer Halbleitervorrichtung, Maskenherstellungsverfahren und Maske Mask pattern correction method, a semiconductor device manufacturing method, mask fabrication method and mask |
| 02/16/2005 | EP1506454A2 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 02/16/2005 | CN1581437A Optical mask, method for making figure and method for making semiconductor device |
| 02/16/2005 | CN1581434A Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 02/16/2005 | CN1580957A Multilayer reflective extreme ultraviolet lithography mask blanks |
| 02/16/2005 | CN1580950A Pattern production system, exposure system, and exposure method |
| 02/16/2005 | CN1189794C Improved pattern generator |
| 02/15/2005 | US6857109 Short edge smoothing for enhanced scatter bar placement |
| 02/15/2005 | US6855997 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
| 02/15/2005 | US6855908 Glass substrate and leveling thereof |
| 02/15/2005 | US6855486 Lithographic method and apparatus |
| 02/15/2005 | US6855467 transfer mask made by forming an aperture pattern in a thin film portion supported by a supporting frame portion, semiconductors |
| 02/15/2005 | US6855464 Fast and flexible method and system for grating overlay patterns, semiconductors |
| 02/15/2005 | US6855463 Photomask having an intermediate inspection film layer |
| 02/15/2005 | US6855380 Method for the production of optical components with increased stability, components obtained thereby and their use |
| 02/10/2005 | WO2005013003A2 Multilayer reflective extreme ultraviolet lithography mask blanks |
| 02/10/2005 | WO2004092829A3 Masking arrangement and method for producing integrated circuit arrangements |
| 02/10/2005 | WO2004079779A3 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 02/10/2005 | US20050034096 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
| 02/10/2005 | US20050032003 Multiple exposure method for forming a patterned photoresist layer |
| 02/10/2005 | US20050031999 Plurality of non-straight lines that are inwardly arched and are formed from plural segments of plural ellipses that are arranged to surround the pattern; for forming a storage electrode of a capacitor of a semiconductor device |
| 02/10/2005 | US20050031976 Adjusting shape utilizing design and vicinity patterns |
| 02/10/2005 | US20050031972 Design and layout of phase shifting photolithographic masks |
| 02/10/2005 | US20050031971 Computer assisted technology for complex designs; readable definitions of alternating aperture, dark field and complimentary mask generation; simplification, quality |
| 02/10/2005 | US20050031969 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 02/10/2005 | US20050031968 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 02/10/2005 | US20050031967 Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device |
| 02/10/2005 | US20050031966 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 02/10/2005 | US20050031965 Removing the defect area by gallium chelation with a water-soluble amine polymer containing carboxyl, hydroxyl and amine groups; polymer is never specified |
| 02/10/2005 | US20050031964 Lithographic antireflective hardmask compositions and uses thereof |
| 02/10/2005 | US20050030594 Systems and methods for verifying scanning mode selection |
| 02/10/2005 | US20050030516 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030513 Photolithographic techniques for producing angled lines |
| 02/10/2005 | US20050030502 Photomask, exposure control method and method of manufacturing a semiconductor device |
| 02/10/2005 | US20050030495 Thermal proximity effects in lithography |
| 02/10/2005 | US20050029126 Fullerenes to increase radiation resistance in polymer-based pellicles |
| 02/10/2005 | DE10351453B3 Angled correcting process for lighting of printing flat involves forming indicator lines from sections along angled path from adjacent picture lines of matrix |
| 02/10/2005 | DE10259331B4 Herstellungsverfahren für eine Photomaske für eine integrierte Schaltung und entsprechende Photomaske Manufacturing method of a photomask for an integrated circuit and corresponding photomask |
| 02/09/2005 | EP1505438A2 Stencil mask, charged particle irradiation apparatus and the method |
| 02/09/2005 | EP1257881A4 Laser imaged printing plates comprising a multi-layer slip film |
| 02/09/2005 | CN1577741A Method for producing substrate with etch-resistant film |
| 02/09/2005 | CN1577731A Semiconductor production system |
| 02/09/2005 | CN1577722A Image correcting method , system and program. mask, semiconductor producing method and design pattern |
| 02/09/2005 | CN1577107A Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/09/2005 | CN1577099A Method and apparatus of simultaneous optimization for na-sigma exposure settings and scattering bars OPC using a device layout |
| 02/09/2005 | CN1577091A Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 02/09/2005 | CN1577085A Method for producing grey mask and grey mask |
| 02/09/2005 | CN1577084A Method for producing grey mask |
| 02/09/2005 | CN1577083A Stencil mask having main and auxiliary strut and method of forming the same |
| 02/09/2005 | CN1577080A Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same |
| 02/09/2005 | CN1577029A Large-size substrate |
| 02/09/2005 | CN1576778A Original and its producing method, exposure apparatus inspection system and method |
| 02/09/2005 | CN1188899C Method for detecting corrected accuracy of optical cover machine table |
| 02/08/2005 | US6854104 Optical proximity correction system for local correction of an aerial image produced from a mask defining a target design; includes an analyzer and a controller, |
| 02/08/2005 | US6853743 Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium |
| 02/08/2005 | US6853417 Slant reflector with bump structure and fabricating method thereof |
| 02/08/2005 | US6852471 Exposure control for phase shifting photolithographic masks |
| 02/08/2005 | US6852455 Amorphous carbon absorber/shifter film for attenuated phase shift mask |
| 02/08/2005 | US6851365 Method for producing multicolor printing |
| 02/03/2005 | WO2005010942A2 Method and apparatus for calibrating a metrology tool |
| 02/03/2005 | WO2005010612A2 Defect inspection of extreme ultraviolet lithography masks and the like |
| 02/03/2005 | WO2005010573A1 Method for production of micro-optics structures |
| 02/03/2005 | WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer |
| 02/03/2005 | WO2004082814A3 Method and device for wetting a substrate with a liquid |
| 02/03/2005 | WO2004065635A3 Laser exposure of photosensitive masks for dna microarray fabrication |
| 02/03/2005 | US20050028131 Method for creating alternating phase masks |
| 02/03/2005 | US20050028129 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout |
| 02/03/2005 | US20050027905 Reflective mirror for lithographic exposure and production method |
| 02/03/2005 | US20050026340 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |