| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/17/2005 | US20050056625 Method and apparatus for repair of reflective photomasks |
| 03/17/2005 | US20050056351 Surface treatment method, process for producing near-field exposure mask using the method, and nanoimprint lithography mask |
| 03/17/2005 | DE102004026206A1 Belichtungsmaskensubstrat-Herstellungsverfahren, Belichtungsmasken-Herstellungsverfahren und Halbleitereinrichtungs-Herstellungsverfahren Exposure mask substrate manufacturing method, exposure mask manufacturing method and semiconductor device production method |
| 03/16/2005 | CN1596385A Half-tone type phase shift mask blank, half-tone type phase shift mask and process for producing same |
| 03/16/2005 | CN1595296A Lithographic antireflective hardmask compositions and uses thereof |
| 03/16/2005 | CN1193405C Optical mask, its producing method, image forming method and method for producing semiconductor device |
| 03/15/2005 | US6868537 Method of generating an IC mask using a reduced database |
| 03/15/2005 | US6868355 Automatic calibration of a masking process simulator |
| 03/15/2005 | US6868209 Optical fiber Bragg gratings and an improved method for writing masks for use in fabricating in-fiber chirped Bragg gratings. |
| 03/15/2005 | US6868175 Pattern inspection apparatus, pattern inspection method, and recording medium |
| 03/15/2005 | US6867845 Mask and projection exposure apparatus |
| 03/15/2005 | US6867843 Debris removing system for use in X-ray light source |
| 03/15/2005 | US6867109 Mask set for compensating a misalignment between patterns and method of compensating a misalignment between patterns using the same |
| 03/15/2005 | US6866987 Resolution and process window improvement using lift-off |
| 03/15/2005 | US6866971 Full phase shifting mask in damascene process |
| 03/15/2005 | US6866970 Energy reflecting mask; removes heat; reducing magnification and focus deviations |
| 03/15/2005 | US6866969 Photomask, microstructure, manufacturing method of photomask, and aligner |
| 03/15/2005 | US6866968 Photomask for off-axis illumination and method of fabricating the same |
| 03/15/2005 | US6866967 A phase shifting mask is disclosed in this present invention. The above-mentioned phase shifting mask comprises a quartz layer and a plurality of transmission adjustor layer onto the quartz layer. By employing the above-mentioned phase shifting |
| 03/10/2005 | WO2005022265A2 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 03/10/2005 | WO2005022259A2 Attaching a pellicle frame to a reticle |
| 03/10/2005 | WO2005022258A2 Photomask and method for maintaining optical properties of the same |
| 03/10/2005 | US20050055658 Method for adaptive segment refinement in optical proximity correction |
| 03/10/2005 | US20050053859 Photoresist, photolithography method using the same, and method for producing photoresist |
| 03/10/2005 | US20050053851 Energy is reflected by first image before passing through substrate and reflected by second image after passing through substrate; masking for photolithography |
| 03/10/2005 | US20050053848 Pattern on surface of substrate ; extracting contours from image map ; generating features; analyzing, determination, positioning |
| 03/10/2005 | US20050053847 Photolithography; forming semiconductors, integrated circuits; detecting defects |
| 03/10/2005 | US20050053846 Phase shift assignments for alternate PSM |
| 03/10/2005 | US20050053845 Attenuating phase shift mask blank and photomask |
| 03/10/2005 | US20050053844 High energy beam sensitive glass; diffractive optical element within photoresist coated on quartz glass; photolithography |
| 03/10/2005 | US20050051516 Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument |
| 03/10/2005 | DE10392343T5 Maske, Herstellungsverfahren für Halbleitereinrichtung und Halbleitereinrichtung Mask manufacturing method of semiconductor device and semiconductor device |
| 03/09/2005 | EP1513012A2 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
| 03/09/2005 | CN1591827A Method of generating interconnection pattern |
| 03/09/2005 | CN1591773A Film electric crystal array substrate and its micro-shadow mfg. method, and light shade designing method |
| 03/09/2005 | CN1591200A Optical proximity correcting method |
| 03/09/2005 | CN1591193A Attaching a pellicle frame to a reticle |
| 03/09/2005 | CN1591189A Source and mask optimization |
| 03/09/2005 | CN1591182A Optical etching method |
| 03/09/2005 | CN1591181A Pellicle for lithography |
| 03/09/2005 | CN1591180A Mask mfg. method |
| 03/09/2005 | CN1590957A Original negative, exposure method and original negative making method |
| 03/08/2005 | US6864182 Method of producing large-area membrane masks by dry etching |
| 03/08/2005 | US6864021 Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process |
| 03/08/2005 | US6864020 Chromeless phase shift mask using non-linear optical materials |
| 03/08/2005 | US6862817 Method and apparatus for kinematic registration of a reticle |
| 03/03/2005 | WO2005019945A1 Spatial-heterodyne interferometry for reflection and transmission (shirt) measurements |
| 03/03/2005 | WO2005019944A1 Spatial-heterodyne interferometry for transmission (shift) measurements |
| 03/03/2005 | WO2005019938A1 Proportional variable resistor structures to electrically measure mask misalignment |
| 03/03/2005 | WO2004095136A3 Arrangement for inspecting objects, especially masks in microlithography |
| 03/03/2005 | US20050050511 System and method of correcting mask rule violations after optical proximity correction |
| 03/03/2005 | US20050050490 Method and equipment for simulation |
| 03/03/2005 | US20050049839 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 03/03/2005 | US20050048764 Method of generating interconnection pattern |
| 03/03/2005 | US20050048417 determining an optical characteristic of an antireflective coating;forming a resist feature above the coating by photolithography; andreducing a size of the feature by etching that is controlled on the basis of initial feature size, desired feature critical dimension, and the optical characteristic |
| 03/03/2005 | US20050048381 Semiconductor device and method of forming the same as well as a photo-mask used therein |
| 03/03/2005 | US20050048380 Dustproof protection film; low cost; uniformity; high light transmission; manufacturing liquid crystal display panels; pellicle film of multi-layer structure of fluorine-doped silica and fluorocarbon resin; high transmittance and high light stability against light of short wavelength |
| 03/03/2005 | US20050048379 image of the structure of the lithography mask is generated by an imaging optic of a microscope; parameters of wavelength lambda , the numerical aperture NA and the coherence of the illumination sigma of the imaging optic of the microscope are chosen such that the inequality P <= lambda NA(1+ sigma ) |
| 03/03/2005 | US20050048378 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 03/03/2005 | US20050048377 Mask for improving lithography performance by using multi-transmittance photomask |
| 03/03/2005 | US20050048376 amorphous cyclized perfluoropolymer pellicle membrane mounted between outer and inner frames attached to the reticle without using conventional adhesives |
| 03/03/2005 | US20050048375 Method of making an attenuated phase-shifting mask from a mask blank |
| 03/03/2005 | US20050048288 Composition and process using fluorinated diols with amide and phosphonate groups with reduced contamination for articles with adhesion do substrates |
| 03/03/2005 | US20050047543 Method and apparatus for personalization of semiconductor |
| 03/03/2005 | US20050046858 Spatial-heterodyne interferometry for reflection and transmission (SHIRT) measurements |
| 03/03/2005 | US20050046857 Spatial-heterodyne interferometry for transmission (SHIFT) measurements |
| 03/03/2005 | US20050046819 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 03/03/2005 | US20050045584 use of a "gas purge" on a photomask during steps to repair opaque defects on photomasks wherein the etching assist gas is minimized by reaction with styrene |
| 03/03/2005 | US20050045262 Attaching a pellicle frame to a reticle |
| 03/03/2005 | DE10335982A1 Checking method for imaging characteristics of photomask used for microelectronic circuit manufacture using ultra-violet imaging of mask onto photoelectric converter |
| 03/03/2005 | DE102004008378A1 Optisches Nähenkorrekturverfahren Optical proximity correction method |
| 03/02/2005 | CN1588225A Optical mask liquid crystal projection color developing method and its device |
| 03/02/2005 | CN1191610C Semiconductor integrated circuit device, and method for producing the same, and method of producing masks |
| 03/01/2005 | US6862726 Light intensity simulation method, program product, and designing method of photomask |
| 03/01/2005 | US6861657 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/01/2005 | US6861648 Scanning probe microscopy inspection and modification system |
| 03/01/2005 | US6861204 Design and layout of phase shifting photolithographic masks |
| 03/01/2005 | US6861203 Non-permanent inkjetted flexographic mask |
| 03/01/2005 | US6861183 Scatter dots |
| 03/01/2005 | US6861182 Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process |
| 03/01/2005 | US6861181 Photomask and method for evaluating an initial calibration for a scanning electron microscope |
| 03/01/2005 | US6861180 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/01/2005 | US6861179 Charge effect and electrostatic damage prevention method on photo-mask |
| 03/01/2005 | US6861178 Phase shift mask, method of exposure, and method of producing semiconductor device |
| 03/01/2005 | US6861176 Hole forming by cross-shape image exposure |
| 02/24/2005 | WO2005017949A2 Method for high-resolution processing of thin layers with electron beams |
| 02/24/2005 | WO2005017785A1 Method for creating patterns for producing integrated circuits |
| 02/24/2005 | WO2005017621A1 Method of producing phase shift masks |
| 02/24/2005 | WO2003085709A9 Reflection type mask blank and reflection type mask and production methods for them |
| 02/24/2005 | US20050044522 Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure |
| 02/24/2005 | US20050044513 Contrast based resolution enhancement for photolithographic processing |
| 02/24/2005 | US20050043903 Circuit-pattern inspection apparatus |
| 02/24/2005 | US20050042780 Integrated circuit identification |
| 02/24/2005 | US20050042553 Durable coating with low surface energy, extend phototool (mask) service life by reducing cleaning requirements, improves circuit making yield |
| 02/24/2005 | US20050042529 Box-in-box field-to-field alignment structure |
| 02/24/2005 | US20050042528 Photomask for semi-transmission film is formed in one step process; large-scale |
| 02/24/2005 | US20050042527 Phase shift mask including sub-resolution assist features for isolated spaces |
| 02/24/2005 | US20050042526 Photomask blank and method of fabricating a photomask from the same |
| 02/24/2005 | US20050042525 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 02/24/2005 | US20050042524 Process for making hard pellicles |