| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/06/2005 | CN1603949A Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 04/06/2005 | CN1603948A Attenuating phase shift mask blank and photomask |
| 04/06/2005 | CN1196175C Method of manufacture for transfer mask |
| 04/06/2005 | CN1196031C Method for error reduction in lithography |
| 04/05/2005 | US6877151 Photomask visual inspection system |
| 04/05/2005 | US6876792 Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask |
| 04/05/2005 | US6876437 Illumination optical system, exposure method and apparatus using the same |
| 04/05/2005 | US6876092 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 04/05/2005 | US6876024 Method and layout for MOS capacitors with phase shifted layers |
| 04/05/2005 | US6875952 Substrate having repaired metallic pattern and method and device for repairing metallic pattern on substrate |
| 04/05/2005 | US6875546 Method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 04/05/2005 | US6875545 Performing a first exposure of the substrate utilizing a x-dipole illumination, and a second exposure of the substrate utilizing a y-dipole illumination; using optical proximity correction |
| 04/05/2005 | US6875544 Method for the fabrication of three-dimensional microstructures by deep X-ray lithography |
| 04/05/2005 | US6875543 Writing pattern; reflective multilayer coating |
| 04/05/2005 | US6874419 Providing customized text and imagery on organic products |
| 03/31/2005 | WO2005029183A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/31/2005 | WO2005029182A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/31/2005 | WO2005029181A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 03/31/2005 | WO2005029180A2 Applications of semiconductor nano-sized particles for photolithography |
| 03/31/2005 | WO2004088425A3 Contact masks and lithographic patterning methods using said masks |
| 03/31/2005 | WO2004021049A3 Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles |
| 03/31/2005 | US20050069789 Photomasking |
| 03/31/2005 | US20050069788 Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 03/31/2005 | US20050069787 Mask blanks and method of producing the same |
| 03/31/2005 | US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/31/2005 | US20050069785 determining degradation by printing on a wafer with a stepper a mask image of monitor structures located in a transition between clear and opaque regions, one stepping distance apart; measuring the displacement between structures; determining pellicle degradation by dispalcement from each other |
| 03/31/2005 | US20050069783 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 03/31/2005 | US20050069782 Each full-depth producing pattern includes an area of UV light-blocking material on a transparent plate that has a smaller dimension equal to or greater than minimum resolvable size; partial-depth producing pattern has an area of UV light-blocking material with smaller dimension less than minimum size |
| 03/31/2005 | US20050069781 conventional exposure, development and baking processes; photomask includes an array of first and second phase shift regions and a non phase shift region; elimination of side-lobe effects; integrated circuits; photolithography |
| 03/31/2005 | US20050067103 Interferometer endpoint monitoring device |
| 03/31/2005 | DE10339888A1 Mask used in photolithographic process for manufacturing integrated circuits, has absorbent layer with more readily-etched layer near substrate |
| 03/31/2005 | DE10339514A1 Light projection system for use during manufacture of semiconductor elements on substrate has lamp shining light through slit onto mask or reticle scanned in front of lens |
| 03/31/2005 | DE102004035617A1 Verfahren zur Herstellung von Substraten für Fotomaskenrohlinge Process for the preparation of substrates for photomask blanks |
| 03/30/2005 | EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/30/2005 | EP1518150A2 Method of using an amorphous carbon layer for reticle fabrication |
| 03/30/2005 | CN1602450A Method and apparatus for image formation |
| 03/30/2005 | CN1602449A Method of enhancing phase shift masks |
| 03/30/2005 | CN1602448A Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 03/30/2005 | CN1601697A Method of forming light resist pattern by using reflect nearby effect |
| 03/30/2005 | CN1601387A Self-aligning method for outskirt state phase shifting light shade |
| 03/29/2005 | US6873720 System and method of providing mask defect printability analysis |
| 03/29/2005 | US6872510 Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same |
| 03/29/2005 | US6872508 Exposure method and method of manufacturing semiconductor device |
| 03/29/2005 | US6872497 Reflective mask for short wavelength lithography |
| 03/29/2005 | US6872496 Providing transparent substrate; forming first thickness of first aluminum-silicon oxide blanket attenuating phase shifting layer; forming second thickness of second aluminum-silicon oxide blanket attenuating phase shifting |
| 03/29/2005 | US6872495 Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection mask |
| 03/29/2005 | US6872494 Photomask for efficiently performing simulation and forming suitable resist patterns |
| 03/29/2005 | US6872320 Maintaining surface to be etched below freezing temperature of phase-change masking material; ejecting in liquid form droplets of phase change masking material in a predetermined pattern; etching surface to remove material; removing mask |
| 03/24/2005 | WO2005026837A2 Imprint lithographic method, and device and stamp for use in imprint lithography |
| 03/24/2005 | WO2005026836A2 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 03/24/2005 | WO2005026706A1 Method for high efficiency multipass article inspection |
| 03/24/2005 | US20050066300 Method for interlayer and yield based optical proximity correction |
| 03/24/2005 | US20050064728 Methods for forming a photoresist pattern using an anti-optical proximity effect |
| 03/24/2005 | US20050064304 Phase shifting for changing the phase of transmitted exposure light, having an optical transmissivity different from the mask substrate; etching the substrate to change the phase of the transmitted light; shielding layer is formed of chromium or molybdenum silicon oxynitride; semiconductor |
| 03/24/2005 | US20050064303 A pattern of a fine opening provided in the light blocking layer; optical head; for generating light; semiconductor processing for improve in fineness of microlithography |
| 03/24/2005 | US20050064302 Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask |
| 03/24/2005 | US20050064301 Forming a first fine pattern which has a fine opening, having a size of not more than a wavelength of exposure light; forming a second mask; for use with microprocessing in a short time; microlithography |
| 03/24/2005 | US20050064300 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |
| 03/24/2005 | US20050064299 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same |
| 03/24/2005 | US20050064298 Multilayer coatings for EUV mask substrates |
| 03/24/2005 | US20050064296 Removing the ions from the quartz blank by incineration process |
| 03/24/2005 | US20050064054 Pattern forming apparatus |
| 03/24/2005 | US20050063030 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment |
| 03/24/2005 | US20050062947 Near-field exposure apparatus |
| 03/24/2005 | DE10340611A1 Lithographic mask for making integrated semiconductor circuit by photolithographic process, comprising angular structure element formed by two opaque segments, with adjacent transparent structure at convex section of angular structure |
| 03/24/2005 | DE10340608A1 Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht Polymer formulation and method for producing a dielectric layer |
| 03/24/2005 | DE10338019A1 Verfahren zum hochaufgelösten Bearbeiten dünner Schichten mit Elektronenstrahlen A method for high-resolution processing of thin films with electron |
| 03/24/2005 | DE102004035559A1 Verfahren zur Auswahl von Substraten für Fotomaskenrohlinge Procedures for the selection of substrates for photomask blanks |
| 03/23/2005 | EP1517180A2 Method of producing a pattern and photomask used in the same |
| 03/23/2005 | EP1517177A2 Method of producing a pattern and photomask used in the same |
| 03/23/2005 | EP1516863A1 Ultra low thermal expansion transparent glass-ceramics |
| 03/23/2005 | EP1516745A1 Photosensitive resin composition for original printing plate capable of being carved by laser |
| 03/23/2005 | EP1177428B1 Inspection systems performing two-dimensional imaging with line light spots |
| 03/23/2005 | CN1599883A Photosensitive flexible printing element and method for the production of newspaper flexible printing plates |
| 03/23/2005 | CN1599029A Template padding method for padding edges of holes on semiconductor masks |
| 03/22/2005 | US6871338 Semiconductor integrated circuit device and method for designing the same |
| 03/22/2005 | US6871337 Optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic; improved depth of focus |
| 03/22/2005 | US6870168 Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool |
| 03/22/2005 | US6869738 The serifs or pattern combine to produce an optical proximity correction that reduces corner rounding and increases edge straightness in the resist pattern |
| 03/22/2005 | US6869736 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 03/22/2005 | US6869735 Method of pattern layout of a photomask for pattern transfer |
| 03/22/2005 | US6869734 EUV reflective mask having a carbon film and a method of making such a mask |
| 03/22/2005 | US6869733 Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks |
| 03/22/2005 | US6869732 Glass substrate for photomasks and preparation method |
| 03/22/2005 | US6869155 Method and apparatus for masking a workpiece with ink |
| 03/17/2005 | WO2005024520A2 Phototool coating |
| 03/17/2005 | WO2005024519A1 Optical proximity effect correction processing method allowing for dummy pattern |
| 03/17/2005 | WO2005024518A2 Phase shift mask blank with increased uniformity |
| 03/17/2005 | WO2005023940A2 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 03/17/2005 | WO2005023822A1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 03/17/2005 | WO2003019626A3 Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask |
| 03/17/2005 | US20050060682 Resolving phase-shift conflicts in layouts using weighted links between phase shifters |
| 03/17/2005 | US20050058915 Photomask |
| 03/17/2005 | US20050058914 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method |
| 03/17/2005 | US20050058913 Stencil mask, charged particle irradiation apparatus and the method |
| 03/17/2005 | US20050058912 First phase shift section and the half tone section are shifted 180 degrees with the second phase shift region; assists in balancing the intensity between light passing thru the first and second phase shift sections |
| 03/17/2005 | US20050058836 Sublimating process for cleaning and protecting lithography masks |
| 03/17/2005 | US20050057998 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 03/17/2005 | US20050057796 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 03/17/2005 | US20050057740 Lithography tool having a vacuum reticle library coupled to a vacuum chamber |