| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/28/2005 | US20050088099 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/27/2005 | EP1526550A1 Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
| 04/27/2005 | EP1526406A1 Photomask |
| 04/27/2005 | EP1526405A2 Phase shift mask blank, phase shift mask, and pattern transfer method |
| 04/27/2005 | EP1525512A2 Method of forming and repairing a lithographic template having a gap defect |
| 04/27/2005 | EP1280664A4 Chemical imaging of a lithographic printing plate |
| 04/27/2005 | CN1609715A Top layer of a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
| 04/27/2005 | CN1199246C Pattern film repair using a gas assisted focused particle beam system |
| 04/26/2005 | US6885436 Optical error minimization in a semiconductor manufacturing apparatus |
| 04/26/2005 | US6885433 Projection exposure apparatus and method |
| 04/26/2005 | US6884984 System and method for lithography process monitoring and control |
| 04/26/2005 | US6884570 Actinic ray-curable urethane resin containing vinyl ether, vinyl ester or propenyl ester groups |
| 04/26/2005 | US6884569 Method of manufacturing TFT array |
| 04/26/2005 | US6884552 Focus masking structures, focus patterns and measurements thereof |
| 04/26/2005 | US6884551 Exposing the substrate using a mask containing gray-tone features |
| 04/26/2005 | US6884550 Insertion of dummy pattern; uniform etching; accuracy patterns |
| 04/21/2005 | WO2005036600A2 System and method for automatically mounting a pellicle assembly on a photomask |
| 04/21/2005 | WO2005036266A1 Masks, lithography device and semiconductor component |
| 04/21/2005 | WO2005036264A2 Photomask having an internal substantially transparent etch stop layer |
| 04/21/2005 | WO2005010612A3 Defect inspection of extreme ultraviolet lithography masks and the like |
| 04/21/2005 | WO2004011161A3 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 04/21/2005 | US20050086629 Method of defining forbidden pitches for a lithography exposure tool |
| 04/21/2005 | US20050085385 Laser-generated ultraviolet radiation mask |
| 04/21/2005 | US20050084806 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 04/21/2005 | US20050084773 photomasks for use in photolithography comprising substrates having antireflective layers having low thermal expansion and reflective multilayers |
| 04/21/2005 | US20050084772 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 04/21/2005 | US20050084771 Phase shift mask |
| 04/21/2005 | US20050084769 Manufacturable chromeless alternating phase shift mask structure with phase grating |
| 04/21/2005 | US20050084768 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 04/21/2005 | US20050084767 directing pulsed laser beams through substrates and focusing it on a target located in the substrate adjacent to coating layers, to write a diffractive optical element, thus changing the scattering properties of the substrate at the target location; masks for use in photolithography |
| 04/21/2005 | US20050084766 lithography using computer controlled imaging layouts, such as spatial light modulators (SLM), with an improved virtual grid |
| 04/21/2005 | US20050083518 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 04/21/2005 | US20050083498 [dynamic mask module] |
| 04/21/2005 | US20050082496 Method and apparatus for image formation |
| 04/21/2005 | DE19756518B4 Herstellungsverfahren für eine Phasenverschiebungs-Photomaske Manufacturing method for a phase shift photomask |
| 04/21/2005 | DE10324502B3 Photomaske, sowie Verfahren zur Herstellung von Halbleiter-Bauelementen Photomask, and to processes for the production of semiconductor devices |
| 04/20/2005 | EP1523696A2 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 04/20/2005 | EP1370911A4 Enchanced bright peak clear phase shifting mask and method of use |
| 04/20/2005 | CN1607649A Forming method of contact hole and manufacturing method of semiconductor device |
| 04/20/2005 | CN1607460A Polarizing film mask slice with high resolution |
| 04/20/2005 | CN1607191A Ultra low thermal expansion transparent glass ceramics |
| 04/20/2005 | CN1198316C Thin film |
| 04/19/2005 | US6883160 Pattern inspection apparatus |
| 04/19/2005 | US6883159 Patterning semiconductor layers using phase shifting and assist features |
| 04/19/2005 | US6883158 Method for error reduction in lithography |
| 04/19/2005 | US6882406 Euv lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer, device manufacturing method and device manufactured thereby |
| 04/19/2005 | US6881991 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 04/19/2005 | US6881523 Photolithography mask for optically transferring a pattern formed in mask onto a substrate and for negating optical proximity effects |
| 04/14/2005 | WO2004107044A3 Mask, mask blank, photosensitive material therefor and fabrication thereof |
| 04/14/2005 | WO2004086143A3 Multi-step process for etching photomasks |
| 04/14/2005 | US20050081180 Elicits an immune response against a canine IL-4 protein or has IL-4 activity. |
| 04/14/2005 | US20050081179 Method and apparatus for generating an OPC segmentation based on modeled intensity gradients |
| 04/14/2005 | US20050081178 Multiple exposure technique to pattern tight contact geometries |
| 04/14/2005 | US20050079654 Variable rotational assignment of interconnect levels in integrated circuit fabrication |
| 04/14/2005 | US20050079427 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 04/14/2005 | US20050079426 A self-supported complimentary pattern of a cantilevered beam; the aspect ratio is confined between 100 and 150; lithography |
| 04/14/2005 | US20050079425 determining location-dependent density of mask structures resulting in structure density; determining location-dependent strength of loading effect with aid of structure density; determining correction values for mask structures using strength of loading effect for compensating for loading effect |
| 04/14/2005 | US20050077267 removing chrome from the surface of a calcium fluoride (CaF2) object by etching the chrome a first amount in a first chrome etchant, and etching the chrome a second amount beyond the first amount in second selective chrome etchant, such that the CaF2 object maintains a micro-roughness. |
| 04/14/2005 | US20050077266 Methods for converting reticle configurations |
| 04/14/2005 | DE10339786A1 Half-tone phase mask for projection of its structure onto substrate in manufacturing integrated circuits with periodical setting fully transparent and semi-transparent structure |
| 04/13/2005 | EP1522889A2 Method and apparatus for generating an OPC segmentation |
| 04/13/2005 | CN1606130A Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device |
| 04/13/2005 | CN1605937A Method for maintaining permissible level of microimage process |
| 04/13/2005 | CN1605936A Photomask and method for forming pattern |
| 04/13/2005 | CN1605935A Modular optical proximate correction configuration and method thereof applicable for integrated circuit |
| 04/13/2005 | CN1605934A Exposure device detecting mask, exposure device detecting method and exposure device |
| 04/13/2005 | CN1605397A Mask blanks and method of producing the same |
| 04/12/2005 | US6879605 Method and apparatus for performing pattern defect repair using Q-switched mode-locked pulse laser |
| 04/12/2005 | US6879406 Use of scatterometry as a control tool in the manufacture of extreme UV masks |
| 04/12/2005 | US6879393 Defect inspection apparatus for phase shift mask |
| 04/12/2005 | US6879374 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 04/12/2005 | US6878950 Method of reducing heat-induced distortion of photomasks during lithography |
| 04/12/2005 | US6878900 Method and apparatus for repair of defects in materials with short laser pulses |
| 04/07/2005 | WO2005031468A1 Near-field light generating method near-field exposure mask and near-field exposure method and apparatus |
| 04/07/2005 | WO2005031458A2 Forming partial-depth features in polymer film |
| 04/07/2005 | WO2004095399A3 Providing cutomized text and imagery on organic products |
| 04/07/2005 | WO2004015496A3 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams |
| 04/07/2005 | US20050076321 Method of photomask correction and its optimization using localized frequency analysis |
| 04/07/2005 | US20050076320 Layout structure of semiconductor integrated circuit and method for forming the same |
| 04/07/2005 | US20050074708 Method for the manufacture of an active matrix, corresponding electro-optical display devices and mask |
| 04/07/2005 | US20050074706 Enhancing photoresist performance using electric fields |
| 04/07/2005 | US20050074700 Method for imaging a semiconductor wafer |
| 04/07/2005 | US20050074689 Silicon-containing compositions for spin-on arc/hardmask materials |
| 04/07/2005 | US20050074682 Forming slit features intersecting one another with good reproducibility; photomask has first light-shielding portions each in insular shape that shield exposure light and are spaced equidistantly; second light-shielding portion is formed to contain a point located equidistantly from first portions |
| 04/07/2005 | US20050074679 Method of manufacturing semiconductor device |
| 04/07/2005 | US20050074678 photomasks for production of semiconductors; photoresists |
| 04/07/2005 | US20050074677 Optical proximity correction (OPC); modifying a mask layout to include scattering bars, which increases the amount of scattering bars included in the mask design, while minimizing the number of individual pieces of scattering bars |
| 04/07/2005 | US20050074676 Chromium oxide film serves as etching stopper formed on diamond film serving as transmitter, and absorptive tungsten layer |
| 04/07/2005 | US20050074352 Method and system for active purging of pellice volumes |
| 04/07/2005 | US20050073664 photoresists; radiation transparency; level shifting caused by gravitational load is prevented |
| 04/07/2005 | US20050073052 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 04/07/2005 | DE10392327T5 Verfahren zum Herstellen einer Belichtungsmaske, Belichtungsmaske und Verfahren zum Herstellen einer Halbleitereinrichtung A method of manufacturing an exposure mask, the exposure mask and method for manufacturing a semiconductor device |
| 04/07/2005 | DE10343323A1 Stempellithografieverfahren sowie Vorrichtung und Stempel für die Stempellithografie Stamp lithography method and apparatus for the stamp and stamp lithography |
| 04/07/2005 | DE10339992A1 Eine Technik zur Erhöhung der Genauigkeit kritischer Abmessungen einer Gateelektrode durch Nutzung von Eigenschaften einer antireflektierenden Beschichtung One technique for increasing the accuracy of critical dimensions of a gate electrode by use of properties of an anti-reflective coating |
| 04/07/2005 | DE102004043430A1 Dämpfender Phasenverschiebungsmaskenrohling und Photomaske Steaming phase shift mask blank and photomask |
| 04/06/2005 | EP1521067A2 Optical imaging system |
| 04/06/2005 | EP1520208A2 Mask and manufacturing method using mask |
| 04/06/2005 | CN1605046A Method and apparatus for patterning a workpiece |
| 04/06/2005 | CN1603951A Slice and frame for slice |
| 04/06/2005 | CN1603950A Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |