| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/18/2005 | EP1531361A2 Stencil mask and method of producing the same |
| 05/18/2005 | EP1531360A2 Stencil mask and method of producing the same |
| 05/18/2005 | CN1618069A Photomask and method for qualifying the same with a prototype specification |
| 05/18/2005 | CN1618043A Multi-tone photomask and method for manufacturing the same |
| 05/18/2005 | CN1617047A Method, program product and apparatus for generating assist features utilizing an image field map |
| 05/18/2005 | CN1617046A Electro-optic device, substrate for electro-optic device and method for manufacturing the same, photomask, and electronic device |
| 05/18/2005 | CN1616992A Anti-glare film and image display device |
| 05/17/2005 | US6894774 Method of defect inspection of graytone mask and apparatus doing the same |
| 05/17/2005 | US6894766 Method for constructing a photomask assembly using an encoded mark |
| 05/17/2005 | US6894748 Bump structure of a scattering reflective board and method for manufacturing the bump structure |
| 05/17/2005 | US6894295 Emission collimation beams; masking patterns |
| 05/17/2005 | US6894291 Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system |
| 05/17/2005 | US6893806 Multiple purpose reticle layout for selective printing of test circuits |
| 05/17/2005 | US6893801 Fabrication method of semiconductor integrated circuit device |
| 05/17/2005 | US6893800 Substrate topography compensation at mask design: 3D OPC topography anchored |
| 05/17/2005 | US6893796 Photoresists; printing plate precursors; photothermography |
| 05/17/2005 | US6893786 Field correction of overlay error |
| 05/17/2005 | US6893785 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/17/2005 | US6893780 Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern |
| 05/17/2005 | US6893779 Phase shifting mask for manufacturing semiconductor device and method of fabricating the same |
| 05/17/2005 | US6893575 Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument |
| 05/17/2005 | US6893105 Method for printing an image from a halftone binary bitmap using multiple exposures |
| 05/12/2005 | WO2005043242A1 Photomask and video device manufacturing method |
| 05/12/2005 | WO2005042264A1 Laser-generated ultraviolet radiation mask |
| 05/12/2005 | WO2004079780A3 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 05/12/2005 | US20050102648 Orientation dependent shielding for use with dipole illumination techniques |
| 05/12/2005 | US20050101151 Laminate for IR ablation |
| 05/12/2005 | US20050100829 Lithography method |
| 05/12/2005 | US20050100802 Method for post-OPC multi layer overlay quality inspection |
| 05/12/2005 | US20050100801 Heat generated at surface can be radiated to support substrate; thin film with aperture pattern; plug |
| 05/12/2005 | US20050100800 Stencil mask and method of producing the same |
| 05/12/2005 | US20050100799 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 05/12/2005 | US20050100798 Device and method for providing wavelength reduction with a photomask |
| 05/12/2005 | US20050100797 Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
| 05/12/2005 | US20050099613 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus |
| 05/11/2005 | EP1530151A2 Process for correcting the recording skew when illuminating a printing master |
| 05/11/2005 | EP1530085A2 Electro-optic device substrate and method for manufacturing the same, electro-optic device and method for manufacturing the same, photomask, and electronic device |
| 05/11/2005 | EP1530084A1 A method for performing transmission tuning of a mask pattern to improve process latitude |
| 05/11/2005 | EP1530083A2 OPC based on decomposition into eigen-functions |
| 05/11/2005 | EP1529246A1 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 05/11/2005 | EP1529245A1 Arrangement for the production of photomasks |
| 05/11/2005 | EP1241523B1 Photomask, method of producing photomask |
| 05/11/2005 | CN2699337Y Light screen master film capable of preventing electron beam deviation caused by electric charge effect |
| 05/11/2005 | CN1614745A Method for preparing polycrystalline silicon layer and light shield |
| 05/11/2005 | CN1614508A Testing mask structure |
| 05/11/2005 | CN1201203C Alternating phase displacement light-cover |
| 05/10/2005 | US6892375 Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium |
| 05/10/2005 | US6891637 Information processing apparatus and method |
| 05/10/2005 | US6891171 Method for repairing a phase shift mask and a focused ion beam apparatus for carrying out method |
| 05/10/2005 | US6890692 Method of focus monitoring and manufacturing method for an electronic device |
| 05/10/2005 | US6890689 Error adjustment; patterning masking substrate with configuration recesses |
| 05/10/2005 | US6890387 Method and device for correcting pattern film on a semiconductor substrate |
| 05/06/2005 | WO2005040919A1 Photo mask, pattern formation method using the same, and mask data generation method |
| 05/06/2005 | WO2005023940A3 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 05/05/2005 | US20050097502 Accommodating diffraction in the printing of features on a substrate |
| 05/05/2005 | US20050097501 Site control for OPC |
| 05/05/2005 | US20050095802 Alignment mark structure |
| 05/05/2005 | US20050095513 Patterns with apertures; rectangle light shielding zones; exposure; uniform light applied to photosensitive body ; reduction of variations in line width; forming semiconductors |
| 05/05/2005 | US20050095512 Lithography mask for imaging of convex structures |
| 05/05/2005 | US20050095510 Flare measuring mask and flare measuring method of semiconductor aligner |
| 05/05/2005 | US20050095509 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same |
| 05/05/2005 | US20050094271 Hybrid optical component for x ray applications and method associated therewith |
| 05/05/2005 | US20050093960 Method for correcting skewed recording when exposing printing originals |
| 05/05/2005 | US20050092921 Sheet beam-type inspection apparatus |
| 05/04/2005 | EP1528429A2 Feature optimization of reticle structures using enhanced interference mapping |
| 05/04/2005 | EP1527373A1 Method for producing flexo printing forms by means of laser direct engraving |
| 05/04/2005 | EP1176466B1 Halftone phase shift photomask and photomask blank |
| 05/04/2005 | CN1612050A Method for extending the range of lithographic simulation integrals |
| 05/04/2005 | CN1612049A Method for executing optical near correction based on model |
| 05/04/2005 | CN1612047A Method for executing optical near correction based on model |
| 05/04/2005 | CN1612046A Method for executing photoetching correction based on model |
| 05/04/2005 | CN1200319C Method of evaluation of mask image using aerial image simulator |
| 05/03/2005 | US6889162 Wafer target design and method for determining centroid of wafer target |
| 05/03/2005 | US6888616 Programmable photolithographic mask system and method |
| 05/03/2005 | US6888250 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 05/03/2005 | US6887644 Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist |
| 05/03/2005 | US6887633 Photolithography design; determination spacings |
| 05/03/2005 | US6887630 Method and apparatus for fracturing polygons on masks used in an optical lithography process |
| 05/03/2005 | US6887629 Radiation-patterning tool |
| 05/03/2005 | US6887628 Manufacturing method for photomask |
| 05/03/2005 | US6887627 Method of fabricating phase shift mask |
| 05/03/2005 | US6887626 Stencil/membrane-type photomask for arranging batch projections so that pattern density is balanced over semiconductor substrate |
| 05/03/2005 | US6887625 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |
| 04/28/2005 | WO2005038527A2 Enhancing photoresist performance using electric fields |
| 04/28/2005 | US20050091634 Renesting interaction map into design for efficient long range calculations |
| 04/28/2005 | US20050091632 Mask data preparation |
| 04/28/2005 | US20050091631 Extending the range of lithographic simulation integrals |
| 04/28/2005 | US20050091014 Performance in model-based OPC engine utilizing efficient polygon pinning method |
| 04/28/2005 | US20050091013 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare |
| 04/28/2005 | US20050090925 Method and device for control of the data flow on application of reticles in a semiconductor component production |
| 04/28/2005 | US20050090120 removing post-etch residue; passivating silicon oxide low-k materials; solution comprises a silylating agent such as hexamethyldisilazane (HMDS), chlorotrimethylsilane (TMCS), trichloromethylsilane (TCMS) |
| 04/28/2005 | US20050089770 Printing irregularly-spaced contact holes using phase shift masks |
| 04/28/2005 | US20050089768 Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product |
| 04/28/2005 | US20050089767 Alternate aperture phase shifting mask; integrated circuit fabrication, photolithography |
| 04/28/2005 | US20050089765 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 04/28/2005 | US20050089764 Multi-step phase shift mask and methods for fabrication thereof |
| 04/28/2005 | US20050089763 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings |
| 04/28/2005 | US20050089761 Method for producing exposure mask, exposure mask, and method for producing semiconductor device |
| 04/28/2005 | US20050089211 Simultaneous computation of multiple points on one or multiple cut lines |
| 04/28/2005 | US20050088592 Bump structure of a scattering reflective board and method for manufacturing the bump structure |