| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/18/2014 | DE102013204444A1 Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik Illumination optics for a mask inspection system and mask inspection system with such an illumination optics |
| 09/18/2014 | DE102013108872A1 Fotomasken für extrem ultraviolettes Licht (EUV) sowie Herstellungsverfahren dieser Photo masks for extreme ultraviolet (EUV) and manufacturing method of this |
| 09/16/2014 | US8839169 Pattern determining method, pattern determining apparatus and storage medium |
| 09/16/2014 | US8839160 Masks for double patterning photolithography |
| 09/16/2014 | US8839158 Pattern designing method, pattern designing program and pattern designing apparatus |
| 09/16/2014 | US8837108 Glass substrate-holding tool and method for producing an EUV mask blank by employing the same |
| 09/16/2014 | US8835083 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device |
| 09/16/2014 | US8834674 Plasma etching apparatus |
| 09/11/2014 | US20140258946 Mask set for double exposure process and method of using the mask set |
| 09/11/2014 | US20140255832 Hardcoat compositions |
| 09/11/2014 | US20140255831 Method and apparatus for protecting a substrate during processing by a particle beam |
| 09/11/2014 | US20140255830 Apparatus and methods for fabricating a photomask substrate for euv applications |
| 09/11/2014 | US20140255829 Mask for dual tone development |
| 09/11/2014 | US20140255828 Euvl process structure fabrication methods |
| 09/11/2014 | US20140255827 Pellicles with reduced particulates |
| 09/11/2014 | US20140255826 Endpoint Detection for Photolithography Mask Repair |
| 09/11/2014 | US20140255825 Mask Blank for Scattering Effect Reduction |
| 09/11/2014 | US20140254913 Multistage extreme ultra-violet mask qualification |
| 09/09/2014 | US8832610 Method for process window optimized optical proximity correction |
| 09/09/2014 | US8832607 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device |
| 09/09/2014 | US8828645 Negative resist composition and patterning process |
| 09/09/2014 | US8828630 Photosensitive resin composition and color filter using the same |
| 09/09/2014 | US8828628 Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
| 09/09/2014 | US8828627 Reflective mask blank for EUV lithography and reflective mask for EUV lithography |
| 09/09/2014 | US8828626 Substrate with reflective layer for EUV lithography and reflective mask blank for EUV lithography |
| 09/09/2014 | US8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same |
| 09/09/2014 | US8827467 Magnifying imaging optical unit and metrology system including same |
| 09/04/2014 | US20140248555 Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof |
| 09/04/2014 | US20140248554 Sub-resolution assist devices and methods |
| 09/04/2014 | US20140247975 Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders |
| 09/04/2014 | US20140247434 Lithographic Focus and Dose Measurement Using A 2-D Target |
| 09/04/2014 | US20140246756 Lithography method and device |
| 09/03/2014 | EP2772802A1 Dual-mask photolithography method minimising the impact of substrate defects |
| 09/02/2014 | US8824774 Method and apparatus for inspecting patterns formed on a substrate |
| 09/02/2014 | US8822375 Method for activating colorant associated with an article |
| 09/02/2014 | US8822110 Photosensitive resin composition for color filter and color filter including the same |
| 09/02/2014 | US8822108 Reticles with subdivided blocking regions |
| 09/02/2014 | US8822107 Grid refinement method |
| 09/02/2014 | US8822106 Grid refinement method |
| 09/02/2014 | US8822105 Photomask and method for manufacturing the same |
| 09/02/2014 | US8822104 Photomask |
| 09/02/2014 | US8822103 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 08/28/2014 | WO2014127985A1 A lithography model for three-dimensional patterning device |
| 08/28/2014 | US20140244215 Method for determining mask pattern, non-transitory recording medium, and information processing apparatus |
| 08/28/2014 | US20140242733 Reflective mask, method of monitoring the same, and method of manufacturing semiconductor device |
| 08/28/2014 | US20140242502 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern |
| 08/28/2014 | US20140242501 Coating Of Shield Surfaces In Deposition Systems |
| 08/28/2014 | US20140242500 Process For Cleaning Shield Surfaces In Deposition Systems |
| 08/28/2014 | US20140242499 Light-reflective photomask and mask blank for euv exposure, and manufacturing method of semiconductor device |
| 08/28/2014 | US20140242498 Production method and evaluation apparatus for mask layout |
| 08/28/2014 | US20140239516 Carbosilane Polymer Compositions for Anti-Reflective Coatings |
| 08/28/2014 | DE102013004481A1 Vorrichtung und Verfahren zum Öffnen von Retikelhüllen Apparatus and method for opening Retikelhüllen |
| 08/28/2014 | DE102004008378B4 Optisches Nähenkorrekturverfahren Optical proximity correction method |
| 08/26/2014 | US8818144 Process for preparing an optical interposer for waveguides |
| 08/26/2014 | US8817367 Plasma ion assisted deposition of Mo/Si multilayer EUV coatings |
| 08/26/2014 | US8815478 Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound |
| 08/26/2014 | US8815477 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask |
| 08/26/2014 | US8815476 Pellicle membrane |
| 08/26/2014 | US8815475 Reticle carrier |
| 08/26/2014 | US8815474 Photomask defect correcting method and device |
| 08/26/2014 | US8815473 Generalization of shot definitions for mask and wafer writing tools |
| 08/21/2014 | WO2014125494A1 Surface defect repair by irradiation |
| 08/21/2014 | WO2014125000A1 Method for ascertaining distortion properties of an optical system in a measurement system for microlithography |
| 08/21/2014 | US20140237434 Photolithography mask design simplification |
| 08/21/2014 | US20140234757 Test pad structure for reuse of interconnect level masks |
| 08/21/2014 | US20140234756 Reflective mask blank for euv lithography, and reflective layer-coated substrate for euv lithography |
| 08/21/2014 | US20140234755 Mask blank substrate, mask blank, reflective mask blank, transfer mask, reflective mask, and methods of manufacturing the same |
| 08/21/2014 | US20140232997 Index matched grating inscription |
| 08/21/2014 | US20140231970 Method for processing a carrier, a carrier, an electronic device and a lithographic mask |
| 08/21/2014 | DE102014100055A1 Verfahren zum Bearbeiten eines Trägers, Träger, elektronische Vorrichtung und Lithographiemaske A method for processing a carrier, carriers, electronic device and lithography mask |
| 08/19/2014 | US8811713 Photomask inspection method, semiconductor device inspection method, and pattern inspection apparatus |
| 08/19/2014 | US8810776 Mask and optical filter manufacturing apparatus including the same |
| 08/19/2014 | US8810646 Focus offset contamination inspection |
| 08/19/2014 | US8809072 Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device |
| 08/19/2014 | US8808559 Etch rate detection for reflective multi-material layers etching |
| 08/14/2014 | US20140227635 Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same |
| 08/14/2014 | US20140226138 Photomask, photomask manufacturing apparatus, and photomask manufacturing method |
| 08/14/2014 | US20140226136 Method and apparatus for cleaning photomask handling surfaces |
| 08/13/2014 | EP2765455A1 Phase shift mask, asymmetric pattern forming method, diffraction grating manufacturing method and semiconductor device manufacturing method |
| 08/13/2014 | EP2764407A1 Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens |
| 08/13/2014 | CN103984203A 掩模版盒的上锁和解锁装置 Reticle cassette locking and unlocking device |
| 08/13/2014 | CN103984202A 掩膜板和彩膜基板的制作方法 Production methods mask and color film substrate |
| 08/13/2014 | CN103984201A 掩模板、掩模板的制造方法及掩模板的裂纹检测装置 Crack detection device mask, and the mask manufacturing method of mask |
| 08/13/2014 | CN103984200A 辅助图形的设计方法、测试版图的制作方法、光刻方法 Production methods assisted graphic design methods, test layout, lithography method |
| 08/13/2014 | CN103091974B 一种光刻版结构 A lithographic printing plate structure |
| 08/13/2014 | CN102866590B 用于对波前像差具有定制的响应的图案设计的方法和系统 Method for the wavefront aberration of the pattern having a custom design and system response |
| 08/13/2014 | CN102866574B 相移光掩模制作方法 Phase-shift photomask manufacturing method |
| 08/13/2014 | CN102511019B 薄膜及其掩模粘接剂 Adhesive film and the mask |
| 08/13/2014 | CN102375327B 嵌入衰减式相位移光罩及其制作方法 Embedded attenuated phase shift mask and manufacturing method thereof |
| 08/12/2014 | US8806394 Pattern-dependent proximity matching/tuning including light manipulation by projection optics |
| 08/12/2014 | US8806390 OPC conflict identification and edge priority system |
| 08/12/2014 | US8806388 Extraction of imaging parameters for computational lithography using a data weighting algorithm |
| 08/12/2014 | US8804902 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus |
| 08/12/2014 | US8802335 Extreme ultra violet (EUV) mask |
| 08/12/2014 | US8802334 Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask |
| 08/12/2014 | US8802333 Reflective lithography masks and systems and methods |
| 08/07/2014 | WO2014120985A1 Euv light source using cryogenic droplet targets in mask inspection |
| 08/07/2014 | US20140223392 Optimized optical proximity correction handling for lithographic fills |
| 08/07/2014 | US20140220482 Method for forming patterns |
| 08/07/2014 | US20140220481 Photomasks and methods of fabricating semiconductor devices using the same |