| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/07/2005 | US6902851 Method for using phase-shifting mask |
| 06/02/2005 | WO2005050719A1 Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography |
| 06/02/2005 | WO2005050317A2 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 06/02/2005 | WO2005050316A2 Method involving a mask or a reticle |
| 06/02/2005 | WO2005050310A2 Phase shift photomask and method for improving printability of a structure on a wafer |
| 06/02/2005 | WO2005050132A1 Method of inspecting unevenness defect of pattern and device therefor |
| 06/02/2005 | US20050120326 Method for producing for a mask a mask layout which avoids aberrations |
| 06/02/2005 | US20050120325 Method of verifying corrected photomask-pattern results and device for the same |
| 06/02/2005 | US20050118533 Planarization of substrate pits and scratches |
| 06/02/2005 | US20050118516 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape |
| 06/02/2005 | US20050118515 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 06/02/2005 | US20050117142 Assembly of a reticle holder and a reticle |
| 06/02/2005 | US20050116272 Semiconductor device and manufacturing method thereof |
| 06/02/2005 | DE19802369B4 Phasenschiebe-Photomasken-Herstellungsverfahren Phase shift photomask manufacturing process |
| 06/02/2005 | DE10353591A1 Verfahren zum lokal begrenzten Ätzen einer Chromschicht A method for localized etching a chromium layer |
| 06/02/2005 | DE10349764A1 Verfahren zur Generierung einer Hartmaske für die Strukturierung einer Schicht und Hartmaske zur Strukturierung einer Schicht Method for generating a hard mask for patterning a layer and hard mask for patterning a layer |
| 06/02/2005 | DE10154820B4 Verfahren zum Herstellen einer Maske für Halbleiterstrukturen A method of manufacturing a mask for semiconductor structures |
| 06/01/2005 | EP1536284A1 Phase shift mask and production method therefor and production method for semiconductor device |
| 06/01/2005 | EP1536283A1 Mask and inspection method therefor and production method for semiconductor device |
| 06/01/2005 | EP1536282A2 Methods and systems for estimating reticle bias states |
| 06/01/2005 | EP1535116A2 Improved photomask having an intermediate inspection film layer |
| 06/01/2005 | EP1535113A2 Exposure method, exposure mask, and exposure apparatus |
| 06/01/2005 | EP1534873A2 Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope |
| 06/01/2005 | CN1621947A Method for producing for a mask a mask layout which avoids aberrations |
| 06/01/2005 | CN1621941A Photomasks including shadowing elements therein and related methods and systems |
| 06/01/2005 | CN1204597C Phase-shift mask manufacturing method |
| 06/01/2005 | CN1204456C Laser imaged printing plates comprising multi-layer slip film |
| 06/01/2005 | CN1204455C System and method for lightening corner of mask to become round in production of said mask |
| 05/31/2005 | US6901577 Pattern forming method and semiconductor device manufactured by using said pattern forming method |
| 05/31/2005 | US6901576 Phase-width balanced alternating phase shift mask design |
| 05/31/2005 | US6901575 Resolving phase-shift conflicts in layouts using weighted links between phase shifters |
| 05/31/2005 | US6901574 Translation layout data; photolithography masking; computer recording; process control |
| 05/31/2005 | US6901569 Graphic arts; generating pattern; reducing, enlarging pattern; calibration; semiconductors, integrated circuits; photolithography |
| 05/31/2005 | US6901133 X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist material |
| 05/31/2005 | US6900878 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same |
| 05/31/2005 | US6900827 Optical recorder and method thereof |
| 05/31/2005 | US6899996 Hydrophilic water swelling particles in nonaqeuos solvent; lithography printing plates |
| 05/31/2005 | US6899981 Photomask and method for detecting violations in a mask pattern file using a manufacturing rule |
| 05/31/2005 | US6899980 Photomask material and process of producing photomask from the photomask material |
| 05/31/2005 | US6899979 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
| 05/31/2005 | US6899814 Creating a mask for producing a printing plate |
| 05/26/2005 | WO2005047976A2 Varying feature size in resist |
| 05/26/2005 | WO2005001573A3 Adhesion method using gray-scale photolithography |
| 05/26/2005 | WO2004099879A3 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
| 05/26/2005 | US20050114823 Method for improving a simulation model of photolithographic projection |
| 05/26/2005 | US20050114822 Integrated scheme for yield improvement by self-consistent minimization of IC design and process interactions |
| 05/26/2005 | US20050112504 Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 05/26/2005 | US20050112478 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography |
| 05/26/2005 | US20050112477 Multilayer light absorption film on quartz substrate; Sputtering in argon, oxygen, nitrogen atmosphere to deposit molybdenum silicon oxynitride film; chromium oxycarbide anti reflective film |
| 05/26/2005 | US20050112476 Phase-shift mask and fabrication thereof |
| 05/26/2005 | US20050112475 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 05/26/2005 | US20050112474 Method involving a mask or a reticle |
| 05/26/2005 | US20050112473 Transparent regions between two adjacent shielding regions and one depression; shielding pattern made of slightly translucent molybdenum silicide |
| 05/26/2005 | US20050111727 Advanced phase shift inspection method |
| 05/26/2005 | US20050111081 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 05/26/2005 | US20050111080 Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/26/2005 | US20050110997 Reticle, reticle inspection method and reticle inspection apparatus |
| 05/26/2005 | US20050110985 Advanced mask cleaning and handling |
| 05/26/2005 | US20050110146 Method for combining via patterns into a single mask |
| 05/26/2005 | US20050109278 Method to locally protect extreme ultraviolet multilayer blanks used for lithography |
| 05/25/2005 | DE4447836B4 Phasenverschiebungsmaske und Herstellungsverfahren dafür Phase shift mask and production method thereof |
| 05/25/2005 | DE10345525A1 Forming a pattern of opaque or semi-transparent structural elements on a photomask useful for the preparation of contact cavity-layers in storage elements and in semiconductor production |
| 05/25/2005 | DE10344645A1 Maske, Maskensubstrathalter und Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung mit der Maske und dem Maskensubstrathalter Mask, mask substrate holder and method for performing a double or multiple exposure with the mask and the mask substrate holder |
| 05/25/2005 | DE10341121A1 Electromagnetic irradiation of a specimen of chalcogenide based material in order to structure the specimen surface used as a mask for structuring a material under a specimen and for preparation of optical elements |
| 05/25/2005 | DE10051134B4 Verfahren zur Feststellung und automatischen Behebung von Phasenkonflikten auf alternierenden Phasenmasken A method for detection and automatic correction of phase conflicts on alternating phase masks |
| 05/25/2005 | CN1620632A Optical proximity correction for phase shifting photolithographic masks |
| 05/25/2005 | CN1619416A Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1619415A Silicon-containing compositions for spin-on arc/hardmask materials |
| 05/25/2005 | CN1203525C Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1203376C Pattern data converting method and apparatus |
| 05/24/2005 | US6898781 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 05/24/2005 | US6898780 Method and system for constructing a hierarchy-driven chip covering for optical proximity correction |
| 05/24/2005 | US6898779 Such as trace lines with fewer subsequent fabrication steps; allows a thinner, more planar deposition of an interlayer dielectric layer with a more uniform thickness. |
| 05/24/2005 | US6898267 X-ray mask |
| 05/24/2005 | US6898011 Multi-layered film reflector manufacturing method |
| 05/24/2005 | US6897942 Projection exposure apparatus and method |
| 05/24/2005 | US6897454 Energy beam exposure method and exposure apparatus |
| 05/24/2005 | US6897157 Method of repairing an opaque defect on a mask with electron beam-induced chemical etching |
| 05/24/2005 | US6897140 Fabrication of structures of metal/semiconductor compound by X-ray/EUV projection lithography |
| 05/24/2005 | US6897126 Semiconductor device manufacturing method using mask slanting from orientation flat |
| 05/24/2005 | US6897010 Opaque patterns; forming photoresists; exposure; photolithography |
| 05/24/2005 | US6897006 Substrate, photosensitive resinous layer having sensitivity to light excepting infrared light and comprising elastomeric binder resin, polymerizable monomeric compound and polymerization initiator, barrier, masking layer |
| 05/24/2005 | US6896998 Pattern forming method |
| 05/24/2005 | CA2259426C Composite relief image printing plates and methods for preparing same |
| 05/19/2005 | WO2005045897A2 Mask data preparation |
| 05/19/2005 | US20050108673 CAD method for arranging via-holes, a CAD tool, photomasks produced by the CAD method, a semiconductor integrated circuit manufactured with photomasks and a computer program product for executing the CAD method |
| 05/19/2005 | US20050106480 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
| 05/19/2005 | US20050106478 applying layers containing carbon over the layer to be patterned, then spin coating a layer containing silicon and carbon, andapplying an antireflective coating layer to be used with an overlying photoresist layer that is patternable using nanotechnology |
| 05/19/2005 | US20050106475 Mask substrate on which the patterned mask layer is arranged, has a protective layer to protect the mask layer from contact with impurity particles |
| 05/19/2005 | US20050106474 Method for controlling linewidth in advanced lithography masks using electrochemistry |
| 05/19/2005 | US20050106473 adjusting the line widths of all the straight lines of the second photomask pattern and the line spacings between all the straight lines of the second photomask pattern |
| 05/19/2005 | US20050106472 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 05/19/2005 | US20050106366 Biocompatibility protective coating; dielectrics; prevent current leakage |
| 05/19/2005 | US20050105180 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 05/19/2005 | US20050105073 Method for carrying out a double or multiple exposure |
| 05/19/2005 | US20050105068 Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device |
| 05/19/2005 | US20050103747 Process for the locally restricted etching of a chromium layer |
| 05/19/2005 | US20050103359 Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition |
| 05/19/2005 | DE10335565A1 Verfahren zur Überprüfung von periodischen Strukturen auf Lithographiemasken Proceedings for review of periodic structures on lithography masks |
| 05/19/2005 | DE10297658T5 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |