| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/14/2005 | DE10142593B4 Verfahren zur gegenseitigen Justierung von Strukturen auf einer Mehrebenen-Phasenschiebemaske Procedures for the mutual adjustment of structures on a multi-level phase shift mask |
| 07/13/2005 | EP1553446A1 Pattern size correcting device and pattern size correcting method |
| 07/13/2005 | EP1553445A2 Composition for blocking light and method of forming an image using the composition |
| 07/13/2005 | CN1639645A Full phase shifting mask in damascene process |
| 07/13/2005 | CN1639638A Mask repair with electron beam-induced chemical etching |
| 07/13/2005 | CN1638053A Method of adjusting deviation of critical dimension of patterns |
| 07/13/2005 | CN1638038A Laser beam pattern mask and crystallization method using the same |
| 07/13/2005 | CN1637607A Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/13/2005 | CN1637598A Surface protective film and surface protection material using the same film |
| 07/13/2005 | CN1637595A 掩模 Mask |
| 07/13/2005 | CN1637594A Exposure mask and exposure method using the same |
| 07/13/2005 | CN1637593A Mask and method of manufacturing liquid crystal display device using the same |
| 07/13/2005 | CN1637486A Method for fabricating a liquid crystal display device |
| 07/13/2005 | CN1636904A Doped-fluorine silicate glass and use thereof |
| 07/13/2005 | CN1210618C Dual layer reticle bland and manufacturing process |
| 07/12/2005 | US6918105 Phase-shift lithography mapping method and apparatus |
| 07/12/2005 | US6918104 Automatically identifying evaluation points where errors are computed and analyzed for improved agreement between a design layout and an actual printed feature |
| 07/12/2005 | US6917411 Simulating the image using varying off-axis illumination parameters |
| 07/12/2005 | US6917115 Alignment pattern for a semiconductor device manufacturing process |
| 07/12/2005 | US6916596 Laser imaged printing plates |
| 07/12/2005 | US6916582 Mask for fabrication of semiconductor devices, process for production of the same, and process for fabrication of semiconductor devices |
| 07/07/2005 | US20050149902 Eigen decomposition based OPC model |
| 07/07/2005 | US20050149901 Resolution enhancing technology using phase assignment bridges |
| 07/07/2005 | US20050149900 Feature optimization using enhanced interference mapping lithography |
| 07/07/2005 | US20050148195 Method for determining the construction of a mask for the micropatterning of semiconductor substrates by means of photolithography |
| 07/07/2005 | US20050147927 Patterning semiconductor layers using phase shifting and assist features |
| 07/07/2005 | US20050147898 Photolithography using interdependent binary masks |
| 07/07/2005 | US20050147897 Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer |
| 07/07/2005 | US20050147896 A first mask pattern is set perpendicular to a second mask pattern, each has a width not larger than the resolution limit thus restraining the optical proximity effect, improved fidelity of the microminiaturization mask pattern |
| 07/07/2005 | US20050147895 Creating a holographic representation of an image using a computer generated local encoding technique (LET); patterned material comprises transparent and opaque regions; three-dimensional patterns may be formed in photoresist layer of target one step; lithography; semiconductors |
| 07/07/2005 | US20050147894 Extreme ultraviolet mask with molybdenum phase shifter |
| 07/07/2005 | US20050147893 Forming rectangular patterns in a design using a pair of facing sides; using two vertexes sharing a side as start points and giving edge division points from start points to facing sides by predetermined intervals; lithography; simplification |
| 07/07/2005 | US20050146703 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 07/07/2005 | US20050145892 Mask, semiconductor device manufacturing method, and semiconductor device |
| 07/07/2005 | DE19727261B4 Verfahren zum Herstellen einer Phasenschiebemaske A method of manufacturing a phase shifting mask |
| 07/07/2005 | DE10392892T5 Reflektierender Maskenrohling Reflective mask blank |
| 07/07/2005 | DE10356035A1 Reflection or transmission photomask for projection onto semiconductor substrate, e.g. wafer, in integrated circuit production, has substrate with opaque or semitransparent layer(s) covered by passivating layer with unpolar surface |
| 07/07/2005 | DE10355264A1 Verfahren zur Verbesserung eines Simulationsmodells der photolithographischen Projektion A method for improving a simulation model of the photolithographic projection |
| 07/07/2005 | DE10255605B4 Reflektionsmaske zur Projektion einer Struktur auf einen Halbleiterwafer sowie Verfahren zu deren Herstellung Reflection mask for projecting a pattern on a semiconductor wafer, as well as processes for their preparation |
| 07/07/2005 | DE10127689B4 Verfahren zur Erzeugung von Streulinien in Maskenstrukturen zur Herstellung von integrierten elektrischen Schaltungen A process for the generation of stray lines in mask patterns for the production of integrated electrical circuits |
| 07/07/2005 | DE10053885B4 Verfahren zur Erzeugung von Maskendaten für die Einzelaufnahme-Teilbelichtung sowie zugehöriges Belichtungsverfahren A method for generating mask data for the individual female part as well as associated exposure exposure method |
| 07/06/2005 | EP1550002A2 Photomask assembly incorporating a porous frame and method for making it |
| 07/06/2005 | EP1171292A4 Process for direct digital printing of circuit boards |
| 07/06/2005 | CN1636265A Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask |
| 07/06/2005 | CN1636165A Phase conflict resolution for photolithographic masks |
| 07/06/2005 | CN1635626A Method and structure for manufacturing halftone mask for semiconductor wafer |
| 07/06/2005 | CN1635612A Electrostatic discharge protection method and structure for photomask |
| 07/06/2005 | CN1635424A Light shield processor and method for processing light shield using same |
| 07/06/2005 | CN1209791C Method for manufacturing complementary mask pair |
| 07/06/2005 | CN1209683C Photomask and method of producing same |
| 07/06/2005 | CN1209682C Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 07/05/2005 | US6915505 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
| 07/05/2005 | US6914252 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/05/2005 | US6913868 Conductive bi-layer e-beam resist with amorphous carbon |
| 07/05/2005 | US6913858 Plurality of apertures expose first surface and second opaque pattern formed on transparent substrate; semiconductors, liquid crystal displays |
| 07/05/2005 | US6913857 Reduced deformation due to heat generation |
| 06/30/2005 | WO2005059651A2 Method for repairing errors of patterns embodied in thin layers |
| 06/30/2005 | WO2004099875A3 Etching of chromium layers on photomasks utilizing high density plasma and low frequency rf bias |
| 06/30/2005 | WO2004066027A3 Electron beam processing for mask repair |
| 06/30/2005 | US20050144583 Method and data-processing system for rule-based optical proximity correction with simulataneous scatter bar insertion |
| 06/30/2005 | US20050142892 Method and structure for fabricating a halftone mask for the manufacture of semiconductor wafers |
| 06/30/2005 | US20050142881 Mask and method of using the same |
| 06/30/2005 | US20050142699 Method and structure for electrostatic discharge protection of photomasks |
| 06/30/2005 | US20050142681 Mask and method of manufacturing liquid crystal display device using the same |
| 06/30/2005 | US20050142501 Method of forming an isolated line pattern using photolithography |
| 06/30/2005 | US20050142470 Feature optimization using interference mapping lithography |
| 06/30/2005 | US20050142465 Method for fabricating a liquid crystal display device |
| 06/30/2005 | US20050142463 Thin films; sputtering target in vacuum; multilayer construction; crhromium nitride; chromium carbide and chromium oxynitride overcoating transparent substrate; photolithography |
| 06/30/2005 | US20050142462 Mask, method of production of same, and method of production of semiconductor device |
| 06/30/2005 | US20050142461 Photo mask and method for fabricating the same |
| 06/30/2005 | US20050142460 Method of fabricating a photomask |
| 06/30/2005 | US20050142459 Line photo masks and methods of forming semiconductor devices using the same |
| 06/30/2005 | US20050142458 Exposure mask and exposure method using the same |
| 06/30/2005 | US20050142457 Improving line resolution by using an overlapping exposing process; pattern bridges can be completely removed by the overlapping exposing process |
| 06/30/2005 | US20050142456 Masks for fabricating semiconductor devices and methods of forming mask patterns |
| 06/30/2005 | US20050142455 Specifying size of the defect to be detected depending on a state where the defect positions on which pixel of many pixels constituting the mask pattern |
| 06/30/2005 | US20050142454 Grid with a space smaller than a minimum pitch allowed by a design rule, and provides hole patterns at lattice points, which are the intersections of the grid; semiconductor integrated circuit manufacturing; flexibility of hole pattern arrangement and quality of hole pattern arrangement easily evaluated |
| 06/30/2005 | US20050142453 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved |
| 06/30/2005 | US20050142450 Laser beam pattern mask and crystallization method using the same |
| 06/30/2005 | US20050142449 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
| 06/30/2005 | US20050140952 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same |
| 06/30/2005 | US20050140949 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 06/30/2005 | US20050140531 Method of verifying proximity effect correction in electron beam lithography |
| 06/30/2005 | US20050139826 Structure of test element group wiring and semiconductor substrate |
| 06/30/2005 | US20050139575 Phase shift mask and fabricating method thereof |
| 06/30/2005 | US20050139112 Providing customized text and imagery on organic products |
| 06/29/2005 | EP1548810A2 Processing of semiconductor components with dense processing fluids and ultrasonic energy |
| 06/29/2005 | EP1548806A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 06/29/2005 | EP1548805A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 06/29/2005 | EP1548506A1 Lithographic apparatus and methods for use thereof |
| 06/29/2005 | EP1548014A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 06/29/2005 | EP1546944A1 Methods and systems for process control of corner feature embellishment |
| 06/29/2005 | CN1633626A Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/29/2005 | CN1633625A Photomask, method of producing it and pattern forming method using the photomask |
| 06/29/2005 | CN1633515A Aperture masks for circuit fabrication |
| 06/29/2005 | CN1632915A Method for distinguishing imperfect graphic spacing to improve microimage process |
| 06/29/2005 | CN1632696A Light shield and method for forming polycrystalline silicon layer applying the same |
| 06/28/2005 | US6912043 Removable reticle window and support frame using magnetic force |
| 06/28/2005 | US6911301 Methods of forming aligned structures with radiation-sensitive material |
| 06/28/2005 | US6911286 Photolithographic process used in semiconductor manufacturing |