| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/02/2005 | US6925202 System and method of providing mask quality control |
| 08/02/2005 | US6924891 Method and apparatus for article inspection including speckle reduction |
| 08/02/2005 | US6924886 photoresists; photolithography; comprises optical microscopes |
| 08/02/2005 | US6924880 Large-area mask and exposure system having the same |
| 08/02/2005 | US6924090 Method of recording identifier and set of photomasks |
| 08/02/2005 | US6924083 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 08/02/2005 | US6924071 Moving a selected feature located in a cell between a first boundary and a second boundary from a first pattern file to a second pattern file and exposing a resist layer of a photomask blank with the first pattern file by using step/repeat; |
| 08/02/2005 | US6924070 Composite patterning integration |
| 08/02/2005 | US6924069 Depositing a negative photoresist over the light blocking layer to include filling a portion of the opening exposing the negative photoresist layer through the quartz substrate; developing and dry etching; accuracy |
| 08/02/2005 | US6924068 Photomask fabrication method, photomask, and exposure method thereof |
| 08/02/2005 | US6924023 Method of manufacturing a structure having pores |
| 07/28/2005 | WO2005050316A3 Method involving a mask or a reticle |
| 07/28/2005 | WO2005015308A3 Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal |
| 07/28/2005 | WO2005001898A3 Method of designing a reticle and forming a semiconductor device therewith |
| 07/28/2005 | US20050166176 Computer implemented design system, a computer implemented design method, a reticle set, and an integrated circuit |
| 07/28/2005 | US20050166175 Alternating phase shift mask design for high performance circuitry |
| 07/28/2005 | US20050166173 Design data format and hierarchy management for processing |
| 07/28/2005 | US20050166172 Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor device |
| 07/28/2005 | US20050166171 Method and system for controlling the quality of a reticle |
| 07/28/2005 | US20050166112 Method and system for efficiently verifying optical proximity correction |
| 07/28/2005 | US20050164514 Method for etching a quartz layer in a photoresistless semiconductor mask |
| 07/28/2005 | US20050164130 Producing artwork; selectively segmenting into discrete regions using individually assigned halftone values, frequencies and angles; simplified, holographic effect |
| 07/28/2005 | US20050164129 Photomask and manufacturing method of semiconductor device |
| 07/28/2005 | US20050164128 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/28/2005 | US20050164121 Mask |
| 07/28/2005 | US20050164100 Phase shifting mask for manufacturing semiconductor device and method of fabricating the same |
| 07/28/2005 | US20050164099 Improved yield and device reliability; uses current manufacturing machines |
| 07/28/2005 | US20050164098 Pattern dimension accuracy; aligning mask or reticle with reference system and determining offset angle; rotating and processing in horizontal or vertical direction |
| 07/28/2005 | US20050164097 Simplifying design of alternating phase shift photomask; forming opaque layer on transparent substrate then patterning and etching and repeating on adjacent region |
| 07/28/2005 | US20050164096 Simple, low cost; utilizing test pattern within step distance of patterned layer |
| 07/28/2005 | US20050164095 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 07/28/2005 | US20050161745 CMOS device, method for fabricating the same and method for generating mask data |
| 07/28/2005 | US20050161620 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/28/2005 | DE102004063455A1 Fotomaske Photomask |
| 07/28/2005 | DE102004062228A1 Wafer exposing method for use during semiconductor device fabrication, involves transferring image onto shot areas by irradiating projection light, and scanning die area of wafer by irradiating scanning light |
| 07/28/2005 | DE102004057180A1 Photomask for patterning integrated circuit device, has substrate including array of shadowing units via which patterning radiation is passed, where transmittance of radiation is greater than approximately twenty percentage |
| 07/28/2005 | DE102004037009A1 Verfahren zum Herstellen einer Flüssigkristalldisplay-Vorrichtung A method of manufacturing a liquid crystal display device |
| 07/27/2005 | EP1557869A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 07/27/2005 | EP1556737A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication |
| 07/27/2005 | CN2713515Y Dim light phase shift light cover having double embedded layers |
| 07/27/2005 | CN1646994A Attenuated embedded phase shift photomask blanks |
| 07/27/2005 | CN1646988A Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method |
| 07/27/2005 | CN1646987A Radiation patterning tools, and methods of forming radiation patterning tools |
| 07/27/2005 | CN1646884A A mask blank and a method for producing the same |
| 07/27/2005 | CN1645377A Method and system for manufacturing layout and mask, and manufacture of semiconductor device |
| 07/27/2005 | CN1645256A Exposure process |
| 07/27/2005 | CN1212658C Monitoring system and method for monitoring process condition change by electron beam |
| 07/27/2005 | CN1212644C Mask pattern forming method, computer programme product, and optical mask production |
| 07/27/2005 | CN1212642C Mask pattern making method and semiconductor device making method |
| 07/27/2005 | CN1212542C Light cage for preventing electrostatic break down |
| 07/26/2005 | US6921613 Keeping contaminants away from a mask during exposure by using a spacer |
| 07/21/2005 | WO2005067010A2 Extreme ultraviolet mask with molybdenum phase shifter |
| 07/21/2005 | US20050160393 Method of automatically correcting mask pattern data and program for the same |
| 07/21/2005 | US20050160388 Streamlined IC mask layout optical and process correction through correction reuse |
| 07/21/2005 | US20050158668 Method of forming a mask pattern on a substrate |
| 07/21/2005 | US20050158638 transferring apperture patterns onto photoresist films, using projectors and phase shifting masks having radiation transparent films and light shields, to manufacture a dynamic random access memory |
| 07/21/2005 | US20050158636 Photomask and method of controlling transmittance and phase of light using the photomask |
| 07/21/2005 | US20050158635 connecting optics having a lithographic structure with frames and pellicles, using inorganic adhesive comprising a potassium silicate solution, to form exposure masks for structuring photoresist layers on substrate wafers |
| 07/21/2005 | US20050158634 Photolithography mask comprising absorber/phase-shifter elements |
| 07/21/2005 | US20050157918 Method for pattern recognition in energized charge particle beam wafer/slider inspection/measurement systems in presence of electrical charge |
| 07/21/2005 | US20050157288 Zero-force pellicle mount and method for manufacturing the same |
| 07/21/2005 | US20050157283 Optical element with a self-assembled monolayer, lithographic projection apparatus including such an optical element, and device manufacturing method |
| 07/21/2005 | US20050155388 Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| 07/21/2005 | DE10361875A1 Lithography mask comprises a structure for transferring a layout onto a substrate, with a blind macrostructure to suppress scattered light |
| 07/21/2005 | DE10360106A1 Handling a dielectric substrate and electrically conducting mask, comprises applying the mask to the substrate and holding it in place electrostatically or magnetically |
| 07/21/2005 | DE10359102A1 Optical component comprises a material with a longitudinal expansion coefficient which is spatially dependent |
| 07/20/2005 | EP1555863A1 Method of forming a mask pattern on a substrate |
| 07/20/2005 | EP1555572A1 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith |
| 07/20/2005 | CN1643659A Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus |
| 07/20/2005 | CN1643654A Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure |
| 07/20/2005 | CN1641485A Exposure system, test mask for flare testing, method for evaluating lithography process |
| 07/20/2005 | CN1211834C Semiconductor integrated circuit device mfg. method |
| 07/19/2005 | US6920628 Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique |
| 07/19/2005 | US6919564 Inspection method, apparatus and system for circuit pattern |
| 07/19/2005 | US6919150 Forming a substrate with windows and filling the windows multiple times, forming a support membrane over the substrate, and a mask layer is then formed and patterned |
| 07/19/2005 | US6919149 Substrate transparent to light from an exposure light source and a waveguide pattern formed on the substrate to define a plurality of transparent regions that are regularly arranged. The transparent regions defined by the waveguide pattern with |
| 07/19/2005 | US6919148 Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask |
| 07/19/2005 | US6919147 Production method for a halftone phase mask |
| 07/19/2005 | US6919146 Having antireflective surface which is easily checked for foreign matter; for use in photolithographic semiconductor manufacturing |
| 07/14/2005 | WO2005064399A2 Lithography system using a programmable electro-wetting mask |
| 07/14/2005 | WO2005063432A1 Device for machining a workpiece using laser light |
| 07/14/2005 | WO2005031458A3 Forming partial-depth features in polymer film |
| 07/14/2005 | WO2005022258A3 Photomask and method for maintaining optical properties of the same |
| 07/14/2005 | WO2005017949A3 Method for high-resolution processing of thin layers with electron beams |
| 07/14/2005 | WO2005010942A3 Method and apparatus for calibrating a metrology tool |
| 07/14/2005 | US20050153824 Fluorine-doped silicate glass and use thereof |
| 07/14/2005 | US20050153564 Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control |
| 07/14/2005 | US20050153466 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 07/14/2005 | US20050153218 Photomasks |
| 07/14/2005 | US20050153217 Pattern verification method, pattern verification system, mask manufacturing method and semiconductor device manufacturing method |
| 07/14/2005 | US20050153216 Lithography mask and lithography system for direction-dependent exposure |
| 07/14/2005 | US20050153214 Single trench repair method with etched quartz for attenuated phase shifting mask |
| 07/14/2005 | US20050153213 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
| 07/14/2005 | US20050153212 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 07/14/2005 | US20050151955 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 07/14/2005 | US20050151096 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151095 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 07/14/2005 | DE10361419A1 Layer structure for a memory component comprises a functional layer containing a lithographically fixed material for fixing the functional layer on the layer lying below it |
| 07/14/2005 | DE10356693A1 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 07/14/2005 | DE102004060600A1 Silicate glass used as substrate material in e.g. extreme ultraviolet-lithography, has silicon dioxide and additional glass former, which is e.g. germanium oxide, where silicate glass is doped with titanium dioxide and fluorine |