Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
08/2005
08/18/2005WO2005076082A1 Photosensitive printing sleeves and method of forming the same
08/18/2005WO2005076081A2 Reticle fabrication using a removable hard mask
08/18/2005WO2005076078A2 Mask for use in a microlithographic projection exposure system
08/18/2005WO2005076077A2 Mask inspection apparatus and method
08/18/2005WO2005076075A2 Adaptive real time control of a reticle/mask system
08/18/2005US20050182593 Wafer target design and method for determining centroid of wafer target
08/18/2005US20050181608 Method and apparatus for etching photomasks
08/18/2005US20050179925 Information processing apparatus and method
08/18/2005US20050179886 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
08/18/2005US20050178752 Method and device for correcting pattern film on a semiconductor substrate
08/18/2005DE10258423B4 Verfahren zur Charakterisierung eines Linsensystems A method for characterizing a lens system
08/17/2005CN1656424A Photolithographic mask fabrication
08/17/2005CN1656423A Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
08/17/2005CN1655062A Method and system for lithographic process window optimization
08/17/2005CN1655056A Optic mask and manufacturing method of thin film transistor array panel using the same
08/17/2005CN1215531C Manufacturing method of mask
08/17/2005CN1215374C Method for making anti-electrostatic light cover
08/16/2005US6931618 Feed forward process control using scatterometry for reticle fabrication
08/16/2005US6931097 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
08/16/2005US6930834 Method of manufacturing diffractive optical element
08/16/2005US6929898 Photopolymers; infrared radiation ablation layer
08/16/2005US6929886 Method and apparatus for the manufacturing of reticles
08/16/2005US6929721 Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes
08/16/2005US6928837 Silica glass substrates and their selection
08/11/2005WO2005073807A1 Computer-implemented methods for detecting defects in reticle design data
08/11/2005WO2005073806A1 Method and system for controlling the quality of a reticle
08/11/2005WO2005013003A3 Multilayer reflective extreme ultraviolet lithography mask blanks
08/11/2005WO2004107046A3 Mask, mask blank, photosensitive film therefor and fabrication thereof
08/11/2005US20050177810 Lithographic process window optimization under complex constraints on edge placement
08/11/2005US20050177809 Correcting 3D effects in phase shifting masks using sub-resolution features
08/11/2005US20050175907 Photo mask including scattering bars and method of manufacturing the same
08/11/2005US20050175906 can be automated to quickly and easily avoid phase shifting segment conflict;
08/11/2005US20050175905 Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask
08/11/2005US20050175145 Masks of semiconductor devices and methods of forming patterns thereof
08/11/2005US20050174557 Exposure pattern forming method and exposure pattern
08/11/2005US20050174553 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
08/11/2005US20050173752 Optic mask and manufacturing method of thin film transistor array panel using the same
08/11/2005US20050172703 Scanning probe microscopy inspection and modification system
08/11/2005DE10393131T5 Verfahren zum Herstellen von Maskenrohlingen, Verfahren zum Herstellen von Transfermasken, Sputtertarget zum Herstellen von Maskenrohlingen A method for producing mask blanks, A method for producing transfer masks, sputtering target for fabricating mask blanks
08/11/2005DE10392942T5 Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung Glass substrate for a mask blank and process for its preparation
08/11/2005DE10392658T5 Verfahren zur Herstellung eines Transfermasken-Substrats, Transfermasken-Substrat und Transfermaske A method for producing a transfer mask substrate transfer mask substrate and transfer mask
08/11/2005DE10239858B4 Verfahren und Anordnung zur Kompensation von Unebenheiten in der Oberfläche eines Substrates Method and apparatus for compensating for irregularities in the surface of a substrate
08/11/2005DE102005000734A1 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns
08/10/2005EP1562076A2 Mask, exposure method and production method of semiconductor device
08/10/2005EP1366511B1 Metal pattern formation
08/10/2005CN1653392A Photomask and method for manufacturing the same
08/10/2005CN1653389A Critical dimension control using full phase and trim masks
08/10/2005CN1653388A Patterning semiconductor layers using phase shifting and assist features
08/10/2005CN1652022A Flatness simulation system for mask substrate
08/10/2005CN1652021A Raster polarization photomask plate and its application in projection photoetching system
08/10/2005CN1652020A 蚀刻掩模 Etching mask
08/10/2005CN1214697C Mask and its mfg. method, electroluminance device and its mfg. method
08/10/2005CN1214615C Narrow band, anisotropic stochastic halftone patterns and methods for creating and method of using the same
08/10/2005CN1214456C Improved system and method for automatic photomask fault detection
08/10/2005CN1214449C Wet-etching agent composition
08/10/2005CN1214291C Composite relief image printing elements
08/10/2005CN1214289C Composite relief image printing plates and preparing method
08/10/2005CN1214286C Method of forming optical images, mask for use in this method, method of manufacturing device using this method, and apparatus for carrying out this method
08/10/2005CN1214285C Method and device for designing electron beam mask
08/09/2005US6928636 Rule based OPC evaluating method and simulation-based OPC model evaluating method
08/09/2005US6927345 Guard ring having electrically isolated lightening bars
08/09/2005US6927014 Printing images on light sensitive coatings using inks, then curing the coatings and washing to form masks
08/09/2005US6927005 Alternating phase shift mask design with optimized phase shapes
08/09/2005US6927004 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
08/09/2005US6927003 Automatic maintenance of radiation transparent deformations on attenuated phase shifting masks(PSM), using computer programs for analysis, then plugging with carbon
08/09/2005US6927002 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
08/09/2005US6926801 Laser machining method and apparatus
08/04/2005WO2005071130A1 Method and device for handling a dielectric substrate and a dielectric mask
08/04/2005WO2005036264A8 Photomask having an internal substantially transparent etch stop layer
08/04/2005US20050172255 Pattern inspection apparatus
08/04/2005US20050172249 Pattern generation on a semiconductor surface
08/04/2005US20050170657 Method of forming nanostructure
08/04/2005US20050170655 Reticle fabrication using a removable hard mask
08/04/2005US20050170294 Exposing a resist film formed on semiconductor substrate to a light using photomask in which patterns are arranged two-dimensionally at a predetermined altitude; development; reducing an opening size; setting a reflow start temperature, heating; coating with water soluble resin; crosslinking; etching
08/04/2005US20050170288 Optical lithography; radiation transparent phase shifting masks used in manufacture of semiconductors/integrated circuits
08/04/2005US20050170287 Actinic radiation absorbing compound uniformly distributed throughout support layer, with photopolymerizable material deposited thereon, and masking layer; relief imaging
08/04/2005US20050170266 Dehydrating chemically amplified resist layer on photomask blank in nitrogen-purged environment at above room temperature; patterning; shelf life, storage stability
08/04/2005US20050170265 Mask, exposure method and production method of semiconductor device
08/04/2005US20050170264 Projects images of grating pattern and test pattern; photoresists
08/04/2005US20050170263 Mask blank manufacturing method and sputtering target for manufacturing the same
08/04/2005US20050170261 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched
08/04/2005US20050169513 Reference data generating method, pattern defect checking apparatus, pattern defect checking method, reference data generating program, and semiconductor device manufacturing method
08/04/2005US20050168739 [tool and process for removing particles from reticle]
08/04/2005US20050168718 Apparatus for kinematic registration of a reticle
08/04/2005US20050167514 Adaptive real time control of a reticle/mask system
08/04/2005US20050166779 Method for producing flexo printing forms by means of laser direct engraving
08/04/2005DE19841528B4 Verfahren und Gerät zum Erzeugen von Halbleiterbelichtungsdaten A method and apparatus for producing semiconductor exposure data
08/04/2005DE19636751B4 Verfahren zum Herstellen einer Phasenschiebemaske A method of manufacturing a phase shifting mask
08/04/2005DE10240085B4 Verfahren zum Strukturieren einer Maskenschicht A method of patterning a mask layer
08/04/2005DE102004063140A1 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same
08/04/2005DE102004024941A1 Light exposure mask for manufacture of a microcircuit has a rounded frame as seen in plan view
08/03/2005EP1560073A2 Method of predicting and minimizing model opc deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
08/03/2005EP1560072A2 Computer aided modeling, reliability checking and verification of a lithography process using a calibrated eigen decomposition model
08/03/2005EP1558446A1 Thermal generation of a mask for flexography
08/03/2005EP1038196B1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same
08/03/2005CN1649155A CMOS device, method for fabricating the same and method for generating mask data
08/03/2005CN1648775A System and method for processing masks with oblique features
08/03/2005CN1648768A Automatic design device and method, and its medium mask unit and semiconductor ic circuit
08/03/2005CN1213345C Method and device for phase-shifting optical cover
08/02/2005US6925629 Reticle fabrication method
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