| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/09/2005 | WO2005024520A3 Phototool coating |
| 09/08/2005 | US20050196713 Adding fluorinated polyether additive to a dispersion of electrophoretic pigment-containing microparticles dispersed in a dielectric solvent prepared by microencapsulation; improved colloidal stability, switching performance and temperature latitude |
| 09/08/2005 | US20050196705 Forming image with high resolving power; producing extremely fine circuit pattern; utilizing excimer laser light emitted from annular shaped source; improving contrast with reduction projection lens; eliminates phase shifting |
| 09/08/2005 | US20050196701 Process for preparing a flexographic printing plate |
| 09/08/2005 | US20050196689 Method for transferring a layout of an integrated circuit level to a semiconductor substrate |
| 09/08/2005 | US20050196688 Performing model-based optical proximity correction (OPC) on the repair solution; allowing repair decision for an attenuated phase shifing mask to be made at the same time that inspection is done |
| 09/08/2005 | US20050196687 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 09/08/2005 | US20050196685 Rectangular contact lithography for circuit performance improvement and manufacture cost reduction |
| 09/08/2005 | US20050196684 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method |
| 09/08/2005 | US20050196683 Forming a first semitransparent layer configured to add a first phase rotation to a light beam passing through; forming a second semitransparent layer configured to add a second phase rotation to a light beam passing through; semiconductors |
| 09/08/2005 | US20050196682 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern |
| 09/08/2005 | US20050196680 Multi-image reticles |
| 09/08/2005 | US20050195414 Method and apparatus for determining local variation of the reflection or transmission behavior over a mask surface |
| 09/08/2005 | US20050194427 X-ray alignment system for fabricating electronic chips |
| 09/08/2005 | DE10356699A1 Lithographiemaske und Lithographiesystem für richtungsabhängige Belichtung Lithography mask lithography system for directional exposure |
| 09/08/2005 | DE102004040764A1 Verfahren zum Korrigieren von Verletzungen von Maskenregeln nach optischer Nachbarschaftskorrektur, maschinenlesbares Speichermedium und System A method for correcting violations of rules after optical proximity correction mask, machine-readable storage medium and system |
| 09/08/2005 | DE102004008835A1 Process for photolithographically exposing a semiconductor wafer used in the production of semiconductor circuits comprises carrying out lithographic exposure using a lithographic mask and post-exposing the wafer in the substrate region |
| 09/08/2005 | DE102004008749A1 Verfahren zur Herstellung eines großvolumigen CaF2-Einkristalles mit geringer Streuung und verbesserter Laserstabilität, sowie ein solcher Kristall und dessen Verwendung A method for producing a large volume of CaF2 single crystal with low scattering and improved laser stability, as well as such a crystal and its use |
| 09/08/2005 | DE102004008497A1 Herstellungsverfahren für eine Halbleiterstruktur in einem Substrat, wobei die Halbleiterstruktur mindestens zwei unterschiedlich zu strukturierende Bereiche aufweist Manufacturing method of a semiconductor structure in a substrate, wherein the semiconductor structure comprises at least two different areas to be patterned comprises |
| 09/08/2005 | DE102004006372A1 Transformation of positional information relating to structural elements in a pattern representing one or more levels of an integrated circuit between two different coordinate systems by use of a transformation step library |
| 09/08/2005 | DE10138882B4 Großflächige Membranmaske und Verfahren zu ihrer Herstellung Large-scale membrane mask and process for their preparation |
| 09/07/2005 | CN1666148A Mask and manufacturing method using mask |
| 09/07/2005 | CN1666147A Method of using an amorphous carbon layer for reticle fabrication |
| 09/07/2005 | CN1664702A Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
| 09/07/2005 | CN1664697A Manufacturing method for exposure mask, generating method for mask substrate information |
| 09/07/2005 | CN1218366C Film semiconductor device |
| 09/07/2005 | CN1218218C Manufacture of ture 3D microelectronic mechanical system based on composite imprinting photoetched material |
| 09/07/2005 | CN1218217C Phase shift masking for complex patterns |
| 09/07/2005 | CN1218171C Gray tone mask defect detecting method and defect detecting device |
| 09/06/2005 | US6941186 Semiconductor manufacturing apparatus |
| 09/06/2005 | US6940585 Evaluation mask, focus measuring method and aberration measuring method |
| 09/06/2005 | US6939650 making integrated circuits using absorbent transmission masks that can be repaired |
| 09/06/2005 | US6939649 Preparing a mask having, on a first main surface of a mask sustrate; permitting inversion of the phase of a light transmitted through the second light transmitting region transferring predetermined patterns to a photoresist film |
| 09/01/2005 | WO2005081070A1 Methods for exposing patterns and emulating masks in optical maskless lithography |
| 09/01/2005 | WO2005081066A1 Rectangular contact lithography for circuit performance improvement |
| 09/01/2005 | WO2005081059A1 Method for the production of masks used in photolithography, and use of such masks |
| 09/01/2005 | WO2005081034A1 Two-dimensional light modulation device, exposure apparatus, and exposure method |
| 09/01/2005 | WO2005079470A2 Photomask and method for conveying information associated with a photomask substrate |
| 09/01/2005 | US20050193364 Pattern forming method and semiconductor device manufactured by using said pattern forming method |
| 09/01/2005 | US20050193363 Method of IC fabrication, IC mask fabrication and program product therefor |
| 09/01/2005 | US20050191843 Fabrication method for semiconductor structure in a substrate, the semiconductor structure having at least two regions that are to be patterned differently |
| 09/01/2005 | US20050191583 Exposure apparatus and method |
| 09/01/2005 | US20050191565 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles |
| 09/01/2005 | US20050191562 Method of increasing the shelf life of a photomask substrate |
| 09/01/2005 | US20050191561 Producing and processing an organic coating on the phase shifter mask using an electron beam for repairing a defect of the phase shifter mask, allowing efficient production of very small structures, even for 157 nm lithography. |
| 09/01/2005 | US20050191419 Fabrication of nanostructures |
| 09/01/2005 | US20050190957 System and method of providing mask defect printability analysis |
| 09/01/2005 | US20050190684 Nanometer scale data storage device and associated positioning system |
| 09/01/2005 | US20050190450 Ultra high transmission phase shift mask blanks |
| 09/01/2005 | US20050190355 Apparatus and system for improving phase shift mask imaging performance and associated methods |
| 09/01/2005 | DE4447264B4 Verfahren zur Herstellung einer Halbton-Phasenverschiebungsmaske A method for producing a halftone phase shift mask |
| 08/31/2005 | CN1662851A Photomask |
| 08/31/2005 | CN1662388A Photosensitive resin composition for original printing plate capable of being carved by laser |
| 08/31/2005 | CN1661773A Mask data correction method, photomask, optical image prediction method |
| 08/31/2005 | CN1661480A Method for forming pattern |
| 08/31/2005 | CN1661479A Eigen decomposition based OPC model |
| 08/31/2005 | CN1217237C Self-compensating mark arrangement for stepper alignment |
| 08/31/2005 | CN1217235C Mfg. method of light shade for protecting film and auxilary protective film |
| 08/30/2005 | US6936931 For use in semiconductor device |
| 08/30/2005 | US6936831 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same |
| 08/30/2005 | US6936406 Method of manufacturing integrated circuit |
| 08/25/2005 | WO2005078483A1 Optical member, its manufacturing method, and display |
| 08/25/2005 | WO2005076935A2 Wavelength filtering in nanolithography |
| 08/25/2005 | WO2005008747A3 Methods and systems for inspection of wafers and reticles using designer intent data |
| 08/25/2005 | WO2004008245A3 Method and system for context-specific mask inspection |
| 08/25/2005 | US20050188341 Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method |
| 08/25/2005 | US20050186691 Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| 08/25/2005 | US20050186491 Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM |
| 08/25/2005 | US20050186488 Spin coated photomasks; antistatic, electroconductive film of oligomeric or polymeric N,N-dimethyl-N-ethyl-(p-vinylbenzyl)ammonium chloride; integrated circuit microlithography |
| 08/25/2005 | US20050186487 Blank has a phase shift film sputtered onto a radiation transparent substrate comprising two or more silicides, nitrides or oxynitrides of molybdenum, zirconium, tantalum and tungsten; lithographic processing and etching the mask; improved high energy radiation resistance, especially to ArF or F2 lasers |
| 08/25/2005 | US20050186486 Method for correcting mask pattern, exposure mask, and mask producing method |
| 08/25/2005 | US20050186485 Forming layer of metal and silicon-containing compound film on transparent substrate by co-sputtering; photoresists; semiconductors; integrated circuits |
| 08/25/2005 | US20050186484 Method for forming mask pattern of semiconductor device |
| 08/25/2005 | US20050186405 Microcontact printing method using imprinted nanostructure and nanostructure thereof |
| 08/25/2005 | US20050185307 Optical component, comprising a material with a predetermined homogneity of thermal expansion |
| 08/25/2005 | US20050185173 Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns |
| 08/25/2005 | US20050185166 Exposure apparatus and device manufacturing method |
| 08/25/2005 | US20050185159 Fast model-based optical proximity correction |
| 08/25/2005 | DE10393095T5 Lithografiemaskenrohling Lithography mask blank |
| 08/25/2005 | DE102005002434A1 Absorber mask for structuring a refraction grating using X-ray depth lithography comprises an appropriately aligned silicon wafer with appropriately aligned grating teeth |
| 08/25/2005 | DE102004003341A1 Attenuated phase shift mask for projecting a pattern onto a light sensitive layer, comprises a transparent mask substrate, and primary and secondary patterned sections |
| 08/25/2005 | DE10131139B4 Verfahren zur Herstellung großflächiger Membranmasken mittels Trockenätzen A process for producing large-area membrane masks by dry etching |
| 08/24/2005 | EP1566691A2 Method for correcting mask pattern, exposure mask, and mask producing method |
| 08/24/2005 | EP1566469A2 Process for producing a large volume CaF2 single crystal with a low scattering and improved laser stability, as well as such a crystal and its application |
| 08/24/2005 | EP1299824A4 Convergence technique for model-based optical and proximity correction |
| 08/24/2005 | EP1269266A4 A method of improving photomask geometry |
| 08/24/2005 | CN1658076A Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model |
| 08/24/2005 | CN1658069A Preparation method of nano mould in nano-seal technology |
| 08/24/2005 | CN1658068A Photolithographic process, photomask and manufacturing thereof |
| 08/24/2005 | CN1216285C Gray tone mask defect detecting method and device, and optical mask defect detecting method and device |
| 08/23/2005 | US6934410 the process is carried out in a computer using computer readable program code that models the mask and light intensities and generates computer definitions of corrected masks for use in the photolithographic process |
| 08/23/2005 | US6934038 Method for optical system coherence testing |
| 08/23/2005 | US6934010 Optical proximity correction method utilizing gray bars as sub-resolution assist features |
| 08/23/2005 | US6933085 Transparent phase shift mask for fabrication of small feature sizes |
| 08/23/2005 | US6933084 Alternating aperture phase shift photomask having light absorption layer |
| 08/23/2005 | US6933083 Selecting an intended modified form of illumination that the phase grating is to provide in a photolithography; dividing into subcells; arbitrarily assigning one of a plurality of phase values to the subcells, randomly selecting mask system |
| 08/23/2005 | US6933082 Photomask with dust-proofing device and exposure method using the same |
| 08/23/2005 | US6933081 Method for quartz bump defect repair with less substrate damage |
| 08/18/2005 | WO2005076322A1 Aligner and semiconductor device manufacturing method using the aligner |
| 08/18/2005 | WO2005076320A1 Integrated circuit design method, design support program used in the integrated circuit design method, and integrated circuit design system |