| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/04/2005 | US6952256 Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles |
| 10/04/2005 | US6951701 Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM |
| 10/04/2005 | US6951502 Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| 09/29/2005 | WO2005090931A1 Embedded attenuated phase shift mask with tunable transmission |
| 09/29/2005 | US20050216878 Long range corrections in integrated circuit layout designs |
| 09/29/2005 | US20050215162 Plasma display panel producing method, and plasma display panel |
| 09/29/2005 | US20050214688 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency |
| 09/29/2005 | US20050214658 Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks |
| 09/29/2005 | US20050214657 Method of generating writing pattern data of mask and method of writing mask |
| 09/29/2005 | US20050214656 Process for producing a mask |
| 09/29/2005 | US20050214655 Made using perfluorinated polymers that have been irradiated with high energy electron beam and fluorinated to increase transparency of perfluorinated polymer; cross-linked perfluorinated polymer selected from FEP, PFA, and tetrafluororethylene-co-perfluoroisobutylene |
| 09/29/2005 | US20050214654 ESD-resistant photomask and method of preventing mask ESD damage |
| 09/29/2005 | US20050214653 Repair of photolithography masks by sub-wavelength artificial grating technology |
| 09/29/2005 | US20050214652 Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret |
| 09/29/2005 | US20050214471 Molecular templating of a surface |
| 09/29/2005 | US20050213084 Mask-defect inspecting apparatus |
| 09/29/2005 | US20050213083 Mask defect inspection apparatus |
| 09/29/2005 | US20050211925 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method |
| 09/29/2005 | US20050211918 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 09/29/2005 | US20050211681 Charged-particle beam system |
| 09/29/2005 | US20050211160 Method for making large-volume CaF2 single cystals with reduced scattering and improved laser stability, the crystals made by the method and uses thereof |
| 09/29/2005 | DE19723618B4 Maske und Verfahren zu ihrer Herstellung zum Belichten von flexographischen Platten Mask and method for their production for exposing flexographic plates |
| 09/29/2005 | DE102004032401A1 Device for exposing a photosensitive resist layer on a semiconductor wafer during manufacture of a semiconductor memory comprises a light source, an illuminator geometry, a hybrid mask, and a projection lens |
| 09/29/2005 | DE102004010002A1 Lithographic mask holder for e.g. mask recorder, has electrodes that are electrically biased to reduce distances between mask and electrodes by electrical attraction of mask, where mask is attached on holder via electrodes |
| 09/28/2005 | EP1580806A2 Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device |
| 09/28/2005 | EP1579274A2 Method and system for context-specific mask inspection |
| 09/28/2005 | EP1579273A2 System and method for aerial image sensing |
| 09/28/2005 | EP1360552B1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 09/28/2005 | CN1675191A Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer |
| 09/28/2005 | CN1674233A Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device |
| 09/28/2005 | CN1674226A A method for performing transmission tuning of a mask pattern to improve process latitude |
| 09/28/2005 | CN1673859A Assembly of a reticle holder and a reticle |
| 09/28/2005 | CN1220912C Method for making grey mask |
| 09/27/2005 | US6950187 Method for determining rotational error portion of total misalignment error in a stepper |
| 09/27/2005 | US6949766 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 09/27/2005 | US6949638 Photolithographic method and system for efficient mask usage in manufacturing DNA arrays |
| 09/27/2005 | US6949320 Preparation method of exposure original plate |
| 09/22/2005 | WO2005088393A1 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 09/22/2005 | WO2005087505A1 Lightweight offset plates, preparation and use thereof |
| 09/22/2005 | WO2005050317A3 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 09/22/2005 | WO2003058344A3 System and method for aerial image sensing |
| 09/22/2005 | US20050210437 Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model |
| 09/22/2005 | US20050210436 Alternating phase-shift mask rule compliant ic design |
| 09/22/2005 | US20050208427 Semiconductor device manufacturing method |
| 09/22/2005 | US20050208396 Identifying a target edge fragment that form a length and a classification in a photolithographic design, length of the target edge fragment is less than a minimum scatter bar length, target edge fragment is smoothed with the collinear edge fragment to increase the length of the target edge fragment |
| 09/22/2005 | US20050208393 Photomask and method for creating a protective layer on the same |
| 09/22/2005 | US20050208392 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes |
| 09/22/2005 | US20050208391 Focus masking structures, focus patterns and measurements thereof |
| 09/22/2005 | US20050208390 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 09/22/2005 | US20050208389 Reflection type mask blank and reflection type mask and production methods for them |
| 09/22/2005 | US20050207638 System and method for automatically transferring a defect image from an inspection system to a database |
| 09/22/2005 | US20050207011 Diffractive optical system |
| 09/22/2005 | US20050206881 Reticle and optical characteristic measuring method |
| 09/22/2005 | US20050206879 Lithographic apparatus and methods for use thereof |
| 09/22/2005 | US20050206867 Scanning exposure apparatus and method |
| 09/22/2005 | US20050205805 Scratch repairing processing method and scanning probe microscope (SPM) used therefor |
| 09/22/2005 | DE102004010902A1 Verfahren zur Übertragung eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat A method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 09/22/2005 | DE102004010363A1 Verfahren und Meßgerät zur Bestimmung einer örtlichen Variation des Reflektions- oder Transmissionsverhaltens über die Oberfläche einer Maske Method and device for determining a local variation of the reflection or transmission behavior over the surface of a mask |
| 09/22/2005 | DE10100820B4 Verfahren zum Prüfen einer Belichtungsmaske A method of testing an exposure mask |
| 09/22/2005 | CA2558444A1 Lightweight offset plates, preparation and use thereof |
| 09/21/2005 | EP0787289B1 Automated photomask inspection apparatus and method |
| 09/21/2005 | CN1672099A Photomask and method for repairing defects |
| 09/21/2005 | CN1672098A Lithographic template having a repaired gap defect |
| 09/21/2005 | CN1670922A Semiconductor device manufacturing method |
| 09/21/2005 | CN1670622A Light shield made through laser annealing and method for forming polycrystalline films by utilizing laser annealing |
| 09/21/2005 | CN1220253C Method for generating mask data, mask and method for manufacturing semiconductor device |
| 09/20/2005 | US6947519 X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
| 09/20/2005 | US6947122 Scanning exposure apparatus and method |
| 09/15/2005 | WO2005085952A1 Photomask substrate made of synthetic quartz glass and photomask |
| 09/15/2005 | WO2005085951A1 Method for supporting mask manufacture, method for providing mask blank and mask blank dealing system |
| 09/15/2005 | WO2005085950A1 Method of manufacturing photomask blank |
| 09/15/2005 | WO2005085947A1 Laser light source device, exposure apparatus using this laser light source device, and mask examining device |
| 09/15/2005 | US20050204330 Exposure pattern forming method and exposure pattern |
| 09/15/2005 | US20050204327 Layout data verification method, mask pattern verification method and circuit operation verification method |
| 09/15/2005 | US20050204322 Design layout preparing method |
| 09/15/2005 | US20050202349 Method for manufacturing a liquid crystal display device |
| 09/15/2005 | US20050202324 Method for producing masks for photolithograpy and the use of such masks |
| 09/15/2005 | US20050202323 Phase shift mask and method of manufacturing phase shift mask |
| 09/15/2005 | US20050202322 Methods of forming alternating phase shift masks having improved phase-shift tolerance |
| 09/15/2005 | US20050202252 Use of alternative polymer materials for "soft" polymer pellicles |
| 09/15/2005 | US20050201514 Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm |
| 09/15/2005 | US20050199809 Processing probe |
| 09/15/2005 | DE10393430T5 Verfahren zur Korrektur eines Maskenmusters A method for correcting a mask pattern |
| 09/15/2005 | DE102004007678B3 Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask |
| 09/15/2005 | DE10127217B4 Verfahren zur Herstellung lagegenauer großflächiger Membranmasken A process for producing more accurate location of large-scale membrane masks |
| 09/14/2005 | EP1574902A1 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 09/14/2005 | EP1573396A2 Laser exposure of photosensitive masks for dna microarray fabrication |
| 09/14/2005 | EP1573395A2 Scatterometry alignment for imprint lithography |
| 09/14/2005 | EP1305673A4 Prioritizing the application of resolution enhancement techniques |
| 09/14/2005 | CN1669121A Transfer mask for exposure and pattern exchanging method of the same |
| 09/14/2005 | CN1668979A Pattern size correcting device and pattern size correcting method |
| 09/14/2005 | CN1668978A In-situ balancing for phase-shifting mask |
| 09/14/2005 | CN1667512A Method for forming light reflecting pattern and products thereof |
| 09/14/2005 | CN1667505A Layout data verification method, mask pattern verification method and circuit operation verification method |
| 09/13/2005 | US6943458 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 09/13/2005 | US6943359 Structured organic materials and devices using low-energy particle beams |
| 09/13/2005 | US6942958 photoresists reduce subwavelength/proximity effect distortions; for production of semiconductors |
| 09/09/2005 | WO2005083516A2 Protected pattern mask for reflection lithography in the extreme uv or soft x-ray range |
| 09/09/2005 | WO2005083515A1 Process for fabricating semiconductor device and method for generating mask pattern data |
| 09/09/2005 | WO2005082063A2 Long range corrections in integrated circuit layout designs |