Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2005
10/26/2005CN1688933A Photomask and its production method, and pattern forming method
10/26/2005CN1688932A Method for correcting mask pattern
10/26/2005CN1688914A Methods and systems for improved boundary contrast
10/25/2005US6959029 Apparatus for performing anastomosis
10/25/2005US6958292 Method of manufacturing integrated circuit
10/25/2005US6958207 a photomask spatially modulates the intensity of UV-light onto a photosensitive material effective for visible light; polymeric films adhered onto optically transparent substrates; high quality surface profiles; uniformity, reproducibility
10/25/2005US6958201 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
10/20/2005WO2005098686A2 Modeling resolution enhancement processes in integrated circuit fabrication
10/20/2005US20050235245 Design pattern correction method and mask pattern producing method
10/20/2005US20050233580 Alignment pattern for a semiconductor device manufacturing process
10/20/2005US20050233511 Laser mask and method of crystallization using the same
10/20/2005US20050233262 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
10/20/2005US20050233226 Apparatus and method for correcting pattern dimension and photo mask and test photo mask
10/20/2005US20050233225 Ultraviolet exposure irradiates from excimer laser or an fluorine gas laser; contains evaluation section with growable substance
10/20/2005US20050233224 Method of improving polysilicon film crystallinity
10/20/2005US20050233223 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
10/20/2005US20050233172 Alumina insulation for coating implantable components and other microminiature devices
10/20/2005US20050232477 Defect inspection apparatus and defect inspection method
10/20/2005US20050231707 Removable reticle window and support frame using magnetic force
10/19/2005EP1587113A2 Stylus system for modifying small structures
10/19/2005EP1586943A2 Photolithographic mask fabrication
10/19/2005EP1586008A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
10/19/2005EP1586007A2 Electron beam processing for mask repair
10/19/2005CN1685284A Multi-image reticles
10/19/2005CN1684228A Optic micro distance correcting method
10/19/2005CN1683998A Method and device for producing analogue exposure tool imaging performance model and program product
10/19/2005CN1683995A Laser mask and method of crystallization using the same
10/19/2005CN1683942A Method for forming color filter and light emitting element layer, color display device and its producing method
10/19/2005CN1224079C Double layer coding light shade for rooting of mask implanting code ROM
10/19/2005CN1223905C Exposure process
10/19/2005CN1223899C A few light shield installable light shield support and micro-image exposure system
10/19/2005CN1223898C Method for producing photo mask and method for producing semiconductor device using said photo mask
10/18/2005US6957414 Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks
10/18/2005US6957176 Reduction processing method and computer readable storage medium having program stored thereon for causing computer to execute the method
10/18/2005US6956694 Broad spectrum ultraviolet inspection systems employing catadioptric imaging
10/18/2005US6955993 Mask and method for making the same, and method for making semiconductor device
10/13/2005WO2005096098A2 Projection objective, projection exposure apparatus and reflective reticle for microlithography
10/13/2005WO2005081066A8 Rectangular contact lithography for circuit performance improvement
10/13/2005WO2005054119A3 Methods and devices for fabricating three-dimensional nanoscale structures
10/13/2005WO2005026836A3 Laminated photosensitive relief printing original plate and method for producing the relief printing plate
10/13/2005US20050229148 Model-based two-dimensional interpretation filtering
10/13/2005US20050229147 Test ket layout for precisely monitoring 3-foil lens aberration effects
10/13/2005US20050229146 Data storage method and data storage device
10/13/2005US20050229145 Method and system for chrome cut-out regions on a reticle
10/13/2005US20050229131 Intermediate layout for resolution enhancement in semiconductor fabrication
10/13/2005US20050227497 Light transparent substrate imprint tool with light blocking distal end
10/13/2005US20050227182 Method of producing a relief image for printing
10/13/2005US20050227169 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance
10/13/2005US20050227165 laser engravable printing element which is a photocured resin formulation containing a solid state resin ( e.g butadiene-styrene copolymer), an organic compound containing a polymerizable unsaturated group e.g divinylbenzene, and inorganic porous particles (silica)
10/13/2005US20050227153 Mask for proximity field optical exposure, exposure apparatus and method therefor
10/13/2005US20050226494 Pattern inspection apparatus, pattern inspection method, and recording medium
10/13/2005US20050226492 Acceptable defect positioning and manufacturing method for large-scaled photomask blanks
10/13/2005US20050225836 Pattern generator mirror configurations
10/13/2005US20050225741 Exposure apparatus
10/13/2005US20050224920 Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device
10/13/2005US20050224725 System and method for proximity effect correction in imaging systems
10/13/2005US20050223785 Scanning probe device and processing method by scanning probe
10/13/2005US20050223718 Thermophoretic wand to protect front and back surfaces of an object
10/13/2005DE102004014482A1 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks
10/13/2005DE102004012240A1 Production of a perforated mask used in the production of integrated circuits comprises preparing a mask blank having a substrate and an etch stop layer, applying a membrane layer on the etch stop layer, and further processing
10/12/2005EP1584980A2 Method of optical proximity correction using chamfers and rounding at corners
10/12/2005EP1584979A1 Mask blank having a protection layer
10/12/2005EP1178889A4 Gravure short run printing plate
10/12/2005CN1680878A Feature optimisation using interference mapping lithography
10/12/2005CN1680877A Lithographic apparatus and methods for use thereof
10/12/2005CN1680873A Screen-printing metal mask plate
10/12/2005CN1222830C Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer
10/12/2005CN1222829C Lithography device which uses source of radiation in the extreme ultraviolet range and multi-layered mirrors with broad spectral band in this range
10/11/2005US6954911 Method and system for simulating resist and etch edges
10/11/2005US6954266 Method and apparatus for inspecting multilayer masks for defects
10/11/2005US6953976 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern
10/11/2005US6953733 Method of manufacturing alignment mark and aligning method using the same
10/11/2005US6953644 Method for compensating for scatter/reflection effects in particle beam lithography
10/11/2005US6953643 Mask shaping using temporal and spatial coherence in ultra high resolution lithography
10/06/2005WO2005093721A1 Transfer mold and exposure mask for manufacturing magnetic disc board
10/06/2005WO2005022259A3 Attaching a pellicle frame to a reticle
10/06/2005US20050223349 Photomask manufacturing support system
10/06/2005US20050221560 Method of forming a vertical memory device with a rectangular trench
10/06/2005US20050221202 Wavelength filtering in nanolithography
10/06/2005US20050221201 Creating at least one drawing layer that defines changes to the structures to be formed on the surface of a semiconductor substrate at one step in the processing , which involves the use of a mask; drawing layer will define a pattern region that will either result in removal of matter from semiconductor
10/06/2005US20050221200 Photomask features with chromeless nonprinting phase shifting window
10/06/2005US20050221199 Mask blank and a method for producing the same
10/06/2005US20050220332 Pattern inspection method, pattern inspection system and pattern inspection program of photomask
10/06/2005US20050220330 Method of inspecting an mura defect in a pattern and apparatus used for the same
10/06/2005US20050219550 Apparatus for optical system coherence testing
10/06/2005US20050219502 RET for optical maskless lithography
10/06/2005US20050217988 Halftones; translucence; semiconductors, integrated circuits
10/06/2005DE19930296B4 Verfahren und Photomaske zur Herstellung eines integrierten Schaltkreisbauelements mit einer Stufe A method and photomask for manufacturing an integrated circuit device with a step
10/05/2005EP1582934A2 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
10/05/2005EP1582922A1 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/05/2005EP1582921A2 Film-depositing target and preparation of phase shift mask blank
10/05/2005EP1582920A2 Halftone phase shifting mask blank, halftone phase shifting mask, and pattern transfer method
10/05/2005EP1581835A1 Liquid crystal displays with post spacers, and their manufacture
10/05/2005CN1679040A Method and system for electronic order entry and automatic processing of photomask orders
10/05/2005CN1678962A Improved photomask having an intermediate inspection film layer
10/05/2005CN1677245A Laser drawing device, method thereof and method for preparing optical mask
10/05/2005CN1677232A Method for making metal picture
10/05/2005CN1677097A Method of inspecting an mura defect in a pattern and apparatus used for the same
10/05/2005CN1221867C Exposure method for forming IC chip image in intermeidate mask using main mask
10/04/2005US6952818 Method and system for optical proximity correction
1 ... 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 ... 249