Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2005
11/17/2005US20050255388 Imaging and devices in lithography
11/17/2005US20050255387 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask
11/17/2005US20050255237 Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height; printing an ink from polymer-coated tip to substrate to form structure on substrate, wherein tip is scanned by position system which provides scanning feedback; biotechnology
11/17/2005US20050254096 Reduction of harmonic artifacts in halftone screens
11/17/2005US20050254065 Method and apparatus for detecting surface characteristics on a mask blank
11/17/2005US20050254063 Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks
11/16/2005EP1596572A2 Reduction of artifacts in halftone screens
11/16/2005CN1698155A Plasma display panel producing method, and plasma display panel
11/16/2005CN1698014A Exposing mask and production metod therefor and exposing method
11/16/2005CN1697726A Method of decorating surface of mold and mold
11/16/2005CN1227737C Method and apparatus for personalization of semiconductor
11/15/2005US6966047 Capturing designer intent in reticle inspection
11/15/2005US6964832 Semiconductor device and manufacturing method thereof
11/15/2005US6964485 Collector for an illumination system with a wavelength of less than or equal to 193 nm
11/10/2005WO2005106597A2 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/10/2005WO2005106585A1 Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
11/10/2005WO2005015308B1 Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal
11/10/2005WO2004083958A3 Photoactive component comprising organic layers
11/10/2005US20050251781 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program
11/10/2005US20050251771 Integrated circuit layout design methodology with process variation bands
11/10/2005US20050250330 integrated circuit; diffusion barrier layer is covalently attached to the silicon substrate
11/10/2005US20050250052 Maskless lithography using UV absorbing nano particle
11/10/2005US20050250041 Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer
11/10/2005US20050250025 Method and lithographic structure for measuring lengths of lines and spaces
11/10/2005US20050250022 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
11/10/2005US20050250021 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects
11/10/2005US20050250020 Mask, layout thereon and method therefor
11/10/2005US20050250019 Mask device for photolithography and application thereof
11/10/2005US20050250018 Halftone phase shift mask blank; suppress the production of foreign substances such as ammonium sulfate caused by ammonium ions due to laser irradiation during exposure; forming a thin film (ammonium ion production preventing layer) containing less nitrogen than the nitrogen-containing thin film
11/10/2005US20050250017 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank
11/10/2005US20050248741 Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device
11/10/2005US20050247669 Method for repairing a phase shift mask
11/09/2005EP1594008A2 Method and apparatus for submicron ic design using edge fragment tagging
11/09/2005EP1594005A2 Process for preparing a flexographic printing plate
11/09/2005EP1594001A1 Device and method for imprint lithography
11/09/2005EP1060439B1 Improved pattern generator for avoiding stitching errors
11/09/2005CN1695222A Particle-optical device and detection means
11/09/2005CN1695150A Methods and systems for process control of corner feature embellishment
11/09/2005CN1695093A Damascene extreme ultraviolet lithography (euvl) photomask and method of making
11/08/2005US6964032 efficiently configure SRAFs corresponding to an optimally configured annular illumination source of a lithographic projection system; lithographic masks
11/08/2005US6964031 Mask pattern generating method and manufacturing method of semiconductor apparatus
11/08/2005US6964030 Method for automatic mask tool translation
11/08/2005US6964016 Method of paginating printed material
11/08/2005US6963434 System and method for calculating aerial image of a spatial light modulator
11/08/2005US6963395 Method and apparatus for inspecting an EUV mask blank
11/08/2005US6962765 substrates having coatings including binders, adjuvants, light to heat conversion dyes and latent curing agents, and receivers having texturized surfaces, for use in thermal printing
11/08/2005US6962762 Exposure positioning in photolithography
11/03/2005WO2005104193A1 Method for correcting electron beam exposure data
11/03/2005WO2005103827A1 A method for error reduction in lithography
11/03/2005WO2005103821A1 Low-expansion glass substrate for a reflective mask and reflective mask
11/03/2005WO2005103820A1 Levenson type phase shift mask and production method therefor
11/03/2005US20050244757 Dynamic mask module
11/03/2005US20050244727 Dynamic mask module
11/03/2005US20050244726 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
11/03/2005US20050244725 Apparatus and method for structure exposure of a photoreactive layer
11/03/2005US20050244724 Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
11/03/2005US20050244723 Lithography mask for the fabrication of semiconductor components
11/03/2005US20050244722 Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
11/03/2005US20050244535 Method for decorating surface of mold and mold
11/03/2005US20050243452 Monolithic hard pellicle
11/03/2005US20050243398 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243397 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243296 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/03/2005US20050242448 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same
11/03/2005US20050241338 Reduced striae extreme ultraviolet elements
11/02/2005EP1170343B1 Infrared sensitive coating liquid
11/02/2005CN1692312A Photomask blank, and photomask
11/02/2005CN1692311A Mask correcting method
11/02/2005CN1690866A Device and method for treating panel
11/02/2005CN1690862A Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool
11/02/2005CN1690849A Optics film and its manufacturing method
11/02/2005CN1690847A Method for acceptable defect location for large size light mask substrate and production of light mask
11/02/2005CN1690698A Optical type appearance testing method and optical type appearance testing device
11/02/2005CN1225678C Optical approaching correcting method
11/01/2005US6961920 Method for interlayer and yield based optical proximity correction
11/01/2005US6960481 Evaluation method
11/01/2005US6960425 Method for laminating and patterning carbon nanotubes using chemical self-assembly process
11/01/2005US6960413 Multi-step process for etching photomasks
11/01/2005US6960412 Uses as an intermediate layer of titanium and boron material easy in controlling a film stress so as to produce a mask prevented from being deformed to cause degradation in transfer accuracy
11/01/2005US6960411 For forming patterns on a semiconductor substrate
11/01/2005US6960381 For photolithographic patterning
10/2005
10/27/2005WO2005101255A2 Intermediate layout for resolution enhancement in semiconductor fabrication
10/27/2005WO2005101130A1 Method of producing a relief image
10/27/2005US20050239291 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/27/2005US20050238996 Photosensitive resin laminate
10/27/2005US20050238966 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors
10/27/2005US20050238965 Method and system of lithography using masks having gray-tone features
10/27/2005US20050238964 Photomask
10/27/2005US20050238963 causing the low reflective layer to function as a thin inorganic etching mask layer; by the use of a pattern formed in the absorber layer as a mask to thereby form a pattern in the buffer layer
10/27/2005US20050238922 Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them
10/27/2005US20050238221 Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device
10/27/2005US20050235853 Edge cure prevention process
10/27/2005US20050235696 Positioning a nonrigid implant in a lower half of the uterine cavity and allowing it to remain to promote tissue growth that results in adhesion formation; reduces or eliminates abnormal intrauterine bleeding causing amenorrhea
10/27/2005DE19740948B4 Phasenschiebemaske und Verfahren zum Herstellen derselben Phase-shifting mask and method for manufacturing the same
10/27/2005DE19622037B4 Verfahren zur Prüfung von Defekten in auf Photomasken ausgebildeten Strukturen Procedure for the assessment of defects in structures formed on photomasks
10/27/2005DE102004017131A1 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices
10/27/2005DE10104577B4 Verfahren zum Belacken eines Photomaskenrohlings für die Chipherstellung A method for lacquering a photomask blank for chip production
10/26/2005EP1589373A1 Exposing mask and production method therefor and exposing method
10/26/2005EP1588221A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
10/26/2005CN1688934A Method for fabricating photomask and semiconductor device
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