| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/08/2005 | WO2005115743A2 Light scattering euvl mask |
| 12/08/2005 | US20050273754 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method |
| 12/08/2005 | US20050273733 OPC conflict identification and edge priority system |
| 12/08/2005 | US20050272590 Silica glass containing TiO2 and process for its production |
| 12/08/2005 | US20050271953 Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
| 12/08/2005 | US20050271952 hexagonal dot pattern, improving the crystallization characteristics; use for thin film transistor (TFT) arrays such as for liquid crystal displays |
| 12/08/2005 | US20050271951 Plasma etching apparatus and method of fabricating photomask using the same |
| 12/08/2005 | US20050271950 vinyl acetate-vinyl chloride copolymers or polyurethane layers containing carbon black nanoparticles, that is impervious to ultraviolet light and exhibits excellent wear resistance and bonding strength to substrate films, used for preparation of flexographic printing plate |
| 12/08/2005 | US20050271949 Reticle manipulations |
| 12/08/2005 | US20050271262 Method and apparatus for inspecting a mura defect, and method of manufacturing a photomask |
| 12/08/2005 | US20050270857 Semiconductor manufacturing apparatus |
| 12/08/2005 | US20050270523 Method of characterizing flare |
| 12/07/2005 | EP1602979A2 Lithography apparatus and pattern forming method using the same |
| 12/07/2005 | EP1602007A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 12/07/2005 | CN1705915A Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 12/07/2005 | CN1704844A Light shield positioning device |
| 12/07/2005 | CN1230717C Photographic corrosion mfg method for mixing chromium-free film and phase transition mixed type photo mask, and photographic corrosion manufacturing method employing the mask |
| 12/06/2005 | US6973636 Method of defining forbidden pitches for a lithography exposure tool |
| 12/06/2005 | US6973633 Caching of lithography and etch simulation results |
| 12/06/2005 | US6972836 Measuring method of illuminance unevenness of exposure apparatus, correcting method of illuminance unevenness, manufacturing method of semiconductor device, and exposure apparatus |
| 12/06/2005 | US6972832 Method of grounding a photoblank to a holding device |
| 12/06/2005 | US6972576 Electrical critical dimension measurement and defect detection for reticle fabrication |
| 12/06/2005 | US6972417 Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons |
| 12/06/2005 | US6972165 Electron beam exposure mask and electron beam exposure method using the same |
| 12/01/2005 | WO2005114327A1 Imaging and devices in lithography |
| 12/01/2005 | US20050268272 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 12/01/2005 | US20050268256 Modeling resolution enhancement processes in integrated circuit fabrication |
| 12/01/2005 | US20050266586 Stylus system for modifying small structures |
| 12/01/2005 | US20050266321 Mask for proximity field optical exposure, exposure apparatus and method therefor |
| 12/01/2005 | US20050266320 Pattern support layer having a thin thickness wherein a time-dependent change in stress is small; excellent membrane quality |
| 12/01/2005 | US20050266319 Patterning substrate and cell culture substrate |
| 12/01/2005 | US20050266318 Reticle manufacturing method |
| 12/01/2005 | US20050266317 Light scattering euvl mask |
| 12/01/2005 | US20050265595 Size checking method and apparatus |
| 12/01/2005 | US20050265592 Image data correction method, lithography simulation method, image data correction system, program , mask and method of manufacturing a semiconductor device |
| 12/01/2005 | US20050264827 Interferometric measuring device and projection exposure installation comprising such measuring device |
| 12/01/2005 | US20050264790 Lithographic apparatus and device manufacturing method |
| 12/01/2005 | US20050264788 Lithography apparatus and pattern forming method using the same |
| 12/01/2005 | US20050263700 Processing method using probe of scanning probe microscope |
| 12/01/2005 | US20050262685 Method of processing vertical cross-section using atomic force microscope |
| 12/01/2005 | DE10204222B4 Verfahren zur Seitenwandpassivierung beim Plasmaätzen A method for sidewall passivation during plasma etching |
| 12/01/2005 | DE10121178B4 Experimentelles Verfahren zur Verifikation von Abbildungsfehlern bei Fotomasken Experimental procedure for the verification of aberrations in photomasks |
| 11/30/2005 | EP1600817A1 Pattern generator mirror configurations |
| 11/30/2005 | EP1599762A2 Optical lithography using both photomask surfaces |
| 11/30/2005 | CN1702549A Pattern data manufacturing method, pattern checking method and application thereof |
| 11/30/2005 | CN1702548A Non-scribing metal mask and use thereof |
| 11/30/2005 | CN1702547A Method for making high accuracy grey scale masks |
| 11/30/2005 | CN1702429A Corrugation flaw inspection mask, corrugation flaw inspection device and method and method for manufacturing photo mask |
| 11/30/2005 | CN1229841C Color separating hood for cathode ray tube |
| 11/29/2005 | US6970589 Method for inspecting defects on a mask |
| 11/29/2005 | US6970291 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 11/29/2005 | US6969864 System and method for lithography process monitoring and control |
| 11/29/2005 | US6969853 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus |
| 11/29/2005 | US6969837 System and method for lithography process monitoring and control |
| 11/29/2005 | US6969568 etched by a plasma containing one of a nitrogen augmented hydro-fluorocarbon oxygen mixture and a nitrogen augmented fluorocarbon oxygen mixture |
| 11/24/2005 | WO2005111874A2 Integrated circuit layout design methodology with process variation bands |
| 11/24/2005 | WO2005045897A3 Mask data preparation |
| 11/24/2005 | US20050262468 Designing method and device for phase shift mask |
| 11/24/2005 | US20050262467 Method and system for utilizing an isofocal contour to perform optical and process corrections |
| 11/24/2005 | US20050260508 manufacturing of micromechanical devices and micro-optical components such as diffractive, refractive and holographic optics; each aperture includes a plurality segments forming a serrated edge, resulting in mixed edge diffraction; resolution |
| 11/24/2005 | US20050260507 Photolithographic method and system for efficient mask usage in manufacturing DNA arrays |
| 11/24/2005 | US20050260506 Phase shift mask including a substrate with recess |
| 11/24/2005 | US20050260505 Preparation of photomask blank and photomask |
| 11/24/2005 | US20050260504 Mask blank having a protection layer |
| 11/24/2005 | US20050260503 Reticle film stabilizing method |
| 11/24/2005 | US20050260502 Method and mask for forming a photo-induced pattern |
| 11/24/2005 | US20050259237 Method for optimizing nils of exposed lines |
| 11/24/2005 | US20050258420 Semiconductor device having a gap between a gate electrode and a dummy gate electrode |
| 11/24/2005 | US20050258165 Heat treating apparatus and heat treating method |
| 11/24/2005 | DE102004021415A1 Verfahren zur Strukturbelichtung einer photoreaktiven Schicht und zugehörige Belichtungsvorrichtung A method for structure exposure of a photoreactive layer and associated exposure apparatus |
| 11/23/2005 | EP1597631A1 Multiple exposure method for circuit performance improvement |
| 11/23/2005 | CN1701279A Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 11/23/2005 | CN1700100A Lithography member and method thereof |
| 11/23/2005 | CN1700097A System and method for calculating aerial image of a spatial light modulator |
| 11/23/2005 | CN1228691C Multiply light shield putting flatwise device and method for improving superimposed micro-image |
| 11/23/2005 | CN1228671C Mask, substrate with light reflection film, method for making light reflection film, display device and electronic device |
| 11/23/2005 | CN1228670C Mask, substrate with light reflection film, light reflection film forming method, electro-optic device and manufacturing method thereof, and electronic device |
| 11/22/2005 | US6968532 Multiple exposure technique to pattern tight contact geometries |
| 11/22/2005 | US6968531 Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data |
| 11/22/2005 | US6968530 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 11/22/2005 | US6968529 Phase shift mask, and exposure method and device manufacturing method using the same |
| 11/22/2005 | US6968528 Photo reticles using channel assist features |
| 11/22/2005 | US6968527 Reticle for transferring an integrated circuit layout to a wafer; efficiency |
| 11/22/2005 | US6967771 Antireflection coating for ultraviolet light at large angles of incidence |
| 11/22/2005 | US6967719 Illuminating a mask, in which a mask-pattern including mask-patterns of different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting |
| 11/22/2005 | US6967712 Apparatus and system for improving phase shift mask imaging performance and associated methods |
| 11/22/2005 | US6967168 Method to repair localized amplitude defects in a EUV lithography mask blank |
| 11/17/2005 | WO2005109257A2 Method and apparatus for designing integrated circuit layouts |
| 11/17/2005 | WO2005109256A2 Methos and apparatus for designing integrated circuit layouts |
| 11/17/2005 | WO2005109095A2 Method for imprint lithography at constant temperature |
| 11/17/2005 | WO2005108914A2 Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks |
| 11/17/2005 | WO2005108077A2 Edge cure prevention process |
| 11/17/2005 | WO2005067010A3 Extreme ultraviolet mask with molybdenum phase shifter |
| 11/17/2005 | WO2005054950A3 Method for creating a control command for a mask writing device |
| 11/17/2005 | WO2005024518A3 Phase shift mask blank with increased uniformity |
| 11/17/2005 | US20050257189 Phase-shift lithography mapping method and apparatus |
| 11/17/2005 | US20050257188 Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein |
| 11/17/2005 | US20050257187 Fast and accurate optical proximity correction engine for incorporating long range flare effects |
| 11/17/2005 | US20050255390 Photomask for the manufacturing of reflective bumps |
| 11/17/2005 | US20050255389 Phase shift mask and method of producing the same |