| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/03/2006 | US6983444 Mask for reducing proximity effect |
| 01/03/2006 | US6982786 Reticle and optical characteristic measuring method |
| 01/03/2006 | US6982222 Method of generating interconnection pattern |
| 01/03/2006 | US6982136 for photoresist/photomask patterns; scanning electron microscopy; semiconductors; integrated circuits |
| 01/03/2006 | US6982135 Pattern compensation for stitching |
| 01/03/2006 | US6982134 Multiple stepped aperture repair of transparent photomask substrates |
| 01/03/2006 | US6982133 Damage-resistant coatings for EUV lithography components |
| 12/29/2005 | WO2005124836A1 Pellicle frame assembly |
| 12/29/2005 | WO2005124468A1 A photolitography apparatus and mask for nano meter scale patterning of some arbitrary shapes |
| 12/29/2005 | WO2005124461A1 Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition |
| 12/29/2005 | WO2005124455A1 Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask |
| 12/29/2005 | WO2005124454A1 Semitransmitting film, photomask blank, photomask, and semitransmitting film designing method |
| 12/29/2005 | WO2005124293A1 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| 12/29/2005 | WO2005123857A1 Polishing method for glass substrate, and glass substrate |
| 12/29/2005 | WO2005123617A1 Process for polishing glass substrate |
| 12/29/2005 | WO2005076081A3 Reticle fabrication using a removable hard mask |
| 12/29/2005 | US20050287797 Method of making a semiconductor device manufacturing mask substrate |
| 12/29/2005 | US20050287483 Contact hole printing method and apparatus with single mask, multiple exposures, and optimized pupil filtering |
| 12/29/2005 | US20050287450 Process for controlling the proximity effect correction |
| 12/29/2005 | US20050287447 Reflection mask, use of the reflection mask and method for fabricating the reflection mask |
| 12/29/2005 | US20050287446 Method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask |
| 12/29/2005 | US20050287445 Method of making grayscale mask for grayscale doe production by using an absorber layer |
| 12/29/2005 | US20050287444 Automatically assigning and changing phase colors as chip circuit designs are being assembled; correct binary colorability of a hierarchical unit is preserved |
| 12/29/2005 | US20050287443 Methods and systems for layout and routing using alternating aperture phase shift masks |
| 12/29/2005 | US20050286755 Photomask image registration in scanning electron microscope imagery |
| 12/29/2005 | US20050285033 luminophor materials comprising terbium, gadolinium-doped rare-earth aluminum scandium borate, used as light sources for fluorescent lamps or plasma display panels |
| 12/29/2005 | DE112004000236T5 Maskenbearbeitungsvorrichtung, Maskenbearbeitungs-Verfahren, Programm und Maske Mask processing apparatus, mask processing method, program and mask |
| 12/29/2005 | DE10392540T5 Verfahren zum Korrigieren einer Maske A method for correcting a mask |
| 12/29/2005 | DE10351972B4 Verfahren zum Bestimmen des optischen Einflusses einer Maskenschicht einer lithographischen Maske A method for determining the optical influence of a mask layer of a lithographic mask |
| 12/28/2005 | EP1610366A1 Cleaning method, method for removing foreign particle, cleaning apparatus and cleaning liquid |
| 12/28/2005 | EP1608596A1 SILICA GLASS CONTAINING TIO sb 2 /sb AND PROCESS FOR ITS PRODUCTION |
| 12/27/2005 | US6981241 Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masks |
| 12/27/2005 | US6979525 Forming a pattern on a substrate by using a halftone phase shift mask where the halftone phase shift mask includes a translucent phase shift pattern having an aperutre, and an auxiliary pattern, having an organic film for light shielding |
| 12/27/2005 | US6979521 exposing the photoresist to a grayscale pattern from a laser writer, developing the photoresist into variable thickness, and transferring the surface relief pattern from the photoresist layer onto the absorber layer by etching. |
| 12/27/2005 | US6979520 Stencil mask for ion implantation |
| 12/27/2005 | US6979519 an opaque-field phase shift mask and the second mask is a single phase structure mask, a phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field |
| 12/27/2005 | US6979518 Attenuated embedded phase shift photomask blanks |
| 12/27/2005 | US6979408 Method and apparatus for photomask fabrication |
| 12/22/2005 | WO2005121893A1 Improvements in printing techniques |
| 12/22/2005 | WO2004081258A3 Apparatus and method for non-contact cleaning of a surface |
| 12/22/2005 | US20050283747 OPC simulation model using SOCS decomposition of edge fragments |
| 12/22/2005 | US20050282072 Providing a mask substrate;forming a lower multilayer reflective stack; forming a first embedded layer over the lower multilayer reflective stack; forming a second embedded layer; forming a top multilayer reflective stack; etching an opening through the top multilayer reflective stack |
| 12/22/2005 | US20050281954 Method for producing a pellicle for lithography |
| 12/22/2005 | US20050281639 Transport apparatus |
| 12/22/2005 | US20050280805 Mura defect inspection mask, apparatus and method of inspecting the mura defect, and method of producing a photomask |
| 12/22/2005 | US20050280800 Optical proximity correction using chamfers and rounding at corners |
| 12/22/2005 | US20050280796 Illumination optical system and method, and exposure apparatus |
| 12/22/2005 | US20050280792 Defining a pattern on a substrate |
| 12/22/2005 | US20050280789 Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto |
| 12/22/2005 | US20050280150 Photolithographic techniques for producing angled lines |
| 12/22/2005 | DE10356966A1 Verfahren zum Erstellen einer Steueranweisung für ein Maskenschreibgerät Procedure to create a control statement for a mask writing tool |
| 12/22/2005 | DE10351607B4 Anordnung zur Projektion eines auf einer Photomaske gebildeten Musters auf einen Halbleiterwafer Arrangement for projecting a pattern formed on a photo mask onto a semiconductor wafer |
| 12/22/2005 | DE10339786B4 Halbtonphasenmaske, Verfahren zur Herstellung derselben und Verfahren zur Projektion einer auf ihr gebildeten Struktur auf ein Substrat Halbtonphasenmaske, method for producing the same and method for projecting a film formed on their structure on a substrate |
| 12/22/2005 | DE10121179B4 Experimentelles Verfahren zur Verifikation von Abbildungsfehlern bei optischen Belichtungsgeräten Experimental procedure for the verification of aberrations in the optical exposure devices |
| 12/21/2005 | EP1606671A2 Method and device for wetting a substrate with a liquid |
| 12/21/2005 | EP1606670A2 Applications of semiconductor nano-sized particles for photolithography |
| 12/21/2005 | CN1711502A Pellicle with small gas production amount |
| 12/21/2005 | CN1710487A Continuous-surface shape mask moving photoetching exposure device |
| 12/20/2005 | US6978438 Optical proximity correction (OPC) technique using generalized figure of merit for photolithograhic processing |
| 12/20/2005 | US6978437 Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same |
| 12/20/2005 | US6978436 Design data format and hierarchy management for phase processing |
| 12/20/2005 | US6978041 Review work supporting system |
| 12/20/2005 | US6977715 Method for optimizing NILS of exposed lines |
| 12/20/2005 | US6977422 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 12/20/2005 | US6977133 Photomask and pattern forming method |
| 12/20/2005 | US6977127 Alternating phase shift mask |
| 12/20/2005 | US6977126 Pellicle, photomask, pellicle frame, and method for manufacturing pellicle |
| 12/20/2005 | US6977098 Method of uniformly coating a substrate |
| 12/15/2005 | WO2005109257A3 Method and apparatus for designing integrated circuit layouts |
| 12/15/2005 | US20050278155 Method of simulation of an exposure process |
| 12/15/2005 | US20050278046 Comprehensive front end method and system for automatically generating and processing photomask orders |
| 12/15/2005 | US20050277065 Method of manufacturing a semiconductor device |
| 12/15/2005 | US20050277035 Exposure measurement method and apparatus, and semiconductor device manufacturing method |
| 12/15/2005 | US20050277034 Mask blank, phase shift mask manufacturing method and template manufacturing method |
| 12/15/2005 | US20050277033 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| 12/15/2005 | US20050277032 Photomask reticle having multiple versions of the same mask pattern with different biases |
| 12/15/2005 | US20050277031 Method and apparatus for clean photomask handling |
| 12/15/2005 | US20050277030 capping structure may include alternating layers of a capping material, e.g., ruthenium, and a material with a lower EUV absorption coefficient, e.g., silicon |
| 12/15/2005 | US20050277028 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment |
| 12/15/2005 | US20050275835 Method and apparatus for protecting an EUV reticle from particles |
| 12/15/2005 | US20050275820 Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product |
| 12/15/2005 | US20050274901 System for scatterometric measurements and applications |
| 12/15/2005 | US20050274693 Device and method for lithography |
| 12/15/2005 | US20050274692 Siloxane copolymer crosslinkable containing an aliphatic or cycloaliphatic organofunctional group such as a hydroxy, epoxy, acyloxy or acryloxy group; improved storage stability, filling properties, adhesion and coating uniformity; film is dissolvable in a stripping solution |
| 12/15/2005 | US20050274392 Cleaning process for photomasks |
| 12/15/2005 | DE102004017131B4 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices |
| 12/14/2005 | EP1604247A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 12/14/2005 | CN1707362A Method of manufacturing a semiconductor device |
| 12/14/2005 | CN1231814C 激光加工设备 Laser processing equipment |
| 12/14/2005 | CN1231813C Grey mask |
| 12/13/2005 | US6976240 Simulation using design geometry information |
| 12/13/2005 | US6974992 Semiconductor device having a non-straight line pattern with plural interconnected arched lines |
| 12/13/2005 | US6974782 Reticle tracking and cleaning |
| 12/13/2005 | US6974652 Lithographic photomask and method of manufacture to improve photomask test measurement |
| 12/13/2005 | US6974651 Method of making a photomask |
| 12/13/2005 | US6974650 Adjust defects during pattern transfer |
| 12/13/2005 | US6974649 Support frames; stress relieving membrane; reducing defects; scattering layer pattern |
| 12/08/2005 | WO2005116759A2 Cleaning a mask substrate |
| 12/08/2005 | WO2005116758A2 Cleaning a mask substrate |
| 12/08/2005 | WO2005116751A1 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |