Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2014
11/04/2014US8881068 Optimized optical proximity correction handling for lithographic fills
11/04/2014US8878119 Optical inspection method and optical inspection apparatus
11/04/2014US8877650 Methods of manufacturing semiconductor devices and optical proximity correction
11/04/2014US8877639 Method and algorithm for random half pitched interconnect layout with constant spacing
11/04/2014US8877410 Data process for E-beam lithography
11/04/2014US8877409 Reflective mask and method of making same
10/2014
10/30/2014US20140322634 Mask black, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
10/28/2014US8875063 Mask layout formation
10/28/2014US8873830 Method for extracting contour of pattern on photo mask, contour extraction apparatus, method for guaranteeing photo mask, and method for manufacturing semiconductor device
10/28/2014US8872135 Electroactive polymers for lithography
10/28/2014US8871433 Method for producing microstructure
10/28/2014US8871424 Laser imageable polyolefin film
10/28/2014US8871410 Method for producing pattern phase difference film
10/28/2014US8871409 Lithographic targets for uniformity control
10/28/2014US8871408 Mask pattern creation method, recording medium, and semiconductor device manufacturing method
10/28/2014US8871407 Patterning mask and method of formation of mask using step double patterning
10/28/2014US8871104 Method of forming pattern, reticle, and computer readable medium for storing program for forming pattern
10/28/2014US8869738 Mask frame assembly for thin film deposition and the manufacturing method thereof
10/23/2014US20140315122 Pellicle and an assembly of photomask plus pellicle
10/21/2014US8869079 Semiconductor device and layout design method for the same
10/21/2014US8867818 Method of creating template for matching, as well as device for creating template
10/21/2014US8867019 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
10/21/2014US8865390 Patterning process and resist composition
10/21/2014US8865378 Photomask blank, photomask, and methods of manufacturing the same
10/21/2014US8865377 Method and system for forming a diagonal pattern using charged particle beam lithography
10/21/2014US8865376 EUVL process structure fabrication methods
10/21/2014US8865375 Halftone phase shift blank photomasks and halftone phase shift photomasks
10/16/2014US20140308604 Photo mask and method for forming pattern using the same
10/14/2014US8863045 Optical proximity correction method based on hybrid simulation model
10/14/2014US8859181 Chemically amplified negative resist composition and patterning process
10/14/2014US8859169 Photomask having patterns for EUV light and DUV light
10/14/2014US8859168 Masks for microlithography and methods of making and using such masks
10/14/2014US8859167 Pattern forming method, positional deviation measuring method and photomask
10/14/2014US8858814 Photomask blank, processing method, and etching method
10/14/2014US8857449 Substrate processing apparatus and substrate processing method
10/09/2014WO2014164894A1 Multistage extreme ultra-violet mask qualification
10/09/2014US20140302679 Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device
10/09/2014US20140302429 Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and mask
10/09/2014US20140302428 Mask for fabricating semiconductor device and method of fabricating the mask
10/09/2014US20140302427 Mask layout patterns for closely spaced primitives in phase shift photolithography masks
10/09/2014DE102013225006A1 Vorrichtung und Verfahren zur Reduzierung von Kontaminationen eines Retikels und/oder eines Wafers in einem optischen System An apparatus and method for reducing contamination of a reticle and / or wafer in an optical system
10/07/2014US8856707 Semiconductor device feature density gradient verification
10/07/2014US8856693 Method for designing optical lithography masks for directed self-assembly
10/07/2014US8854600 Exposure apparatus and photomask
10/07/2014US8853642 Beam regulating apparatus for an EUV illumination beam
10/07/2014US8852853 Photo-mask and method for manufacturing liquid crystal display device using the same
10/07/2014US8852832 Radiation-sensitive colored composition, color filter and method for producing the same, solid state image device, and liquid crystal display apparatus
10/07/2014US8852831 Device for manufacturing a surface using character projection lithography with variable magnification
10/07/2014US8852830 Photomask and semiconductor apparatus manufacturing method
10/07/2014US8852728 Conductive film
10/02/2014WO2014154452A1 Lithographic apparatus
10/02/2014WO2014153889A1 Ultraviolet mask plate and preparation method therefor, and curing method for sealant
10/02/2014WO2014153879A1 Uv mask and fabrication method thereof
10/02/2014WO2014153866A1 Mask plate and manufacturing method therefor
10/02/2014US20140295330 Optically transparent and electrically conductive coatings and method for their deposition on a substrate
10/02/2014DE102014204876A1 Inspektionsverfahren und Inspektionsvorrichtung Inspection method and inspection apparatus
09/2014
09/30/2014US8846276 Blankmask and photomask using the same
09/30/2014US8846275 Method for mask patterns
09/30/2014US8846274 Mask blank, transfer mask and process for manufacturing semiconductor devices
09/30/2014US8846273 Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
09/30/2014US8845908 Reticles, and methods of mitigating asymmetric lens heating in photolithography
09/30/2014CA2688799C In-line holographic mask for micromachining
09/25/2014US20140287568 Method for manufacturing semiconductor device and exposure mask used in the same method
09/25/2014US20140285789 Lithography Method and Structure for Resolution Enhancement with a Two-State Mask
09/25/2014US20140283873 Apparatus and Method For Indirect Surface Cleaning
09/23/2014US8843859 Layout content analysis for source mask optimization acceleration
09/23/2014US8842982 Communications network
09/23/2014US8842272 Apparatus for EUV imaging and methods of using same
09/23/2014US8841049 Electron beam data storage system and method for high volume manufacturing
09/23/2014US8841048 Photomask blank, photomask, and making method
09/23/2014US8841047 Extreme ultraviolet lithography process and mask
09/18/2014WO2014143928A1 Method and apparatus for preparing a screen printing screen
09/18/2014WO2014142125A1 Pellicle film, and pellicle
09/18/2014WO2014140047A2 Method and device for writing photomasks with reduced mura errors
09/18/2014WO2014140046A2 Mechanically produced alignment fiducial method and device
09/18/2014WO2014139855A1 Patterning device, method of producing a marker on a substrate and device manufacturing method
09/18/2014WO2014139807A1 Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unit
09/18/2014US20140282299 Method and apparatus for performing optical proximity and photomask correction
09/18/2014US20140273310 Monitoring pattern for devices
09/18/2014US20140272717 System and Method for Lithography Exposure with Correction of Overlay Shift Induced by Mask Heating
09/18/2014US20140272687 Extreme ultraviolet (euv) multilayer defect compensation and euv masks
09/18/2014US20140272686 Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same
09/18/2014US20140272685 Method and device for writing photomasks with reduced mura errors
09/18/2014US20140272684 Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor
09/18/2014US20140272683 Method Of Fabricating Mask
09/18/2014US20140272682 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140272681 Extreme Ultraviolet Light (EUV) Photomasks, and Fabrication Methods Thereof
09/18/2014US20140272680 Method For Mask Fabrication And Repair
09/18/2014US20140272679 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140272678 Structure and Method for Reflective-Type Mask
09/18/2014US20140272677 Methods for fabricating euv masks and methods for fabricating integrated circuits using such euv masks
09/18/2014US20140272676 Technique for Repairing an EUV Photo-Mask
09/18/2014US20140272675 Method and system for forming a diagonal pattern using charged particle beam lithography
09/18/2014US20140272674 Mask structure
09/18/2014US20140272673 Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
09/18/2014US20140268091 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140268087 Lithography and Mask for Resolution Enhancement
09/18/2014US20140268083 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor
09/18/2014US20140268081 Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
09/18/2014US20140268080 Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
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